• Title/Summary/Keyword: Micro Assembly

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A Multi-chip Microelectrofluidic Bench for Modular Fluidic and Electrical Interconnections (전기 및 유체 동시접속이 가능한 멀티칩 미소전기유체통합벤치의 설계, 제작 및 성능시험)

  • Chang Sung-Hwan;Suk Sang-Do;Cho Young-Ho
    • Transactions of the Korean Society of Mechanical Engineers A
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    • v.30 no.4 s.247
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    • pp.373-378
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    • 2006
  • We present the design, fabrication, and characterization of a multi-chip microelectrofluidic bench, achieving both electrical and fluidic interconnections with a simple, low-loss and low-temperature electrofluidic interconnection method. We design 4-chip microelectrofluidic bench, having three electrical pads and two fluidic I/O ports. Each device chip, having three electrical interconnections and a pair of two fluidic I/O interconnections, can be assembled to the microelectofluidic bench with electrical and fluidic interconnections. In the fluidic and electrical characterization, we measure the average pressure drop of $13.6{\sim}125.4$ Pa/mm with the nonlinearity of 3.1 % for the flow-rates of $10{\sim}100{\mu}l/min$ in the fluidic line. The pressure drop per fluidic interconnection is measured as 0.19kPa. Experimentally, there are no significant differences in pressure drops between straight channels and elbow channels. The measured average electrical resistance is $0.26{\Omega}/mm$ in the electrical line. The electrical resistance per each electrical interconnection is measured as $0.64{\Omega}$. Mechanically, the maximum pressure, where the microelectrofluidic bench endures, reaches up to $115{\pm}11kPa$.

Development of auto-alignment punching system and de-burring (자동 정렬 펀칭 시스템의 개발과 디버링)

  • 홍남표;신홍규;김병희;김헌영
    • Proceedings of the Korean Society for Technology of Plasticity Conference
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    • 2003.05a
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    • pp.434-438
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    • 2003
  • The shearing process for the sheet metal is normally used in the precision elements such as semi-conductor components. In these precision elements, the burr formation brings a bad effect on the system assembly and demands the additional de-burring process. In this paper, we have developed the desktop-type precision punching system to investigate the burr formation mechanism and present kinematically Punch-die auto aligning methodology, for the purpose of burr unifomizing and minimizing, between the rectangular shaped punch and die. By using the scanning electron microscope, the aligned punching results are compared with the miss-aligned ones. Also, we measured the relative burr heights using the self-designed laser measuring device for insitu self aligning. Since it is hard to get the perfect, so called, burr-free edges during the shearing process, we introduced the ultrasonic do-burring machine. The de-burring operation was carried out by a novel do-burring method, the reversal flow resistance method, under different machining loads and abrasive types. The final do-burring results show the validity of our punching do-burring system pursuing the burr-free punched elements.

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Contact Print Lithography for Precise Transplantation of Three-dimensional Microstructures into a Microsystem (표면접촉 인쇄방식을 이용한 극미세 3차원 형상의 이식공정에 관한 연구)

  • Park, Sang-Hu;Jeong, Jun-Ho;Choi, Dae-Geun;Kim, Ki-Don;Altun, Ali Ozhan;Lee, Eung-Sug;Yang, Dong-Yol;Kong, Hong-Jin;Lee, Kwang-Sup
    • Journal of the Korean Society for Precision Engineering
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    • v.24 no.12
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    • pp.136-142
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    • 2007
  • Precise fabrication of three-dimensional (3D) self-standing microstructures on thin glass plates via two-photon induced polymerization (TPP) has been an important issue for innovative 3D nanodevices and microdevices. However, there are still issues remaining to be solved, such as building 3D microstructures on opaque materials via TPP and being able to implant them as functional parts onto practical systems. To settle these issues simply and effectively, we propose a contact print lithography (CPL) method using an ultraviolet (UV)-curable polymer layer. We report some of the possibilities and potential of CPL by presenting our results for transplanting 3D microstructures onto large-area substrates and also our examination of some of the effects of the process parameters on successful transplantation.

Numerical Simulation for Characteristics of Rock Strength and Deformation Using Grain-Based Distinct Element Model (입자 기반 개별요소모델을 통한 암석의 강도 및 변형 특성 모사)

  • Park, Jung-Wook;Lee, Yun-Su;Park, Chan;Park, Eui-Seob
    • Tunnel and Underground Space
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    • v.24 no.3
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    • pp.243-254
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    • 2014
  • The present study introduces a numerical technique to simulate the mechanical behavior of brittle rock, based on a grain-based model combined with Universal Distinct Element Code (GBM-UDEC). Using the technique, the microstructure of rock sample was represented as an assembly of deformable polygonal grains, and the failure process with the evolution of micro tensile cracks under compression was examined. In terms of the characteristics of strength and deformation, the behaviors of the simulated model showed good agreement with the observations in the laboratory-scale experiments of rock.

Self-assembly of Fine Particles Applied to the Production of Antireflective Surfaces

  • Kobayashi, Hayato;Moronuki, Nobuyuki;Kaneko, Arata
    • International Journal of Precision Engineering and Manufacturing
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    • v.9 no.1
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    • pp.25-29
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    • 2008
  • We introduce a new fabrication process for antireflective structured surfaces. A 4-inch silicon wafer was dipped in a suspension of 300-nm-diameter silica particles dispersed in a toluene solution. When the wafer was drawn out of the suspension, a hexagonally packed monolayer structure of particles self-assembled on almost the complete wafer surface. Due to the simple process, this could be applied to micro- and nano-patterning. The self-assembled silica particles worked as a mask for the subsequent reactive ion etching. An array of nanometer-sized pits could be fabricated since the regions that correspond to the small gaps between particles were selectively etched off. As etching progressed, the pits became deeper and combined with neighboring pits due to side-etching to produce an array of cone-like structures. We investigated the effect of etching conditions on antireflection properties, and the optimum shape was a nano-cone with height and spacing of 500 nm and 300 nm, respectively. This nano-structured surface was prepared on a $30\;{\times}\;10-mm$ area. The reflectivity of the surface was reduced 97% for wavelengths in the range 400-700 nm.

Laser Head Design and Heat Transfer Analysis for 3D Patterning (3차원 패터닝을 위한 레이저 헤드설계 및 열해석)

  • Ye, Kang-Hyun;Choi, Hae-Woon
    • Journal of the Korean Society of Manufacturing Process Engineers
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    • v.15 no.4
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    • pp.46-50
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    • 2016
  • A laser head was designed for micro-scale patterning and joining applications. The target feature size of the pattern was $100{\mu}m$, and optics were designed to perform the target. Two singlet lenses were combined to minimize the chromatic aberration, and the geometry of the lenses was calculated by using the raytracing method with a commercial software program. As a restriction of lens design, the focal length was set at 100mm, and the maximum diameter of the lens or beam size was limited to 10mm for the assembly in the limited cage size. The maximum temperatures were calculated to be $1367^{\circ}C$, $1508^{\circ}C$, and $1905^{\circ}C$ for 10, 12, and 15 Watts of power, respectively. A specially designed laser head was used to compensate for the distance between the object and the lens. The detailed design mechanism and 3D data were presented. The optics design and detailed performance of the lens were analyzed by using MTF and spot diagram calculation.

Plate Spring Design of a Micro Actuator Using Topology-parameter Optimization (위상-치수 최적화에 의한 마이크로 구동기 판 스프링의 설계)

  • Lee, Jong-Jin;Lee, Ho-Cheol;Yoo, Jeong-Hoon
    • Transactions of the Korean Society for Noise and Vibration Engineering
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    • v.17 no.12
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    • pp.1246-1253
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    • 2007
  • The recent issue of optical pickup actuators is to apply optical storage devices to mobile devices such as a cellular phone and PDA. It requires actuators to become smaller than conventional types. As the size becomes smaller, the magnetic force is reduced and the assembly of optical pickup actuators becomes more difficult. In addition, its dynamic characteristics are changed. In this paper, methods to improve magnetic forces and dynamic characteristics are suggested and the optimal result of the plate spring design is obtained. A diamond shape magnet and the fine pattern coil (FPC) are used to improve magnetic forces and damping elements are attached to decrease the peak magnitude of the mode instead of using structural damping, mostly for the purpose of improving the accuracy of the finite element simulation. To get more stable dynamic characteristics than conventional ones, a plate spring is applied to the optical pickup actuator and it is optimized with topology and parameter optimization to obtain the concept and the detail design, respectively.

Preparation and Characterization of Nanoparticles Using Poly(N-isopropylacrylamide)-$Poly({\varepsilon}-caprolactone)$ and Poly(ethylene glycol)-$Poly({\varepsilon}-caprolactone)$ Block Copolymers with Thermosensitive Function

  • Choi, Chang-Yong;Jang, Mi-Kyeong;Nah, Jae-Woon
    • Macromolecular Research
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    • v.15 no.7
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    • pp.623-632
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    • 2007
  • Thermosensitive nanoparticles were prepared via the self-assembly of two different $poly({\varepsilon}-caprolactone)$-based block copolymers of poly(N-isopropylacrylamide)-b-$poly({\varepsilon}-caprolactone)$ (PNPCL) and poly(ethylene glycol)-b-$poly({\varepsilon}-caprolactone)$ (PEGCL). The self-aggregation and thermosensitive behaviors of the mixed nanoparticles were investigated using $^1H-NMR$, turbidimetry, differential scanning microcalorimetry (micro-DSC), dynamic light scattering (DLS), and fluorescence spectroscopy. The copolymer mixtures (mixed nanoparticles, M1-M5, with different PNPCL content) formed nano-sized self-aggregates in an aqueous environment via the intra- and/or intermolecular association of hydrophobic PCL chains. The microscopic investigation of the mixed nanoparticles showed that the critical aggregation concentration (cac), the partition equilibrium constants $(K_v)$ of pyrene, and the aggregation number of PCL chains per one hydrophobic microdomain varied in accordance with the compositions of the mixed nanoparticles. Furthermore, the PNPCL harboring mixed nanoparticles evidenced phase transition behavior, originated by coil to the globule transition of PNiPAAm block upon heating, thereby resulting in the turbidity change, endothermic heat exchange, and particle size reduction upon heating. The drug release tests showed that the formation of the thermosensitive hydrogel layer enhanced the sustained drug release patterns by functioning as an additional diffusion barrier.

Performance Test of Scroll Expander for Micro-Power Generation (소규모 발전용 스크롤 팽창기 성능시험)

  • Kim Hyun J.;Park Ik S.;Rha Phil C.
    • Korean Journal of Air-Conditioning and Refrigeration Engineering
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    • v.17 no.4
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    • pp.325-332
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    • 2005
  • This paper addresses the development of a scroll expander for power generation from relatively low temperature steam source. It has a double-sided orbiting scroll member so that no thrust bearing is needed to support the base plate of the orbiting scroll. Three power transmission shafts are placed at the periphery of the orbiting scroll base plate, and these shafts can also function as anti-rotation devices. Final output is obtained from the main central shaft engaged with the three power transmission shafts through gear assembly. The clearance between the fixed and orbiting scroll elements was estimated by comparing measurement of the mass flow rate with calculation results of a computer simulation. Due to large clearance, the expander total and volumetric efficiencies were measured to be $34\%\;and\;43\%$, respectively. It has been shown through the computer simulation that the total and volumetric efficiencies could be improved to $65\%\;and\;83\%$, respectively, if the current clearance is reduced by half.

Direct Patterning of Self Assembled Nano-Structures of Block Copolymers via Electron Beam Lithography

  • Yoon Bo Kyung;Hwang Wonseok;Park Youn Jung;Hwang Jiyoung;Park Cheolmin;Chang Joonyeon
    • Macromolecular Research
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    • v.13 no.5
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    • pp.435-440
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    • 2005
  • This study describes a method where the match of two different length scales, i.e., the patterns from self-assembled block copolymer (<50 nm) and electron beam writing (>50 nm), allow the nanometer scale pattern mask. The method is based on using block copolymers containing a poly(methyl methacrylate) (PMMA) block, which is subject to be decomposed under an electron beam, as a pattern resist for electron beam lithography. Electron beam on self assembled block copolymer thin film selectively etches PMMA microdomains, giving rise to a polymeric nano-pattern mask on which subsequent evaporation of chromium produces the arrays of Cr nanoparticles followed by lifting off the mask. Furthermore, electron beam lithography was performed on the micropatterned block copolymer film fabricated by micro-imprinting, leading to a hierarchical self assembled pattern where a broad range of length scales was effectively assembled, ranging from several tens of nanometers, through submicrons, to a few microns.