• Title/Summary/Keyword: Micro/Nano-Patterning

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Thin Film Micromachining Using Femtosecond Laser Photo Patterning of Organic Self-assembled Monolayers

  • Chang Won-Seok;Choi Moo-Jin;Kim Jae-Gu;Cho Sung-Hak;Whang Kyung-Hyun
    • International Journal of Precision Engineering and Manufacturing
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    • v.7 no.1
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    • pp.13-17
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    • 2006
  • Self-Assembled Monolayers (SAMs) formed by alkanethiol adsorption to thin metal film are widely being investigated for applications as coating layer for anti-stiction or friction reduction and in fabrication of micro structure of molecules and bio molecules. Recently, there have been many researches on micro patterning using the advantages of very thin thickness and etching resistance of Self-Assembled Monolayers in selective etching of thin metal film. In this report, we present the several machining method to form the nanoscale structure by Mask-Less laser patterning using alknanethiolate Self-Assembled Monolayers such as thin metal film etching and heterogeneous SAM structure formation.

Polyelectrolyte Micropatterning Using Agarose Plane Stamp and a Substrate Having Microscale Features on Its Surface

  • Lee, Min-Jung;Lee, Nae-Yoon;Lee, Sang-Kil;Park, Sung-Su;Kim, Youn-Sang
    • Bulletin of the Korean Chemical Society
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    • v.26 no.10
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    • pp.1539-1542
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    • 2005
  • We have introduced polyelectrolyte micro-patterning technique employing agarose plane stamp and a hard substrate having microscale features on its surface. With this method, chemically micropatterned surfaces with both positive and negative functionalities were successfully embedded in well-defined microstructures, and selective impartment of charge functionalities was confirmed by patterning bead bearing surface charge. Furthermore, this technique allows highly sensitive immobilization of protein onto targeted surface simply by endowing functionalities, which extends the potential of its use as a tool for high-throughput protein microarray and proteomics. Because plane agarose stamp is free of structures on its surface, there is no concern for pattern collapse, and the combination of agarose plane stamp with patterned substrate is more suited for selective protein patterning compared with adopting surface-patterned agarose stamp with flat substrate. Our technique using agarose plane stamp and a substrate having microscale features on its surface suggests a range of possible applications, including the micropatterning of biofunctionalized copolymer having polyelectrolyte block, immobilization of micro- and nanoparticle with biofunctionalities such as biotin and streptavidine, and establishing optoelectronic microstructures with micro-beads on various surfaces.

Micro Patterning of Conductive Line by Micro Droplet Ejection of Nano Metal Ink (나노 금속잉크의 미세 액적 토출을 이용한 마이크로 패터닝)

  • Seo S.H.;Park S.J.;Jung H.C.;Joung J.W.
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2005.10a
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    • pp.689-693
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    • 2005
  • Inkjet printing is a non-contact and direct writing associated with a computer. In the industrial field, there have been many efforts to utilize the inkjet printing as a new way of manufacturing, especially for electronic devices. For the application of inkjet printing to electronic field, one of the key factors is exact realization of designed images into printed patterns. In this work, micro patterning for conducting line has been studied using the piezoelectric print head and silver nano ink. Dimensions of printed images have been predicted in terms of print resolution and diameter of a single dot. The predicted and the measured values showed consistent results. Using the results, the design capability for industrial inkjet printing could be achieved.

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Investigation into direct fabrication of nano-patterns using nano-stereolithography (NSL) process (나노 스테레오리소그래피 공정을 이용한 무(無)마스크 나노 패턴제작에 관한 연구)

  • Park Sang Hu;Lim Tae-Woo;Yang Dong-Yol
    • Journal of the Korean Society for Precision Engineering
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    • v.23 no.3 s.180
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    • pp.156-162
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    • 2006
  • Direct fabrication of nano patterns has been studied employing a nano-stereolithography (NSL) process. The needs of nano patterning techniques have been intensively increased for diverse applications for nano/micro-devices; micro-fluidic channels, micro-molds. and other novel micro-objects. For fabrication of high-aspect-ratio (HAR) patterns, a thick spin coating of SU-8 process is generally used in the conventional photolithography, however, additional processes such as pre- and post-baking processes and expansive precise photomasks are inevitably required. In this work, direct fabrication of HAR patterns with a high spatial resolution is tried employing two-photon polymerization in the NSL process. The precision and aspect ratio of patterns can be controlled using process parameters of laser power, exposure time, and numerical aperture of objective lens. It is also feasible to control the aspect ratio of patterns by truncation amounts of patterns, and a layer-by-layer piling up technique is attempted to achieve HAR patterns. Through the fabrication of several patterns using the NSL process, the possibility of effective patterning technique fer various N/MEMS applications has been demonstrated.

Printability of synthesized Silver Nano sol in Micro-patterning of Electrode on ITO Glass

  • Ryu, Beyong-Hwan;Park, Han-Sung;Byun, Jong-Hoon;Choi, Young-Min;Kong, Ki-Jeong;Lee, Jeong-O;Chang, Hyun-Ju
    • 한국정보디스플레이학회:학술대회논문집
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    • 2004.08a
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    • pp.981-984
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    • 2004
  • We have studied a printability of synthesized silver nano solon ITO glass substrate. The highly concentrated polymeric dispersant-assisted silver nano sol was prepared by variation of molecular weight and control of initial nucleation and growth of silver nanoparticles, to achive dispersion stability and controlling the size of silver nanoparticles. The synthesized silver nano-sol was tested for printability to explore the possibility of micro-electrodes patterning on ITO glass substrate. The silver micro-electrode with 50${\sim}100{\mu}m$ line width was formed on ITO glass substrate.

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Micro Patterning of Nano Metal Ink for Printed Circuit Board Using Inkjet Printing Technology (잉크젯 프린팅 기술을 이용한 나노 금속잉크의 인쇄회로기판용 미세배선 형성)

  • Park, Sung-Jun;Seo, Shang-Hoon;Joung, Jae-Woo
    • Journal of the Korean Society for Precision Engineering
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    • v.24 no.5
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    • pp.89-96
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    • 2007
  • Inkjet printing has become one of the most attractive manufacturing techniques in industry. Especially inkjet printing technology will soon be part of the PCB (Printed Circuit Board) fabrication processes. Traditional printing on PCB includes screen printing and photolithography. These technologies involve high costs, time-consuming procedures and several process steps. However, by inkjet technology manufacturing time and production costs can be reduced, and procedures can be more efficient. PCB manufacturers therefore willingly accept this inkjet technology to the PCB industry, and are quickly shifting from conventional to inkjet printing. To produce the printed circuit board by the inkjet technology, it must be harmonized with conductive nano ink, printing process, system, and inkjet printhead. In this study, micro patterning of conductive line has been investigated using the piezoelectric printhead driven by a bipolar voltage signal is used to dispense 20-40 ${\mu}m$ diameter droplets and silver nano ink which consists of 1 to 50 nm silver particles that are homogeneously suspended in an organic carrier. To fabricate a conductive line used in PCB with high precision, a printed line width was calculated and compared with printing results.

Micro Patterning Using Near-Field Coupled Nano Probe Laser Photo Patterning Of Chloromethylated Polyimide Thin Film (클로로메틸 폴리이미드(CMPI) 박막과 근접장 나노 프로브 레이저 패터닝을 이용한 미세 형상 가공 기술)

  • 최무진;장원석;김재구;조성학;황경현
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2004.10a
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    • pp.369-372
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    • 2004
  • Photo-induced surface alignment is charming as a non-contact photo-patternable alignment technology which can be used in the next generation of displays, such as large area, multi-domain. For decades, many polymer film have been investigated and developed to be used in the photo alignment. Among these photoreactive materials, recently developed polyimide, Chloromethylated Polyimide(CMPI) now became the focus of interests in this area because of its high photosensitivity and superior thermal stability. In this report, we present micro patterning method to form the nanoscale structure by Mask-Less laser patterning using this CMPI film and NSOM probe.

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Development of Micro-Nano Plotting Mechanism using Electrostrictive Polymer (Electrostrictive Polymer를 이용한 마이크로-나노 플로터 메커니즘 개발)

  • 류경주;김훈모
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2003.06a
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    • pp.656-659
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    • 2003
  • Although Hereafter a mass production will claim for patterning nano sized thickness or line in micro-nano industry. existent lithography fabrication has many usable fields, it has complex fabrication steps, expensive values and row work rates. Development of Dip-pen type nano plotter using polymer actuator can construct row cost mass production system because it will change existent lithography fabrication more simple and easy.

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