• 제목/요약/키워드: MgO Thin Film

검색결과 297건 처리시간 0.033초

$Mg_xZn_{1-x}SiN_2$를 모체로 한 박막 전계발광소자용 형광체의 발광특성 (Luminescent Characteristics of $Mg_xZn_{1-x}SiN_2$ Based Phosphors for Thin Film Electroluminescent Device Applications)

  • 이순석;임성규
    • 전자공학회논문지D
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    • 제34D권2호
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    • pp.27-37
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    • 1997
  • Photoluminescent and cathodoluminescent charcteristics of inorganic luminescent materials were investigated ot develop possible phosphors for thin film electroluminescent (TFEL) device applications. Mg, Zn, and Photoluminescent and cathodoluminescent charcteristics of inorganic luminescent materials were investigated ot develop possible phosphors for thin film electroluminescent (TFEL) device applications. Mg, Zn, and $Si_3N_4$ powders were used to synthesize $(Mg_xZn_{1-x})SiN_2$ host materials. $Tb_4O_7$ and $Eu_2O_3$ powdrs were added as luminescent centers. Very sharp emission spectra of $Tb^{3+}$ ions were observed from $Mg._5Zn._5SiN_2:Tb$ sampels sintered at $1400^{\circ}C$ for an hour and the maximum intensity of emission spectra occured at wavelength of 550nm (green light). Synthetic conditions of $(Mg_xZn_{1-x})SiN_2:Eu$ phosphors were optimized for the hghest luminescence. The Eu concentrations were varied from 0.2% to 1.6%. Before firing, the powders were mixed using ballmills, methanol, acetone, or D.I. water. The Mg/Zn ratio also were varied from x=0.3 to x=0.7. The maximum PL intensity was obtained from a sample with 1.2% Eu concentration and the powder was mixed with methanol and dried before firing. The maximum intensity of the emission spectra occurred t the wavelength of 470nm(blue light). TFEL devices fabricated by using sputter deposition of $(Mg._3Zn._7)SiN_2:Eu$ phosphor layer showed yellowish white emission at the phosphor field of 2MV/cm.

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Atmosphere Effects in Low Temperature Pyrolysis of Chemical Solution Derived Pb(Zr, Ti) O3 Films

  • Hwang, Kyu-Seog;Lee, Hyung-Min;Kim, Byung-Hoon
    • The Korean Journal of Ceramics
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    • 제4권3호
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    • pp.199-203
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    • 1998
  • $Pb(Zr, Ti)O_3$ (Pb:Zr:Ti=1:0.52:0.48) thin films were prepared on single crystal MgO(100) substrates by dipping-pyrolysis process using a solution of constituent metal naphthenates as starting materials. The solution was spin-coated onto substrate and the precursor films were pyrolyzed at $200^{\circ}C$ in air or at $200^{\circ}C$ in argon for 1, 2, 5 and 24h, followed by final heat treatment at $750^{\circ}C$. For all the films, highly (h00)/(00l)-oriented Pb$Pb(Zr, Ti)O_3$ thin films with smooth surfaces and crack-free were obtained, whereas thin film pyrolyzed in air for 24 h exhibited polycrystalline character. According to the pole-figure analysis, epitaxy of the product films was found to depend on pyrolysis atmosphere.

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MBE growth and magnetic properties of epitaxial FeMn2O4 film on MgO(100)

  • Duong, Van Thiet;Nguyen, Thi Minh Hai;Nguyen, Anh Phuong;Dang, Duc Dung;Duong, Anh Tuan;Nguyen, Van Quang;Cho, Sunglae
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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    • pp.318.2-318.2
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    • 2016
  • FeM2X4 spinel structures, where M is a transition metal and X is oxygen or sulfur, are candidate materials for spin filters, one of the key devices in spintronics. Both the Fe and M ions can occupy tetrahedral and octahedral sites; therefore, these types of compounds can display various physical and chemical properties [1]. On the other hand, the electronic and magnetic properties of these spinel structures could be modified via the control of cation distribution [2, 3]. Among the spinel oxides, iron manganese oxide is one of promising materials for applications. FeMn2O4 shows inverse spinel structure above 390 K and ferrimagnetic properties below the temperature [4]. In this work, we report on the structural and magnetic properties of epitaxial FeMn2O4 thin film on MgO(100) substrate. The reflection high energy electron diffraction (RHEED) and X-ray diffraction (XRD) results indicated that films were epitaxially grown on MgO(100) without the impurity phases. The valance states of Fe and Mn in the FeMn2O4 film were carried out using x-ray photoelectron spectrometer (XPS). The magnetic properties were measured by vibrating sample magnetometer (VSM), indicating that the samples are ferromagnetic at room temperature. The structural detail and origin of magnetic ordering in FeMn2O4 will be discussed.

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Rf co-sputtering으로 제작한 MgB$_2$ 박막의 in-situ 열처리 효과 (In-situ Annealing of $MgB_2$ Thin Films Prepared By rf Magnetron Co-Sputtering)

  • 김윤원;안종록;이순걸;이규원;김인선;박용기
    • Progress in Superconductivity
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    • 제5권2호
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    • pp.105-108
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    • 2004
  • We have studied effects of in-situ annealing on the fabrication of superconducting MgB$_2$ thin films prepared by rf magnetron co-sputtering. The Films were deposited on A1$_2$O$_3$ (1102) substrates at room temperature by using Mg and B targets. To trap remnant $O_2$ gas in the chamber, we used 20 mtorr Af sputter-gas balanced with 5 mol % of H$_2$ gas. To enhance adhesion to the substrate a thin layer of B was deposited prior to the codeposition of Mg and B. After completion of the film deposition, an additional Mg layer was deposited on top to compensate for Mg loss during the subsequent in-situ annealing. We have investigated the effects of two most important annealing parameters that are the Mg-to-B composition ratio and the annealing temperature. The range of the Mg-to-B composition ratio was from 0.42 to 0.85, and that of the annealing temperature was 500 $^{\circ}C$∼750 $^{\circ}C$. The Best result was obtained for the composition ratio of about 10% Mg excess from the stoichiometry and the annealing temperature of 700 $^{\circ}C$. Based on these results, we obtained films with T$_{c}$ : 36.5 K by further refining the fabrication process.s.

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THIN FILM TECHNOLOGIES RELATED TO THE HIGH T$_{c}$ SUPERCONDUCTORS

  • Ri, Eui-Jae
    • 한국표면공학회지
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    • 제29권5호
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    • pp.415-423
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    • 1996
  • Thin film technologies for fabricating SQUIDs involve etching and deposition procedures with the proper substrate materials and $YBa_2Cu_3O_{7-d}$ (YBCO) as the high $T_c$ superconductor. YBCO were prepared on various substrates of MgO, $SrTiO_3$, and $LaAlO_3$ by using off-axis magnetron sputtering methods and annealing in-situ. The parameters of film fabrication processes had been optimized to yield good quality films in terms of the critical temperature $T_c$ and the critical current density $J_c$. The optimized processes yielded $T_C$>90K along with $J_c$>$10_6A$$extrm{cm}^2$ at 77K and>$2\times10_7A/Cm^2$ at 5K. We fabricated step-edge type dc-SQUIDs and directly coupled magnetometers, producing step edges on MgO(100) substrates by etching with Ar-ion beam, depositing YBCO material on them, then patterning them by using ion-milling technique. Circuitizing washer-shape SQUIDs to possess a pair of step-edge junctions of 2-5$\mu$ line width with a high angle>$50^{\circ}C$ , we examined their I-V characteristics thoroughly and Shapiro steps clearly as we irradiate microwaves of 8-20 GHz frequency.

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원자층 증착방법에 의한 Al2O3 박막의 OLED Thin Film Encapsulation에 관한 연구 (Study on the OLED Thin Film Encapsulation of the Al2O3 Thin Layer Formed by Atomic Layer Deposition Method)

  • 김기락;조의식;권상직
    • 반도체디스플레이기술학회지
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    • 제21권1호
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    • pp.67-70
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    • 2022
  • In order to prevent water vapor and oxygen permeation in the organic light emitting diodes (OLED), Al2O3 thin-film encapsulation (TFE) technology were investigated. Atomic layer deposition (ALD) method was used for making the Al2O3 TFE layer because it has superior barrier performance with advantages of excellent uniformity over large scales at relatively low deposition temperatures. In this study, the thickness of the Al2O3 layer was varied by controlling the numbers of the unit pulse cycle including Tri Methyl Aluminum(Al(CH3)3) injection, Ar purge, and H2O injection. In this case, several process parameters such as injection pulse times, Ar flow rate, precursor temperature, and substrate temperatures were fixed for analysis of the effect only on the thickness of the Al2O3 layer. As results, at least the thickness of 39 nm was required in order to obtain the minimum WVTR of 9.04 mg/m2day per one Al2O3 layer and a good transmittance of 90.94 % at 550 nm wavelength.

불평형 마그네트론 스파터링에 의한 AC PDP의 MgO 보호층 형성에 관한 연구 (Preparation of MgO Protective Layer for AC PDP by Unbalanced Magnetron Sputtering)

  • 고광식;김영기;박정태;김언진;조정수;박정후
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2000년도 영호남학술대회 논문집
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    • pp.142-145
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    • 2000
  • The performance of ac plasma display panels (PDP) is influenced strongly by the surface glow discharge characteristics on the MgO thin films. This paper deals with the surface glow discharge characteristics and some physical properties of MgO thin films prepared by reactive RF planar unbalanced magnetron sputtering in connection with ac PDP. The samples prepared with the dc bias voltage of -10V showed lower discharge voltage and lower erosion rate by ion bombardment than those samples prepared by conventional magnetron sputtering or E-beam evaporation. The main factor that improves the discharge characteristics by bias voltage is considered to be due to the morphology changes or crystal structure of the MgO thin film by ion bombardment during deposition process.

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다양한 산화물 기판 위에 RF 마그네트론 스퍼터링 방법으로 성장된 ZnO 박막의 특성 비교 (Comparison on Properties of ZnO Thin Films Grown by RF Magnetron Sputtering on Various Oxide Substrates)

  • 이재욱;정철원;한석규;최준호;홍순구;조형균;송정훈;이정용
    • 한국전기전자재료학회논문지
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    • 제20권4호
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    • pp.289-293
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    • 2007
  • ZnO thn films are grown on five kinds of oxide substrates including $c-Al_2O_3(0001),\;r-Al_2O_3(01-12)$, MgO(100), MgO(111), $NdGaO_3(110)$ by rf magnetron sputtering and effects substrate types on properties of ZnO thin films ate investigated. In order to compare the substrate effects one growth condition is selected and all the films are grown by the same growth condition. Structural and optical properties of the ZnO films ate different depending on the substrates although the films ate not epitaxial but polycrystalline. The ZnO film grown on $NdGaO_3(100)$ substrate shows the best overall properties among the films grown on substrates investigated in this study.

마이크로스트립 평행결합선을 이용한 초전도 협대역 필터의 제작 (Fabrication of Superconducting Narrow Bandpass Filters with Parallel Microstrip Line)

  • 박주형;이상렬;윤형국;윤영중
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1998년도 하계학술대회 논문집 D
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    • pp.1549-1551
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    • 1998
  • We have designed and developed narrow bandpass multipole filters for satellite communication using $YBa_2Cu_3O_{7-x}$(YBCO) thin films on MgO substrates. The superconducting film used in this study was prepared by laser ablation on one side polished MgO (100) substrates. A Nd:YAG laser was used to fabricate YBCO thin films. The wave length of the laser was 355 nm. The laser beam was focused onto a YBCO target rotating linearly to avoid deep craters that may eject macroscopic YBCO particles. The YBCO films were grown at $750^{\circ}C$ in the oxygen partial pressure of 200 mTorr. The deposited YBCO thin films were patterned by conventional wet-etching method. The transition temperatures of YBCO thin films were 85 - 88 K and the film thicknesses were about 5,000 $\AA$. By comparing the performances of normal-metal filters and YBCO filters, we observed that superconducting YBCO multipole filters have been showed superior performances at 77 K.

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유리알에 코팅된 TiO2 박막의 구조 및 광촉매 특성 (Structural and Photocatalytic Properties of TiO2 Thin Film Coated Glass Beads)

  • 정지은;이창용
    • 공업화학
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    • 제34권1호
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    • pp.30-35
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    • 2023
  • TiO2 졸을 사용하여 유리알 표면에 TiO2 코팅한 후 건조 처리한 시료(TB)와 소성한 시료(TBc)를 제조하였다. 이들 시료에 대한 TiO2 박막의 특성분석과 메틸렌블루 및 톨루엔의 광분해 실험을 수행하였다. FE-SEM, XPS 및 FTIR 분석 결과, TB 시료의 TiO2 박막은 스펀지 폼과 같은 형태이며 무정형 TiO2와 일부 결정형 TiO2가 존재하였다. TBc 시료의 TiO2 박막에는 결정형 TiO2가 주로 존재하며 침상형 입자와 미세 입자들이 혼재하였다. TBc 시료(46 mg/g)의 톨루엔 흡착량은 같은 코팅량의 TB 시료 대비 적었으나 톨루엔 분해율은 비슷했다. TB 시료의 경우, TiO2 코팅량이 증가함에 따라 톨루엔 분해능이 흡착능에 비해 적게 감소하였다. 이러한 결과는 소성하지 않은 TB 시료는 TiO2 코팅량이 증가하면 무정형 텍스처의 비표면적은 감소하는 반면 결정성 입자들의 활성점 감소는 적게 일어나기 때문으로 판단된다.