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http://dx.doi.org/10.4313/JKEM.2007.20.4.289

Comparison on Properties of ZnO Thin Films Grown by RF Magnetron Sputtering on Various Oxide Substrates  

Lee, Jae-Wook (한국과학기술원 신소재공학과)
Jung, Chul-Won (충남대학교 재료공학과)
Han, Seok-Kyu (충남대학교 재료공학과)
Choi, Jun-Ho (충남대학교 재료공학과)
Hong, Soon-Ku (충남대학교 재료공학과)
Cho, Hyung-Koun (성균관대학교 신소재공학과)
Song, Jung-Hoon (공주대학교 물리학과)
Lee, Jeong-Yong (한국과학기술원 신소재공학과)
Publication Information
Journal of the Korean Institute of Electrical and Electronic Material Engineers / v.20, no.4, 2007 , pp. 289-293 More about this Journal
Abstract
ZnO thn films are grown on five kinds of oxide substrates including $c-Al_2O_3(0001),\;r-Al_2O_3(01-12)$, MgO(100), MgO(111), $NdGaO_3(110)$ by rf magnetron sputtering and effects substrate types on properties of ZnO thin films ate investigated. In order to compare the substrate effects one growth condition is selected and all the films are grown by the same growth condition. Structural and optical properties of the ZnO films ate different depending on the substrates although the films ate not epitaxial but polycrystalline. The ZnO film grown on $NdGaO_3(100)$ substrate shows the best overall properties among the films grown on substrates investigated in this study.
Keywords
Oxide substrate; ZnO film; RF magnetron sputtering;
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