• 제목/요약/키워드: Metal thin-film pressure sensor

검색결과 11건 처리시간 0.033초

금속박막형 압력세서의 제작과 그 특성 (Fabrication of Metal Thin-Film Pressure Sensor and Its Characteristics)

  • 정귀상;최성규;남효덕;이원재;송재성
    • 한국전기전자재료학회논문지
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    • 제14권5호
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    • pp.405-409
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    • 2001
  • This paper describes fabrication and characteristics of metal thin-film pressure sensor for working at high temperature. The proposed pressure consists of a chrom thin-film, patterned on a Wheat stone bridge configuration, sputter-deposited onto thermally oxidized Si membranes with an aluminium interconnection layer. The fabricated pressure sensor presents a low temperature coefficient of resistance, high-sensitivity, low non-linearity and excellent temperature stability. The sensitivity is 1.097∼1.21mV/V$.$kgf/$\textrm{cm}^2$ in the temperature range of 25∼200$^{\circ}C$ and the maximum non-linearity is 0.43%FS.

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실리콘 박막 멤브레인상에 제작된 금속박막형 압력센서의 특성 (Characteristics of metal thin-film pressure sensors by on silicon thin-film mer)

  • 최성규;남효덕;정귀상
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2001년도 하계학술대회 논문집 C
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    • pp.1372-1374
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    • 2001
  • This paper describes fabrication and characteristics of metal thin-film pressure sensor for working at high temperature. The proposed pressure sensor consists of a chrom thin-film, patterned on a Wheatstone bridge configuration, sputter-deposited onto thermally oxidized Si membranes with an aluminium interconnection layer. The fabricated pressure sensor presents a low temperature coefficient of resistance, high-sensitivity, low non-linearity and excellent temperature stability. The sensitivity is 1.097 $\sim$ 1.21 mV/V kgf/$cm^2$ in the temperature range of 25 $\sim$ $200^{\circ}C$ and the maximum non-linearity is 0.43 %FS.

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과부하 방지용 마이크로머시닝 금속 박막형 압력센서의 제작과 그 특성 (Fabrication of a Micromachined Metal Thin-film Type Pressure Sensor for High Overpressure Tolerance and Its Characteristics)

  • 김재민;임병권;정귀상
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2002년도 춘계합동학술대회 논문집
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    • pp.192-196
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    • 2002
  • This paper describes on the fabrication and characteristics of a metal thin-film pressure sensor based on Cr strain-gauges for harsh environment applications. The Cr thin-film strain-gauges are sputter-deposited onto a micromachined Si diaphragms with buried cavity for overpressure protectors. The proposed device takes advantages of the good mechanical properties of single-crystalline Si as diaphragms fabricated by SDB and electrochemical etch-stop technology, and in order to extend the operating temperature range, it incorporates relatively the high resistance, stability and gauge factor of Cr thin-films. The fabricated pressure sensor presents a low temperature coefficient of resistance, high-sensitivity, low non-linearity and excellent temperature stability. The sensitivity is 1.097~1.21 $mV/V{\cdot}kgf/cm^2$ in the temperature range of $25{\sim}200^{\circ}C$ and the maximum non-linearity is 0.43 %FS.

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Fabrication of low-stress silicon nitride film for application to biochemical sensor array

  • 손영수
    • 센서학회지
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    • 제14권5호
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    • pp.357-361
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    • 2005
  • Low-stress silicon nitride (LSN) thin films with embedded metal line have been developed as free standing structures to keep microspheres in proper locations and localized heat source for application to a chip-based sensor array for the simultaneous and near-real-time detection of multiple analytes in solution. The LSN film has been utilized as a structural material as well as a hard mask layer for wet anisotropic etching of silicon. The LSN was deposited by LPCVD (Low Pressure Chemical Vapor Deposition) process by varing the ratio of source gas flows. The residual stress of the LSN film was measured by laser curvature method. The residual stress of the LSN film is 6 times lower than that of the stoichiometric silicon nitride film. The test results showed that not only the LSN film but also the stack of LSN layers with embedded metal line could stand without notable deflection.

박막형 MoO3가스센서의 가스 감지 특성 및 첨가물의 영향 (Gas Sensing Characteristics and Doping Effect of MoO3Thin Films Sensor)

  • 황종택;장건익;윤대호
    • 한국전기전자재료학회논문지
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    • 제16권8호
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    • pp.705-710
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    • 2003
  • MoO$_3$thin films were deposited on electrode of alumina substrates in $O_2$atmosphere by RF reactive sputtering using molybdenum metal target. The deposition was performed at 30$0^{\circ}C$ with 350 W of a forward power in an Ar-O$_2$atmosphere. The working pressure was maintained at 3$\times$10$^{-2}$ torr and all deposited films were annealed at 50$0^{\circ}C$ for 5 hours. The surface morphology of films was observed by using a SEM and crystalline phases were analyzed by using a XRD. To investigate gas sensing characteristics of the doped MoO$_3$thin film, Co, Ni and Pt were used as dopants. The sensing properties were investigated in term of gas concentration under exposure of reducing gases such as H$_2$, NH$_3$and CO at optimum working temperature. Co-doped MoO3 thin film shows the maximum 46.8 % of sensitivity in NH$_3$ and Ni-doped MoO$_3$thin film exhibits 49.7 % of sensitivity in H$_2$.

RF magnetron sputtering법으로 제조한 $MoO_3$ 박막의 가스 감지 특성 및 첨가물의 영향 (Gas Sensing Characteristics and Doping Effect of $MoO_3$ Thin Films prepared by RF magnetron sputtering)

  • 황종택;장건익
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2002년도 추계학술대회 논문집 Vol.15
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    • pp.460-463
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    • 2002
  • $MoO_3$ thin films were deposited on electrode and heater screen-printed alumina substrates in $O_2$ atmosphere by RF reactive sputtering using Molybdenum metal target. The deposition was performed at $300^{\circ}C$ with 350W of a forward power in an $Ar-O_2$ atmosphere. The working pressure was maintained at $3{\times}10^{-2}mtorr$ and all deposited films were annealed at $500^{\circ}C$ for 5hours. To investigate gas sensing characteristics of the addition doped $MoO_3$ thin film, Co, Ni and Pt were used as adding dopants. The sensing properties were investigated in tenn of gas concentration under exposure of reducing gases such as $H_2$, $NH_3$ and CO at optimum working temperature. Co-doped $MoO_3$ thin film shows the maximum 46.8% of sensitivity in $NH_3$ and Ni-doped $MoO_3$ thin film exhibits 49.7% of sensitivity in $H_2$.

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P-N Junction Type 박막열전소자제작 및 특성 (Design of P-N Junction Type Thin-Film Thermoelectric Device and their Device Characteristics)

  • 권성도;송현철;정대용;윤석진;주병권;김진상
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2007년도 추계학술대회 논문집
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    • pp.142-142
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    • 2007
  • Micro thermoelectric generator has been attractive for the alternative power source to operate the wireless sensor node. In this paper, we designed the column-type micro thermoelectric device and their device characteristics were measured. n-type Bi2Te3 and p-type BiSbTe3 thermoelectric thin films were grown on (001) GaAs substrates by metal organic chemical vapour deposition (MOCVD) and they were pattemed. The height of thermoelectric film were controlled by the deposition time, temperature and MO-x gas pressure. Seebeck coefficient was measured at room temperature and hole concentration and electrical resistivity of thermoelectric film were also characterized.

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Synthesis of Nanoporous Metal Oxide Films Using Anodic Oxidation and Their Gas Sensing Properties

  • Suh, Jun Min;Kim, Do Hong;Jang, Ho Won
    • 센서학회지
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    • 제27권1호
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    • pp.13-20
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    • 2018
  • Gas sensors based on metal oxide semiconductors are used in numerous applications including monitoring indoor air quality and detecting harmful substances like volatile organic compounds. Nanostructures, for example, nanoparticles, nanotubes, nanodomes, and nanofibers have been widely utilized to improve gas sensing properties of metal oxide semiconductors, and this increases the effective surface area, resulting in participation of more target gas molecules in the surface reaction. In the recent times, 1-dimensional (1D) metal oxide nanostructures fabricated using anodic oxidation have attracted great attention due to their high surface-to-volume ratio with large-area uniformity, reproducibility, and capability of synthesis under ambient air and pressure, leading to cost-effectiveness. Here, we provide a brief overview of 1D metal oxide nanostructures fabricated by anodic oxidation and their gas sensing properties. In addition, recent progress on thin film-based anodic oxidation for application in gas sensors is introduced.

프탈로시아닌을 이용한 NO$_{2}$ 가스센서의 제작 및 특성 (Frbrication and characteristics of NO$_{2}$ Gas sensor using the phthalocyanines)

  • 전춘배;박효덕;이덕동
    • 전자공학회논문지A
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    • 제32A권7호
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    • pp.85-93
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    • 1995
  • In this study, phthalocyanine thin films were prepared by vacuum sublimation method and investigated sensing characteristics of the films. The phthalocyannies used for the prepaation of the NO$_{x}$ sensors were metal-free Pc(H$_{2}$Pc) and metal Pc(CuPc, CoPc, PbPc). And the substrate temperatures maintained during the fomation of Pc films were varied between R.T. and 200$^{\circ]C$, and the base pressure was 5${\times}10^{6}$ torr. The relationships between NO$_{2}$ sensing properties and SEM analyses as a function of substrate temperatures during the formation of the films were investigated. Among the Pc films, PbPc film showed the best sensing characteristics. Particularlly, the PbPc films prepared at 70$^{\circ]C$ of the substrage temperature showen good sensitivity of 85% to 1ppm NO$_{2}$ gas at operating temperature 190$^{\circ]C$ and response time was about 24 seconds.

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금속 산화물 나노구조형 마이크로 박막 센서의 제작 및 가스 응답 특성 (Microfabrication of Thin Film Sensor with Metal Oxide Nanostructure and Their Gas Sensing Properties)

  • 강봉휘;이상록;송갑득;주병수;이덕동
    • 대한전자공학회논문지SD
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    • 제43권8호
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    • pp.13-18
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    • 2006
  • Sn과 Zn 금속을 이용해 각각 산소와 아르곤 가스를 주입한 대기압 분위기에서 열처리를 통해 $SnO_2$와 ZnO 나노박막을 형성시켰다. 나노구조로 형성된 $SnO_2$ 박막의 경우 CO 가스(5,000 ppm)에 대해 $200^{\circ}C$의 동작온도에서 약 50 %의 감도를 나타내었으며, $SnO_2$ 나노 금속산화물에 Pt 금속을 이온 코팅법에 의해 첨가한 박막의 경우에는 동작온도 $150^{\circ}C$에서 73 %의 높은 감도를 얻을 수 있었다. 순수 ZnO 나노 박막의 경우 NOx(20 ppm) 가스에 대해 낮은 감도를 나타내었으나, Cu를 이온 코팅법에 의해 첨가한 박막의 경우에는 동작온도 $200^{\circ}C$에서 90 %의 높은 감도를 나타내었다. 나노 구조가 아닌 $SnO_2$와 ZnO 박막이 가지는 CO와 NOx에 대한 가스 감도에 비해 매우 높은 감도를 가짐을 알 수 있었다.