• Proceedings of the Korean Vacuum Society Conference
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• 2013.02a
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• pp.631-631
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• 2013

Battery has major drawbacks including its size and life expectancy, and environmental problem. As an alternative, energy harvesting is emerging as a potential solution to replace battery along with more energy-efficient IT devices. The idea of harnessing energy from our living environment is sustainable, semi-permanent, and eco-friendly. Also, unlike battery, energy harvester does not require much space to store energy. Therefore, energy harvesting can provide a better source of power for small, portable, and wireless devices. Among various ways of harvesting energy from our surroundings, triboelectricity is chosen due to its potential to be miniaturized, and efficient. Triboelectric effect occurs as two different materials with different polarity of charge separation come into contact through friction, and then become separated so that electric potential difference is achieved. In this research, such characteristic of triboelectricity is used as a way to convert ambient mechanical energy into electric energy.Series of recent researches have shown promising results that the triboelectric energy harvester can be simple and cost effective. However, sufficient electricity level required to operate mobile devices has not yet been achieved.In this research, our group focuses on the design and optimization of triboelectric energy harvesting device to enhance its output. By using maskless lithography to pattern Kapton film and silicon substrate, which is used as a mold for PDMS thin layer, and sputtering metal electrodes on each side, we fabricate and demonstrate different designs of triboelectric energy harvester that utilizes the contact electrification between a polymer thin film and a metal thin foil. In order to achieve optimized result, the output voltage and current are measured under diverse conditions, which include different surface structure and pattern, material, and the gap between layers.

• Transactions of Materials Processing
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• v.13 no.4
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• pp.326-333
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• 2004

The nanoprobe based on lithography, mainly represented by SPM based technologies, has been recognized as a potential application to fabricate the surface nanosctructures because of its operational versatility and simplicity. However, nanoprobe based on lithography itself is not suitable for mass production because it is time a consuming method and not economical for commercial applications. One solution is to fabricate a mold that will be used for mass production processes such as nanoimprint, PDMS casting, and others. The objective of this study is to fabricate the silicon stamper for PDMS casting process by a mastless fabrication technique using the combination of nano/micro machining by Nanoindenter XP and KOH wet etching. Effect of the Berkovich tip alignment on the deformation was investigated. Grooves were machined on a silicon surface, which has native oxide on it, by constant load scratch (CLS), and they were etched in KOH solutions to investigate chemical characteristics of the machined silicon surface. After the etching process, the convex structures was made because of the etch mask effect of the mechanically affected layer generated by nanoscratch. On the basis of this fact, some line patterns with convex structures were fabricated. Achieved groove and convex structures were used as a stamper for PDMS casting process.

• Proceedings of the Korean Society of Laser Processing Conference
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• 2005.11a
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• pp.37-41
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• 2005

When screen size of the Flat Panel Display (FPD) becomes larger, the traditional photo-lithography using photomasks and UV lamps might not be possible to make patterns on Photo Resist (PR) material due to limitation of the mask size. Though the maskless photo-lithography using UV lasers and scanners had been developed to implement large screen display, it was very slow to apply the process for mass-production systems. The laser exposure system using 405 nm semi-conductor lasers and Digital Micromirror Devices (DMD) has been developed to overcome above-mentioned problems and make more than 100 inches FPD devices. It makes very fine patterns for full HD display and exposes them very fast. The optical engines which contain DMD, Micro Lens Array (MLA) and projection lenses are designed for 10 to 50 ${\mu}m$ bitmap pattern resolutions. The test patterns for LCD and PDP displays are exposed on PR and Dry Film Resists (DFR) which are coated or laminated on some specific substrates and developed. The fabricated edges of the sample patterns are well-defined and the results are satisfied with tight manufacturing requirements.

• 한국정보디스플레이학회:학술대회논문집
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• 2009.10a
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• pp.1272-1273
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• 2009

We demonstrate conformal phosphor coating and patterning methods on light emitting diodes (LEDs) using image processing based optofluidic maskless lithography (IP-OFML) system in microfluidic channels. IP-OFML allows a real-time detection and dynamic mask generation for packaging of randomly dispersed microchips. Our system detects each chip by considering rotation of the chip through image processing regardless of their arrangement error. Therefore, it precisely packages the chip making conformal polymer layer.

• Proceedings of the KIEE Conference
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• 2000.07c
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• pp.2257-2259
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• 2000

This paper reports on the design, fabrication and driving experiment of micro mirror array(MMA) for lithography process to apply to biochip fabrication Photolithography technology is applied to activate specific area on the surface of modified glass surface, DNA monomers are bound on the activated area of the glass surface. After repeat of DNA monomer synthesizing process, DNA single strand probes could be solid-synthesized on the glass substrate. Without using photomask, photolithography process is tried using micro mirror array(MMA). Photomask or mask alignment is not required in maskless photolithography process using micro mirror array.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2005.10a
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• pp.268-271
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• 2005

Etch resistance of mask layer on silicon substrate modified by AFM-based Tribo-Nanolithography (TNL) in Aqueous Solution in an aqueous solution was demonstrated. n consists or sequential processes, nano-scratching and wet chemical etching. The simple scratching can form a mask layer on the silicon substrate, which acting as an etching mask. For TNL, a specially designed cantilever with diamond tip, allowing the formation of mask layer on silicon substrate easily by a simple scratching process, has been applied instead of conventional silicon cantilever fur scanning. This study demonstrates how the TNL parameters can affect the etch resistance of mask layer, hence introducing a new process of AFM-based maskless nanolithography in aqueous solution.

• Journal of the Korean Society for Precision Engineering
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• v.22 no.1
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• pp.199-206
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• 2005

Mask manufacturing is a high COC and COO process in developing of semiconductor devices because of mask production tool with high resolution. Direct writing has been thought to be the one of the patterning method to cope with development or small-lot production of the device. This study consists two categories. One is the additional process of the direct and maskless patterning generation using SLA for easy and convenient application and the other is a removal process using wet-etching process. In this study, cured status of epoxy pattern is most important parameter because of the beer-lambert law according to the diffusion of UV light. In order to improve the contact force between patterns and substrate, prime process was performed and to remove the semi-cured resin which makes a bad effects to the pattern, spin cleaning process using TPM was also performed. At a removal process, contact force between photo-curable resin as an etching mask and Si wafer is important parameter.

• Transactions of Materials Processing
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• v.12 no.7
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• pp.640-646
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• 2003

The nanoprobe based on lithography, mainly represented by SPM based technologies, has been recognized as potential application to fabricate the surface nanostructures because of its operational versatility and simplicity. The objective of the work is to suggest new mastless pattern fabrication technique using the combination of machining by nanoindenter and KOH wet etching. The scratch option of the nanoindenter is a very promising method for obtaining nanometer scale features on a large size specimen because it has a very wide working area and load range. Sample line patterns were machined on a silicon surface, which has a native oxide on it, by constant load scratch (CLS) of the Nanoindenter with a Berkovich diamond tip, and they were etched in KOH solutions to investigate chemical characteristics of the machined silicon surface. After the etching process, the convex structure was made because of masking effect of the affected layer generated by nano-scratch. On the basis of this fact, some line patterns with convex structures were fabricated. Achieved patterns can be used as a mold that will be used for mass production processes such as nanoimprint or PDMS molding process. All morphological data of scratch traces were scanned using atomic force microscope (AFM).

• Proceedings of the Korean Vacuum Society Conference
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• 2013.02a
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• pp.272-273
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• 2013

Some living thingsuse micro- or nano- structures for living in nature. Scientists and engineers made efforts to mimic them, and they succeeded in making new types of applications. They used 'Namib desert beetle' to self-filling device by moisture harvesting and 'lotus leaf' to self-cleaning device by water repelling. 'Namib desert beetle' and lotus leaf have micro-patterns on their surface, which consists of hydrophobic or hydrophilic materials [1]. Moreover, micro-patterns on the surface make self-filling or self-cleaning property enhanced because of the surface roughness. Surface roughness enhances wettability [2]. Micro-pattern is a significant factor to make the surface be functional, so we want to make new types of functional surface by micro-patterning. In this work,we make several functional micro-patterns (radial, line, and dot arrays) using maskless lithography and analyze the characteristics of each micro-pattern. In order to analyze and understand surface characteristics, micro-patterns with varying sizes are investigated. All experiments are proceeded on mr-DWL5 photo resists coated on silicon wafers in same condition. All the experiments have demonstrated good performances about hydrophobic or hydrophilic property corresponding to their material and structural combinations. In radial micro-pattern, although the surface is flat, water drops on hydrophilic radial pattern can be convergent to a middle point and water drops on hydrophobic radial pattern can be divergent from the middle point. In line array micro-pattern, water drops can roll off along only one direction in parallel with the line arrays. Such phenomena might be mainly caused by the local change of surface roughness. From these results, controlling the movement and direction of water drops is made feasible without introducing a slope, which can potentially be used for new types of applications.