• Title/Summary/Keyword: Mask material

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Flexible electronic-paper active-matrix displays

  • Huitema, H.E.A.;Gelinck, G.H.;Lieshout, P.J.G. Van;Veenendaal, E. Van;Touwslager, F.J.
    • 한국정보디스플레이학회:학술대회논문집
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    • 2004.08a
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    • pp.141-144
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    • 2004
  • A QVGA active-matrix backplane is produced on a 25${\mu}m$ thin plastic substrate. A 4-mask photolithographic process is used. The insulator layer and the semiconductor layer are organic material processed from solution. This backplane is combined with the electrophoretic display effect supplied by SiPix and E ink, resulting in an electronic paper display with a thickness of only 100${\mu}m$. This is world's thinnest active-matrix display ever made.

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A Study on Chemical Mechanical Polishing using Pattern Density based Modeling (패턴 밀도를 고려한 Chemical Mechanical Polishing에 관한 연구)

  • 이재경;문원하;황호정
    • Proceedings of the IEEK Conference
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    • 2002.06b
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    • pp.221-224
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    • 2002
  • Recently, simulation of Chemical Mechanical Polis hing is becoming more important because Process parameters on the material removal rate are complicated. And pattern-depent effects are a key concern in CMP processes. In this paper, we have been studied the changes of pattern density vs. oxide thickness with Stine's simulation model. We also have estimated the effective density using optimal window size with density mask, and have made a study of the change of oxide thickness as a function of polishing time.

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Reliable Design of the Frame for Tension Type CRT

  • Bae, Joon-Soo;Lee, Byeong-Yong;Cho, Sang-Myung
    • 한국정보디스플레이학회:학술대회논문집
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    • 2002.08a
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    • pp.355-358
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    • 2002
  • The deformation behavior of the frame for tension mask CRT is investigated by experiments and finite element method. We calculate and measure the stress-strain relation at the stress concentrations. The endurance test at 100$^{\circ}C$ was performed for checking tension decrease with time.

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UV Optical Solutions for Thin Film Processing and Annealing Research

  • Delmdahl, Ralph;Shimizu, Hiroshi;Dittmar, Mirko;Fechner, Burkhard
    • 한국정보디스플레이학회:학술대회논문집
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    • 2009.10a
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    • pp.246-249
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    • 2009
  • A compact, flexible family of UV laser material processing systems has been developed to drive advancements in both large area processing and annealing of semiconductor surfaces. UV photons can either be applied via demagnifying a mask pattern image or by scanning a homogenized excimer beam across the substrate area. 193nm, 248nm and 308nm wavelength applications are supported.

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The Development of Local Festival Costumes in Andong (안동지역 축제의상 개발에 관한 연구)

  • Kim, Hee-Sook
    • Fashion & Textile Research Journal
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    • v.19 no.1
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    • pp.1-10
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    • 2017
  • The purpose of this research is to industrialize and to localize traditional culture resources of Andong by developing festival costumes related to 'Andong Mask Dance Festival'. We tried several methods to deliver meanings and images of festival costumes, as followings. Frist, from April, 2009 to October, 2012, we created the new design of the festival costumes after consulting with 7 festival experts about the conditions and characteristics of 'Andong Mask Dance Festival'. The festival costume design is characterized by the detachable parts of clothing based on Han-bok style, the front and back of bodice, right and left side of both sleeves, and pockets, which can be tied up with strings. Therefore the consumers can choose and attach the part they want. Secondly, the newly created festival costumes were evaluated appropriately to the consumer's satisfaction, implementation, practicality, and long-term development possibility according to the survey of 85 participants who were, in fact, wearing the festival costumes in the festival. The results are as follows: Frist, festival costumes are based on Korean traditional costumes, and it appears wearing object as festival costumes. Secondly, traditional beauty and modern beauty are well matched up, so men and women of all ages are possible to wear. Thirdly, size of costume can be controlled, so it's easy to wear. Finally, construction method is very simple. The possibility of long-term development by various material development is needed.

Real-time Analysis and Safety Assessment of Volatile Organic Compounds Emitted from Masks (마스크에서 방출되는 휘발성유기화합물의 실시간 분석 사례)

  • Hyekyung Seo
    • Journal of Korean Society of Occupational and Environmental Hygiene
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    • v.34 no.3
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    • pp.179-188
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    • 2024
  • Objectives: The safety of distributed masks has been widely investigated following the coronavirus disease (COVID-19) pandemic. Although the unpleasant odor from masks is concerning, research on the toxicity of volatile organic compounds emitted from them is limited. Here, we aimed to quantify the VOCs emitted from masks and explore strategies for safe mask usage. Methods: The VOCs emitted from 15 masks in five categories were measured. Proton transfer reaction time-of-flight mass spectrometry (PTR-TOF-MS, IONICON, Austria), which can rapidly and sensitively detect complex mixtures, was conducted. The test chamber connected to the equipment was comprised of uninterrupted acrylic and glass. PTR-TOF-MS data were analyzed using Tofware (PTR-MS Viewer 3.3, IONICON, Austria). Statistical analyses were performed using SPSS ver. 20 to determine the highest, lowest, and average concentrations of the VOCs (IBM SPSS Inc., USA). Analysis of variance (ANOVA) was conducted to compare the VOCs emitted from different masks. Results: A total of 25 VOCs were detected among the 15 masks. The peak concentrations of formaldehyde, acrolein, isoprene, and benzene were higher than the exposure standards (Ceiling). The average concentrations of these compounds differed significantly among the mask samples (p < 0.05). The VOC concentration decreased gradually after approximately one hour. Conclusions: Higher concentrations of VOCs were emitted from healthy, printed, and surgical masks compared to industrial masks. Further research is required to determine the factors affecting VOCs, such as mask material, temperature, and humidity. For safety, masks must be ventilated for at least an hour before usage.

Hydrogen Plasma와 Oxygen Plasma를 이용한 50 nm 텅스텐 패턴의 Oxidation 및 Reduction에 관한 연구

  • Kim, Jong-Gyu;Jo, Seong-Il;Nam, Seok-U;Min, Gyeong-Seok;Kim, Chan-Gyu;Yeom, Geun-Yeong
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.08a
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    • pp.288-288
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    • 2012
  • The oxidation characteristics of tungsten line pattern during the carbon-based mask layer removal process using oxygen plasmas and the reduction characteristics of the WOx layer formed on the tungsten line surface using hydrogen plasmas have been investigated for sub-50 nm patterning processes. The surface oxidation of tungsten line during the mask layer removal process could be minimized by using a low temperature ($300^{\circ}K$) plasma processing instead of a high temperature plasma processing for the removal of the carbon-based material. Using this technique, the thickness of WOx on the tungsten line could be decreased to 25% of WOx formed by the high temperature processing. The WOx layer could be also completely removed at the low temperature of $300^{\circ}K$ using a hydrogen plasma by supplying bias power to the tungsten substrate to provide an activation energy for the reduction. When this oxidation and reduction technique was applied to actual 40 nm-CD device processing, the complete removal of WOx formed on the sidewall of tungsten line could be observed.

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Fabrication Technology of Glass Micro-framework by Photolithographic Process (사진식각 공정에 의한 유리 미세구조물 제작 기술)

  • O, Jae-Yeol;Jo, Yeong-Rae;Kim, Hui-Su;Jeong, Hyo-Su
    • Korean Journal of Materials Research
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    • v.8 no.9
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    • pp.871-875
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    • 1998
  • High aspect ratio microstructures were fabricated by photolithography. The material for the microstructure was photosensitive glass which has good mechanical and electrical insulation properties. The photosensitive glass was exposed to ultraviolet light at 312nm through a chromium mask in which the structures are drawn. After heat treatment process over $500^{\circ}C$, the photosensitive glass was etched in a 10% hydrofluoric acid solution with ultrasonic conditions. Final dimension of the micro-framework was greatly dependent on the thickness of photosensitive glass, mask pattern, ultraviolet light exposure and etching conditions. The maximum aspect ratio of the micro-framework obtained from this work was over 30.

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Filtration efficiency and Manikin-based Total Inward Leakage Study of Particle Filtering Mask Challenged with Silver Nanoparticles (은나노입자에 대한 방진마스크 포집효율 및 총누설율)

  • Kim, Jong-Kyu
    • Journal of Korean Society of Occupational and Environmental Hygiene
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    • v.26 no.3
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    • pp.367-376
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    • 2016
  • Objectives: The production and use of nanoparticles have been increased. In 2014 Workplace Survey Results, 335 companies produce and treat nanoparticls. However, lack of data on nano-toxicity and a method for risk management and regulation on nanoparticles and the standard test method are not sufficient. Protective equipment selection guidelines for nanoparticles are not established. It is required to carry out respirator efficiency test against nanoparticles. This study was performed to evaluate filtration efficiency and manikin-based total inward leakage of particle filtering mask using in Korean country challenged with silver nanoparticles. Methods: We investigated filtration efficiency and total inward leakage of 7 respirator with silver nanoparticle. Results: The geometric mean diameters of Silver nanoparticles were 30 nm and number concentration were about $10^6{\sharp}/cm^3$. Filtration efficiency of six of the seven particle filtering masks was more than 98% and one particle filtering masks filtration efficiency was 94.9%. The filtration efficiency of particle filtering masks to 20 nm silver nanoparticels was highest. Artificial breathing machine with manikin based total inward leakage were 7.6% ~ 42.3%. Conclusions: The results of this study nano-silver filter efficiency was high but the total inward leakage was higher than filter penetration. Therefore, education on how to wear a respirator should be demanded. Especially for workers handling nanoparticles and toxic material, user seal checking and fit test must be performed.

Micro-Pattern Machining Characteristics Evaluation of $Si_3N_4$-hBN based Machinable Ceramics Using Powder Blasting Process (파우더 블라스팅에 의한 $Si_3N_4$-hBN계 머시너블 세라믹스의 미세패턴 가공성 평가)

  • 박동삼;조명우;김동우;조원승
    • Transactions of the Korean Society of Machine Tool Engineers
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    • v.13 no.2
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    • pp.33-39
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    • 2004
  • Sandblasting has recently been developed into a powder blasting technique for brittle materials. In this study, the machinability of $Si_3N_4$-hBN based machinable ceramics are evaluated for micro - pattern making processes using powder blasting. Material properties of the developed machinable ceramics according to the variation of h-BN contents give a good machinability to the ceramics. The effect of scanning times, the size of patterns and variation of BN contents on the erosion depth of samples without mask and samples with different mask patterns in powder blasting of $Si_3N_4$-hBN ceramics are investigated. The Parameters are the impact angle of $90^{\circ}$, the scanning times of nozzle up to 40, and the stand-off distances of 100mm The widths of masked pattern are 0.1mm 0.5mm and 1mm. The powder used is Alumina particles, WA#600. and the blasting pressure of powder is 0.2MPa. Through required experiments, the results are investigated and analyzed. As the results, the machinability of the developed ceramics increases as the BN contents in the ceramics.