• Title/Summary/Keyword: Mask Stress

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Biomechanical Effects of Facial Mask according to Direction of Forces on the Craniofacial Complex : A Finite Element Study (두개안면복합체에서 Face Mask의 견인방향에 따른 생역학적 연구 : 유한요소법 연구)

  • Hyun, Ha-Young;Cha, Kyung-Suk;Chung, Dong-Hwa
    • Journal of Dental Rehabilitation and Applied Science
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    • v.23 no.4
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    • pp.359-371
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    • 2007
  • Recently, many studies were reported accurate analysis of facemask effect due to the development of the personal computers and computer programs. The aim of this study is appropriate protraction direction of facemask using finite element study with computer aided design and computer aided measurement. The construction of the three dimensional FEM was based on the computer tomography(CT) scans of 13.5 year-old male subject. Protraction force of 500 mg was applied at 0, 30, 60 and 90 degrees downwards to the Frankfort horizontal plane, and maxillary displacement and stress distribution were measured. When 60 degree force was applied, it showed forward movement of premolar roots area and downward movement of anterior nasomaxillary area, and others showed clockwise rotation movement of the nasomaxillary complex. Finally, we can produce the protraction of maxillary bone without rotation of maxilla about 60 degrees.

Prediction of Springback Shape in the Flange Forming (유한요소법을 이용한 박판 플랜지 형상 예측)

  • Kim Y. T.;Lee S. W.;Jeon J. H.;Lim H. C.
    • Proceedings of the Korean Society for Technology of Plasticity Conference
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    • 2005.05a
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    • pp.86-91
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    • 2005
  • The stack, the core unit of the MCFC system, is composed of the three main parts which are the electrodes, the matrix keeping the electrolyte and the separator. Among these, the separator made of low carbon steel is manufactured by some sheet metal forming processes. The flatness of flange of the mask plate of the separator is crucial not only to enhance the stack performance but also to reduce the production cost. This study has focused on the enhancement of flatness of the mask plate flange by controlling some process parameters like the punch and die comer radii, the blank holding force, the friction coefficient and so on. The springback phenomenon occurring in the flange drawing process has been studied first using the finite element method (FEM) in order to understand what causes the springback. The distribution pattern of local longitudinal stress in the flanged part has been revealed very important in predicting the final shape of the flange. This fact has been backed up by the experimental results carried out with the developed test dies.

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The Analysis of the Residual Stress and Bending Characteristics on the Heterogeneous Materials by Laser Welding (레이저 용접에 의한 이종재료의 잔류응력과 굽힘 특성 분석)

  • 오세헌;민택기
    • Journal of Welding and Joining
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    • v.22 no.3
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    • pp.45-49
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    • 2004
  • Generally, it is used the compensation spring to compensate the inaccuracy of screen image induced by thermal deformation in CRT monitor. Its mechanism is hi-metallic system made of heterogeneous metals and these springs are bonded by laser welding. But laser welding induces a non-uniform temperature distribution, and residual stress is yielded locally by these temperature deviation. Therefore, this study measures the curvature constant to assess functions of the compensation spring of shadow mask with respect to increment temperature and estimates the effect of residual stress on the performance of tri-metal used to compensation spring.

A Study on the Skin Stress Recognition and Beauty Care Status due to Wearing Masks (안면 마스크 착용에 따른 피부 스트레스 인식도와 뷰티 케어 현황에 관한 연구)

  • Kim, Hyeon-Suk
    • Journal of the Korean Applied Science and Technology
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    • v.38 no.2
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    • pp.465-475
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    • 2021
  • This study conducted an online and offline survey of 210 people from March 11 to 27, 2021 for the purpose of investigating and analyzing the current status of skin stress recognition and beauty care behavior due to wearing masks. The collected data were analyzed using SPSS 25.0 with Cronbach's α, Frequency Analysis, Chi-square test, and One way Anova. The average daily mask wearing time of more than 7 hours during the Covid-19 period was 43.8%, and skin stress recognition by wearing masks was highest among those in their 30s (M=4.27) and service workers (M=4.64), and those with acne and skin troubles (M=4.47) perceived high stress. The most important factor for home care treatment was cleansing(67.6%) and for beauty care was skin care(36.7%). Considerations factors on beauty care were 54.3% for service and customer care capabilities, and on body shape management method 45.7% for exercise. According to this study, respondents are recognizing skin stress due to the long-term use of masks, and home care treatment has been increasing as the esthetic salon has become unstable to visit due to the Covid-19 epidemic.

The Association between Skin Type and Skin Care Behavior and Stress Perception during COVID-19 Pandemic

  • Tae-Oim KIM;Ki-Han KWON
    • The Journal of Industrial Distribution & Business
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    • v.14 no.4
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    • pp.33-46
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    • 2023
  • Purpose: During the coronavirus disease-19 (COVID-19) outbreak, mask-wearing is required to protect against and limit the spread of infection, but it can directly affect skin problems. Change in skin condition might be related to mental health. This study explored the association between skin conditions and behavior of skin cares and stress levels during the Covid-19pandemics. Research design, data and methodology: A survey was conducted on 516 adults who were aware of damaged skin due to continuous wearing of masks for a long time during the COVID-19 Pandemic. The study included 164 men and 352 women in the Republic of Korea. Results: Skin conditions and behavior of skin cares associated with stress perceptions. A multiple linear regression model was used adjusting for potential confounder. Conclusion: Since management so far in the COVID-19 Pandemic can cause skin concerns and change the original skin type, it is necessary to redefine and improve the use of skin care, face-washing methods, and functional cosmetics. People with high and low interest in skin type recognition and management were evenly identified, and it was confirmed that stress awareness decreases as awareness of skin care attitude increases.

Vibration test and verification of Multi-Anode-Photo-Multiplier-Tube's survivability with X-Ray Coded Mask Gamma Ray Burst Alert Trigger mechanical system in space launch environment

  • Choi, Ji Nyeong;Choi, Yeon Ju;Jeong, Soomin;Jung, Aera;Kim, Min Bin;Kim, Ji Eun;Kim, Sug-Whan;Kim, Ye Won;Lee, Jik;Lim, Heuijin;Min, Kyung Wook;Na, Go Woon;Nam, Ji Woo;Park, Il Hung;Ripa, Jakub.;Suh, Jung Eun
    • The Bulletin of The Korean Astronomical Society
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    • v.37 no.2
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    • pp.209.2-209.2
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    • 2012
  • UFFO Burst Alert & Trigger telescope (UBAT) is one of major instruments of UFFO-Pathfinder. The UBAT aims at 10 arcmin resolution localization of Gamma Ray Bursts with X-ray coded mask technique. It has $400mm{\times}400mm$ coded mask aperture, hopper, shielding and detector module with effective area of $191cm^2$. The detector module consists of an assembly of 36 64-ch MAPMTs and $25mm{\times}25mm$ pixellated YSO crystal array, and associated analog and digital electronics of about 2500 channels. We performed a vibration test using a dummy MAPMT with the detector module structure to measure the indused stress applied onto the MAPMT. We designed a sub-structure on the detector module to avoid the resonance that would otherwise deforms the detector module structure. A finite element analysis confirms the reduction of the load acceleration down to 12g. The experimental results are to be reported. Consequently, it proves that the MAPMT arrays of the flight UBAT detector module structure would survive in the space launch environment.

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Anisotropic Silicon Etching Using $RuO_2$ Thin Film as a Mask Layer by TMAH Solution ($RuO_2$를 마스크 층으로 TMAH에 의한 이방성 실리콘 식각)

  • 이재복;오세훈;홍경일;최덕균
    • Journal of the Korean Ceramic Society
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    • v.34 no.10
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    • pp.1021-1026
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    • 1997
  • RuO2 thin film has reasonably good conductivity and stiffness and it is thought to substitute for the cantilever beam made up of Pt and Si3N4 double layers in microactuators. Therefore, anisotopic Si etching was performed using RuO2 thin film as a mask layer in 25 wt. % TMAH water solution. In the etching temperature ranging from 6$0^{\circ}C$ to 75$^{\circ}C$, the etch rates of all the crystallographic directions increased linearly as the etching temperature increased. The etch rate ratio(selectivity) of [111]/[100] which varied from 0.08 to 0.14, was not sensitive to temperature. The activation energies for [110] direction, [100] direction and [111] direction were 0.50, 0.66 and 1.04eV, respectively. RuO2 cantilever beam with a clean surface was formed at the etching temperatures of 6$0^{\circ}C$ and $65^{\circ}C$. But the damages due to formation of pin holes on RuO2 surface were observed beyond 7$0^{\circ}C$. The tensile stress of RuO2 thin films caused the cantilever bending upward. As a result, it was demonstrated that the formation of conducting oxide RuO2 cantilever beam which can replace the role of an electrode and supporting layer could be possible by TMAH solution.

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Measurement of residual stress of TEOS and PSG for MEMS (MEMS용 PSG와 TEOS의 열처리에 따른 잔류응력의 측정)

  • Yi, Sang-Woo;Lee, Sang-Woo;Kim, Jong-Pal;Park, Sang-Jun;Lee, Sang-Chul;Kim, Sung-Un;Cho, Dong-Il
    • Proceedings of the KIEE Conference
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    • 1998.07g
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    • pp.2536-2538
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    • 1998
  • This paper investigates the residual stress of tetraethoxysilane (TEOS) and 7wt% phosphosilicate glass (PSG), which are commonly used as a sacrificial layer or etch mask in the fabrication of microelectromechanical systems (MEMS). In order to measure residual stress, $2{\mu}m$ thick TEOS and PSG stress measurement structures are fabricated. Polysilicon is used as the sacrificial layer. First the residual stress of an as-deposited 7wt% PSG flim and TEOS film are measured to be-0.3115% and -0.435%, respectively, which are quite large. These films are annealed from $500^{\circ}C$ to $800^{\circ}C$. Annealing has the effects of reducing residual stress. In the case of the 7wt% PSG film, the residual stress becomes +0.00715% after annealing at $625^{\circ}C$ for 150 minutes. In the case of TEOS film, the residual stress reduces to -0.2134% after same condition. Incidentally, this condition is the same condition for depositing a $2{\mu}m$ thick polysilicon at $625^{\circ}C$ at our low pressure chemical vapor deposition (LPCVD) furnace.

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The study on optimum design for shear stress integrated pressure sensor (전단응력형 집적화 압력센서의 최적설계)

  • 주리아;도태성;이종녕;서희돈
    • Journal of the Korean Institute of Telematics and Electronics T
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    • v.35T no.1
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    • pp.75-81
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    • 1998
  • This paper is to optimize single-element piezoresistor shear stress strain gauge related to aspect ratio of rectangular diaphragm. The shear stress distribution on diaphragm has been simulated by finite-element method(FEM). As simulation results, the maximum sensitivity for strain gauge was appeared at the center of diaphragm with aspect ratio 3, and in along to long edge with the ratio 2. The diaphragm with ratio 2 is not acceptable due to the yield of mask alignment in IC process technology. The optimum condition of diaphragm with respect to good sensitivity was realized in the case of ratio 3. In this case, the area by gauge was 8% of overall size of rectangular diaphragm.

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A Study on the W-Ti Absorber Properties with Various Ti Composition for X-ray Lithography Mask (Ti 함량 변화에 따른 X선 노광 마스크용 W-Ti 흡수체의 물성 연구)

  • Kim, Gyeong-Seok;Lee, Gyu-Han;Im, Seung-Taek;Lee, Seung-Yun;An, Jin-Ho
    • Korean Journal of Materials Research
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    • v.10 no.3
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    • pp.218-222
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    • 2000
  • W-Ti film properties for X-ray absorber applications have been investigated with Ti composition have been investigated with Ti composition variation. W-Ti films were deposited by DC magnetron sputtering system. As the working pressure increases, film density decreases and film stress changes from compressive to tensile. The transition pressure (where the film stress in zero) and the stress gradient decrease by adding Ti into W-Ti(6.5 at.%) film shows the smallest stress gradient and transition pressure. It also shows high density ($17.7g/\textrm{cm}^3$) similar to that of pure-W ($17.8g/\textrm{cm}^3$) at the transition pressure. All the films show columnar structure, and its size decreases with increasing Ti composition. Surface roughness and thermal stability are improved by Ti-addition, resulting in a better property for X-ray absorber applications.

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