• 문화기술의 융합
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• 제7권1호
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• pp.576-581
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• 2021

유행병 후 시대에 COVID-19는 아직 완전히 통제되지 않고 있다. 마스크 착용은 여전히 전염병 예방의 주요수단이며, 마스크로 인한 부정적인 영향은 계속되고 있다. 오랫동안 마스크를 착용하면 두 가지 문제가 발생할 수 있다. 첫 번째 문제는 저산소증이고 다른 하나는 심리적 스트레스의 증가이다. 마스크의 부정적인 영향을 줄이기 위해 이 논문에서는 새로운 호흡방식을 제안하였다. 저산소증과 스트레스 증가의 두 가지 문제를 동시에 해결하는 "음~"발성호흡이다. 이 논문에서 새로운 호흡 패턴으로 스트레스를 해소하는 원리를 파악하였고, HRV와 스트레스 지수의 관계를 설명하면서 SDNN을 지표로 사용하여 이 호흡 패턴의 효과를 스트레스지수로 측정하였다. 실험결과 "음 ~"발성호흡이 마스크 착용으로 인한 스트레스를 해소 할 수 있을 뿐만 아니라, 마스크를 쓰지 않을 때도 일상적인 스트레스를 해소해 주기도 한다. 따라서 누구나 쉽게 구현할 수 있는 이 방법은 앞으로 더 대중화될 것이다.

• 한국임상수의학회지
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• 제22권3호
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• pp.214-219
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• 2005

This experiment was conducted in order to identify the effect of the laryngeal mask airway and it's clinical utility on cardiovascular system, intraocular pressure and stress reaction at the time of anesthesia care. The heart rate, systolic arterial pressure, diastolic arterial pressure and intraocular pressure were significantly reduced in the experimental group to be compared with the control group. But, there were no significant differences in mean arterial pressure, central venous pressure and blood cortisol concentration between both groups. In view of the above results, it is thought that the airway management using the laryngeal mask airway will be useful to reduce the stress condition in the induction of anesthesia.

• 소성∙가공
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• 제12권5호
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• pp.487-492
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• 2003

Tension variations with heat treatment in shadow mask for flat braun tubes are investigated in this study. In CRT, landing shift of the electron beam due to thermal deformation of the tension mask made the color purity of screen worse. In order to get the final results of thermal deformation, the tensile force within the mask and the welding processes between the rail and the extended mask have to be analysed sequentially. In this study, the effect of heat treatment is studied in terms of tension variations of shadow mask during its manufacturing process.

• 소성∙가공
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• 제12권2호
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• pp.123-127
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• 2003

The cold rolling conditions for the ultra thin steel for tension mask are very important because the residual stress that affects the flatness of strip is generate during the cold rolling. The residual stress in the sheet causes etching curls when it suffers perforation process. The residual stress through the thickness. To estimate the residual stress and deformation due to etching curl. FEM analysis is performed. Numerical simulation employ a ANSY5 5.6 and an elastic-plastic constitutive equation. The simulation results indicate the distribution of residual stress in the rolled sheet can be controlled by selecting the rolling conditions properly.

• 한국소성가공학회:학술대회논문집
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• 한국소성가공학회 2002년도 춘계학술대회 논문집
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• pp.195-198
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• 2002

Residual stress of sheet occurs during cold rolling and it is hard to avoid and inevitable. The residual stress in the sheet cause etching curls when it suffers peroration process. The residual stress through the thickness direction in the sheet is a function of a friction coefficient, total reduction, mil size and initial sheet thickness. To estimate the residual stress and deformation due to etching curl, FEM analysis is performed. A numerical analysis is used a ANSYS 5.6 and an elastic-plastic constitutive equations. rho simulation results indicate a distribution of residual stress.

• 한국정밀공학회지
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• 제21권8호
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• pp.152-156
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• 2004

A new tool of surface patterning technique for general purpose lithography was developed based on shadow mask method. This paper describes the fabrication of a new type of miniaturized shadow mask. The shadow mask is fabricated by photolithography and etching of 100-mm full wafer. The fabricated shadow mask has over 388 membranes with apertures of micrometer length scale ranging from 1${\mu}{\textrm}{m}$ to 100s ${\mu}{\textrm}{m}$ made on each 2mm${\times}$2mm large low stress silicon nitride membrane. It allows micro scale patterns to be directly deposited on substrate surface through apertures of the membrane. This shadow mask method has much wider choice of deposit materials, and can be applied to wider class of surfaces including chemical functional layer, MEMS/NEMS surfaces, and biosensors.

• 디지털융복합연구
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• 제19권2호
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• pp.439-446
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• 2021

본 연구는 천연광물질로 나염 처리된 스포츠마스크가 방역마스크와 면마스크와 비교하여 주관적인 구취관련특성과 심리적 특성에서 차이가 있는 지 조사하는 것이다. 연구대상자는 스포츠마스크 군(Sports Mask Group) 30명, 방역마스크 군(KF Mask Group, KMG) 30명과 면 마스크 군(cotton mask group, CMG) 30명으로 나누어 총 90명의 대상자가 연구에 참가하였으며, 하루 1개, 3일 간 3개의 마스크를 사용하게 하였다. 또한 연구 기간은 2020년 10월 15일부터 2020년 10월 30일까지 실시하였다. 연구결과 구취건강과 구강건조 항목에서는 3군 간 차이가 없는 것으로 나타났지만 구강호흡과 구취자각도에서는 스포츠 마스크가 다른 마스크에 비하여 우수하게 나타났다. 심리적 요인을 분석한 결과 우울증은 3군 간 차이가 없는 것으로 나타났지만, 스트레스 요인에서는 스포츠마스크가 다른 마스크보다 스트레스지수가 감소된 것으로 나타났다. 연구의 결과는 기능성 마스크의 활용 방향성을 제시한 것으로써 가치가 있으며, 향후 연구될 기능성 마스크 연구의 기초 자료로 활용되길 바라는 바이다.

• 한국정밀공학회지
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• 제20권6호
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• pp.214-221
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• 2003

Tension mask assembly is positioned right behind the glass-made front panels of CRT type display devices. The frame-supported thin metal sheet contains numerous slits, through which electron beams are focused to enhance definition. Pretension is imposed on the masks, especially for enlarged flat screens, in order to avoid vibration due to acoustic or mechanical impact. High temperature assembly process subsequent to pretensioning, however, degenerates the creep resistance of common mask materials, and if tensile stress is high enough, tension on the mask may be loosened substantially due to creep deformation. In this study, the assembly is modeled as a combined structure of beams and wire array, and a numerical simulation is attempted for pretensioning followed by high temperature process. According to a model study, small amount of creep strain is likely to be generated, but its adverse influence is not negligible. Some structural modification measures to reduce the creep-induced tension loosening are proposed and evaluated. Also, optimal configuration of frame structure is sought for, which maintains high tension of masks and minimizes the possible creep of frame simultaneously.

• 대한기계학회논문집A
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• 제27권6호
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• pp.1034-1040
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• 2003

Tension mask is a part of CRT type devices, which is installed right behind glass-made front panel. Numerous slits on the thin metal sheet enable the electron beams emitted from posterior gun to be focused, resulting in enhanced definition. Flattened and enlarged displays necessitate the imposition of pretension on the masks, in order to improve the robustness of display quality against vibration or impact. High temperature assembly process subsequent to pretensioning, however, degenerates creep resistance of mask material, and common mask may become susceptible to undesirable elongation due to creep. Once tensile stress becomes high enough to induce creep deformation, pretension is substantially loosened. In this study, tension mask assembly is modeled as a combined structure of beams and wire array, and a numerical simulation is attempted for pretensioning followed by high temperature process. Based on a model study, creep occurrence is found to be probable and its adverse influence is quantified. As fur maintaining high tensile force, simply increasing pretension does not seem to be helpful. Instead, the structure of frame needs to be modified somehow, or material for mask needs to be selected properly.

• 대한기계학회논문집A
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• 제30권10호
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• pp.1314-1319
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• 2006

This paper describes the novel fabrication method of the high-aspect-ratio nano structure which is impossible by conventional method using a shadow mask and a Deep X-ray Lithography (DXRL). The shadow mask with $1{\mu}m-sized$ apertures is fabricated on the silicon membrane using a conventional UV-lithography. The size of aperture is reduced to 200nm by accumulated low stress silicon nitride using a LPCVD (low pressure chemical vapor deposition) process. The X-ray mask is fabricated by depositing absorber layer (Au, $3{\mu}m$) on the back side of nano shadow mask. The thickness of an absorber layer must deposit dozens micrometers to obtain contrast more than 100 for a conventional DXRL process. The thickness of $3{\mu}m-absorber$ layer can get sufficient contrast using a central beam stop method, blocking high energy X-rays. The nano circle and nano line, 200nm in diameter in width, respectively, were demonstrated 700nm in height with a negative photoresist of SU-8.