• Journal of the Korean Institute of Telematics and Electronics A
• /
• v.32A no.12
• /
• pp.115-121
• /
• 1995

A mask for x-ray lithography is fabricated with SiN membrane and WTi absorber. SiN membrane is deposited by plasma enhanced chemical vapor deposition, and the stress of SiN membrane is controlled to be less than 100 MPa by rapid thermal annealing. WTi absorber is reactively deposited by DC-magnetron type sputter, and the working gases are argon and nitrogen. Added nitrogen is contributed to the stress of WTi absorber. The stress of WTi absorber is controlled to be less than $\pm$ 100 MPa by controlling the deposition pressure. 10$\mu$m WTi pattern is delineated on SiN membrane by dry etching technique.

• Transactions on Electrical and Electronic Materials
• /
• v.5 no.6
• /
• pp.215-218
• /
• 2004

This paper presents a three-dimensional numerical simulation for thermal oxidation process. A new elasto-viscoplastic model for robust numerical oxidation simulation is proposed. The three-dimensional effects of oxidation process such as mask lifting effect and corner effects are analyzed. In nano-scale process, the oxidant diffusion is punched through to the other side of the mask. The mask is lifted so the thickness of oxide region is greatly enhanced. The compressive pressure during the oxidation is largest in the mask corner of the island structure. This is because the masked area near the corner is surrounded by an area larger than the others in the island structure. This stress induces the retardation of the oxide growth, especially at the masked corner in the island structure.

• Textile Coloration and Finishing
• /
• v.29 no.1
• /
• pp.45-54
• /
• 2017

Ultraviolet radiation have much influenced with a deep wrinkles, roughness, laxity of skin damage and pigmentation through oxidative stress and oxidative photo-damage. This study investigates the functional properties of hydrogel facial mask sheets made from agar, Styela clava tunics and Broussonetia papyrifera tunics. The skin of S. clava is covered with a hard cellulose containing glycoprotein, glycosaminoglycan and chondroitin sulfate. B. papyrifera is better known as Paper mulberry. It contains kazinol which serves as a tyrosinase inhibitor and skin whitening agent. The tensile strength of facial mask sheet was measured by universal testing machine, and the water absorption and moisture permeability of facial mask sheet were measured by dryer. Additionally, the DPPH assay and MTT assay were conducted for anti-oxidative activity and cytotoxicity of facial mask sheet. The whitening effect of the facial mask sheet was measured by tyrosinase inhibitor assay. These tests showed that the three ingredients are suitable cosmetic materials. The results reveal that they produce a high quality hydrogel facial mask sheet when the membrane contains 1%(W/V) of agar, 0.1%(W/V) of B. papyrifera tunics and 0.05%(W/V) of S. clava tunics.

• Proceedings of the IEEK Conference
• /
• 2000.11d
• /
• pp.223-226
• /
• 2000

In this paper, we report detects system algorithm, adapted a perimetric mask and a generalized symmetry system, to detect a transformable material and find out a minute error cannot be noticed by a naked eye. In this thesis, supposed a stable detecting system applied a general image processing theory and perimetric mash algorithm to detect badness. And finally, detected some vague errors with the application of symmetry transform algorithm that accumulate a symmetry of minute error and put stress on it.

• Proceedings of the Materials Research Society of Korea Conference
• /
• 1997.05a
• /
• pp.117-117
• /
• 1997

• Journal of Dental Rehabilitation and Applied Science
• /
• v.25 no.2
• /
• pp.171-181
• /
• 2009

The objective of this study was to analyse stress distribution of maxillary complex by use of face mask. The construction of the three-dimensional FEM model was based on the computed tomography(CT) scans of 13.5 years-old male subject. The CT image were digitized and converted to the finite element model by using the mimics program, with PATRAN. An anteriorly directed force of 500g was applied at the first premolar 45 degrees downwards to the FH plane and at the first molar 20 degrees downwards to the FH plane. When 45 degrees force was applied at maxillary first premolar, there were observed expansion at molar part and constriction at premolar part. The largest displacement was 0.00011mm in the x-axis. In the y-axis, anterior displacement observed generally 0.00030mm at maximum. In the z-axis, maxillary complex was displaced 0.00036 mm forward and downward. When 20 degrees force was applied at maxilla first molar, there were observed expansion at lateral nasal wall and constriction at molar part. The largest displacement was 0.001mm in the X-axis. In the Y-axis, anterior displacement observed generally 0.004mm at maximum. In the Z-axis, ANS was displaced upward and pterygoid complex was displaced downward. The largest displacement was 0.002mm.

• 한국정보디스플레이학회:학술대회논문집
• /
• 2002.08a
• /
• pp.355-358
• /
• 2002

The deformation behavior of the frame for tension mask CRT is investigated by experiments and finite element method. We calculate and measure the stress-strain relation at the stress concentrations. The endurance test at 100$^{\circ}C$ was performed for checking tension decrease with time.

• Anxiety and mood
• /
• v.19 no.2
• /
• pp.61-68
• /
• 2023

Objective : The purpose of this study was to investigate the associations between psychosocial factors and the mask-wearing behavior after deregulation of COVID-19 quarantine guidelines among adults in Korea. Methods : We collected data (345 subjects) from online questionnaire survey. The questionnaire included the Korean version of the Patient Health Questionnaire-9, the Korean version of fear of COVID-19 Scale, the Korean version of the Patient Health Questionnaire-15, Korean versions of the Perceived Stress Scale, and measurement tools adapted from previous studies for COVID-19 risk perception, social stigma, and appearance interest of subjects. We analysed data using SPSS version 23.0 for descriptive statistics, chi-square test, and logistic regression analysis. Results : People with cohabitant or mask-wearing tendency before COVID-19 pandemic had a higher rate of mask-wearing than those who were not. Subjects reporting higher level of social stigma (OR=1.154, 95% CI 1.049-1.270) and COVID-19 anxiety (OR=1.072, 95% CI 1.007-1.141) were more likely to report maskwearing behavior. Conclusion : From the results, appropriate intervention to those who fear social stigma and are anxious to the infectious diseases will be needed. Additionally, providing policies and guidelines that consider cohabitants and offering continuous education with information of disease to the public are also expected to helpful for recovery of daily life from infectious diseases.

• Journal of Sensor Science and Technology
• /
• v.14 no.5
• /
• pp.357-361
• /
• 2005

Low-stress silicon nitride (LSN) thin films with embedded metal line have been developed as free standing structures to keep microspheres in proper locations and localized heat source for application to a chip-based sensor array for the simultaneous and near-real-time detection of multiple analytes in solution. The LSN film has been utilized as a structural material as well as a hard mask layer for wet anisotropic etching of silicon. The LSN was deposited by LPCVD (Low Pressure Chemical Vapor Deposition) process by varing the ratio of source gas flows. The residual stress of the LSN film was measured by laser curvature method. The residual stress of the LSN film is 6 times lower than that of the stoichiometric silicon nitride film. The test results showed that not only the LSN film but also the stack of LSN layers with embedded metal line could stand without notable deflection.

• Journal of the Microelectronics and Packaging Society
• /
• v.7 no.2
• /
• pp.1-6
• /
• 2000

X-ray lithography mask with SiC membrane and Ta absorber patterns has been fabricated using ECR plasma CVD, d.c. magnetron sputtering, and ECR plasma etching. The stress of stoichiometric SiC film was adjusted by rapid thermal annealing under $N_2$, ambient. Adjusting the working pressure during sputtering process resulted in a near-zero residual stress, reasonable density, and smooth surface morphology of Ta film. Cl-based plasma showed a good etching characteristics of Ta, and two-step etching process was implemented to suppress microloading effect fur sub-quarter $\mu\textrm{m}$ patterning.