• The Journal of the Convergence on Culture Technology
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• v.7 no.1
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• pp.576-581
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• 2021

In the post-epidemic era, COVID-19 has not yet been fully controlled. Wearing masks is still the main means of epidemic prevention, and the negative effects brought by masks continue to continue. Wearing a mask for a long time can cause two problems. The first problem is hypoxia, and the other is an increase in psychological stress. To reduce the negative impact of masks, this paper proposes a new breathing mode. It is the "Umm~" vocal breathing mode, which simultaneously solves the two problems of hypoxia and increased stress. This paper explores the reasons why new breathing patterns can relieve stress. Explains the relationship between HRV and stress index and uses SDNN as an indicator to detect stress index to confirm the effectiveness of this breathing pattern. Experimental results prove that the "Umm~" vocal breathing mode can not only relieve the stress induced by wearing a mask. And when not wearing a mask, it can also be used to relieve daily stress. This method that anyone can easily implement should be more popularized.

• Journal of Veterinary Clinics
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• v.22 no.3
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• pp.214-219
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• 2005

This experiment was conducted in order to identify the effect of the laryngeal mask airway and it's clinical utility on cardiovascular system, intraocular pressure and stress reaction at the time of anesthesia care. The heart rate, systolic arterial pressure, diastolic arterial pressure and intraocular pressure were significantly reduced in the experimental group to be compared with the control group. But, there were no significant differences in mean arterial pressure, central venous pressure and blood cortisol concentration between both groups. In view of the above results, it is thought that the airway management using the laryngeal mask airway will be useful to reduce the stress condition in the induction of anesthesia.

• Transactions of Materials Processing
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• v.12 no.5
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• pp.487-492
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• 2003

Tension variations with heat treatment in shadow mask for flat braun tubes are investigated in this study. In CRT, landing shift of the electron beam due to thermal deformation of the tension mask made the color purity of screen worse. In order to get the final results of thermal deformation, the tensile force within the mask and the welding processes between the rail and the extended mask have to be analysed sequentially. In this study, the effect of heat treatment is studied in terms of tension variations of shadow mask during its manufacturing process.

• Transactions of Materials Processing
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• v.12 no.2
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• pp.123-127
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• 2003

The cold rolling conditions for the ultra thin steel for tension mask are very important because the residual stress that affects the flatness of strip is generate during the cold rolling. The residual stress in the sheet causes etching curls when it suffers perforation process. The residual stress through the thickness. To estimate the residual stress and deformation due to etching curl. FEM analysis is performed. Numerical simulation employ a ANSY5 5.6 and an elastic-plastic constitutive equation. The simulation results indicate the distribution of residual stress in the rolled sheet can be controlled by selecting the rolling conditions properly.

• Proceedings of the Korean Society for Technology of Plasticity Conference
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• 2002.05a
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• pp.195-198
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• 2002

Residual stress of sheet occurs during cold rolling and it is hard to avoid and inevitable. The residual stress in the sheet cause etching curls when it suffers peroration process. The residual stress through the thickness direction in the sheet is a function of a friction coefficient, total reduction, mil size and initial sheet thickness. To estimate the residual stress and deformation due to etching curl, FEM analysis is performed. A numerical analysis is used a ANSYS 5.6 and an elastic-plastic constitutive equations. rho simulation results indicate a distribution of residual stress.

• Journal of the Korean Society for Precision Engineering
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• v.21 no.8
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• pp.152-156
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• 2004

A new tool of surface patterning technique for general purpose lithography was developed based on shadow mask method. This paper describes the fabrication of a new type of miniaturized shadow mask. The shadow mask is fabricated by photolithography and etching of 100-mm full wafer. The fabricated shadow mask has over 388 membranes with apertures of micrometer length scale ranging from 1${\mu}{\textrm}{m}$ to 100s ${\mu}{\textrm}{m}$ made on each 2mm${\times}$2mm large low stress silicon nitride membrane. It allows micro scale patterns to be directly deposited on substrate surface through apertures of the membrane. This shadow mask method has much wider choice of deposit materials, and can be applied to wider class of surfaces including chemical functional layer, MEMS/NEMS surfaces, and biosensors.

• Journal of Digital Convergence
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• v.19 no.2
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• pp.439-446
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• 2021

This study was to investigate whether there are differences in subjective bad breath-related characteristics and psychological characteristics of sports masks printed with natural minerals compared with quarantine masks and cotton masks. The study subjects were divided into 30 people in the Sports Mask Group, 30 people in the KF Mask Group (KMG), and 30 people in the cotton mask group (CMG), and a total of 90 subjects participated in the study. It was randomly sent to use 1 mask per day and 3 masks for 3 days. The study period was conducted from October 15, 2020 to October 30, 2020. As a result of the study, there was no difference in the use of masks between the three groups in terms of bad breath health and dry mouth. However, the sports mask was superior to other masks in oral respiration and bad breath angle. As a result of analyzing psychological factors, there was no difference between the 3 groups for depression. However, in the stress factor, sports masks were superior to other masks in stress. The results of this study are valuable as suggesting the direction of use of functional masks, and we hope that they will be used as basic data for functional mask research to be studied in the future.

• Journal of the Korean Society for Precision Engineering
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• v.20 no.6
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• pp.214-221
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• 2003

Tension mask assembly is positioned right behind the glass-made front panels of CRT type display devices. The frame-supported thin metal sheet contains numerous slits, through which electron beams are focused to enhance definition. Pretension is imposed on the masks, especially for enlarged flat screens, in order to avoid vibration due to acoustic or mechanical impact. High temperature assembly process subsequent to pretensioning, however, degenerates the creep resistance of common mask materials, and if tensile stress is high enough, tension on the mask may be loosened substantially due to creep deformation. In this study, the assembly is modeled as a combined structure of beams and wire array, and a numerical simulation is attempted for pretensioning followed by high temperature process. According to a model study, small amount of creep strain is likely to be generated, but its adverse influence is not negligible. Some structural modification measures to reduce the creep-induced tension loosening are proposed and evaluated. Also, optimal configuration of frame structure is sought for, which maintains high tension of masks and minimizes the possible creep of frame simultaneously.

• Transactions of the Korean Society of Mechanical Engineers A
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• v.27 no.6
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• pp.1034-1040
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• 2003

Tension mask is a part of CRT type devices, which is installed right behind glass-made front panel. Numerous slits on the thin metal sheet enable the electron beams emitted from posterior gun to be focused, resulting in enhanced definition. Flattened and enlarged displays necessitate the imposition of pretension on the masks, in order to improve the robustness of display quality against vibration or impact. High temperature assembly process subsequent to pretensioning, however, degenerates creep resistance of mask material, and common mask may become susceptible to undesirable elongation due to creep. Once tensile stress becomes high enough to induce creep deformation, pretension is substantially loosened. In this study, tension mask assembly is modeled as a combined structure of beams and wire array, and a numerical simulation is attempted for pretensioning followed by high temperature process. Based on a model study, creep occurrence is found to be probable and its adverse influence is quantified. As fur maintaining high tensile force, simply increasing pretension does not seem to be helpful. Instead, the structure of frame needs to be modified somehow, or material for mask needs to be selected properly.

• Transactions of the Korean Society of Mechanical Engineers A
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• v.30 no.10 s.253
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• pp.1314-1319
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• 2006

This paper describes the novel fabrication method of the high-aspect-ratio nano structure which is impossible by conventional method using a shadow mask and a Deep X-ray Lithography (DXRL). The shadow mask with $1{\mu}m-sized$ apertures is fabricated on the silicon membrane using a conventional UV-lithography. The size of aperture is reduced to 200nm by accumulated low stress silicon nitride using a LPCVD (low pressure chemical vapor deposition) process. The X-ray mask is fabricated by depositing absorber layer (Au, $3{\mu}m$) on the back side of nano shadow mask. The thickness of an absorber layer must deposit dozens micrometers to obtain contrast more than 100 for a conventional DXRL process. The thickness of $3{\mu}m-absorber$ layer can get sufficient contrast using a central beam stop method, blocking high energy X-rays. The nano circle and nano line, 200nm in diameter in width, respectively, were demonstrated 700nm in height with a negative photoresist of SU-8.