• Journal of the Korean Society of Clothing and Textiles
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• v.48 no.3
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• pp.417-432
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• 2024

This study aimed to enhance the comfort of health masks by conducting in-depth interviews, online surveys, and wearing tests on commercial health masks. The findings are summarized below. In-depth interviews revealed that the most comfortable mask styles were ranked as follows: Beak-1 (B-1) & Beak-2 (B-2) style > Flat style > 3-Horizontal foldable (3H) style. Men generally preferred flat style masks, while women favored beak-shaped masks. The internet survey results showed that 77.8% of surveyed brands offered a variety of mask styles, with 3H and B-2 masks being the most common. Different brands provided masks with different filtration levels, ranging from KF-AD to KF94. Size consistency also varied among brands, with flat masks having relatively consistent dimensions and B-2 masks showing significant size differences. Wearing tests indicated that 3H and B-1 masks were highly satisfying for categories like "itchiness," "unpleasant odor," and "mask slipping." Conversely, flat masks scored the highest satisfaction in classifications such as "stiff," "heavy," "thick," "hot while wearing it," "moisture accumulation," "breathing discomfort," "short ear straps," and "itchiness". Overall, the flat style, B-1, and B-2 yielded higher satisfaction levels, while 4-Horizontal foldable (4H) and 3H garnered lower satisfaction scores on wearing tests.

• Journal of Convergence for Information Technology
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• v.11 no.11
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• pp.288-295
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• 2021

This study was conducted to investigate the effect of end paper adsorbed with mask pack active ingredients on hair during permanent wave treatment. Permanent wave was performed with purchasing mask packs containing green tangerine, collagen, and Houttuynia cordate active ingredients among commercially available mask packs and adsorbing them to the end paper. As experimental methods, hair thickness, hair moisturizing power, tensile strength, hair epidermis observation using SEM, and hair constituent element analysis using EDS were performed. As a result of the experiment, it was confirmed that the experimental group treated with Houttuynia cordate active ingredient on the end paper had a hair protection effect as a result of hair thickness, tensile strength, hair epidermis observation, and hair component analysis. In addition, it was confirmed that the experimental group treated with green tangerine active ingredient on the end paper contained a relatively large amount of moisture in the hair moisturizing power test result. It is hoped that the development and research of various materials and tools will proceed so that basic cosmetic products containing active ingredients can be developed and used as hair cosmetics, and applied during chemical treatment in the industrial field.

• Journal of Convergence for Information Technology
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• v.11 no.9
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• pp.208-213
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• 2021

This study is a proposal for art mask design through the use of Art Nouveau. Based on precedent studies, its characteristics have been divided into a curvy expression, feminine expression, naturalism expression, and a repetitive expression. The four pieces by Gustav Klimt, a signature artist of Art Nouveau, have been selected. With the motif from them, the art masks were redesigned and the following results have been obtained. First, the study sought out a possibility and the methodologies to apply Art Nouveau to the art mask design. Second, the study has improved the accessibility to materials by increasing the scopes and methods of the art masks. Third, an integration of the art masks with the art history has provided a suitable condition for them. Based on such study results, it is expected that art mask materials could be developed and their status, as a field of makeup, could be raised.

• 전기의세계
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• v.29 no.10
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• pp.678-688
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• 1980

This paper is concerned with the computer design of the multiple-output switching functions by using the improved MASK method in order to obtain the paramount prime implicants (prime implicants of the multiple-output switching function) and new algorithm to design the optimal logic network. All the given minterms for each function are considered as minterms of one switching function to simplify the desigh procedures. And then the improved MASK method whose memory requirement and time consuming are much less than any existing known method is applied to identify the paramount prime implicants. In selecting the irredundant paramount prime implicants, new cost criteria are generated. This design technuque is suitable both for solving a problem by hand or programming it on a digital computer.

• Proceedings of the IEEK Conference
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• 2000.11a
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• pp.325-328
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• 2000

This paper has been studied a rower amplifier for IMT-2000 handset. Circuit design is performed and optimized by using HP ADS RF software. Designed amplifier consist of 2 stage, has 25㏈ gain, over 27㏈m output power and about 40% power efficiency. Power amplifier operation frequency range is 1955${\pm}$70MHz. Mask layout of the designed Amplifier consisting of 4 mask. The measured results of these values are satisfying the specification of IMT-2000 handset.

• Proceedings of the KAIS Fall Conference
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• 2002.11a
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• pp.201-204
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• 2002

Overlay margin 확보를 위한 oversizing과, design rule checking, jog filtering를 통하여 side-lobe를 추출하였다. 이렇게 추출한 side-lobe를 extent하고, Cr pattern을 정의하여 side-lobe 현상을 해결할 수 있었다. 하지만 이 방법은 mask제조 공정이 복잡하므로 Cr shield방식의 단점인 복잡한 mask제작공정과 구조를 단순화하기 위하여 scattering bar를 이용하였다. 따라서, scattering bar를 삽입하기 위한 rule을 생성하여 metal layer에 적용하고 aerial image simulation을 통해 side-lobe 현상이 억제되었음을 확인하였다. 그리고 앞에서와는 반대로 background clear의 경우에 발생하는 side-lobe에 scattering bar를 적용하여 억제됨을 확인하였다.

• Proceedings of the Korean Institute of Intelligent Systems Conference
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• 2006.11a
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• pp.272-274
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• 2006

In this paper, we concentrate on the mask design problem for optical micro-lithography. The pre-distorted mask is obtained by minimizing the error between the designed output image and the projected output image. We use the particle swarm optimization(PSO) and fuzzy system to insure that the resulting images are identical to the desired image. Our method has good performance for the iteration number by an experiment.

• Journal of Information Display
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• v.6 no.3
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• pp.18-21
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• 2005

A new technology for reducing photolithography process from a four step to a three step process in the fabrication of TFT LCD is introduced. The core technology for 3-mask-TFT processes is the lift-off process [1], by which the PAS and PXL layers can be formed simultaneously. A different method of the lift-off process was developed in order to enhance the performance of efficiency with conventional positive and not negative PR which is the generally used in other lift-off process. In addition, the removal capacity of the ITO/PR in lift-off process was evaluated. The evaluation results showed that the new process can be run in conventional TFT production condition. In order to apply this new process in existing TFT process, several tests were conducted to ensure stability of the TFT process. It was found that the outgases from PR on the substrate in ITO sputtering chamber do not raise any problem, and the deposited ITO film beside the PR has conventional ITO qualities. Furthemore, the particles that were produced due to the ITO chips in PR strip bath could be reduced by the existing filtering system of stripper. With the development of total process and design of the structure for TFT using this technology, 3-mask-panels were achieved in TN and IPS modes, which showed the same display performances as those with the conventional 4mask process. The applicability and usefulness of the 3-mask process has already verified in the mass production line and in fact it currently being used for the production of some products.

• Journal of IKEEE
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• v.17 no.3
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• pp.221-228
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• 2013

About functional parameters of a LED/UVLED (Light Emitting Diode/Ultra Violet LED), one of the most important parameters is the I-V characteristic. By researching factors affect to the I-V characteristic of uvled, we found that beside of the structure of the device itself, there is the influence of the electrode materials, electrode shapes, the process of wiring and packaging. In this work, we want to improve the performance of UVLED to find out the optimal mask design principles. The study is based on theoretical mathematical models, as well as the use of simulation software tool Comsol. From all results obtained, the team has improved mask design to manufacture electrodes for GaN-based UVLED. Electrode masks are designed by three softwares, which are Intellisuite, Klayout and AutoCad. Intellisuite masks would be used in fabrication simulation while Klayout and AutoCad are used to fabricate electrodes in experiments. As well as, we silmulated the structure of an uvled 355nm emission wavelength by TCAD software, in order to compare with uvled sample that has the same emission wavelength.

• Journal of Communications and Networks
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• v.5 no.4
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• pp.344-353
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• 2003

Ultra-wideband (UWB) technology is gaining increasing interest for its potential application to short-range indoor wireless communications. Utilizing ultra-short pulses, UWB baseband transmissions enable rich multipath diversity, and can be demodulated with low complexity receivers. Compliance with the FCC spectral mask, and interference avoidance to, and from, co-existing narrow-band services, calls for judicious design of UWB pulse shapers. This paper introduces pulse shaper designs for UWB radios, which optimally utilize the bandwidth and power allowed by the FCC spectral mask. The resulting baseband UWB systems can be either single-band, or, multi-band. More important, the novel pulse shapers can support dynamic avoidance of narrow-band interference, as well as efficient implementation of fast frequency hopping, without invoking analog carriers.