• Fashion & Textile Research Journal
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• v.19 no.1
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• pp.1-10
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• 2017

The purpose of this research is to industrialize and to localize traditional culture resources of Andong by developing festival costumes related to 'Andong Mask Dance Festival'. We tried several methods to deliver meanings and images of festival costumes, as followings. Frist, from April, 2009 to October, 2012, we created the new design of the festival costumes after consulting with 7 festival experts about the conditions and characteristics of 'Andong Mask Dance Festival'. The festival costume design is characterized by the detachable parts of clothing based on Han-bok style, the front and back of bodice, right and left side of both sleeves, and pockets, which can be tied up with strings. Therefore the consumers can choose and attach the part they want. Secondly, the newly created festival costumes were evaluated appropriately to the consumer's satisfaction, implementation, practicality, and long-term development possibility according to the survey of 85 participants who were, in fact, wearing the festival costumes in the festival. The results are as follows: Frist, festival costumes are based on Korean traditional costumes, and it appears wearing object as festival costumes. Secondly, traditional beauty and modern beauty are well matched up, so men and women of all ages are possible to wear. Thirdly, size of costume can be controlled, so it's easy to wear. Finally, construction method is very simple. The possibility of long-term development by various material development is needed.

• The Research Journal of the Costume Culture
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• v.30 no.4
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• pp.495-512
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• 2022

This study aims to design a new sizing system for hygienic masks to protect against COVID-19-related respiratory disorders. The product sizes were collected from 70 commercially available hygienic masks, and 18 head measurements were obtained from the three-dimensional (3D) scan data of 2,048 men and women aged 20 to 69 years from the 6th Size Korea Survey. The statistical analysis was performed using the IBM Statistical Package for the Social Sciences (SPSS) 28.0 program. The "bitragion-subnasale arc" and "menton-sellion length" were chosen as the key body dimensions for the hygienic mask sizing system. The linear regressions with 18 3D head measurements were analyzed, and it was determined that the key body dimensions were useful for statistically predicting other 3D head measurements related to hygienic masks. A new sizing system was proposed for two types of masks, "masks with a tight fit" and "masks with a loose fit," taking into account the existing Korean Industrial Standards (KS) and the shortcomings of the sizes of hygienic masks on the market. The sizing system for tight-fitting masks consisted of the key body dimensions, with their sizes indicated by a pair of numbers. The sizing system for loose-fitting masks consisted solely of the bitragion-subnasale arc, with their sizes denoted by letters such as S, M, and L (denoting small, medium, and large, respectively). Future studies should consider this mask sizing system for different age groups, such as children and adolescents.

• Proceedings of the Korean Information Science Society Conference
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• 2010.06a
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• pp.252-253
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• 2010

• Proceedings of the IEEK Conference
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• 2005.11a
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• pp.1253-1256
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• 2005

We have developed an electron lithography method, Electron Emission Lithography (EEL), which is capable of printing integrated circuits with an exposure time of only a few seconds. The basic design of the mask, manufactured by standard MIM technology, will be discussed. Patterns printed into e-beam resist by a 1:1 projection system show the applicability of the mask for lithography purposes. The minimum feature size projected so far is 10 um in a system capable of 100 m resolution. Further improvements in resolution to 50 nm are possible.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.14 no.1
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• pp.6-11
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• 2001

We studied the feasibility of optical lithography for the critical layers of 0.12${\mu}{\textrm}{m}$ DRAM assuming ArF excimer laser as a light source. To enhance the fidelity of aerial image and process margin, Phase shift mask (PSM) patterns as well as binary mask patterns are corrected with in-house developed Optical Proximity Correction (OPC) software. As the result, w found that the aerial image of critical layers of DRAM cell with 0.12${\mu}{\textrm}{m}$ design rule could not be reproduced with binary masks. But if we use PSM or optical proximity corrected PSM, the fidelity of aerial image ,resolution and process margin are so much enhanced that they could be processed with optical lithography.

• Journal of the Korean Institute of Telematics and Electronics
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• v.26 no.5
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• pp.99-107
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• 1989

This paper describes the KUI-LED (Kyungpook national University Intelligent CAD-Layout EDitor) which is a 2-dimensional graphics editor for IC mask layout. This system runs of IBM PC/AT with the ${\Omega}$/PC graphics board. It offers a sufficient set of facilities to do most kinds of layout. KUIC-LED is written in 'C' and 'Assembly' language.

• Journal of the Korean Institute of Telematics and Electronics
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• v.26 no.6
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• pp.115-123
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• 1989

This paper describes a new method of mask compaction to formulate a mixed integer linear programming problem from a user defined stick diagram. By solving this mixed integer program, a compacted and design rule violation free layout is obtained. Also, a new efficient algorithm is given which solves the longest problem in the constraint graph.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2002.10a
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• pp.141-144
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• 2002

Computer code was developed to design waveguide gratings based on coupled-mode equations and the transfer matrix formalism. The experimental set-up has been constructed for inscribing Bragg gratings in planar waveguides with a phase mask and uv laser beam, which enables alignment and packaging of grating devices as well as in-situ performance measurements. Bragg grating has been fabricated on silica planar waveguides with 0.75% Germanium concentration and its transmittance spectrum was measured to have 95% reflectance at the peak wavelength. Optical losses as the function of the misalignment were measured and their usage is described.

• Proceedings of the Korean Information Science Society Conference
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• 2007.10c
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• pp.367-370
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• 2007

In this paper, we concentrate on the mask design problem for optical micro-lithography. The pre-distorted mask is obtained by minimizing the error between the designed output image and the projected output image. We use the particle swarm optimization(PSO) and fuzzy system to insure that the resulting images are identical to the desired image. Our method has good performance for the iteration number by an experiment.

• Proceedings of the Korea Institute of Applied Superconductivity and Cryogenics Conference
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• 2003.10a
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• pp.146-149
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• 2003

In this Work, we have studied about an RSFQ 2$\times$2 crossbar switch. The circuit was designed, simulated, and laid out for mask fabrication The switch cell was composed of a splitter a confluence buffer, and a switch core. An RSFQ 2$\times$2 crossbar switch was composed of 4 switch cells, a switch control input to select the cross and bar, data input, and data outputs. When a pulse was input to the switch control input to select the cross or bar the route of the input data was determined, and the data was output at the proper output port. We simulated and optimized the switch-element circuit and 2$\times$2 crossbar switch, by using Xic and Julia. We also performed the mask layout of the circuit by using Xic and Lmeter.