• Journal of Magnetics
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• v.4 no.4
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• pp.119-122
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• 1999

Magnetic properties and crystal structures of (Fe1-XCoX) Pt (X = 0, 0.2, 0.4, 0.5, 0.6, 0.8 and 1.0) ternary thin films were investigated. The order-disorder phase transformation of FePt thin films during annealing was also studied by x-ray diffraction and M ssbauer spectroscopy. The magnetic thin films were deposited on glass substrates using a dc sputtering method and were subsequently annealed at 400~$700^{\circ}C$ in a high vacuum. The as-deposited films exhibited a high degree of the <111> preferred orientation and the preferred orientation was not destroyed even after the subsequent post annealing. The coercivity of the ($Fe_xCo_{1-x}$) Pt thin films annealed at $700^{\circ}C$ showed a minimum value at the equiatomic composition of the Fe and Co atoms. The ordered structure of the FePt alloy was thought to have formed from the disordered structure by an inhomogeneous process, which was confirmed by the asymmetric peak shapes and M ssbauer spectra.

• Journal of the Korean Magnetics Society
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• v.5 no.5
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• pp.528-532
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• 1995

Ferromagnetic resonance experiments have been used to investigate the magnetic properties of amorphous $Co_{89.5}Zr_{10.5}$ thin films deposited by DC magnetron sputtering method. In the thickness range from $350\;{\AA}$ to $3,200\;{\AA}$, measurements were carried out in a static magnetic field perpendicular and parallel to the film plane and in a conventional 9.44 GHz spectrometer at room temperature. The ferromagnetic resonance spectra by the field perpendicular to the film plane showed standing spin wave. The spacing and the relative intensities between the various spin wave resonance peaks are analysed considering surface magnetic anisotropy. The surface magnetic anisotropy constant ($K_{so},\;K_{sd}$) of amorphous $Co_{89.5}Zr_{10.5}$ thin films are $0.02\;erg/\textrm{cm}^2$ and $0.55\;erg/\textrm{cm}^2$ respectively regardless of the film thickness except for $3,200\;{\AA}$ film. In case of $3,200\;{\AA}$ these values are $0.46\;erg/\textrm{cm}^2$ and $0.55\;erg/\textrm{cm}^2$ respectively.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2001.07a
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• pp.478-480
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• 2001

Fe-base amorphous films exhibit large saturation magnetostriction and soft magnetic Properties, which make them suitable for strain sensor applications. Most important material properties for the performance of these elements are the superior soft magnetic properties, such as high permeability and small coercive force, as well as magnetoelastic properties. It is well known that the strain generated in film deposition and/or post-heat treatment processes is one of important material properties, which effects on the soft magnetic properties of the film via magnetoelastic coupling. In this study, the effect of an isotropic strain in plane of magnetic films have been performed experimently. Amorphous films with the composition of (F $e_{90}$ $Co_{10}$)$_{78}$S $i_{l2}$ $B_{10}$ were employed in this study. The film with 5${\mu}{\textrm}{m}$ thick was deposed onto the polyimide substrate with 50${\mu}{\textrm}{m}$ thick by virtue of RF sputtering. The film was subject to post annealing with a static magnetic field with 500Oe magnetic field intensity at 35$0^{\circ}C$ for 1 hour. The polyimide substrate with the film was bonded with an adhesive on PZT piezoelectric substrate with 600${\mu}{\textrm}{m}$ thick in applying voltage of 500V. The change in MH loops of films due to the isotropic strain was measured by using VSM. The coercive force was evaluated from MH loops. It has shown in the results that M-H loops of films are subject to change considerably with a dc voltage, resulting of the magnetization rotation from normal to plane direction as the applied voltage is changed from 500V to 250V.50V.V.

• Journal of Magnetics
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• v.9 no.4
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• pp.116-120
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• 2004

Hexagonal barium-ferrite ($BaFe_{12}O_{19}$, magnetoplumbite structure; BaM) film with perpendicularly c-axis orientation was successfully deposited on (100) silicon substrates with an MgO (111) underlayer by rf diode sputtering and in-situ heating at $920^{\circ}C$. The magnetic and structural properties of 0.27 ${\mu}m$ thick BaM films on MgO (111) underlayers were compared to films of the same thickness deposited onto single-crystal MgO (111) and c-plane ($000{\ell}$) sapphire ($Al_2O_3$) substrates by vibrating sample magnetometry (VSM), x-ray diffractometer (XRD), and atomic force microscopy (AFM). The thickness dependence of MgO (111) underlayers on silicon wafer was found to have a large effect on both magnetic and structural properties of the BaM film. The thickness of 15 nm MgO (111) underlayers produced BaM films with almost identical magnetic and structural properties as the single-crystal substrates; this can be explained by the lower surface roughness for thinner underlayer thicknesses. The magnetization saturation ($M_s$) and the ratio $H_{cII}/H_{c{\bot}}$ for the BaM film with a 15 nm MgO (111) underlayer is 217 emu/cc and 0.24, respectively. This is similar to the results for the BaM films deposited on the single-crystal MgO (111) and sapphire substrates of 197 emu/cc and 0.10, 200 emu/cc and 0.12, respectively. Therefore, the proposed MgO (111) underlayer can be used in many applications to promote c-axis orientation without the cost of expensive substrates.

• Journal of the Korean Magnetics Society
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• v.5 no.1
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• pp.42-47
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• 1995

FeN thin films for inductive recording heads were sputter deposited using RF diode sputtering mehtod from a pure iron target onto 7059 glass substrates, and their magnetic properties were measured. The magnetic properties were greatly affected by film thickness, gas pressure, sputter power and flow ratio of $N_{2}$ to Ar. Single layer FeN films with their thickness varied from $1,000\;{\AA}$ to $6,000\;{\AA}$ were doposited. 800 W sputter power, 3 mT gas pressure, $N_{2}$ to Ar flow ratio of 6.6 : 100 were the sputtering conditions. Up to 7 layers of FeN films having total thickness of $6,000\;{\AA}$ were deposited using $SiO_{2}$ of $30\;{\AA}$ thickness as intermediate layers and their coercivity and saturation magnetization were measured. The sputtering conditions were the same as those in the single layer films. Easy axis coercivity of the single layer FeN films gradually decreased as their thickness was increased, but for the films with their thicknesses above $3,000\;{\AA}$, the coercivity changed very little. As the number of the FeN layers were increased, the coercivity decreased We estimated the grain size of FeN films from the FWHM (Full Width at Half Maximum) of X-ray diffraction peaks. The grain size steadily decreased from about $200\;{\AA}$ to $120\;{\AA}$ as the number of layers were increased. Minimum hard axis coercivity of 0.4 Oe was obtained when the number of layers was four. Maximum relative permeability was 2,900 when the number of layers was three. The cut off frequeocy of the multilayer films were above 100 MHz.

• Proceedings of the Korean Vacuum Society Conference
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• 1999.07a
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• pp.216-216
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• 1999

The usage of a stationary plasma thruster (SPT) ion source, invented previously for space application in Russia, in experiments with surface modifications and film deposition systems is reported here. Plasma in the SPT is formed and accelerated in electric discharge taking place in the crossed axial electric and radial magnetic fields. Brief description of the construction of specific model of SPT used in the experiments is presented. With gas flow rate 39ml/min, ion current distributions at several distances from the source are obtained. These was equal to 1~3 mA/$\textrm{cm}^2$ within an ion beam ejection angle of $\pm$20$^{\circ}$with discharge voltage 160V for Ar as a working gas. Such an extremely high ion current density allows us to obtain the Ti metal films with deposition rate of $\AA$/sec by sputtering of Ti target. It is shown a possibility of using of reactive gases in SPT (O2 and N2) along with high purity inert gases used for cathode to prevent the latter contamination. It is shown the SPT can be operated at the discharge and accelerating boltages up to 600V. The results of presented experiments show high promises of the SPT in sputtering and surface modification systems for deposition of oxide thin films on Si or polymer substrates for semiconductor devices, optical coatings and metal corrosion barrier layers. Also, we have been tried to establish in application of the modeling expertise gained in electric and ionic propulsion to permit numerical simulation of additional processing systems. In this mechanism, it will be compared with conventional DC sputtering for film microstructure, chemical composition and crystallographic considerations.

• Korean Journal of Materials Research
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• v.8 no.3
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• pp.195-199
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• 1998

Magnetic and Magneto-Optical properties of Co-based MnSbPt thin films prepared by R.F Sputtering were investigated. In this study, the optimum heat treatment condition was found to be $300^{\circ}C$-4hours under a $5\times10^{-6}$ Torr, but perpendicularly magnetized thin films could not be obtained. Coercive force showed maximum value of about 5000e at $250\AA$ Co thickness but the value is not enough for practical use of the thin film. Heat treated Co-based MnSbPt thin film shows 0.78 degree of Kerr rotation angle for 700nm of incident wavelength.

• Journal of the Korean Magnetics Society
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• v.6 no.2
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• pp.93-97
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• 1996

The effects of annealing after deposition on the magnetic and magneto-optical properties of MnSbPt thin films prepared by rf sputtering were investigated. The MnSbPt alloy thin films were annealed in a vacuum with $10^{-5}$ Torr and the air, respectively, as a function of temperature and time. The films annealed at $300^{\circ}C$ for 4 hours was found to have the highest value of the saturation magnetization. The films annealed in the air did not show any thermal degradations, which indicates their chemical stability for the magneto-optical recording process. It was revealed that the $Mn_{43}Sb_{46}Pt_{11}$ films annealed at $300^{\circ}C$ for 4hours in a vacuum with $10^{-5}$ Torr exhibit high Kerr rotation angle of $0.8^{\circ}$ for the incident wavelength of 550nm, which is ascribed to the increase of the volume ratio of Clb phase. However, similar to the PtMnSb alloy thin films, these films are still horizontally magnetized and have the coercive field less than 400 Oe.

• Korean Journal of Materials Research
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• v.11 no.8
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• pp.713-717
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• 2001

The magnetic and magnetostrictive properties of amorphous Tb/sub 45.7/Fe/sub 54.3-x/Co/sub x/ and Tb/sub 50.2/Fe/sub 49.8-x/Co/sub x/ (0≤x≤9.6) thin films have systematically been investigated. The films were fabricated by rf magnetron sputtering using a composite target which consists of a Fe plate and Tb, Co chips. The microstructure mainly consists of an amorphous phase. Excellent intrinsic and low magnetic-field-magnetostrictive properties were achieved in Tb/sub 45.7/Fe/sub 54.3-x/Co/sub x/ and Tb/sub 50.2/Fe/sub 49.8-x/Co/sub x/ (0≤x≤9.6). The magnetostriction of 130 ppm was obtained with low field of 100 Oe. The intrinsic magnetostriction(applied field, 5 kOe) were increased from 330ppm to 400ppm.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.20 no.5
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• pp.216-220
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• 2010

Ni-Fe alloys have various applications such as thin film inductor, thin film transformer, magnetic head's shield case, etc. Magnetic properties of Ni-Fe thin films depend on the process parameters such as thickness, contents, deposition rate, substrates, etc. In this study, NiFe films with a thickness of about 150nm were deposited on Si(100) wafer and $SiO_2$/Si(100) substrate at room temperature by a DC magnetron co-sputtering using Fe and Ni targets. Their phase formation and magnetic properties as a function of annealing temperature were investigated with XRD, FE-SEM and VSM. The assputtered films have BCC structure. With increasing annealing temperature, NiFe thin film for $SiO_2$/Si(100) substrate transformed completely from BCC to FCC phase above $500^{\circ}C$, but some BCC phase remained above $500^{\circ}C$ on Si(100) wafer. For samples annealed at $450^{\circ}C$, squareness ratio of NiFe thin film shows peak value and its saturation magnetization is around 0.0118 emu, which means that the optimum annealing temperature of NiFe thin film seems to be $450^{\circ}C$. The saturation magnetization of films decreased rapidly above the annealing temperature of $500^{\circ}C$ due to phase transformation from BCC to FCC phase.