• Title/Summary/Keyword: Magnetic sputtering

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Formation of $Al_O_3$Barrier in Magnetic Junctions on Different Substrates by $O_2$Plasma Etching

  • Wang, Zhen-Jun;Jeong, Won-Cheol;Yoon, Yeo-Geon;Jeong66, Chang-Wook;Joo, Seung-Ki
    • Journal of Magnetics
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    • v.6 no.3
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    • pp.90-93
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    • 2001
  • Co/$Al_O_3$/NiFe and CO/$Al_O_3$/Co tunnel junctions were fabricated by a radio frequency magnetron sputtering at room temperature with hard mask on glass and $4^{\circ}$ tilt cut Si (111) substrates. The barrier layer was formed through two steps. After the Al layer was deposited, it was oxidized in the chamber of a reactive ion etching system (RIE) with $O_2$plasma at various conditions. The dependence of the TMR value and junction resistance on the thickness of Al layer (before oxidation) and oxidation parameters were investigated. Magnetoresistance value of 7% at room temperature was obtained by optimizing the Al layer thickness and oxidation conditions. Circular shape junctions on $4^{\circ}$tilt cut Si (111) substrate showed 4% magnetoresistance. Photovoltaic energy conversion effect was observed with the cross-strip geometry junctions on Si substrate.

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Microstructures and Magnetic Properties of the Annealed FeSiB Thin Films Prepared by DC Magnetron Sputtering

  • Jang, T.S.;Lee, D.H.;Hong, J.W.;Park, J.W.
    • Journal of Magnetics
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    • v.10 no.4
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    • pp.145-148
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    • 2005
  • Effect of vacuum annealing on the microstructures and magnetic properties of $Fe_{84}Si_6B_{10}$ films has been investigated as a function of annealing temperature. X-ray diffraction and transmission electron microscopy were employed to analyze crystallization behavior of the films. Permeability of the films was measured at various frequencies by one-turn coil method. When the films were annealed below 673 K, the coercivity of the films did not change a lot (${\~}$1500 A/m) although the grain size of a crystalline phase in the partially crystallized films increased gradually up to about 16 nm. It then increased rapidly as the films became almost fully crystalline mostly with $\alpha$-(Fe,Si) phase at and above 723 K. On the other hand, the electrical resistivity of the films decreased monotonically with the increase of annealing temperature. The permeabilities of the films annealed at 473${\~}$673 K were all over 1000, showing the optimum value of 3500 at 523 K, and almost constant up to 300 MHz. However, those of the as-deposited and fully crystallized films were lower than 1000 and unstable at the same frequency range.

A Study on the widthwise thickness uniformity of HTS wire using thickness gradient deposition technology

  • Gwantae Kim;Insung Park;Jeongtae Kim;Hosup Kim;Jaehun Lee;Hongsoo Ha
    • Progress in Superconductivity and Cryogenics
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    • v.25 no.4
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    • pp.24-27
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    • 2023
  • Until now, many research activities have been conducted to commercialize high-temperature superconducting (HTS) wires for electric applications. Most of all researchers have focused on enhancing the piece length, critical current density, mechanical strength, and throughput of HTS wires. Recently, HTS magnet for generating high magnetic field shows degraded performance due to the deformation of HTS wire by high electro-magnetic force. The deformation can be derived from widthwise thickness non-uniformity of HTS wire mainly caused by wet processes such as electro-polishing of metal substrate and electro-plating of copper. Gradient sputtering process is designed to improve the thickness uniformity of HTS wire along the width direction. Copper stabilizing layer is deposited on HTS wire covered with specially designed mask. In order to evaluate the thickness uniformity of HTS wire after gradient sputtering process, the thickness distribution across the width is measured by using the optical microscope. The results show that the gradient deposition process is an effective method for improving the thickness uniformity of HTS wire.

Soft Magnetic Properties of CoFeHfO Thin Films (CoFeHfO 박막의 자기적 특성)

  • Lee, K.E.;Tho, L.V.;Kim, S.H.;Kim, C.G.;Kim, C.O.
    • Journal of the Korean Magnetics Society
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    • v.16 no.4
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    • pp.197-200
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    • 2006
  • Amorphous alloys of Co-rich magnetic amorphous films are well known as thpical soft magnetic alloys. They are used for many kinds of electric and electronic parts such as magnetic recording heads, transformers and inductors. CoFeHfO thin films were prepared by RF magnetron reactive sputtering. The films were deposited onto Si(100) substrates with a power of 300 W at room temperature. The reactive gas was introduced up to 10% ($O_2$/(Ar + $O_2$)) during deposition, and the $Co_{39}Fe_{34}Hf_{9.5}O_{17.5}$ thin film exhibit excellent soft magnetic properties : saturation magnetization ($4{\pi}M_s$) of 19kG, magnetic coercivity ($H_c$) of 0.37 Oe, anisotropy field ($H_k$) of 48.62 Oe, and an electrical property is also shown to be as high as 300 ${\mu}{\Omega}cm$. It is assumed that the good soft magnetic properties of $Co_{39}Fe_{34}Hf_{9.5}O_{17.5}$ thin film results from high electrical resistivity and large anisotropy field.

Magneto-Impedance Effect of FeCoSiB Amorphous Magnetic Films (FeCoSiB계 아몰퍼스 자성박막의 자기-임피 던스 효과)

  • Shin, Yong-Jin;Soh, Dae-Hwa;Kim, Hyen-Wook;Kim, Dae-Ju;Seo, Kang-Soo
    • Korean Journal of Materials Research
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    • v.8 no.3
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    • pp.252-255
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    • 1998
  • In this paper, we investigate the magneto-impedance(M1) effect of the FeCoSiB amorphous magnktic films. The amorphous magnetic film having near zero magnetostriction is fabricated by using the sputtering method, and then annealed in magnetic field. When the external magnetic field is directly applied to the fabricated film, the voltage amplitude between both side of the magnetic film varies about 76.2% at 120[MHzl and the impedance varies about 2.1%/0e. Thus, we find that the fabricated magnetic film has the characteristics of good sensor element.

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Fabrication and statistical characterization of Nb SQUID sensors for multichannel SQUID system

  • Kim, B.K.;Yu, K.K.;Kim, J.M.;Kwon, H.;Lee, S.K.;Lee, Y.H.
    • Progress in Superconductivity and Cryogenics
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    • v.22 no.4
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    • pp.62-66
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    • 2020
  • We fabricated superconducting quantum interference devices (SQUIDs) based on Nb Josephson junctions, and characterized the key parameters of the SQUIDs. The SQUIDs are double relaxation oscillation SQUIDs (DROSs) having larger flux-to-voltage transfer coefficient than the standard DC-SQUIDs. SQUID sensors were fabricated by using Nb junction technology consisted of a DC magnetron sputtering and a conventional photolithography process. In multichannel SQUID systems for whole-head magnetoencephalography measurement with a helmet-type SQUID array, we need about 336 SQUID sensors for each system. In this paper, we fabricated a few hundred SQUID sensors, measured the critical current, flux modulation voltage and decided if each tested SQUID can be used for the multichannel systems. As the criterion for the acceptance of the sensors, we chose the critical current and amplitude of the modulation voltage to be 8 ㎂ and 80 ㎶, respectively. The average critical current of the SQUIDs was 10.58 ㎂. The typical flux noise of the SQUIDs with input coil shorted was 2 μΦ0/√Hz at white region.

Variations of Magnetic Properties and Composition with Deposition Ratio in GdFe Thin film (GdFe 박막의 증착속도에 따른 조성 및 자기특성의 변화)

  • Choe, Yeong-Geun;Park, Chang-Man;Baek, Ju-Yeol;Lee, Gi-Am;Hwang, Do-Geun
    • Journal of the Korean Magnetics Society
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    • v.2 no.3
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    • pp.257-262
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    • 1992
  • We have studied the variations of composition and magnetic properties with deposition rate in GdFe thin films by means of DC magnetron sputtering with the enhanced complex target method. Gd atomic percent was decreased with the increase of deposite rate. It appeared the transition phenomena at 1.0 ${\AA}/s the deposition rate. Also, the deposition rate increased with input power and the sputtering efficience was proportional to the number of Gd chip. An increase of the coercivity with input power can be interpreted by the large size of Fe crystal grains. We have introduced by the diffusion guard sputtering and it was effective for reproducibility of the sample. We have measured ${\theta}_k$ with Kerr angle gauge, and could observe that the ${\theta}_k$ was little varied with input power.

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Properties of Green-Emitting CaNb2O6:Tb3+ Thin Films Grown by Radio-Frequency Magnetron Sputtering (라디오파 마그네트론 스퍼터링으로 성장한 녹색 발광 CaNb2O6:Tb3+ 박막의 특성)

  • Seonkyeong Kim;Shinho Cho
    • Korean Journal of Materials Research
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    • v.33 no.10
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    • pp.400-405
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    • 2023
  • Tb3+-doped CaNb2O6 (CaNb2O6:Tb3+) thin films were deposited on quartz substrates at a growth temperature of 300 ℃ using radio-frequency magnetron sputtering. The deposited thin films were annealed at several annealing temperatures for 20 min and characterized for their structural, morphological, and luminescent properties. The experimental results showed that the annealing temperature had a significant effect on the properties of the CaNb2O6:Tb3+ thin films. The crystalline structure of the as-grown CaNb2O6:Tb3+ thin films transformed from amorphous to crystalline after annealing at temperatures greater than or equal to 700 ℃. The emission spectra of the thin films under excitation at 251 nm exhibited a dominant emission band at 546 nm arising from the 5D47F5 magnetic dipole transition of Tb3+ and three weak emission bands at 489, 586, and 620 nm, respectively. The intensity of the 5D47F5 (546 nm) magnetic dipole transition was greater than that of the 5D47F6 (489 nm) electrical dipole transition, indicating that the Tb3+ ions in the host crystal were located at sites with inversion symmetry. The average transmittance at wavelengths of 370~1,100 nm decreased from 86.8 % at 700 ℃ to 80.5 % at an annealing temperature of 1,000 ℃, and a red shift was observed in the bandgap energy with increasing annealing temperature. These results suggest that the annealing temperature plays a crucial role in developing green light-emitting CaNb2O6:Tb3+ thin films for application in electroluminescent displays.

Magnetron Sputter Coating of Inner Surface of 1-inch Diameter Tube

  • Han, Seung-Hee;An, Se-Hoon;Song, In-Seol;Lee, Keun-Hyuk;Jang, Seong-Woo
    • Proceedings of the Korean Vacuum Society Conference
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    • 2015.08a
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    • pp.135-135
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    • 2015
  • Tubes are of extreme importance in industries as for fluid channels or wave guides. Furthermore, some weapon systems such as cannons use the tubes as gun barrels. To increase the service life of such tubes, a protective coating must be applied to the tubes' inner surface. However, the coating methods applicable to the inner surface of the tubes are very limited due to the geometrical restriction. A small-diameter cylindrical magnetron sputtering gun can be used to deposit coating layers on the inner surface of the large-bore tubes. However, for small-bore tubes with the inner diameter of one inch (~25 mm), the magnetron sputtering method can hardly be accommodated due to the space limitation for permanent magnet assembly. In this study, a new approach to coat the inner surface of small-bore tubes with the inside diameter of one inch was developed. Instead of using permanent magnets for magnetron operation, an external electro-magnet assembly was adopted around the tube to confine the plasma and to sustain the discharge. The electro-magnet was operated in pulse mode to provide the strong axial magnetic field for the magnetron operation, which was synchronized with the negative high-voltage pulse applied to the water-cooled coaxial sputtering target installed inside the tube. By moving the electro-magnet assembly along the tube's axial direction, the inner surface of the tube could be uniformly coated. The inner-surface coating system in this study used the tube itself as the vacuum chamber. The SS-304 tube's inner diameter was 22 mm and the length was ~1 m. A water-cooled Cu tube (sputtering target) of the outer diameter of 12 mm was installed inside of the SS tube (substrate) at the axial position. The 50 mm-long electro-magnet assembly was fed by a current pulse of 250 A at the frequency and pulse width of 100 Hz and 100 usec, respectively. The calculated axial magnetic field strength at the center was ~0.6 Tesla. The central Cu tube was synchronously driven by a HiPIMS power supply at the same frequency of 100 Hz as the electro-magnet and the applied pulse voltage was -1200 V with a pulse width of 500 usec. At 150 mTorr of Ar pressure, the Cu deposition rate of ~10 nm/min could be obtained. In this talk, a new method to sputter coat the inner surface of small-bore tubes would be presented and discussed, which might have broad industrial and military application areas.

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Ferromagnetism of thin films deposited from paramagnetic stainless steel targets by Facing Targets Sputtering

  • Matsushita, N.;Ono, N.;Naoe, M.
    • Proceedings of the Korean Magnestics Society Conference
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    • 1991.05a
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    • pp.73-74
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    • 1991
  • The films with ferromagnetic fine particles dispersed in nonmagnetic matrix, such as $Fe-Al_2O_3$ and Fe-Cu have been studied for use of magnetic recording medium, optically device and sensor. Their magnetic properties depend strongly on structural parameter such as size and volume fraction of ferromagnetic particles. Fe-Cr-Ni alloy sputtered films also have microstructure with ferromagnetic -- b.c.c phase and nonmagnetic f.c.c phase grains. Magnetic properties of these films depend strongly on such a unique structure. These are depend on the ratio in volume of ferromagnetic particles to nonmagnetic ones $V_F/V_N$, the saturation magnetization Ms increased with increase of $V_F/V_N$. The coercivity Hc of the as-deposited films took maximum value of about 200 Oe at adequate $V_F/V_N$ and then Ms and Squareness S were 500 emu/cc and 0.5, respectively.(omitted)

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