• 제목/요약/키워드: Magnesium thin films

검색결과 45건 처리시간 0.031초

Magnesium Thin Films Possessing New Corrosion Resistance by RF Magnetron Sputtering Method

  • Lee, M.H.;Yun, Y.S.;Kim, K.J.;Moon, K.M.;Bae, I.Y.
    • Corrosion Science and Technology
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    • 제3권4호
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    • pp.148-153
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    • 2004
  • Magnesium thin flims were prepared on cold-rolled steel substrates by RF magnetron sputtering technique. The influence of argon gas pressure and substrate bias voltage on their crystal orientation and morphology of the coated films were investigated by scanning electron microscopy (SEM) and X-ray diffraction, respectively. And the effect of crystal orientation and morphology of magnesium films on corrosion behaviors was estimated by measuring anodic polarization curves in deaerated 3%NaCl solution. From the experimental results, all the sputtered magnesium films showed obviously good corrosion resistance to compare with 99.99% magnesium target of the sputter-evaporation metal. Finally it was shown that the Corrosion-resistance of magnesium films can be improved greatly by controlling the crystal orientation and morphology with effective use of the plasma sputtering technique.

건식플라즈마 표면처리법에 의한 마그네슘 합금의 내식특성 향상 (A Study on the Enhancement of Corrosion Resistance of Magnesium Alloy by Dry Plasma Process)

  • 윤용섭
    • 해양환경안전학회지
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    • 제17권2호
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    • pp.155-160
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    • 2011
  • 현재 지구온난화 등의 환경문제로 인해 각종 산업분야에서 정량화에 대한 요구가 증대되어 해양산업에도 그 수요가 증가하고 있는 실정이다. 따라서 본 연구에서는 차세대 경량화 재료인 마그네슘이 활용되기 위해서 반드시 극복해야할 가장 중요한 특성인 내식특성에 대하여 고찰하고, 그 내식특성 향상을 위한 마그네슘 박막의 Morphology나 결정배향성의 영향을 해명하고자 하였다. 실험결과로부터 제작한 Mg 박막의 전기화학적 내식특성은 Ar 가스압이 높은 조건에서 제작한 막일수록 내식특성이 우수하였다. 이러한 경향은 표면 및 단면의 Morphology와 결정배향성과의 상관관계를 통하여 설명 가능하였다.

Preparation of Novel Magnesium Precursors and MgO Thin Films Growth by Atomic Layer Deposition (ALD)

  • Kim, Hyo-Suk;park, Bo Keun;Kim, Chang Gyoun;Son, Seung Uk;Chung, Taek-Mo
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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    • pp.364.2-364.2
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    • 2014
  • Magnesium oxide (MgO) thin films have attracted great scientific and technological interest in recent decades. Because of its distinguished properties such as a wide band gap (7.2 eV), a low dielectric constant (9.8), a low refractive index, an excellent chemical, and thermal stability (melting point=$2900^{\circ}C$), it is widely used as inorganic material in diverse areas such as fire resistant construction materials, optical materials, protective layers in plasma display panels, buffer layers of multilayer electronic/photonic devices, and perovskite ferroelectric thin films. Precursor used in the ALD requires volatility, stability, and low deposition temperature. Precursors using a heteroleptic ligands with different reactivity have advantage of selective reaction of the heteroleptic ligands on substrate during ALD process. In this study, we have synethesized new heteroleptic magnesium precursors ${\beta}$-diketonate and aminoalkoxide which have been widely used for the development of precursor because of the excellent volatility, chelating effects by increasing the coordination number of the metal, and advantages to synthesize a single precursor. A newly-synthesized Mg(II) precursor was adopted for growing MgO thin films using ALD.

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이온 플레이팅법에 의한 내식 박막의 제작과 부식방식 메카니즘 (Preparation of corrosion-resistive thin films by ion plating method and their corrosion protection mechanism)

  • 이경희;배일용;김기준;문경만;이명훈
    • 한국마린엔지니어링학회:학술대회논문집
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    • 한국마린엔지니어링학회 2006년도 전기학술대회논문집
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    • pp.285-286
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    • 2006
  • Magnesium is the lightest of all the structural metals having density of 1.74. It is approximately 2/3 lighter than aluminium, l/4 lighter than titanium alloy and 1/5 lighter than iron. Among the light-weight alloys, magnesium and its alloys show a good possibility for high performance aerospace and automotive applications, however the widespread use of magnesium alloys has been limited mainly by its poor oxidation and corrosion resistance. In this work, corrosion-resistive thin films were prepared onto the magnesium alloy substrate(AZ91D) by environmental friendly coating technique, ion plating method. And their corrosion protection mechanism were analyzed.

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마그네슘 존재 하에 형성된 칼슘포스페이트 박막의 물리화학적 특성과 세포증식에 미치는 영향 (Physicochemical Properties of Calcium Phosphate Thin Films Prepared in the Presence of Magnesium and Its Effects on Cellular Proliferation)

  • 신현영;이우걸
    • 공업화학
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    • 제18권3호
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    • pp.262-266
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    • 2007
  • 연구에서는 칼슘포스페이트(CP) 박막형성에 있어서 마그네슘 이온의 존재가 박막의 물리화학적 그리고 생물학적 특성에 미치는 영향에 관한 연구를 수행하였다. 실험에서는 5 종류의 다른 표면을 사용하였으며, 배양접시(CTL)와 마그네슘이 존재하지 않는 상태에서 제조한 CP박막(CaP)을 비교군으로 사용하였다. 나머지 3개 종류의 박막은 마그네슘 농도가 다른 조건에서 형성하여 사용하였다. 마그네슘의 농도 0.1, 1 그리고 10 mM 조건에서 형성된 박막을 각각 CaPL, CaPM, 그리고 CaPH로 지정하였다. 제조된 CP박막들의 표면형태를 scanning electron microscopy (SEM)으로 관찰한 결과, 마그네슘의 존재가 박막의 다공성을 감소시키는 등의 상당한 영향을 미치는 것으로 나타났다. 또한 CP박막의 결정성을 분석하기 위해 X-ray diffraction (XRD)로 분석한 결과, 제조된 박막들은 무결정성 구조를 갖는 것으로 나타났다. X-ray photoelectron spectroscopy (XPS) 분석을 통해 형성된 박막은 칼슘, 인, 그리고 마그네슘으로 구성되어 있음을 확인하였다. 제조된 박막에 대한 세포부착실험에서 사용한 마그네슘의 농도가 높을수록 세포부착이 감소하는 것으로 나타났다. 그러나 마그네슘 농도증가에 따라 세포증식이 증가하는 것으로 나타났다. 따라서 이러한 결과는 마그네슘이 존재 하에 CP박막의 생체적합성이 향상될 수 있음을 제시한다.

초경량성 박용기관을 위한 마그네슘 표면처리 (A Study on the Surface Treatment of Magnesium for marine engine systems)

  • 윤용섭
    • Journal of Advanced Marine Engineering and Technology
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    • 제35권2호
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    • pp.252-257
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    • 2011
  • 본 연구에서는 초경량성 마그네슘 재료를 엔진 블록, 실린더 헤드커버 등과 같은 박용기관에 적용하기 위한 환경 친화적 표면처리의 개발에 대하여 고찰하였다. 또한 이온플레이팅법에 의해 마그네슘 박막을 제작하고, 그 제작조건에 따라 변화하는 막의 결정배향성과 몰포로지가 경도특성에 미치는 영향을 해명하고자 하였다. 마그네슘 박막의 경도측정 결과, 아르곤 가스압의 증가에 따라 그 경도값이 상승하였 는데, 그 원인은 결정립계에 의한 강화와 성분 외 가스입자의 흡장효과에 의한 것으로 사료된다.

XPS Characterization and Morphology of MgO Thin Films grown on Single-Crystalline Diamond (100)

  • Lee, S.M.;Ito, T.;Murakami, H.
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2003년도 하계학술대회 논문집 Vol.4 No.1
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    • pp.19-27
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    • 2003
  • Morphology and composition of MgO films grown on single-crystalline diamond (100) have been studied. MgO thin films were deposited in the substrate temperature range from room temperature (RT) to 723K by means of electron beam evaporation using MgO powder source. Atomic force microscopy images indicated that the film grown at RT without $O_2$ supply was relatively uniform and flat whereas that deposited in oxygen ambient yielded higher growth rates and rough surface morphologies. X-ray photoelectron spectroscopy analyses demonstrate that the MgO film deposited at RT without $O_2$ has the closest composition to the stoichiometric MgO, and that a thin contaminant layer composed mainly of magnesium peroxide (before etching) or hydroxide (after etching) was unintentionally formed on the film surface, respectively. These results will be discussed in relation to the interaction among the evaporated species and intentionally supplied oxygen molecules at the growth front as well as the interfacial energy between diamond and MgO.

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Structural and Electrical Properties of Bismuth Magnesium Niobate Thin Films deposited at Various Temperatures

  • Park, Jong-Hyun;Yoon, Soon-Gil
    • Transactions on Electrical and Electronic Materials
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    • 제8권4호
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    • pp.153-156
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    • 2007
  • Structural and electrical properties of the fully crystallized-bismuth magnesium niobate ($Bi_2Mg_{2/3}Nb_{4/3}O_7$, BMN) films with 15 mol% excess bismuth deposited on Pt bottom electrode by pulsed laser deposition are characterized for various deposition temperatures. The BMN films were crystallized with a monoclinic structure from $300^{\circ}C$ and the surface roughness slightly decreases with increasing deposition temperature. The capacitance density of the films increases with increasing deposition temperature and especially, films deposited at $400^{\circ}C$ exhibit a capacitance density of approximately $620nF/cm^2$. The crystallized BMN films with approximately 170 nm thickness exhibit breakdown strength above 600 kV/cm (${\leq}10V$) irrespective of deposition temperature and a leakage current density of approximately $2{\times}10^{-8}A/cm^2$ at 590kV/cm (at 10 V).

두 메인 상의 타겟을 사용하여 스퍼터링으로 증착한 bismuth magnesium niobate 박막의 유전특성 (Dielectric properties of bismuth magnesium niobate thin films deposited by sputtering using two main phase target in the system)

  • 안준구;김혜원;윤순길
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2007년도 추계학술대회 논문집
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    • pp.264-264
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    • 2007
  • $B_2Mg_{2/3}/Nb_{4/3}O_7\;(B_2MN)$ thin films and $Bi_{3/2}MgNb_{3/2}O_7\;(B_{1.5}MN)$ thin films were deposited as a function of various deposition temperatures on Pt/$TiO_2/SiO_2$/Si substrates by radio frequency magnetron sputtering system. Both of their thin films are shown to crystalline phase at $500^{\circ}C$, deposition temperature, using 100W RF power. The composition of them and structural micro properties are investigated by RBS spectrum and SEM, AFM. 200 nm-thick $B_2MN$ thin films were deposited at room temperature had capacitance density of $151nF/cm^2$ at 100kHz, dissipation factor of 0.003 and had capacitance density of $584nF/cm^2$ at 100kHz, dissipation factor of 0.0045 at $500^{\circ}C$ deposition temperature. Both of their dielectric constant deposited at room temperature and at $500^{\circ}C$ were each approximately 40 and 100.

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고내식성의 신 마그네슘 코팅막 제작 (Preparation of New Corrosive Resistive Magnesium Coating Films)

  • 이명훈
    • Journal of Advanced Marine Engineering and Technology
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    • 제20권5호
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    • pp.103-113
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    • 1996
  • The properties of the deposited film depend on the deposition condition and these, in turn depend critically on the morphology and crystal orientation of the films. Therefore, it is important to clarify the nucleation occurrence and growth stage of the morphology and orientation of the film affected by deposition parameters, e.g. the gas pressure and bias voltage etc. In this work, magnesium thin flims were prepared on cold-rolled steel substrates by a thermo-eletron activation ion plating technique. The influence of nitrogen gas pressure and substrate bias voltage on their crystal orientation and morphology of the coated films were investigated by scanning electron microscopy (SEM) and X-ray diffraction, respectively. The diffraction peaks of magnesium film became less sharp and broadened with the increase of nitrogen gas pressure. With an increase in nitrogen gas pressure, flim morphology changed from colum nar to granular structure, and surface crystal grain-size decreased. The morphology of films depended not only on gas pressure but also on bias voltage, i.e., the effect of increasing bias voltage was similar to that of decreasing gas pressure. The effect of crystal orientation and morphology of magnesium films on corrosion behaviors was estimated by measuring anodic polarization curves in deaerated 3%NaCl solution. Magnesium, in general, has not a good corrosion resistance in all environments. However, these magnesium films prepared by changing nitrogen gas pressure showed good corrosion resistance. Among the films, magnesium films which exhibited granular structure had the highest corrosion resistance. The above phenomena can be explained by applying the effects of adsorption, occlusion and ion sputter of nitrogen gas.

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