• Title/Summary/Keyword: Low-Energy Electron Beam

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Effect of Storage Conditions on Graft of Polypropylene Non-woven Fabric Induced by Electron Beam (전자선 조사된 폴리프로필렌 부직포의 그라프트에 있어 보관조건이 미치는 영향)

  • Lee, Jin Young;Jeun, Joon-Pyo;Kang, Phil-Hyun
    • Journal of Radiation Industry
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    • v.9 no.2
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    • pp.57-62
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    • 2015
  • In this study, we fabricated effect of storage conditions on graft of polypropylene (PP) non-woven fabric induced by electron beam. The electron beam irradiations on PP non-woven fabric were carried out over a range of irradiation doses from 25 to 100 kGy to make free radicals on fabric surface. The radical measurement was established by electron spin resonance (ESR) for confirming the changes of the alkyl radical and peroxy radical according to effect of storage time, storage temperature and atmosphere. It was observed that the free radicals were increased with irradiation dose and decreased with storage time due to the continuous oxidation. However, the radical extinction was significantly delayed due to reduced mobility of radicals at extremely low temperature. The degree of graft based on the analysis of ESR was investigated. The conditions of graft reaction were set at a temperature: $60^{\circ}C$, reaction time: 6 hours and styrene monomer concentration: 20 wt%.

Installation for Preparing of Nanopowders by Target Evaporation with Pulsed Electron Beam

  • Sokovnin S. Yu.;Kotov Yu. A.;Rhee C. K.
    • Journal of Powder Materials
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    • v.12 no.3
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    • pp.167-173
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    • 2005
  • Production of weakly agglomerated nanopowders with the characteristic size of about 10 nm and a narrow particle size distribution is still a topical problem especially if the matter is an acceptable output (>50 g/hour), a high purity of the final product, and a low (energy consumption. The available experience and literature data show that the most promising approach to production of such powders is the evaporation-condensation method, which has a set of means for heating of the target. From this viewpoint the use of pulsed electron accelerators for production of nanopowders is preferable since they allow a relatively simple adjustment of the energy, the pulse length, and the pulse repetition rate. The use of a pulsed electron accelerator provides the following opportunities: a high-purity product; only the target and the working gas will interact and their purity can be controlled; evaporation products will be removed from the irradiation zone between pulses; as a result, the electron energy will be used more efficiently; adjustment of the particle size distribution and the characteristic size of particles by changing the pulse energy and the irradiated area. Considering the obtained results, we developed a design and made an installation for production of nanopowders, which is based on a hollow-cathode pulsed gas-filled diode. The use of a hollow-cathode gas-filled diode allows producing and utilizing an electron beam in a single chamber. The emission modulation in the hollow cathode will allow forming an electron beam 5 to 100 ms long. This will ensure an exact selection of the beam energy. By now we have completed the design work, manufactured units, equipped the installation, and began putting the installation into operation. A small amount of nanopowders has been produced.

Research on the penetration depth of low-energy electron beam in the PMMA-resist film using Monte Carlo numerical analysis (Monte Carlo 수치해석법을 이용한 PMMA resist에서의 저 에너지 전자빔 투과 깊이에 관한 연구)

  • Ahn, Seung-Joon;Ahn, Seong-Joon;Kim, Ho-Seob
    • Journal of the Korea Academia-Industrial cooperation Society
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    • v.8 no.4
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    • pp.743-747
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    • 2007
  • There has been steady effect for the development of the electron-beam lithography technologies for the circuit patterning of the future semiconductor devices. In this study, we have performed a Monte-Carlo simulation whore $1{\times}10^4$ electrons with various kinetic energies (100eV, 300eV, 500eV, 700eV, and 1000eV) were shot into polymethyl methacrylate(PMMA) resist of 100-nm thickness. The penetration depth of each electron beam in the resist layer were analyzed using Gaussian analysis method.

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Analysis of the Electrical Defect Detection Mechanism using a Low Energy Electron Beam on the TFT Substrate for TFT-LCDs (TFT-LCD용 TFT기판에서 저에너지 전자빔을 이용한 전기적 결함 검출 메카니즘 분석)

  • Oh, Tae-Sik;Kim, Ho-Seob;Kim, Dae-Wook;Ahn, Seung-Joon;Lee, Gun-Hee
    • Journal of the Korea Academia-Industrial cooperation Society
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    • v.12 no.4
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    • pp.1803-1811
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    • 2011
  • We have analyzed the electrical defect detection mechanism using low energy microcolumn on the TFT substrate for TFT-LCD. In this study, we have acquired the SEM images of the various pixel defects for 7-inch TFT substrate by scanning of low energy electron beam in the high vacuum chamber. Futhermore, we have interpreted the defect detection mechanism through the correlations between the SEM images and electrical behaviors of the defective pixels. As a result, we obtained consistent results as the follows. We can confirm that the SEM images using low energy electron beam are significantly affected by the space charge effect.

Characterization of Electron Beam Cured Epoxy Acrylate (에폭시 아크릴레이트의 전자선 영향 평가)

  • Shin, Jin-Wook;Oh, Byung-Hwan;Ko, Keum-Jin;Jeun, Joon Pyo;Kang, Phil Hyun
    • Journal of Radiation Industry
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    • v.4 no.3
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    • pp.271-276
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    • 2010
  • Epoxy resin has wide application in various industrial fields because of their good mechanical strength, superiority adhesion and low shrinkage etc. And the typical curing method for epoxy resins is thermal and press compaction. However, a curing method was used electron beam process in this study. Epoxy acrylate was fabricated from mixture of epoxy, acrylic acid, tetraphenylporphyrin (TPP) and hydroquinone monomethyl ether (MEHQ) with mole ratios. Then electron beam irradiation effect on the curing of the epoxy acrylate resin was investigated various absorption dose in nitrogen atmospheres at room temperature. The dynamic mechanical and thermal properties of the irradiated epoxy acrylate resins were characterized using dynamic mechanical analysis (DMA) and thermogravimetric analyzer (TGA). And the tensile and flexural strength were measured by an universal tensile machine (UTM).

XPS STUDY ON DNA DAMAGE BY LOW-ENERGY ELECTRON IRRADIATION

  • Noh, Hyung-Ah;Cho, Hyuck
    • Journal of Radiation Protection and Research
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    • v.36 no.4
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    • pp.190-194
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    • 2011
  • After the first report that electrons with sub-ionization energy of DNA could cause single strand breaks or double strand breaks to DNA, there have been various studies to investigate the mechanisms of DNA damage by low-energy electrons. In this paper, we examined the possibility of using X-ray photoelectron spectroscopy (XPS) to analyze the dissociation patterns of the molecular bonds by electron irradiation on DNA thin films and tried to establish the method as a general tool for studying the radiation damage of biomolecules by low energ yelectrons. For the experiment, pBR322 plasmid DNA solution was formed into the films on tantalum plates by lyophilization and was irradiated by 5-eV electrons. Un-irradiated and irradiated DNA films were compared and analyzed using the XPS technique.

Theoretical analysis on the maximum volume ablation rate for copper ablation with a 515nm picosecond laser (515nm 피코초 레이저를 이용한 구리 어블레이션 공정의 최대 가공율에 대한 이론적 분석)

  • Shin, Dongsig;Cho, Yongkwon;Sohn, Hyonkee;Suh, Jeong
    • Laser Solutions
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    • v.16 no.2
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    • pp.1-6
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    • 2013
  • Picosecond lasers are a very effective tool for micromachining metals, especially when high accuracy, high surface roughness and no heat affected zone are required. However, low productivity has been a limit to broadening the spectrum of their industrial applications. Recently it was reported that in the micromachining of copper with a 1064nm picosecond laser, there exist the optimal pulse energy and repetition rate to achieve the maximum volume ablation rate. In this paper, we used a 515nm picosecond laser, which is more efficient for micromachining copper in terms of laser energy absorption, to obtain its optimal pulse energy and repetition rate. Theoretical analysis based on the experimental data on copper ablation showed that using a 515nm picosecond laser instead of a 1064nm picosecond laser is more favorable in that the calculated threshold fluence is 75% lower and optical penetration depth is 50% deeper.

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Modulation of Hyaluronic Acid Properties by Electron Beam Irradiation (전자선 조사를 이용한 히알루론산의 특성 조절)

  • Shin, Young Min;Kim, Woo-Jin;Kim, Yong-Soo;Jo, Sun-Young;Park, Jong-Seok;Gwon, Hui-Jeong;Lim, Youn-Mook;Nho, Young-Chang
    • Journal of Radiation Industry
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    • v.5 no.2
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    • pp.159-164
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    • 2011
  • A variety of natural polymers have been used as tissue engineering scaffolds, drug delivery system, and cosmetic materials due to their higher biocompatibility and water uptake. As a major component of extracellular matrix, hyaluronic acid consisting of D-glucuronic acid and N-acetylglucosamine has been popularly used as a hydrogel material. Even though it has good properties to be used in the tissue engineering and cosmetic industry, its higher viscosity has limited a potential use in a variety of applications; only low content should be applied in preparing above products. In the present study, we investigated the effect of electron beam irradiation on the properties of hyaluronic acid. Hyaluronic acid paste containing low contents of water changed to solution after electron beam irradiation ranging from 1 to 10 kGy, which didn't exhibit any alteration of surface properties and morphological change after freeze-drying. However, its viscosity was significantly decreased as absorbed dose increased, which was approximately one by hundred in comparison with the viscosity of original hyaluronic acid solution with same concentration. In addition, it can still interact with positive charged chitosan generating polyelectrolyte complex. Therefore, only viscosity was decreased after electron beam irradiation, whereas other properties of hyaluronic acid maintained. Consequently, these hyaluronic acids with lower viscosities can be used in a variety of applications in tissue engineering, drug delivery, and cosmetic industry.

The domestic development of 60kw Electron Beam Welding System (고정밀 60kW급 전자빔 용접시스템 국산화 개발)

  • 정원희;엄기원;정인철
    • Proceedings of the KWS Conference
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    • 2001.10a
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    • pp.121-124
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    • 2001
  • The main characteristic of the Electron Beam Welding technique is its high energy density which produces thin and deep welds with very little distortion. High accelerated electrons, focused in a beam of 0.5 ∼ 2mm diameter, produce narrow welds with deep penetration. The result is a small HAZ as well as a low and uniform distortion which is predictible within very narrow limits. But the small diameter of the EB increases the requirements for the equipment control system for centering the beam on the welding joint in order to avoid any lack of fusion. Therefore, in this paper, we introduce the system developed at our company and the quality of welding zone, the detail function of system.

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The Electroluminescence Display using Electron Beam evaporation (E-Beam 증착기를 이용한 전계발광 표시장치)

  • Hur, Chang-Wu
    • Journal of the Korea Institute of Information and Communication Engineering
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    • v.12 no.6
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    • pp.1051-1055
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    • 2008
  • If ZnS receive electric energy, it can generate light. Thin film ELD has merits of excellent sight effect, solid state and easy fabrication but has problems of low emission density, high power loss and high operating voltage. Thin film deposited by electron beam evaporator has good uniformity of 6%. We fabricate excellent thin film ELD for solution of this problems. The thin film ELD made in this study has brightness of 650fL at yellow light and 350fL at green light.