• 제목/요약/키워드: Low Energy Electron-Beam

검색결과 141건 처리시간 0.024초

전자선 조사된 폴리프로필렌 부직포의 그라프트에 있어 보관조건이 미치는 영향 (Effect of Storage Conditions on Graft of Polypropylene Non-woven Fabric Induced by Electron Beam)

  • 이진영;전준표;강필현
    • 방사선산업학회지
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    • 제9권2호
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    • pp.57-62
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    • 2015
  • In this study, we fabricated effect of storage conditions on graft of polypropylene (PP) non-woven fabric induced by electron beam. The electron beam irradiations on PP non-woven fabric were carried out over a range of irradiation doses from 25 to 100 kGy to make free radicals on fabric surface. The radical measurement was established by electron spin resonance (ESR) for confirming the changes of the alkyl radical and peroxy radical according to effect of storage time, storage temperature and atmosphere. It was observed that the free radicals were increased with irradiation dose and decreased with storage time due to the continuous oxidation. However, the radical extinction was significantly delayed due to reduced mobility of radicals at extremely low temperature. The degree of graft based on the analysis of ESR was investigated. The conditions of graft reaction were set at a temperature: $60^{\circ}C$, reaction time: 6 hours and styrene monomer concentration: 20 wt%.

Installation for Preparing of Nanopowders by Target Evaporation with Pulsed Electron Beam

  • Sokovnin S. Yu.;Kotov Yu. A.;Rhee C. K.
    • 한국분말재료학회지
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    • 제12권3호
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    • pp.167-173
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    • 2005
  • Production of weakly agglomerated nanopowders with the characteristic size of about 10 nm and a narrow particle size distribution is still a topical problem especially if the matter is an acceptable output (>50 g/hour), a high purity of the final product, and a low (energy consumption. The available experience and literature data show that the most promising approach to production of such powders is the evaporation-condensation method, which has a set of means for heating of the target. From this viewpoint the use of pulsed electron accelerators for production of nanopowders is preferable since they allow a relatively simple adjustment of the energy, the pulse length, and the pulse repetition rate. The use of a pulsed electron accelerator provides the following opportunities: a high-purity product; only the target and the working gas will interact and their purity can be controlled; evaporation products will be removed from the irradiation zone between pulses; as a result, the electron energy will be used more efficiently; adjustment of the particle size distribution and the characteristic size of particles by changing the pulse energy and the irradiated area. Considering the obtained results, we developed a design and made an installation for production of nanopowders, which is based on a hollow-cathode pulsed gas-filled diode. The use of a hollow-cathode gas-filled diode allows producing and utilizing an electron beam in a single chamber. The emission modulation in the hollow cathode will allow forming an electron beam 5 to 100 ms long. This will ensure an exact selection of the beam energy. By now we have completed the design work, manufactured units, equipped the installation, and began putting the installation into operation. A small amount of nanopowders has been produced.

Monte Carlo 수치해석법을 이용한 PMMA resist에서의 저 에너지 전자빔 투과 깊이에 관한 연구 (Research on the penetration depth of low-energy electron beam in the PMMA-resist film using Monte Carlo numerical analysis)

  • 안승준;안성준;김호섭
    • 한국산학기술학회논문지
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    • 제8권4호
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    • pp.743-747
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    • 2007
  • 반도체 소자 제작에 있어서 회로의 pattern 형성에 이용하는 차세대 lithography 공정 기술을 위해서 전자빔 lithography 공정 기술 연구가 진행되고 있다. 본 연구에서는 Gauss 해석법과 Monte Carlo의 수치해석법을 사용하여 두께 100 nm의 PMMA (poly-methyl-methacrylate) resist에 전자 $1{\times}10^4$를 입사시키고, 입사 전자빔 에너지에 따른 PMMA 내에서의 투과 깊이를 비교하였다. 전자빔 에너지의 크기는 100eV, 300eV, 500eV, 700eV, 그리고 1000eV에 대하여 simulation을 실시하였다.

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TFT-LCD용 TFT기판에서 저에너지 전자빔을 이용한 전기적 결함 검출 메카니즘 분석 (Analysis of the Electrical Defect Detection Mechanism using a Low Energy Electron Beam on the TFT Substrate for TFT-LCDs)

  • 오태식;김호섭;김대욱;안승준;이건희
    • 한국산학기술학회논문지
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    • 제12권4호
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    • pp.1803-1811
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    • 2011
  • TFT-LCD용 TFT기판 상에서 저에너지 마이크로 컬럼을 이용하는 전기적인 결함 검출 메카니즘을 분석하였다. 본 연구에서는 고진공 챔버 내에서 7인치 TFT 기판에 저에너지 전자빔을 주사하여 여러 가지 불량 화소에 대한 SEM 이미지를 획득하였다. 더불어 각각의 불량 화소에서 나타나는 현상과 전기적인 거동과의 연관성을 분석하여 검출 메카니즘을 해석하였다. 그 결과로서 저에너지 초소형 전자 컬럼을 이용하는 저에너지 전자빔에 의한 SEM 이미지는 전자간 반발효과에 크게 영향을 받는 일관성 있는 결과를 확인하였다.

에폭시 아크릴레이트의 전자선 영향 평가 (Characterization of Electron Beam Cured Epoxy Acrylate)

  • 신진욱;오병환;고금진;전준표;강필현
    • 방사선산업학회지
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    • 제4권3호
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    • pp.271-276
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    • 2010
  • Epoxy resin has wide application in various industrial fields because of their good mechanical strength, superiority adhesion and low shrinkage etc. And the typical curing method for epoxy resins is thermal and press compaction. However, a curing method was used electron beam process in this study. Epoxy acrylate was fabricated from mixture of epoxy, acrylic acid, tetraphenylporphyrin (TPP) and hydroquinone monomethyl ether (MEHQ) with mole ratios. Then electron beam irradiation effect on the curing of the epoxy acrylate resin was investigated various absorption dose in nitrogen atmospheres at room temperature. The dynamic mechanical and thermal properties of the irradiated epoxy acrylate resins were characterized using dynamic mechanical analysis (DMA) and thermogravimetric analyzer (TGA). And the tensile and flexural strength were measured by an universal tensile machine (UTM).

XPS STUDY ON DNA DAMAGE BY LOW-ENERGY ELECTRON IRRADIATION

  • Noh, Hyung-Ah;Cho, Hyuck
    • Journal of Radiation Protection and Research
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    • 제36권4호
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    • pp.190-194
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    • 2011
  • After the first report that electrons with sub-ionization energy of DNA could cause single strand breaks or double strand breaks to DNA, there have been various studies to investigate the mechanisms of DNA damage by low-energy electrons. In this paper, we examined the possibility of using X-ray photoelectron spectroscopy (XPS) to analyze the dissociation patterns of the molecular bonds by electron irradiation on DNA thin films and tried to establish the method as a general tool for studying the radiation damage of biomolecules by low energ yelectrons. For the experiment, pBR322 plasmid DNA solution was formed into the films on tantalum plates by lyophilization and was irradiated by 5-eV electrons. Un-irradiated and irradiated DNA films were compared and analyzed using the XPS technique.

515nm 피코초 레이저를 이용한 구리 어블레이션 공정의 최대 가공율에 대한 이론적 분석 (Theoretical analysis on the maximum volume ablation rate for copper ablation with a 515nm picosecond laser)

  • 신동식;조용권;손현기;서정
    • 한국레이저가공학회지
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    • 제16권2호
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    • pp.1-6
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    • 2013
  • Picosecond lasers are a very effective tool for micromachining metals, especially when high accuracy, high surface roughness and no heat affected zone are required. However, low productivity has been a limit to broadening the spectrum of their industrial applications. Recently it was reported that in the micromachining of copper with a 1064nm picosecond laser, there exist the optimal pulse energy and repetition rate to achieve the maximum volume ablation rate. In this paper, we used a 515nm picosecond laser, which is more efficient for micromachining copper in terms of laser energy absorption, to obtain its optimal pulse energy and repetition rate. Theoretical analysis based on the experimental data on copper ablation showed that using a 515nm picosecond laser instead of a 1064nm picosecond laser is more favorable in that the calculated threshold fluence is 75% lower and optical penetration depth is 50% deeper.

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전자선 조사를 이용한 히알루론산의 특성 조절 (Modulation of Hyaluronic Acid Properties by Electron Beam Irradiation)

  • 신영민;김우진;김용수;조선영;박종석;권희정;임윤묵;노영창
    • 방사선산업학회지
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    • 제5권2호
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    • pp.159-164
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    • 2011
  • A variety of natural polymers have been used as tissue engineering scaffolds, drug delivery system, and cosmetic materials due to their higher biocompatibility and water uptake. As a major component of extracellular matrix, hyaluronic acid consisting of D-glucuronic acid and N-acetylglucosamine has been popularly used as a hydrogel material. Even though it has good properties to be used in the tissue engineering and cosmetic industry, its higher viscosity has limited a potential use in a variety of applications; only low content should be applied in preparing above products. In the present study, we investigated the effect of electron beam irradiation on the properties of hyaluronic acid. Hyaluronic acid paste containing low contents of water changed to solution after electron beam irradiation ranging from 1 to 10 kGy, which didn't exhibit any alteration of surface properties and morphological change after freeze-drying. However, its viscosity was significantly decreased as absorbed dose increased, which was approximately one by hundred in comparison with the viscosity of original hyaluronic acid solution with same concentration. In addition, it can still interact with positive charged chitosan generating polyelectrolyte complex. Therefore, only viscosity was decreased after electron beam irradiation, whereas other properties of hyaluronic acid maintained. Consequently, these hyaluronic acids with lower viscosities can be used in a variety of applications in tissue engineering, drug delivery, and cosmetic industry.

고정밀 60kW급 전자빔 용접시스템 국산화 개발 (The domestic development of 60kw Electron Beam Welding System)

  • 정원희;엄기원;정인철
    • 대한용접접합학회:학술대회논문집
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    • 대한용접접합학회 2001년도 추계학술발표대회 개요집
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    • pp.121-124
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    • 2001
  • The main characteristic of the Electron Beam Welding technique is its high energy density which produces thin and deep welds with very little distortion. High accelerated electrons, focused in a beam of 0.5 ∼ 2mm diameter, produce narrow welds with deep penetration. The result is a small HAZ as well as a low and uniform distortion which is predictible within very narrow limits. But the small diameter of the EB increases the requirements for the equipment control system for centering the beam on the welding joint in order to avoid any lack of fusion. Therefore, in this paper, we introduce the system developed at our company and the quality of welding zone, the detail function of system.

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E-Beam 증착기를 이용한 전계발광 표시장치 (The Electroluminescence Display using Electron Beam evaporation)

  • 허창우
    • 한국정보통신학회논문지
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    • 제12권6호
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    • pp.1051-1055
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    • 2008
  • ZnS는 전기적 에너지를 받으면 전자와 정공이 무수히 발생하며 이들이 평형상태로 갈 때 보다 높은 준위로 여기되면 빛이 생성될 수 있다. 박막 ELD는 탁월한 시각효과, 고체상태 및 제조의 용이성 등의 장점을 갖고 있으나 발광세기의 향상, 소모전력의 감소, 구동전압의 저하 등 해결되어야 할 문제점이 많이 남아있다. 이러한 문제점을 해결하기 위하여 보다 우수한 박막EL의 전계발광(EL)표시장치를 설계 제작하였다. 우수한 재료선택을 위하여 일본의 High purity사의 제품을 선택하였고, 이 제품이 Electron Beam으로 증착 시에 우수한 특성을 나타냈고, 휘도도 상용화된 800fL에 80% 수준으로 제작과정을 개선하여 더욱 우수한 결과를 얻을 수 있고 본 연구는 Yellow의 경우 650fL의 휘도를 얻었고, Green의 경우 350fL의 휘도를 얻었다. Electron Beam 제작용으로 자체 제작된 기판 홀더로 막을 제작한 결과 두께 균일도는 6% 내외 의 결과로 상당히 우수한 특성을 나타내었다.