• Food Science and Preservation
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• v.1 no.2
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• pp.87-92
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• 1994

For the measurement of the change of respiration rate caused by the gas content of storage atmosphere which furnishes important data for the interpretation of ULO storage, GC was used. It has been shown that the respiration rate and respiratory heat generation rate of Fuji apple is more than doubled in normal low temperature storage when compared with ULO storage, and that in ULO storage the respiration rate and respiratory heat generation rate directly proportional to the concentration of O2 in storage atmosphere as well as inversely proportional to that of CO2. It was possible to establish a functional formula for the respiratory heat generation rate of Fuji apple in all the storage conditions in terms of u=-0.7638+0.0003 O2-0.0007 log(CO2)+0.1369 log(Tb) concerning temperature and the concentration of O2 and CO2

• Journal of the Korean Ceramic Society
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• v.35 no.8
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• pp.801-806
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• 1998

$Eu^{3+}$ -doped $Y_2$$O_3$ phosphors has been prepared by a polymerized complex method and investigated their powder and luminescence properties. They were compared with phosphors prepared by a solid state reac-thion method. The phosphors synthesized have been characterized by X-ray diffraction low-voltage lu-minescent emission spectroscopy etc. Under low-voltage electron excitation $Eu^{3+}$-doped $Y_2$$O_3$ exhibited a strong narrow-band red emission peaking at 612nm. On the other hand the critical value for concentration quenching of sample prepared by the polymerized complex method fired at $1400^{\circ}C$ is x=0.05 for $(Y_{1-x}Eu_x__2O_3$ The emission intensity of phosphors prepared by the polymerized complex method was higher than that of phosphors prepared by the solid state reaction method.

• Journal of the Korean Society of Food Culture
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• v.34 no.2
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• pp.233-239
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• 2019

This paper presents a literature review on the active technologies to regulate the levels of carbon dioxide and oxygen in Kimchi packaging. In this study, laser-etched pouches and $O_2$ scavengers were used for Kimchi packaging, and the efficiency of each packaging technique to regulate the $CO_2$ and $O_2$ levels inside Kimchi packages was investigated. When Kimchi was packaged with a laser-etched pouch, the $CO_2$ concentration in the sample with a high gas transmission rate was less than that in other pouches (p<0.05), and a low $CO_2$ level had little effect on the expansion of the package volume. Kimchi treated with an $O_2$ absorber exhibited a significantly lower (p<0.05) $O_2$ concentration inside the packages relative to the control. A low $O_2$ concentration inside the Kimchi package effectively inhibited the growth of total aerobic bacteria and lactic acid bacteria, as well as yeasts and molds on Kimchi. These results suggest that $O_2$ absorbers have a positive effect on the microbial quality of Kimchi. Therefore, packaging in a laser-etched pouch and the use of an $O_2$ scavenger could provide a novel packaging material for regulating the $CO_2$ and $O_2$ levels during Kimchi packaging.

• Proceedings of the Korean Vacuum Society Conference
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• 2010.02a
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• pp.213-213
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• 2010

Magnetic random access memory (MRAM), based on magnetic tunnel junction (MTJ) and CMOS, is one of the best semiconductor memories because it can provide nonvolatility, fast access time, unlimited read/write endurance, low operating voltage and high storage density. For the realization of high density MRAM, the etching of MTJ stack with good properties is one of a key process. Recently, there has been great interest in the MTJ stack using MgO as barrier layer for its huge room temperature MR ratio. The use of MgO barrier layer will undoubtedly accelerate the development of MTJ stack for MRAM. In this study, high-density plasma reactive ion etching of MgO films was investigated in an inductively coupled plasma of $Cl_2$/Ar gas mixes. The etch rate, etch selectivity and etch profile of this magnetic film were examined on vary gas concentration. As the $Cl_2$ gas concentration increased, the etch rate of MgO monotonously decreased and etch slop was slanted. The effective of etch parameters including coil rf power, dc-bais voltage, and gas pressure on the etch profile of MgO thin film was explored, At high coil rf power, high dc-bais voltage, low gas pressure, the etching of MgO displayed better etch profiles. Finally, the clean and vertical etch sidewall of MgO films was achieved using $Cl_2$/Ar plasma at the optimized etch conditions.

• Solar Energy
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• v.19 no.2
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• pp.57-65
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• 1999

In this study $H_2O$-NaCl mixture was selected as a cold thermal storage material and its phase change temperature($liquid{\Leftrightarrow}solid$) was controlled with the molar concentration of NaCl. Ion dipole interaction mechanism and the fusion and crystallization structure of $H_2O$-NaCl were visualized with the low and high concentration of NaCl in the heating and cooling processes. In this study, the original cause of the appearance of two steps phase change period in heating and cooing processes were found by the visualization of the ion dipole interaction mechanism of $H_2O$-NaCl, and the theoretical equation of the phase change temperature variation in the NaCl high molar concentration was rearranged.

• Journal of Korean Society of Water and Wastewater
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• v.8 no.1
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• pp.34-43
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• 1994

It is well known that the adsorption character of activated carbon is dependent on the specific surface area and pore volume, but the relationship between the surface-chemical structure and the adsorption character has not been studied very often. The purpose of this study is to investigate the effect of the acidic surface functional groups of activated carbon and the adsorption characteristics of low concentration phenol. So three types of activated carbons and four different treatments were introduced to this isotherm experiment. These treatments were nontreatment, 1N $HNO_3$ treatment, 6N $HNO_3$ treatment, $H_2O_2$ treatment. The conclusions of this study are as followings. If the initial concentration of phenol is high as 5mg/l, the adsorption is dependent on the specific surface area. If the initial concentration of phenol is low as $100{\mu}g/l$, the adsorption is dependent on the average pore volume. The acidic surface functional groups prevent the adsorption of phenol molecules to activated carbon. And the adsorbed amount decreases more for $HNO_3$ treatment than for $H_2O_2$ treatment and more for concentrated $HNO_3$ treatment than for dilute $HNO_3$ treatment.

• Applied Chemistry for Engineering
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• v.10 no.7
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• pp.1035-1040
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• 1999

Photocatalytic degradation of trichloroethylene has been carried out with UV-illuminated $TiO_2$-coated pyrex reactor in gas phase. Three commercial $TiO_2$ oxides were used as catalysts. The effect of reaction conditions, initial concentration of trichloroethylene, concentration of oxidant and light intensity on the photocatalytic activity were examined. Anatase-type catalyst showed higher activity than rutile-type, but P-25 catalyst showed the highest activity. The degradation rate increased with the decrease of flow rate and initial trichloroethylene concentration. It was preferable to use air as an oxidant. In addition, reactants with the water vapor decreased the activity and the degradation rate increased with the increase of light intensity, but it was very low with solar light. Photocatalytic deactivation was not observed at low concentration of trichloroethylene.

• Bulletin of the Korean Chemical Society
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• v.19 no.12
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• pp.1320-1325
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• 1998

ZnGa2O4: Mn phosphors were prepared by a new chemical process, and their photoluminescence and electron paramagnetic resonance characteristics were investigated. The chemical method showed a low temperature formation of phosphors and a rod-type shape of particles. The strong ultraviolet emission was observed in the undoped ZnGa2O4 phosphor, while strong green emission in the Mn2+-activated ZnGa2O4 phosphor. The green emission intensity of the phosphor prepared by the chemical method was much stronger than that prepared by the conventional method. This difference with preparation methods was interpreted as due to the difference in the distribution of Mn2+ in the host lattice. From EPR results, it was explained that the line intensity of the undoped ZnGa2O4 is associated with the electrical conductivity of this material and the concentration quenching of green luminescence of ZnGa2O4: Mn at higher Mn2+ concentration is attributed to the coupling by exchange interaction between Mn2+ ions.

• Proceedings of the Materials Research Society of Korea Conference
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• 2009.11a
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• pp.44.2-44.2
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• 2009

Polycrystalline materials suchas yttria and alumina have been applied as a plasma resisting material for the plasma processing chamber. However, polycrystal line material may easily generate particles and the particles are sources of contamination during the plasma enhanced process. Amorphous material can be suitable to prevent particle generation due to absence of grain-boundaries. We manufactured nitrogen-containing $SiO_2-Al_2O_3-Y_2O_3$ based glasses with various contents of silicon and fixed nitrogen content. The thermal properties, mechanical properties and plasma etching rate were evaluated and compared for the different composition samples. The plasma etching behavior was estimated using XPS with depth profiling. From the result, the plasma etching rate highly depends on the silicon content and it may results from very low volatile temperature of SiF4 generated during plasma etching. The silicon concentration at the plasma etched surface was very low besides the concentration of yttrium and aluminum was relatively high than that of silicon due to high volatile temperature of fluorine compounds which consisted with aluminum and yttrium. Therefore, we conclude that the samples having low silicon content should be considered to obtain low plasma etching rate for the plasma resisting material.

• Journal of Environmental Science International
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• v.12 no.12
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• pp.1321-1327
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• 2003

Two different kinds of cases, with and without addition of noncrystalline silica to the Hadong kaolin were studied to obtain useful information on the synthesis of zeolite. The research was carried out to investigate the formation area and the crystalized degree of zeolite according to a synthetic time, the water content of raw material mixture, KOH concentration, and stirring intensity. In the case of without addition of noncrystalline silica to the Hadong kaolin and the low concentration range of KOH, the structure of the kaolin was not changed. However, when the mole ratio of K2O/SiO$_2$ in natural kaolin was increased, Linde-L zeolite and unknown structure of kaolins, U-1 and U-2 were produced. While in the high concentration range of KOH, the unknown structure of kaolins, U-6 and U-2, were produced and the production rate of U-6 was increased with the increased of K2O/SiO$_2$ mole ratio. In the case of with addition of noncrystalline silica to the Hadong kaolin and treatment with KOH hydrothermal processing, ZSM-5, ZSM-35, and Linde-L zeolites and the mixture of unknown structure of zeolites, U-1, U-2, U-3, and U-4, were obtained. Both cases demonstrated that the synthesis of zeolite from the Hadong kaolin was highly influenced by KOH concentration of raw material mixture.