• Title/Summary/Keyword: Long-memory Properties

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LSTM Prediction of Streamflow during Peak Rainfall of Piney River (LSTM을 이용한 Piney River유역의 최대강우시 유량예측)

  • Kareem, Kola Yusuff;Seong, Yeonjeong;Jung, Younghun
    • Journal of Korean Society of Disaster and Security
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    • v.14 no.4
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    • pp.17-27
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    • 2021
  • Streamflow prediction is a very vital disaster mitigation approach for effective flood management and water resources planning. Lately, torrential rainfall caused by climate change has been reported to have increased globally, thereby causing enormous infrastructural loss, properties and lives. This study evaluates the contribution of rainfall to streamflow prediction in normal and peak rainfall scenarios, typical of the recent flood at Piney Resort in Vernon, Hickman County, Tennessee, United States. Daily streamflow, water level, and rainfall data for 20 years (2000-2019) from two USGS gage stations (03602500 upstream and 03599500 downstream) of the Piney River watershed were obtained, preprocesssed and fitted with Long short term memory (LSTM) model. Tensorflow and Keras machine learning frameworks were used with Python to predict streamflow values with a sequence size of 14 days, to determine whether the model could have predicted the flooding event in August 21, 2021. Model skill analysis showed that LSTM model with full data (water level, streamflow and rainfall) performed better than the Naive Model except some rainfall models, indicating that only rainfall is insufficient for streamflow prediction. The final LSTM model recorded optimal NSE and RMSE values of 0.68 and 13.84 m3/s and predicted peak flow with the lowest prediction error of 11.6%, indicating that the final model could have predicted the flood on August 24, 2021 given a peak rainfall scenario. Adequate knowledge of rainfall patterns will guide hydrologists and disaster prevention managers in designing efficient early warning systems and policies aimed at mitigating flood risks.

Ferroelectric Properly of Bi3.75La0.25Ti3O12 Ceramic Sintered in the Ambient (분위기 소결공정에 의한 Bi3.75La0.25Ti3O12세라믹의 강유전특성)

  • 김응권;박춘배;박기엽;송준태
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.15 no.9
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    • pp.783-787
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    • 2002
  • In recent year, B $i_{4-}$x L $a_{x}$ $Ti_3$ $O_{12(BLT)}$ is one of promising substitute materials for the ferroelectric random access memory(FRAM) applications. But the systematic composition is still insufficient, so this experiment was carried out in ceramic ambient sintering process which has the very excellent ferroelectric property. Samples were prepared by a bulk and the purpose which was estimated with a suitability of thin films applications. The density of B $i_{3.75}$ L $a_{0.25}$ $Ti_3$ $O_{12}$ was high and the XRD pattern showed that the intensity of main peak (117) was increased at the argon ambient sintering. Controlling the quantity of oxygen, crystallization showed a thin, long plate like type, and we obtained the excellent dielectric and polarization properties at the argon atmosphere sintering. Also this sintering process was effective at the bulk sample. Argon ambient sintered sample produced higher permittivity of 154, the remanent polarization(2Pr) of 6.8 uC/$\textrm{cm}^2$ compared with that sintered in air and oxygen ambient. And this sintering process showed a possibility which could be applied to thin films process..

Stabilizing Properties of SiOF Film with Low Dielectric Constant by $N_2O$ Plasma Annealing ($N_2O$ 플라즈마 열처리에 의한 저유전율 SiOF 박막의 물성 안정화)

  • Kim, Yoon-Hae;Lee, Seok-Kiu;Kim, Sun-Oo;Kim, Hyeong-Joon
    • Korean Journal of Materials Research
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    • v.8 no.4
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    • pp.317-322
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    • 1998
  • The stabilization of low dielectric constant SiOF films prepared by conventional PECVD using TEOS and $C_2F_6$ was evaluated by the $N_2O$-plasma post-deposition annealing. Properties of SiOF film became unstable when it was air-exposed or heat-treated. Water absorption of SiOF films was increased as F content was increased due to the for¬mation of F -Si- F bonds. Also F content of SiOF films decreased after heat treatment. $N_2O$-plasma post-deposition annealing was proved to be effective on stabilizing SiOF films. which was mainly due to the formation of thin SiON layer near the top surface of films. However. the value of dielectric constant was greatly increased again when $N_2O$-plasma post-deposition annealing was done for a long time. To stabilize the SiOF films without an increase of dielec¬tric constant by $N_2O$- plasma post-deposition annealing. the annealing time should be kept the minimum value. to which stabilizing effects against air environment and heat treatment were preserved.

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Optical Property of Super-RENS Optical Recording Ge2Sb2Te5 Thin Films at High Temperature (초해상 광기록 Ge2Sb2Te5 박막의 고온광물성 연구)

  • Li, Xue-Zhe;Choi, Joong-Kyu;Lee, Jae-Heun;Byun, Young-Sup;Ryu, Jang-Wi;Kim, Sang-Youl;Kim, Soo-Kyung
    • Korean Journal of Optics and Photonics
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    • v.18 no.5
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    • pp.351-361
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    • 2007
  • The samples composed of a GST thin film and the protective layers of $ZnS-SiO_2$ or $Al_2O_3$ coated on c-Si substrate were prepared by using the magnetron sputtering method. Samples of three different structures were prepared, that is, i) the GST single film on c-Si substrate, ii) the GST film sandwiched by the protective $ZnS-SiO_2$ layers on c-Si substrate, and iii) the GST film sandwiched by $Al_2O_3$ protective layers on c-Si substrate. The ellipsometric constants in the temperature range from room temperature to $700^{\circ}C$ were obtained by using the in-situ ellipsometer equipped with a conventional heating chamber. The measured ellipsometric constants show strong variations versus temperature. The variation of ellipsometric constants at the temperature region higher than $300^{\circ}C$ shows different behaviors as the ambient medium is changed from in air to in vacuum or the protective layers are changed from $ZnS-SiO_2$ to $Al_2O_3$. Since the long heating time of 1-2 hours is believed to be the origin of the high temperature variation of ellipsometric constants upon the heating environment and the protective layers, a PRAM (Phase-Change Random Access Memory) recorder is introduced to reduce the heating time drastically. By using the PRAM recorder, the GST samples are heated up to $700^{\circ}C$ decomposed preventing its partial evaporation or chemical reactions with adjacent protective layers. The surface image obtained by SEM and the surface micro-roughness verified by AFM also confirmed that samples prepared by the PRAM recorder have smoother surface than the samples prepared by using the conventional heater.