• Analytical Science and Technology
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• v.25 no.2
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• pp.127-132
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• 2012

A test tool for self-leveling and flowing characters of coating materials used to semiconductors and electronic parts, especially for protection of LCD and PDP connectors, was designed, and the test tool was evaluated using polymeric siloxane coating materials which have various viscosities. The test results showed that the designed test tool was effective to measure self-leveling and flowing properties of coating materials. Therefore, considering that the viscosity is not directly correlated with self-leveling and flowing properties, we believe that this test tool will be a very useful tool for measurement instead of classical method using viscosities of coating materials. Particularly, the measurement of self-leveling and flowing properties using the test tool would be expected to be used in the area of selecting suitable protective coating materials for LCD (Liquid Crystal Display), PDP (Plasma Display Panel) and semiconductor connection parts.

• Journal of KIISE:Software and Applications
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• v.34 no.11
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• pp.953-960
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• 2007

To correctly detect muras, visual defects in TFT-LCD panels, image distortion occurring on the profess of capturing panels should be corrected. In general vision systems, there are several known methods to restore the observed image. However, the vignetting effect particularly shown only in panel images cannot be easily restored through traditional methods because it is combined with background non-uniformity due to the unique characteristic of panel. To increase the reliability of image restoration, the vignetting effect should be properly corrected after being separated from image background. Therefore, in this paper we present a new method to analyze and correct the vignetting effect of panel images using principal component analysis. Experimental results for a total of 175 test images showed that the average contrast error of the muras in the distorted images was reduced from 37% to 11% and the mura misidentification rate was decreased from 14.8% to 2.2% by image restoration.

• The Transactions of the Korean Institute of Power Electronics
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• v.19 no.4
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• pp.320-326
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• 2014

In this paper, the new smart dimming algorithm which is mixed with PWM and PAM control method is proposed for reducing the power consumption of LED TV Backlight. The proposed technique is using the curve characteristics of LED forward voltage and current which is proportionally changing LED forward voltage as changing LED forward current. Therefore, each PWM and PAM control method has different LED forward voltage and current in the same brightness condition. The PWM control method adjusts the brightness of LED TV Backlight by only varying the duty ratio of PWM and constantly sustaining the amplitude of LED forward current and voltage. So, the level of LED forward current and voltage in the PWM control method is relatively high and constant regardless of duty ratio of PWM. On the other hand, the PAM control method adjusts the brightness of LED TV Backlight by directly varying the level of LED forward current. So, the level of LED forward current and voltage in the PAM control method is lowered according to the brightness level. For the above-mentioned reason, the PAM control method has the advantage of reducing the total power consumption of LED TV Backlight at the brightness condition of below 100%, compared with PWM control method. By implementing this characteristic to LED driver circuit with control algorithm in MCU, the power consumption of LED TV Backlight can expect to be reduced. The effectiveness of the proposed method, new smart dimming algorithm, CPWAM(=Conditional Pulse Width Amplitude Modulation), has been verified by experimental results.

• The Transactions of the Korean Institute of Power Electronics
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• v.15 no.2
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• pp.111-118
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• 2010

Recently, LCD TV using LED backlight has a great attention due to its low power consumption, slim construction, mercury free, wide color gamut and fast response. For the uniform brightness of the LCD panel, multi channel LEDs and DC/DC converter for each LED are required in conventional system. Therefore energy conversion efficiency is poor, the system size bulky and the cost of production high. To overcome these above mentioned drawbacks, a new current-balancing multi-channel LED driver is proposed in this paper. It can not only drive multi-channel LEDs with one DC/DC converter but also provide all LEDs with constant balanced current. To confirm the validity of the proposed driver, its operation and performance are verified on a prototype for 46" LCD TV.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2007.06a
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• pp.430-430
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• 2007

In this study, the nematic liquid crystal (NLC) alignment effects treated on the ZnO thin film layers using ion beam irradiation were successfully studied for the first time. The ZnO thin films were deposited on indium-tin-oxide (ITO) coated glass substrates by rf-sputter and The ZnO thin films were deposited at the three kinds of rf power. The used DuoPIGatron type ion beam system, which can be advantageous in a large area with high density plasma generation. The ion beam parameters were as follows: energy of 1800 eV, exposure time of 1 min and ion beam current of $4\;mA/cm^2$ at exposure angles of $15^{\circ}$, $30^{\circ}$, $45^{\circ}$, and $60^{\circ}$. The homogeneous and homeotropic LC aligning capabilities treated on the ZnO thin film surface with ion beam exposure of $45^{\circ}$ for 1 min can be achieved. The low pretilt angle for a NLC treated on the ZnO thin film surface with ion beam irradiation for all incident angles was measured. The good LC alignment treated on the ZnO thin film with ion beam exposure at rf power of 150 W can be measure. For identifying surfaces topography of the ZnO thin films, atomic force microscopy (AFM) was introduced. After ion beam irradiation, test samples were fabricated in an anti-parallel configuration with a cell gap of $60{\mu}m$.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2007.11a
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• pp.370-370
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• 2007

The liquid crystal (LC) aligning capabilities treated on the Organic overcoat thin film surfaces by ion beam irradiation and rubbing method was successfully studied for the first time. The Organic overcoat layer was coated by spin-coating. In order to characterize the LC alignment, the microscope, pretilt angle, thermal stress, and atomic force microscopy (AFM) image was used. The good LC aligning capabilities treated on the Organic overcoat thin film surfaces with ion beam exposure of $45^{\circ}$ above ion beam energy density of 1200 eV can be achieved. But, the alignment of defect of NLC on the Organicovercoat surface at low energy density of 600 eV was measured. The pretilt angle of NLC on the Organic overcoat thin film surface with ion beam exposure of $45^{\circ}$ for 1 min at energy density of 1800eV was measured about 1.13 degree. But, low pretilt angles of NLC on the Organic overcoat thin film surface with ion beam exposure at energy density of 600, 1200, 2400, and 3000 eV was measured. Also, the pretilt angle of NLC on the rubbed Organic overcoat thin film surfaces was measured about 0.04 degrees. Finally, the good thermal stability of LC alignment on the Organic overcoat thin film surface with ion beam exposure of $45^{\circ}$ for 1 min can be measured.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2006.06a
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• pp.105-105
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• 2006

IT 산업 및 반도체 산업이 발전함에 따라 초소형, 고집적화 시스템의 요구에 대응하기 위해서 고해상도 및 고정밀의 패턴 구현에 관한 많은 연구가 진행되고 있다. 이러한 연구는 각종 산업제품의 PCB(Printed Circuit Board) 및 디스플레이 장치인 PDP(Plasma Display Panel), LCD(Liquid Crystal Display) 등에 적용되어 널리 응용되고 있다. 현재 널리 사용되는 인쇄 회로 기판은 마스킹 후 선택적 에칭 방식을 적용하여 금속 배선을 형성하는 방식을 적용하고 있다. 이러한 방식은 설계가 변경될 경우 마스크를 다시 제작해야 하는 번거로움이 있어 설계 변경이 용이하지 않고 더욱 길어진 생산시간의 증가로 인하여 생산성 및 집적도가 떨어지게 된다. 따라서 최근에는 이러한 한계를 극복하기 위한 방안이 여러 가지 측면에서 시도되고 있으며, 그 중에서도 Inkjet Printing 기술에 대한 관심이 증가하고 있다. 본 연구에서는 Inkjet Printing 방식을 적용하여 금속 배선을 형성하고 선폭과 두께의 오차를 줄여 배선의 Tolerance 를 개선할 수 있는 방안을 제안하였다. Inkjet Printing 방식을 이용한 기존의 금속 배선 형성은 고해상도의 DPI(Dot Per Inch)에서 잉크 액적이 뭉치는 Bulge 현상이 발생되어 원하는 형상 및 배선의 폭을 구현하는데 어려움이 있었다. Bulge 현상은 배선의 불균일성을 야기할 뿐만 아니라 근접한 배선의 간섭에도 영향을 미처 금속 배선의 기능을 할 수 없는 단점을 발생시킨다. 따라서 본 연구에서는 이러한 Bulge 현상을 줄이고 배선간의 간섭을 방지하여 원하는 배선을 용이하게 형성할 수 있는 순차적 인쇄 방식을 적용하였다. 본 연구에서는 노즐직경 35um 의 Inkjet Head 와 나노 Ag 입자 잉크를 사용하여 Glass 표면 위에 배선을 형성하고 배선의 폭과 두께를 측정하였다. 또한 순차적 인쇄 방식을 적용하여 700DPI 이상의 고해상도에서 나타날 수 있는 Bulge 현상이 감소하였음을 관찰하였으며 금속 배선의 Tolerance를 10%내외로 유지할 수 있음을 확인하였다.

• Journal of the Korean Vacuum Society
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• v.9 no.3
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• pp.233-236
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• 2000

The structural, electrical and chemical characteristics of Al alloy thin film with low impurity concentrations AlW deposited by using dc magnetron sputtering deposition are investigated for the applications as data bus line in the TFT-LCD panel. The deposited thin films show the decrease of resistivity and the increase of grain size after the RTA at $300^{\circ}C$ for 20 min.. Moreover, the resistivity of AlW does not show appreciable grain size dependence after RTA. It is concluded that the decrease of resistivity after RTA is due to the increase of grain size. The annealed AlW is found to be hillock free. And for investigating chemical attack in TFT-LCD etching processing the electric potential of AlW alloy for Ag/AgCl were investigated by cyclic voltammetry. When W wt.% of AlW alloy was higher than about 3%, the electric potential of AlW was more positive than ITO's. Therefore AlW alloy thin film can be propose to use for data bus line.

• Journal of the Korean Vacuum Society
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• v.9 no.3
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• pp.237-241
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• 2000

The structural, electrical and etching characteristics of Al alloy thin film with low impurity concentrations AlNd deposited by using do magnetron sputtering deposition are investigated for the applications as gate bus line in the TFt-LCD panel. And ITO thin film was deposited on AlNd, then the contact resistance was measured by Kelvin resistor. The deposited thin films show the decrease of resistivity and the increase of grain size after the RTA at $300^{\circ}C$ for 20 min. Moreover, the resistivity of AlNd does not show appreciable grain size dependence after RTA. It is concluded that the decrease of resistivity after RTA is due to the increase of grain size. The annealed AlNd is found to be hillock free. The etching profiles of AlNd was good and the minimun contact resistance was about $110\;{\mu\Omega}cm$. Calculation results reveal that the AlNd (2wt.%) thin film can be applicable to 25" SXGA class TFT-LCD panels.

• Proceedings of the Korean Vacuum Society Conference
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• 2010.02a
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• pp.263-263
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• 2010

투명도전막(indium tin oxide; ITO)은 투명하면서도 전기 전도도가 높기 때문에, 액정표시소자(LCD; Liquid Crystal Display), 전자발광소자(ELD; Electroluminescent Display) 및 전자 크로믹 소자(Electrochromic Display)를 포함하는 평판형 표시 소자(FPD; Flat Panel Display)와 태양전지 등에 이용되고 있다. 낮은 비저항과 높은 투과율의 ITO 박막은 $300^{\circ}C$ 이상의 고온에서 코팅해야 하는 것으로 알려져 있다. 그러나 최근 플라스틱과 같은 연성 소자가 전자부품에 널리 이용되면서 ITO를 저온에서 증착해야할 필요성이 대두되고 있다. 본 연구에서는 ITO를 플라스틱에 적용하기 위한 저온 코팅 공정 및 시편의 전 후처리공정을 개발하여 박막의 특성을 알아보고자 한다. 실험에 사용된 기판은 고투과율의 고분자(polyethylene terephthalate; PET) 필름이며 $5\;{\times}\;10\;cm^2$의 크기로 절단하여 알코올로 초음파 세척을 실시하였고, 진공 용기에 장입한 후 펄스전원을 이용하여 3분간 in-situ 청정을 실시하였다. ITO 코팅은 마그네트론 스퍼터링을 이용하였으며, 코팅시간, 전처리, 후처리, 기판온도, 산소유량 등 코팅 조건에 따른 박막의 특성을 조사하였다. ITO 박막의 코팅 조건에 따른 박막의 결정구조 분석은 x-선 회절(x-ray diffraction; XRD)을 이용하였고, 박막의 표면형상과 두께 보정 및 단면의 미세조직과 결정 성장 여부 등은 투과전자 현미경(transmission electron microscope; TEM)을 이용하여 분석하였다. 또한 ITO 박막의 면저항과 분광특성은 four-point Probe (CMP-100MP, Advanced Instrument Technology), spectrophotometer (UV-1601, SHIMADZU)를 이용하여 측정하였다. ITO 박막의 광학특성 분석 결과 전광선 투과율은 두께에 따라 변화 하였지만, 색차와 Haze 값은 증착 조건에 따라 큰 차이는 보이지 않았다. 그리고 박막의 결정화에 영향을 주는 가장 중요한 인자는 기판온도이지만, 기판온도를 높이지 못할 경우 비평형 마그네트론(unbalanced-magnetron; UBM)에 의해서 플라즈마 밀도를 높이는 방법으로 유사한 효과를 얻을 수 있음을 확인하였다.