• Proceedings of the Materials Research Society of Korea Conference
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• 2012.05a
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• pp.64.2-64.2
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• 2012

전자산업에서 소자를 제작하는 핵심공정으로써, 패턴을 형성하는 방식은 식각 마스크를 통해 이루어진다. 공정 순서는 원하는 물질을 증착한 후 사진공정 (photolithograpy)을 통하여 원하는 패턴의 감광제 식각마스크 (etch mask)를 형성하게 된다. 이후, 습식식각이나 건식식각을 통하여 물질의 불필요한 부분을 제거한 후 최종적으로 감광제 식각마스크를 제거하여 원하는 물질의 패턴을 얻게 된다. 최근에 소개된 잉크젯 프린팅 기술 (inkjet printing technology)은 나노 잉크를 이용하여 사진공정과 식각공정을 이용하지 않고, 직접 나노잉크를 분사하여 패턴을 형성하는 방법으로, 패터닝 공정을 단순화 시킬 수 있을 뿐만 아니라 각종 전자 산업의 환경오염물을 획기적으로 줄일 수 있는 친환경기술이다. 특히, OLED, O-TFT, RF-ID, PCB 분야 등 다양한 전자산업분야의 제조기술로서 응용하고자, 전도성 폴리머나 실버 (silver) 나노파티클 잉크를 이용한 전도성 라인 패터닝 (line patterning)에 관한 연구가 활발히 진행되고 있다. 본 강연에서는 친환경 생산공정기술 측면에서의 잉크젯기술을 분석하고, 기술의 구성요소, 응용분야, 기술 동향에 관해서 소개하고, 또한 현재 한국생산기술연구원에 진행하고 있는 잉크젯 프린팅 기술 기반의 인쇄전자 분야에 관한 내용을 소개한다.

• ETRI Journal
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• v.5 no.3
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• pp.39-47
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• 1983

수작업에 의한 보전관리방식은 고장신고에 의하여 수행되는 사후 관리방식으로서 가입자 회선의 급속한 증가에 따라 필요한 보전 인력 확충이 어렵고 보전 작업량의 예측이 힘들어 정확한 보전계획 수립이 불가능하다. 또한 고도로 숙련된 운용요원을 요구하는 수동식 시험대는 교환기종마다 상이하여 획일적인 보전관리가 이루어지지 않는다. 이러한 문제점을 해결하기 위하여 가입자 시설 집중보전 시스템 (SLMOS)을 개발하였다. SLMOS구성은 일정 지역별로 지역보전 센터를설치, 여러 전화국을 수용하는 형태로서, 가입자 고장신고 접수 및 수리시험 요원을 집중시켜 인력절감을 꾀하며 각종 보전업무의 전산화로 가입자 서어비스의 질적 향상 및 능률적인 보전관리를 도모한다. 가입자 고장신고는 집중화된 접수요원이 담당하며 전화번호만 key-in시키면 고장원인 및 수리약속 시간이 CRT화면에 나타나므로 가입자에게 정화한 정보를 제공한다. 지역보전 센터의 프린터에는 접수요원이 받은 고장신고 내용 및 심야에 실시된 예방시험의 결과가 출력되므로 통제석에서 이를 분석, 해당 수리 시험석으로 분배한다. 모든 요원의 작업내용은 고장기연 data base에 저장되므로 지역보전 센터 의 관리자는 원하는 각종 통계, 분석 자료를 출력시킬 수가 있어 보전업무의 효율적 운영을 할 수 있게된다. SLMOS의 software개발에 UNIX 0S를 사용함으로써 machine independence와 시스템의 융통성 및 Portability를 추구하고있으며 신고접수, 수리에 mask기법및 한글사용으로 용이하게 시스템을 사용할 수 있도록 하였다. 자동 선로시험 장치에 $\mu$-processor를 내장시켜 예방시험 기능의 추가와 자동 고장판정으로 운용요원의 기량에 의존하는 방식의 탈피를 시도하였다. 본 연구개발은 81년에 착수하여 84년에 완료할 예정이며 82년말 중앙전화국 시험실에서 연구소 computer와 on-line 방식으로 시험 운용을실시하였다. 83연도에 시스템기능을 보완 및 추가 개발하고 84년도에 현장 및 실용화 시험을거쳐 한국전기통신공사에 공급할 계획이다.

• Proceedings of the Korean Institute of Information and Commucation Sciences Conference
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• 2013.10a
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• pp.765-767
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• 2013

Modern societies need image processing technology as mobile phones, computers and multimedia etc. are supplied, and image signal processing is now applied in many fields. However, images are damaged by impulse noise from various sources; to restore the damaged images from impulse noise standard median filter has been used as a typical method, but it makes errors at edge area lowering image quality. Therefore, in this paper average filter algorithm, in which mask is processed with multiple partition to remove impulse noise, is proposed. Simulation showed that the proposed method is superior in noise removal property to the existing ones.

• Journal of the Korean Graphic Arts Communication Society
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• v.26 no.2
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• pp.55-64
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• 2008

We designed a UV-LED exposure system which has 365nm dominant wavelength due to the environment-friendly and economical maskless screen plate making. And the photoresist applied on the screen stretched was exposed without mask by beam projector with UV-LED light source. Then it was developed by air spray with $1.7\;kgf/cm^2$ of injection pressure. The pencil hardness and solvent resistance of curing photoresist film were excellent as those of conventional photoresist film and the maximum resolution of line image formed by maskless screen plate making. was $100{\mu}m$, so we could establish the possibility of environment-friendly maskless screen plate making technology. But the sharpness of the patterns were ${\pm}40{\mu}m$ since the exposure system for maskless plate making has weak light intensity and the diffusion of light.

• Journal of Korean Academy of Fundamentals of Nursing
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• v.5 no.2
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• pp.313-323
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• 1998

This study was a descriptive research on the level of self-care available to continous ambulatory peritoneal dialysis patients (hereinafter referred to as 'CAPD patient') related to the specific area of infection management. The method employed for the collection of data was a modified instrument of the self-care survey essentially based on Young Sook Choi's instrument. The relevant data was collected from september 1, 1996 to september 30, 1996. The subjects were provided with an open-ended question regarding the reasons behind why they did not seek self-care. The answers provided about self-care compliance were analyzed by SPSS for frequency, percentage, mean, t-test, ANOVA. Reasons for non-compliance were analyzed by content analysis. The results of the study were as follows : 1. The percentage of patients engaging in self-care were according to the following self performed tasks : preparation of dialysis : 30.58 points Dialysate exchange procedures : 49.40 points - Two bag type : 50.50 points - Spike type : 48.80 points - Neo type : 48.90 points Catheter exit site care : 25.13 points More specifically, in relation to the preparation of dialysis as referred to above, those patients engaging in self care was relatively high with respect to the cleaning of the dialysis before use and for the preservation of peritosol. However, in dialysate exchange procedures, data revealed that those patients engaging in self-care are relatively low with respect to putting on a mask during the performance of peritosol exchange. Similary in peritosol exchange procedure and catheter exit care, low levels of self-care performance were found in the area of putting on a mask during the peritosol exchange procedures and catheter line testing procedures, respectively. 2. In general characteristics, there appeared to be no distinction in self-care compliance among CAPD patients. 3. The main reasons for non-compliance were based in the following factor : intellectual, attitude, enviromental surrounding and physical. As a result of the foregoing finding, nurses should provide adequate assistance to promote self-care compliance by CAPD patients by checking the preparation of dialysis, dialysate exchange procedure, and catheter exit site care which recieved low point in this research.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.02a
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• pp.431-432
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• 2012

In the era of 20 nm scaled semiconductor volume manufacturing, Microelectronics Manufacturing Engineering Education is presented in this paper. The purpose of microelectronic engineering education is to educate engineers to work in the semiconductor industry; it is therefore should be considered even before than technology development. Three Microelectronics Manufacturing Engineering related courses are introduced, and how undergraduate students acquired hands-on experience on Microelectronics fabrication and manufacturing. Conventionally employed wire bonding was recognized as not only an additional parasitic source in high-frequency mobile applications due to the increased inductance caused from the wiring loop, but also a huddle for minimizing IC packaging footprint. To alleviate the concerns, chip bumping technologies such as flip chip bumping and pillar bumping have been suggested as promising chip assembly methods to provide high-density interconnects and lower signal propagation delay [1,2]. Aluminum as metal interconnecting material over the decades in integrated circuits (ICs) manufacturing has been rapidly replaced with copper in majority IC products. A single copper metal layer with various test patterns of lines and vias and $400{\mu}m$ by $400{\mu}m$ interconnected pads are formed. Mask M1 allows metal interconnection patterns on 4" wafers with AZ1512 positive tone photoresist, and Cu/TiN/Ti layers are wet etched in two steps. We employed WPR, a thick patternable negative photoresist, manufactured by JSR Corp., which is specifically developed as dielectric material for multi- chip packaging (MCP) and package-on-package (PoP). Spin-coating at 1,000 rpm, i-line UV exposure, and 1 hour curing at $110^{\circ}C$ allows about $25{\mu}m$ thick passivation layer before performing wafer level soldering. Conventional Si3N4 passivation between Cu and WPR layer using plasma CVD can be an optional. To practice the board level flip chip assembly, individual students draw their own fan-outs of 40 rectangle pads using Eagle CAD, a free PCB artwork EDA. Individuals then transfer the test circuitry on a blank CCFL board followed by Cu etching and solder mask processes. Negative dry film resist (DFR), Accimage$^{(R)}$, manufactured by Kolon Industries, Inc., was used for solder resist for ball grid array (BGA). We demonstrated how Microelectronics Manufacturing Engineering education has been performed by presenting brief intermediate by-product from undergraduate and graduate students. Microelectronics Manufacturing Engineering, once again, is to educating engineers to actively work in the area of semiconductor manufacturing. Through one semester senior level hands-on laboratory course, participating students will have clearer understanding on microelectronics manufacturing and realized the importance of manufacturing yield in practice.

• Transactions of the Korean Society of Mechanical Engineers A
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• v.34 no.12
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• pp.1877-1883
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• 2010

We examined the mechanism of generation of higher harmonics by theoretically analyzing the frequency characteristics of a narrow-band surface wave generated by a laser beam with line-arrayed slit masks. We experimentally analyzed the effects of slit opening width and laser intensity on the acoustic nonlinearity of aluminum 6061-T6 alloy by using single-slit and line-arrayed slit masks. The magnitude of the harmonic wave depended on the slit opening width. In our experiment, we generated a 1.75-MHz surface wave by using an arrayed slit with intervals of 1.67 mm. The magnitude of the second harmonic component decreased about by 80% when the slit opening width was increased from 0.5 mm to 1.0 mm. In addition, the relationship between the magnitudes of the fundamental and the second harmonic wave showed good linearity, which agreed well with the typical behavior of acoustic nonlinearity.

• The KIPS Transactions:PartB
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• v.9B no.4
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• pp.481-490
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• 2002

Off-line handwritten character recognition is in difficulty of incomplete preprocessing because it has not dynamic information has various handwriting, extreme overlap of the consonant and vowel and many error image of stroke. Consequently off-line handwritten character recognition needs to study about preprocessing of various methods such as binarization and thinning. This paper considers running time of watershed algorithm and the quality of resulting image as preprocessing for off-line handwritten Korean character recognition. So it proposes application of effective watershed algorithm for segmentation of character region and background region in gray level character image and segmentation function for binarization by extracted watershed image. Besides it proposes thinning methods that effectively extracts skeleton through conditional test mask considering routing time and quality of skeleton, estimates efficiency of existing methods and this paper's methods as running time and quality. Average execution time on the previous method was 2.16 second and on this paper method was 1.72 second. We prove that this paper's method removed noise effectively with overlap stroke as compared with the previous method.

• Journal of Advanced Information Technology and Convergence
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• v.9 no.1
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• pp.115-125
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• 2019

In this paper, the image is received from the camera and the lane is sensed. There are various ways to detect lanes. Generally, the method of detecting edges uses a lot of the Sobel edge detection and the Canny edge detection. The minimum use of multiplication and division is used when designing for the hardware configuration. The images are tested using a black box image mounted on the vehicle. Because the top of the image of the used the black box is mostly background, the calculation process is excluded. Also, to speed up, YCbCr is calculated from the image and only the data for the desired color, white and yellow lane, is obtained to detect the lane. The median filter is used to remove noise from images. Intermediate filters excel at noise rejection, but they generally take a long time to compare all values. In this paper, by using addition, the time can be shortened by obtaining and using the result value of the median filter. In case of the Sobel edge detection, the speed is faster and noise sensitive compared to the Canny edge detection. These shortcomings are constructed using complementary algorithms. It also organizes and processes data into parallel processing pipelines. To reduce the size of memory, the system does not use memory to store all data at each step, but stores it using four line buffers. Three line buffers perform mask operations, and one line buffer stores new data at the same time as the operation. Through this work, memory can use six times faster the processing speed and about 33% greater quantity than other methods presented in this paper. The target operating frequency is designed so that the system operates at 50MHz. It is possible to use 2157fps for the images of 640by360 size based on the target operating frequency, 540fps for the HD images and 240fps for the Full HD images, which can be used for most images with 30fps as well as 60fps for the images with 60fps. The maximum operating frequency can be used for larger amounts of the frame processing.

• Journal of the Institute of Electronics Engineers of Korea TC
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• v.43 no.2 s.344
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• pp.81-87
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• 2006

A small size broadband microstrip patch antenna with small ground plane has been fabricated using MEMS. Multiple layer substrates we used to realize small size and broadband characteristics. The microstrip patch is divided into 4 pieces and each patch is connected to each other using a metal microstrip line. The fabrication please process is simple and only one mask is needed. Two types of microtrip antennas are fabrication Type A is the microstrip antenna with metal lines and type B is the microstrip antenna without metal lines. The size of proposed microstip antenna is $8{\times}12{\times}2mm^3$ and the experimental results show that the antenna type A and type B have the bandwidth of 420MHz at 5.3 GHz and 480MHz at 5.66 GHz, respectively