• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.18 no.10
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• pp.941-944
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• 2005

In this experiment, OLEDs(Organic Light Emitting Diodes) was fabricated to confirm effect of Plasma treatment which increase the hole injection characteristic from anode. Device structure was $ITO/2-TNATA/{\alpha}-NPD/DPVBi/BAlq/Alq_3/Al:Li$. We used DPVBi (4, 4 - Bis (2,2-diphenylethen-1-yls) - Biphenyl) as a blue emitting material. To optimize the process condition of plasma treatment, we used 2 gases of the oxygen and nitrogen gas under 120 mTorr with 100 W, 200 W, and 400 W plasma power. The current efficiency of $N_2$ plasma is more efficient than that of $O_2$ plasma. At $1000 cd/m^2$, we obtained the maximum current efficiency of 6.45 cd/A using $N_2$ gas with 200 W plasma power.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2007.06a
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• pp.74-75
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• 2007

We report on the characteristics of organic light-emitting diodes with Al cathode deposited by specially designed twin target sputter(TTS) system. It was found that the Al cathode films grown by TTS system were amorphous structure with nanocrystallines due to low substrate temperature during sputtering process. Effective confinement of high-density plasma between two Al targets lead to low temperature sputtering process on organic layer. Moreover, organic light-emitting diodes with Al cathode deposited by TTS system exhibited low leakage current density of $4{\times}10^{-6}\;mA/cm2$ at -6 V indicating plasma damage due to bombardment of energetic particles such as ions and $\gamma$-electrons was effectively restricted in the ITS system. Sputtering method using ITS system is expected to be applied in organic electronics and flexible displays due to its low temperature and plasma damage free deposition process.

• 한국정보디스플레이학회:학술대회논문집
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• 2003.07a
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• pp.889-892
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• 2003

Effects of $N_{2}$ plasma treatment of the Al bottom cathode on the characteristics of top emission inverted organic light emitting diodes (TEIOLEDs) were studied. TEIOLEDs were fabricated by depositing an Al bottom cathode, a tris-(8-hydroxyquinoline) aluminum $(Alq_{3})$ emitting layer, an N,N'-diphenyl-N,N'-bis(3-methylphenyl)-1,1'-diphenyl-4,4'diamine (TPD) hole transport layer, and an indium tin oxide (ITO) top anode sequentially. The Al bottom cathode layer was subjected to $N_{2}$ plasma treatment before deposition of the $Alq_{3}$ layer. X-ray photoelectron spectroscopy suggested that the existence of and the amount of $AIN_x$ between the $Alq_{3}$ emitting layer and the Al bottom cathode significantly affect the characteristics of TEIOLEDs. The maximum external quantum efficiency of the TEIOLED with an Ai bottom cathode subjected to $N_{2}$ plasma treatment for 30 s was about twice as high as that of the TEIOLED with an untreated Al bottom cathode.

• Journal of the Semiconductor & Display Technology
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• v.21 no.2
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• pp.7-10
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• 2022

A functional polyethylene terephthalate substrate to increase light extraction efficiency of organic light-emitting diodes is studied. We formed nano-structured PET surfaces by controlling the power, gas, and exposure time of the linear ion-beam. The haze of the polyethylene terephthalate can be controlled from 0.2% to 76.0% by changing the peak-to-valley roughness of nano structure by adjusting the exposure cycle. The treated polyethylene terephthalate shows average haze of 76.0%, average total transmittance of 86.6%. The functional PET increases the current efficiency of organic light-emitting diodes by 47% compared to that of organic light-emitting diode on bare polyethylene terephthalate. In addition to polyethylene terephthalate with light extraction performance, by conducting additional research on the development of functional PET with anti-reflection and barrier performance, it will be possible to develop flexible substrates suitable for organic light-emitting diodes lighting and transparent flexible displays.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.23 no.1
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• pp.18-23
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• 2010

We demonstrated that the solution processed organic light-emitting diodes (OLEDs) have the high efficiency with pre-treated indium-tin-oxide (ITO). ITO surface was pre-treated with four methods and compared each other. The pre-treatment of ITO surface improves the chemical and physical characteristics of ITO such as the surface roughness, adhesion property, and the hole injection ability. These properties were analyzed by the contact angle, atomic force microscope (AFM) image, and the current flow character in device. As a results, the device with ITO pre-treated by $O_2$ plasma shows the current efficiency of 5.93 cd/A, which is 1.5 times the device without pre-treatment.

• The Journal of the Korea institute of electronic communication sciences
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• v.7 no.6
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• pp.1343-1351
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• 2012

In this study, trends for five research areas of LED(Light Emitting Diode), OLED(Organic Light Emitting Diode), LCD(Liquid Crystal Display), PDP(Plasma Display Panel) and CRT(Cathode Ray Tube) are investigated using bibliometric analysis. The papers and patents citation data were extracted from Scopus and USPTO databases, respectively. We could figure out the research trends by the number of publications and citation information. We prospect the current interests and future trends by investigating the development process of the 5 research areas as function of time.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2002.05c
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• pp.177-180
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• 2002

The purpose of this thesis is to develope buffer materials by the plasma polymerization method. In this article the buffer materials, plasma poly thiophene(PPTh) is used to study the interface of eter/organic in organic light emitting diodes(OLED). The interface of meter/organic materials is the important and critical objectives in development of OLED. The hole transport layer was N,N'-dipheneyl-N, N'bis-(3-methypheneyl)-1,1'dipheneyl-4,4'-diamine (TPD); the host material of mission layer was 8-tris-hydroxyquinoline aluminium (Alq3). When PPTh was inserted between ITO and TPD, emission efficiency increased.

• JSTS:Journal of Semiconductor Technology and Science
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• v.5 no.2
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• pp.77-82
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• 2005

We compare electrical and optical properties of organic light emitting diodes (OLEDs) using rhodium-oxide-coated indium-tin-oxide ($O_2$-Rh/ITO) to that using $O_2$-plasma-treated ITO (ITO) anodes. The turn-on voltage decreased from 7 V to 5 V and luminance value increased when the $O_2$ plasma treated Rh layer was deposited on ITO. Synchrotron radiation photoelectron spectroscopy results showed the dipole energies of both ITO and $O_2$-Rh/ITO were same with each other, - 0.3 eV, meaning the formation of same amount of interface dipole. The secondary electron emission spectra revealed that the work function of $O_2$-Rh/ITO is higher hy 0.2 eV than that of ITO, resulting in the decrease of the tum-on voltage via reduction ofhole injection barrier.

• The Transactions of the Korean Institute of Electrical Engineers C
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• v.54 no.1
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• pp.8-12
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• 2005

Indium tin oxide(ITO) surface treated by Oxygen plasma has been in situ analyzed using XPS(X-ray Photoelectron Spectroscopy) and EDS(Energy Dispersive Spectroscopy), to investigate the relations between the properties of the ITO surface and the properties of OLED(Organic Light Emitting Diode). We measured electrical resistivity using Four-Point-Probe and calculated sheet resistance, and ITO surface roughness was measured by AFM(Atomic Force Microscope). We fabricated OLED using substrate that was treated optimum ITO surface. The plasma treatment of the ITO surface lowered the operating voltage of the OLED. We have obtained an improvement of luminance and decrease of turn-on voltage.

• 한국정보디스플레이학회:학술대회논문집
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• 2008.10a
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• pp.543-544
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• 2008

In the fabrication of inverted top emission organic light emitting diodes (ITOLEDs), the organic layers are damaged by high-energy plasma sputtering process for transparent top anode. In this study, the plasma process induced damages on metal oxide hole injection layers (HILs) including $WO_3$, $MoO_3$, and $V_2O_5$ as buffer layer are examined. With the result of IV characteristic of hole-only devices, we propose that $MoO_3$ and $V_2O_5$ are stable materials against plasma sputtering process.