• 제목/요약/키워드: Laser Patterning

검색결과 187건 처리시간 0.034초

골육세포 성장 촉진을 위한 스마트 써피스 텍스처링 임플란트 스템 제작 기술 (Smart Surface Texturing Implant Stem for Enhancement of Osteoblast Cell Biocompatibility)

  • 김경한;이제훈;박종권;진석원;최완해;이홍진
    • 한국정밀공학회지
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    • 제31권5호
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    • pp.375-380
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    • 2014
  • To enhance biocompatibility between the orthopedic implant stem and obsteoblast cells, bone-forming cells, micro-size holes are patterned in Ti plate surface. Initially, the house built laser power stabilization system is applied to the laser micro patterning machine to convince repeatable result. Various pulse widths are irradiated Ti plate and relationship between diameters of patterned holes and pulsed width is derived. Effect of multi pulse is observed and optimal pulse number is considered to avoid heat affected zone. After MG-63 osbeoblast cells are cultured, micro patterned Ti plates are compared with control plates. In SEM image, cells are well aligned and aggregation is observed in both 60, and $100{\mu}m$ patterned plates. Finally, free form surface stem model is prepared to test micro hole patterning.

Laser Assisted Lift-Off Process as a Organic Patterning Methodology for Organic Thin-Film Transistors Fabrication

  • Kim, Sung-Jin;Ahn, Taek;Suh, Min-Chul;Mo, Yeon-Gon;Chung, Ho-Kyoon;Bae, Jin-Hyuk;Lee, Sin-Doo
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2006년도 6th International Meeting on Information Display
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    • pp.1154-1157
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    • 2006
  • Organic thin-film transistors (OTFTs) based on a semiconducting polymer have been fabricated using an organic patterning methodology. Laser assisted lift-off (LALO) technique, ablating selectively the hydrophobic layer by an excimer laser, was used for producing a semiconducting polymer channel in the OTFT with high resolution. The selective wettability of a semiconducting polymer, poly (9-9-dioctylfluorene-co-bithiophene) (F8T2), dissolved in a polar solvent was found to define precisely the pattering resolution of the active channel. It is demonstrated that in the F8T2 TFTs fabricated using the LALO technique and is applicable for the larger area display.

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High Efficiency AMOLED using Hybrid of Small Molecule and Polymer Materials Patterned by Laser Transfer

  • Chin, Byung-Doo;Suh, Min-Chul;Kim, Mu-Hyun;Kang, Tae-Min;Yang, Nam-Choul;Song, Myung-Won;Lee, Seong-Taek;Kwon, Jang-Hyuk;Chung, Ho-Kyoon;Wolk, Martin B.;Bellmann, Erika;Baetzold, John P.
    • Journal of Information Display
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    • 제4권3호
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    • pp.1-5
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    • 2003
  • Laser-Induced Thermal Imaging (LITI) is a laser addressed patterning process and has unique advantages such as high-resolution patterning with over all position accuracy of the imaged stripes of within 2.5 micrometer and scalability to large-size mother glass. This accuracy is accomplished by real-time error correction and a high-resolution stage control system that includes laser interferometers. Here the new concept of hybrid system that complement the merits of small molecule and polymer to be used as an OLED; our system can realize easy processing of light emitting polymers and high luminance efficiency of small molecules. LITI process enables the stripes to be patlerned with excellent thickness uniformity and multi-stacking of various functional layers without having to use any type of fine metal shadow mask. In this study, we report a full-color hybrid OLED using the multi-layered structure consisting of small molecules and polymers.

Patterning of the ITO Electrode of AC PDP using $Nd:YVO_4$ Laser

  • Kim, Kwang-Ho;Ahn, Min-Hyung;Kwon, Sang-Jik
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2007년도 7th International Meeting on Information Display 제7권2호
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    • pp.1368-1371
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    • 2007
  • Laser-ablated ITO patterns showed the formation of shoulders at the edge of the ITO lines and a ripple-like structure of the etched bottom. When the laser ablation was applied in the fabrication of PDP panel, the laser-ablated ITO patterns showed a higher sustaining voltage than that of chemically wet-etched ITO.

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레이저 빔 응용 기술 (Laser Beam Application and Technology in Micro Machining)

  • 윤경구;이성국;김재구;신보성;최두선;황경현;박진용
    • 한국정밀공학회지
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    • 제17권7호
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    • pp.27-35
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    • 2000
  • 재료가공분야에의 레이저의 적용은 1960년대 후반부터 시작되었으며, 고출력 CO$_2$ 와 Nd:YAG 레이저가 많은 산업분야에서 보편화될 정도로 발전하여 왔다. 재료가공에서의 레이저의 적용분야는 금속의 절단, 용접 및 드릴링, 세라익의 스크라이빙, 플라스틱과 복합재의 절단 및 여러 가지 재료의 마킹 등을 포함한다. 이와 같은 모든 응용에서 공통적인 것이 레이저 조사에 의해 재료를 용융, 증발시키는 열적 메카니즘이다.(중략)

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Holographic femtosecond laser processing

  • Hayasaki, Yoshio
    • 한국광학회:학술대회논문집
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    • 한국광학회 2008년도 하계학술발표회 논문집
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    • pp.61-63
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    • 2008
  • Parallel femtosecond laser processing using a computer-generated hologram (CGH) displayed on a liquid crystal spatial light modulator (LCSLM) is demonstrated. The use of the LCSLM enables to perform an arbitrary and variable patterning. This holographic femtosecond laser processing has advantages of high throughput and high light-use efficiency. A critical issue is to precisely control the intensities of the diffraction peaks of the CGH. We demonstrate some methods for the control of the diffraction peaks. We also demonstrate the laser processing with two-dimensional and three-dimensional parallelism.

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UV레이저를 이용한 Cr 박막의 어블레이션 (The UV Laser Ablation of Cr film on Glass Substrate)

  • 윤경구;이성국;김재구;최두선;황경현;정재경;장원석;나석주
    • 한국정밀공학회지
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    • 제17권8호
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    • pp.134-139
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    • 2000
  • In order to understand the removal mechanism and seek the optimal conditions. KrF excimer laser ablation of Cr films on glass substrates is investigated. The surface morphology of the laser-irradiated spot is examined by SEM. The measured single-shot ablation rate is found to be about two times the result of numerical analysis based on a surface vaporization model and heat conduction theory. Surface morphology examination indicates that the Cr film is removed by the sequence of melting-surface vaporization-,melt expulsion by plasma recoil and that the outmost ripple of the diffraction pattern gives a strong effect on the morphology of molten Cr during the melting and vaporization processes. To seek the optimal process parameters for micro patterning morphological investigation is carried out experimentally on samples having different chromium film thicknesses. Optimal processing conditions are determined to enhance the accuracy and quality of thin film removal for micro patterning.

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