• Journal of the Korean Society for Precision Engineering
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• v.21 no.7
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• pp.30-36
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• 2004

Recently, the lead-time of a product is to be shortened in order to satisfy consumer's demand. It is thus important to reduce the manufacturing time and the cost of 3D-shaped microstructures. Micro-Electro-Mechanical Systems (MEMS) and devices are usually fabricated by lithography-based methods. Above method is not flexible for the rapid manufacture of 3D-shaped microstructures because it depends on work's experiences and requires excessive cost and time for making many masks. In this paper, the effective laser micrornachining is developed to fabricate UV sensitive polymer microstructures using laser ablation. The proposed process, named by laser microRP, is a very useful method on rapid manufacturing for 3D-shaped microstructures.

• Journal of the Korean Society for Precision Engineering
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• v.21 no.2
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• pp.210-217
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• 2004

In this study, a new process, named as nano replication printing(nRP) process, is developed for printing any figure in the range of several micrometers by using voxel matrix scanning scheme. In this newly developed process, a femto-second laser is scanned on a photosensitive monomer resin in order to induce polymerization of the liquid resin according to a voxel matrix which is transformed from bitmap format file. After the polymerization, a droplet of ethanol is dropt to remove the unnecessary remaining liquid resin and then the polymerized figures with nano-scaled precision are only remaining on the glass plate. By the nRP process, any figure file of bitmap format could be reproduced as nano-scaled precision replication in the range of several micrometers. Also, nano/micro-scaled patterns for an extremely wide range of applications would become a technologically feasible reality. Some of figures with nano-scaled precision were printed in scaled replication as examples to prove the usefulness of this study.

• Journal of the Korea Academia-Industrial cooperation Society
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• v.5 no.2
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• pp.186-190
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• 2004

By this time, a mold with nano size pattern was produced using a fabrication of X-ray lithography method and in a m icro size's case it was produced using fabrication of Deep UV lithography. In this paper, we produced mold with 400 $\mu{m}$depth pattern using a new technology of SLS(Selective Laser Sintering) Rapid Prototyping method. In addition to enhance strength and thermal stability, we produced Ni structure with a thickness of 300 $\mu{m}$ on a surface of mold using electro forming method.

• Polymer(Korea)
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• v.28 no.4
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• pp.305-313
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• 2004

A vacuum pressure-difference technique for making a nano-precision replica is investigated for various applications. Master patterns for replication were fabricated using a nano-replication printing (nRP) process. In the nRP process, any picture and pattern can be replicated from a bitmap figure file in the range of several micrometers with resolution of 200nm. A liquid-state monomer is solidified by two-photon absorption (TPA) induced by a femto-second laser according to a voxel matrix scanning. After polymerization, the remaining monomers were removed simply by using ethanol droplets. And then, a gold metal layer of about 30nm thickness was deposited on the fabricated master patterns prior to polydimethylsiloxane molding for preventing bonding between the master and the polydimethylsiloxane mold. A few gold particles attached on the polydimethylsiloxane stamp during detaching process were removed by a gold selecting etchant. After fabricating the polydimethylsiloxane mold, a nano-precision polydimethylsiloxane replica was reproduced. More precise replica was produced by the vacuum pressure-difference technique that is proposed in this paper. Through this study, direct patterning on a glass plate, replicating a polydimethylsiloxane mold, and reproducing polydimethylsiloxane replica are demonstrated with a vacuum pressure-difference technique for various micro/nano-applications.

• Proceedings of the KAIS Fall Conference
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• 2004.06a
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• pp.267-269
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• 2004

본 연구에서는 일반적인 미세구조물 제작공정인 lithography 공정을 이용하지 않고 SLS(Selective Laser sintering)형 RP(Rapid Prototyping system)을 이용하여 패턴의 깊이가 400$\mu$m인 미세구조물을 제작하였다. 제작 공정변수 중 재료의 상태가 new powder 이고 배치각이 $0^{\circ}$ 일 때 패턴의 깊이, 선폭과 표면조도가 가장 잘 구현되었다.