• Journal of the korean society of oceanography
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• v.37 no.3
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• pp.196-200
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• 2002

The time variation in the Kuroshio is studied by use of nine observed distances of the main Kuroshio axis from the Japanese coast. The observed distances over 1975 - 1995 are estimated from the Prompt Report of Oceanographic Conditions published by Hydrographic Department of the Maritime Safety Agency of Japan. It is shown that large sea level difference between Naze and Nishinoomote, which represents the volume transport of the southern inflow south of Kyushu, coincides with larger distance of the Kuroshio in the upstream area from off Kyushu to off eastern Kii Peninsula and smaller distance in the downstream area from off Omae-zaki to off Boso Peninsula. In contrast, large sea level difference between Nishinoomote and Aburatsu, which represents the volume transport of northern inflow south of Kyushu, corresponds to smaller distance in the upstream area and larger distance in the downstream area. Path dynamics of the Kuroshio is discussed with reference to the variation in Volume transport south of Kyushu.

• The Transactions of the Korea Information Processing Society
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• v.6 no.5
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• pp.1351-1361
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• 1999

The wide spread of multimedia system demands a large area viewing display device which can inform a message to many people in open area. This paper is about the design of a large area viewing LED panel control system. The control system runs on 16 bit microprocessor MC68EC000 and has following functions: 16 line clock and time, 2 channel priority interrupt, 2 channel direct memory access, 2 channel 12 bit clock and timer, 2 channel infrared remocon receiver, 2 channel RS-232C with 16 byte FIFO, IBM PC/AT compatible keyboard interface, ISA bus, battery backuped real time clock, battery backuped 256 byte SRAM and watch dog timer. The core circuits are implemented to ASIC, considering lower cost, higher reliability, higher performance, smaller dimension, and lower power consumption. This is verified by simulation and fabricated in 0.6 um CMOS SOG processes. The total gate count is 39,083 and the clock frequency is 48 MGz. The fabricated ASIC is mounted on test board.

• Journal of the Korean Society of Environmental Restoration Technology
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• v.6 no.3
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• pp.35-45
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• 2003

This study was performed to suggest growth status data of the large old trees as the natural monuments of Korea. Field investigation of 70 large old trees as the natural monuments of Korea was carried out in Seoul, Inchon, Kyungki, Chungbuk, Chungnam, Chonbuk, Chonnam. The main field of this study is classified into the growth condition, soil state and management situation. The results of this study are below : The age distribution of the large old trees as the natural monuments of Korea is as follows : above l00years in 5.9%, above 200years in 8.9%, above 300 years in 11.8%, above 400 years in 16.2%, above 500 years in 16.2% and above 600years in 41.1%. Location types of the large old trees as the natural monuments of Korea are found in 11 types; the types are hill side(22.9%), historical monument area(15.7%), field(l4.3%) and building area(12.9%), etc. Also, growth type of the trees is individually placed. In the aspect of soil environment, the acidification of soils has been appearing in all surveyed areas, and the soil of Seoul area has much acidum phosphoricum because of excessive fertilizer. Finally, in management situation. major factors inhibiting growth of the large old trees as the natural monuments of Korea are soil covering of protruded root above ground, soil hardening by human, embankments, small area that has been surrounded fence. Continuous monitoring and accumulation of status data are necessary to preserve the large old trees as the natural monuments of Korea.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2008.06a
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• pp.119-120
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• 2008

• 한국방재학회:학술대회논문집
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• 2007.02a
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• pp.231-237
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• 2007

To monitor process of vegetation rehabilitation at the damaged area after large-fire is required a lot of manpowers and budgets. However the analysis of vegetation recovery using satellite imagery can be obtaining rapid and objective result remotely in the large damaged area. Space and airbone sensors have been used to map area burned, assess characteristics of active fires, and characterize post-fire ecological effects. Burn severity incorporates both short- and long-term post-fire effects on the local and regional environment. Burn severity is defined by the degree to which an ecosystem has changed owing to the fire. To classify fire damaged area and analyze burn severity of Samcheok fire area occurred in 2000, Cheongyang fire 2002, and Yangyang fire 2005 was utilized Landsat TM and ETM+ imagery. Therefore the objective of the present paper is to quantitatively classify fire damaged area and analyze burn severity using normalized burn index(NBR) of pre- and post-fire's Landsat satellite imagery.

• Proceedings of the Korean Vacuum Society Conference
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• 2011.08a
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• pp.148-148
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• 2011

Recently, there have been many research activities to develop the large-area plasma source, which is able to generate the high-density plasma with relatively good uniformity, for the plasma processing in the thin-film solar cell and display panel industries. The large-area CCP sources have been applied to the PECVD process as well as the etching. Especially, the PECVD processes for the depositions of various films such as a-Si:H, ${\mu}c$-Si:H, Si3N4, and SiO2 take a significant portion of processes. In order to achieve higher deposition rate (DR), good uniformity in large-area reactor, and good film quality (low defect density, high film strength, etc.), the application of VHF (>40 MHz) CCP is indispensible. However, the electromagnetic wave effect in the VHF CCP becomes an issue to resolve for the achievement of good uniformity of plasma and film. Here, we propose a new electrode as part of a method to resolve the standing wave effect in the large-area VHF CCP. The electrode is split up a series of strip-type electrodes and the strip-type electrodes and the ground ones are arranged by turns. The standing wave effect in the longitudinal direction of the strip-type electrode is reduced by using the multi-feeding method of VHF power and the uniformity in the transverse direction of the electrodes is achieved by controlling the gas flow and the gap length between the powered electrodes and the substrate. Also, we provide the process results for the growths of the a-Si:H and the ${\mu}c$-Si:H films. The high DR (2.4 nm/s for a-Si:H film and 1.5 nm/s for the ${\mu}c$-Si:H film), the controllable crystallinity (~70%) for the ${\mu}c$-Si:H film, and the relatively good uniformity (1% for a-Si:H film and 7% for the ${\mu}c$-Si:H film) can be obtained at the high frequency of 40 MHz in the large-area discharge (280 mm${\times}$540 mm). Finally, we will discuss the issues in expanding the multi-electrode to the 8G class large-area plasma processing (2.2 m${\times}$2.4 m) and in improving the process efficiency.

• Journal of Powder Materials
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• v.20 no.4
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• pp.297-301
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• 2013

Mirror surface machining for large area flattening in the display field has a problem such as a tool wear and a increase in machining time due to large area machining. It should be studied to decrease machining time and tool wear. In this paper, multi-tool machining method using a PCD tool and a SCD tool was applied in order to decrease machining time and tool wear. Machining characteristics (cutting force, machined surface and surface roughness) of PCD tool and SCD tool were evaluated in order to apply PCD tool to flattening machining. Based on basic experiments, the PCD/SCD multi-tool method and the SCD single-tool method were compared through surface roughness and machining time for appllying large area mold machining.

• Proceedings of the Korean Vacuum Society Conference
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• 2014.02a
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• pp.234.1-234.1
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• 2014

Many studies have been investigated on high density plasma source (Electron Cyclotron Resonance[ECR], Inductively Coupled Plasma[ICP], Helicon plasma) for large area source after It is announced that productivity of plasma process depends on plasma density. Among them, Some researchers have been studied on multiple sources In this study, we attempted to determine the possibility of multiple inductively coupled plasma (ICP), and helicon plasma sources for large-area processes. Experiments were performed with the one and two coils to measure plasma and electrical parameters, and a circuit simulation was performed to measure the current at each coil in the 2-coil experiment. Based on the result, we could determine the possibility of multiple ICP sources due to a direct change of impedance due to current and saturation of impedance due to the skin-depth effect. However, a helicon plasma source is difficult to adapt to the multiple sources due to the consistent change of real impedance due to mode transition and the low uniformity of the B-field confinement. As a result, it is expected that ICP can be adapted to multiple source for large-area processes.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2006.05a
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• pp.571-572
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• 2006

RTP (rapid thermal pressing), one of micro-pattern replication techniques like hot embossing, is focused on achieving shorter cycle time. DFSS(Design for Six Sigma) has been applied in order to enhance the completeness of the development process for RTP system. According to DIDOV roadmap, we derived design concepts and subsequently decided the main performances, design factors, and components for RTP system. In the design process of RTP system using finite element analysis, it was realized that its structural characteristics affect large area replicability. Optimizing structural design factors, based on CAE, it was checked out that its large area replicability could be improved in a virtual test. Finally, we have a plan to validate the large area replicability of the developed RTP system, by performing micro-pattern replication tests with polymeric sheets.

• Transactions of the Society of Information Storage Systems
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• v.1 no.2
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• pp.182-187
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• 2005

A large area micro mirror is an optical element that functions as changing an optical path by reflection in integrated optical system. We fabricated the large area silicon mirror by anisotropic etching using MEMS for implementation of integrated optical pickup. In this work, we report the optimum conditions to better fabricate and design, greatly improve mirror surface quality. To obtain mirror surface of $45^{\circ},\;9.74^{\circ}$ off-axis silicon wafer from (100) plane was used in etching condition of $80^{\circ}C$ with 40wt.% KOH solution. After wet etching, polishing process by MR fluid was applied to mirror surface for reduction of roughness. In the next step, after polymer coating on the polished Si wafer, the Si mirror was fabricated by UV curing using a trapezoid bar-type way structure. Finally, we obtained peak to valley roughness about 50 nm in large area of $mm^2$ and it is applicable to optical pickup using blu-ray wavelength as well as infrared wavelength.