• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2006년도 6th International Meeting on Information Display
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• pp.112-116
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• 2006

In this presentation we will describe two core elements, which combination gives a new approach to layout verification; they are a computational algorithm for modeling of photolithographical processes and a method for physical layout verification that uses output contours of that algorithm. Utilization of this approach allows to improve the quality of LCOS/AM OLED backplanes physical verification, because it considers discrepancies between mask features and printed contours on a wafer.