• 한국정보디스플레이학회:학술대회논문집
• /
• 2006.08a
• /
• pp.112-116
• /
• 2006

In this presentation we will describe two core elements, which combination gives a new approach to layout verification; they are a computational algorithm for modeling of photolithographical processes and a method for physical layout verification that uses output contours of that algorithm. Utilization of this approach allows to improve the quality of LCOS/AM OLED backplanes physical verification, because it considers discrepancies between mask features and printed contours on a wafer.