• Title/Summary/Keyword: LCD 유리기판

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Comparison of particle removal efficiency between the physical cleaning methods in the fabrication of liquid crystal displays (LCD 제조공정에서 물리적 세정법의 미립자 제거효율 비교 연구)

  • Park, Chang-Beom;Yi, Seung-Jun;Chang, In-Soung
    • Journal of the Korea Academia-Industrial cooperation Society
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    • v.11 no.3
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    • pp.795-801
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    • 2010
  • As the fabrication technology of LCDs (Liquid Crystal Displays) advances, the size of mother glass substrates is getting larger, and the fabrication process is becoming finer. Accordingly, the importance of cleaning processes grows in the fabrication process of LCDs. In this study, we have compared and evaluated the particle removal efficiency for three different methods of physical cleaning, which are brush, bubble jet, and aqua/air cleaning. Using the seventh generation glass substrate, the particle removal efficiency has been investigated by changing operation conditions such as a flow rate of deionized water, pressure, contact depth between a brush bristle and a glass substrate, and so forth. In the case of brush cleaning, the cleaning efficiency barely changes after a critical point when the contact depth is varied. While the cleaning efficiency of bubble jet cleaning is almost independent of pressure, that of aqua/air cleaning is affected by pressure up to a critical point, but is not changed after it. We note the brush cleaning is the most effective among the three cleaning methods under our experimental conditions.

A Study on the Polishing Characteristics of LCD Glass (LCD 유리기판 폴리싱 가공특성에 관한 연구)

  • Lee, Sang-Min;Lee, Choong-Seok;Chae, Seung-Su;Kim, Taeck-Su;Park, Hwi-Keun;Lee, Jong-Chan
    • Journal of the Korean Society of Manufacturing Process Engineers
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    • v.8 no.1
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    • pp.77-82
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    • 2009
  • This paper reports a kinematic analysis and experimental results for the polishing process of G7 LCD glass. A kinematic analysis for the relative motion of the upper plate and lower plate has been done and computer simulation has been programmed. A series of polishing experiments has also been carried out and compared with analytical data. The experimental results agreed well with analytical ones. The experimental results indicate that the polishing removal is proportional to the relative speed and pressure.

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기류방출형 정전기제거장치의 개발에 관한 연구

  • 이동훈;박훈규
    • Proceedings of the Korean Institute of Industrial Safety Conference
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    • 2003.05a
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    • pp.167-172
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    • 2003
  • 액정판넬(LCD) 및 반도체 제조공정에 있어서 정전기 발생으로 인하여 미세한 먼지가 LCD 및 반도체 웨이퍼에 부착되거나, 정전기 방전에 의해 반도체소자 및 LCD 유리기판상의 패헌의 파괴를 야기하여 제품의 수율을 저하시키고 제조원가를 상승시키는 주요한 요인이 된다. 현재 이러한 제조공정에서 정전기를 위한 대책으로 코로나방전에 의한 이온바(Ion Bar) 및 이온브로어(Ion Blower)를 제전설비로 사용하고 있으나, 이 장치는 코로나 방전에 의한 이온을 발생시키고 이온화된 공기를 불어 내기 위하여 팬을 사용하여 공기를 대류 시킨다.(중략)

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Measurement of a refractive index and thickness of silicon-dioxide thin film on LCD glass substrate using a variable angle ellipsometry (가변 입사각 타원 해석법을 사용한 유리기판위의 이산화규소박막의 굴절율 및 두께 측정)

  • Pang, H. Y.;Kim, H. J.;Kim, S. Y.;Kim, B. I.
    • Korean Journal of Optics and Photonics
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    • v.8 no.1
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    • pp.31-36
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    • 1997
  • We measured refractive indices and thicknesses of SiO$_2$ thin films that have been plated on LCD glass substrate for the purpose of preventing the out-diffusion of sodium ions. The best experimental condition to determine refractive index and thickness of SiO$_2$ thin film by using ellipsometry is searched for, where ⅰ) the film thickness is increased uniformly by 20 $\AA$ from 0 $\AA$ to the period thickness while the angle of incidence is fixed and ⅱ) the angle of incidence is increased uniformly by 1$^{\circ}$ from 45$^{\circ}$ to 70$^{\circ}$ while the film thickness is fixed. We estimated the errors in determining the refractive index and thickness by comparing the measurement error of $\Delta$ and Ψ with the calculated one. The ellipsometric constants of SiO$_2$ thin film on LCD glass substrate are measured at several angle of incidence around the Brewster angle, which is the best angle if the experimental error of ellipsometer is not sensitive to the incident angle. Also the best fit refractive index and thickness of SiO$_2$ thin film to these ellipsometric constants measured at several angle of incidenc eas well as the best fit ones to the SE data are obtained using regressional analysis.

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The Study on the Development of Composite Robot Hand for TFT-LCD Glass Transport (대면적 TFT-LCD 유리기판 이송용 복합재료 로봇 손 개발에 관한 연구)

  • Choi, Gi-Han;Han, Chang-Woo;Lee, Sang-Ryong
    • Transactions of the Korean Society of Mechanical Engineers A
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    • v.26 no.7
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    • pp.1357-1365
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    • 2002
  • A robot hand is used to transport the glass substrate in TFT-LCD manufacturing process. Carbon/epoxy composite is one of the best materials for this kind of robot hand application, due to their lightweight, high stiffness, and good damping characteristics. Major requirement of the robot hand is given as allowable deflection under weight loading of glass substrate and robot hand itself. In this thesis, a carbon/epoxy robot hand was analyzed using finite element method and beam theory to determine the deflection of the hand under the loading that is equivalent to actual weight. Because natural frequency is one of the major interests in robot hand design for TFT-LCD manufacturing process, modal analysis is also conducted using finite element method and beam theory. A robot hand was manufactured, and actual deflection and natural frequency were measured to verify the analysis results and compliance to requirement. The test results showed good agreement with analysis results.

Leakage Current Suppression of Asymmetric-Offset Polycrystalline Thin Film Transistor employing (교류 자계 유도 결정화된 다결정 박막 트랜지스터의 비대칭 오프셋 구조를 통한 누설 전류 감소 효과)

  • Kang, Dong-Won;Lee, Won-Kyu;Han, Sang-Myeun;Choi, Joonhoo;Kim, Chi-Woo;Han, Min-Koo
    • Proceedings of the KIEE Conference
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    • 2008.07a
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    • pp.1199-1200
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    • 2008
  • N형 공핍 모드의 탑 게이트 다결정실리콘 박막 트랜지스터에 비대칭 오프셋 구조를 적용하였다. 이로써 드레인 부근의 전계를 감소시켜, on전류의 큰 손실 없이 누설 전류를 86% 감소시켰다. 박막 트랜지스터는 유리 기판위에 교류 자계 유도 결정화를 이용하여 제작하였고, 마스크 추가 없이 오프셋 구조를 형성하였다. 또한 비정질 실리콘과 n+ 층은 이온 주입을 하지 않고 증착하였다. 이 방법은 능동 구동 디스플레이에서 소비 전력 감소와 이미지 유지에 도움이 될 수 있다.

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Relationship between Working Parameter and Surface Nniformity of ITO coated Glass Substrate using Regression Analysis (회귀분석을 이용한 ITO 코팅유리기판의 표면균일도와 운전변수의 상관관계 분석)

  • 김면희;이상룡;이태영;배준영
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2004.10a
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    • pp.1353-1356
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    • 2004
  • In recent year, OLED(organic light emitted display) is used as the next generation device of FPD. OLED have been replacing the flat panel display device such as LCD, STN-LCD and TFT because this device is more efficient, economic and simple than those FPD devices, and this need not backlight system for visualization. The performance and efficiency of OLED is related with surface defect of ITO coated glass substrate. The typical surface defect of glass substrate is nonuniformity and bad surface roughness. ITO coated glass substrate is destroied for inspection about surface roughness and non-uniformity. Generally detection of the defects in the surface for ITO coated glass substrate is dependent on operator's experience. In this research, relationship between working parameter and surface non-uniformity is studied using regression analysis.

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Numerical modeling of dynamic switching behavir in a bistable TN LCD (쌍안정 TN 액정셀의 스위칭 특성 해석)

  • 김병석;김양수;윤태훈;김재창
    • Korean Journal of Optics and Photonics
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    • v.9 no.2
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    • pp.117-122
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    • 1998
  • We modeled the dynamic switching behavior of a bistable twisted-nematic liquid crystal cell by employing the Berreman's backflow model. Although viscosity paramenters of the liquid crystal material are not known, numerically calculated optical switching characteristics shows good agreement with experimental results. With this model we also have shown that bistable switching can be observed in a $180^{\circ}$ twisted cell only when two alignment layers are rubbed in the opposite direction.

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Negative metal on ion beam 증착방법을 이용한 TFT-LCD용 저온 poly-Si 박막 성장

  • 전철호;김현숙;권오진;박종윤
    • Proceedings of the Korean Vacuum Society Conference
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    • 1999.07a
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    • pp.70-70
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    • 1999
  • 현재 TFT-LCD에서 주류를 이루고 있는 a-Si 으로는 SXGA급 이상의 LCD를 구현하는 데 그 자체 이동도(0.4~1.0cm2/Vs)의 한계 때문에 poly-Si(100~300cm2/Vs)을 사용하지 않을 수 없다. Poly-Si을 성장시키는 방법으로는 PECVD 방법, SPC 방법, Laser Annealing 방법등이 있으나 아직 이 모든 방법으로는 성장박막의 질, 즉 이동도, 균일성 등이 만족스럽지 못하다. 그 중에서 Laser Annealing 방법으로 저온에서 가장 좋은 막질을 얻고 있으나 균일성 및 생산성 향상면에서 여려움이 제기되고 있다. 따라서 차세대 TFT-LCD의 핵심소재인 poly-Si을 저온에서 유리기판위에 양질의 박막으로 성장시킬 수 있는 박막성장법이 절실하다. 본 연구에서 사용된 실리콘 이온 증착법은 Sidl 이온 상태로 직접 증착되므로 이온 에너지가 직접 결합에 기여하게 되고 동시에 이온 에너지는 전기적으로 제어되므로 박막 형성에 필요한 정정 에너지를 공급할 수 있다. 따라서 종래의 열에너지만을 이용한 방법보다 훨씬 낮은 온도에서 박막을 성장시킬 수 있었다. 3kV의 Cs+에 의해 sputter 된 Si beam- 에너지를 20~100eV, Si- flux를 약 4$\mu$A.cm2로 조절하며, 기판온도 300~45$0^{\circ}C$에서 각각 제조하였다. 30$0^{\circ}C$, 20~50eV에서 poly-Si임을 XRD 분석으로 확인 할 수 있었다.

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