• Journal of the Korea Society of Computer and Information
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• v.28 no.7
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• pp.113-120
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• 2023

The purpose of this study was the accuracy of cardiac compression, fatigue, and physiological changes of the rescuer for different mask type in cardiopulmonary resuscitation(CPR). Data collection was from 9 to 12 May 2022, the participants were a total of 24 paramedic students with a BLS provider at D University. The students participated in an experiment in which 12 students each wore a surgical mask (Dental mask) and a fine particle 94% blocking mask (KF94 mask) and performed CPR for 2 minutes over a total of 7 times. As a result of the study, in the analysis of the quality of the rescuer's chest compression according to the type of mask, there was a significant difference in the compression speed (F=24.91, p<.001) and bad compression hand position (F=14.54, p=.024) in the group wearing the KF94, Fatigue showed significant differences in both the Dental mask group (F=51.16, p<.001) and the KF94 mask group (F=63.49, p<.001). Among the physiological changes, heart rate showed a significant difference between the Dental mask group (F=34.79, p<.001) and the KF94 mask group (F=35.55, p<.001), and the respiratory rate showed a significant difference between the Dental mask group (F=25.02, p=.001) and the KF94 mask group(F=23.02, p=.002). Therefore, in order to improve the quality of efficient chest compression and reduce the fatigue and physiological changes of rescuers, it will be necessary for rescuers to wear suitable personal protective equipment.

• Journal of the Korean Society for Precision Engineering
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• v.21 no.8
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• pp.152-156
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• 2004

A new tool of surface patterning technique for general purpose lithography was developed based on shadow mask method. This paper describes the fabrication of a new type of miniaturized shadow mask. The shadow mask is fabricated by photolithography and etching of 100-mm full wafer. The fabricated shadow mask has over 388 membranes with apertures of micrometer length scale ranging from 1${\mu}{\textrm}{m}$ to 100s ${\mu}{\textrm}{m}$ made on each 2mm${\times}$2mm large low stress silicon nitride membrane. It allows micro scale patterns to be directly deposited on substrate surface through apertures of the membrane. This shadow mask method has much wider choice of deposit materials, and can be applied to wider class of surfaces including chemical functional layer, MEMS/NEMS surfaces, and biosensors.

• Journal of the Korean Society for Precision Engineering
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• v.14 no.3
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• pp.15-20
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• 1997

This paper presents the experimental study of the non-contact temperature measurement for the shadow mask of cathode ray tube using InSb sensor. At present, High resolution of CRT(Cathode Ray Tube) is needed broadly; therefore, the measurement of temperature distribution of shadow mask in CRT during operation is important to analyze the thermal deformation of shadow mask. Most of the studies could not measure the temperature distribution of shadow mask precisely. We studied the temperature dis- tribution of shadow mask using InSb photo sensor for 17" cathode ray tube (CRT). Experiments using ther- mocouple are performed to validate the results of non-contact measurement. The results agree well with those results of non-contact method using InSb sensor.nsor.

• Proceedings of the Korean Society Of Semiconductor Equipment Technology
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• 2007.06a
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• pp.164-168
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• 2007

Deformation of a shadow mask is one of the problems encountered during the deposition of organic materials for manufacturing large size OLED. The larger the glass substrate, the larger the shadow mask becomes. But as the size of the shadow mask increases, its deformation becomes more severe, thereby making it difficult to deposit organic materials in a precise pattern on a substrate. In this paper, a new type mask-frame structure is proposed. The proposed mask-frame structure making a curved mask has the ability of reducing drooping of mask. The test frame is fabricated and evaluation experiments are performed.

• Transactions of the Korean Society for Noise and Vibration Engineering
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• v.12 no.9
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• pp.731-737
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• 2002

Nonlinear vibration of the CRT shadow mask with impact damping wires is analyzed in consideration of the mask tension distribution and the effect of wire impact damping. A reduced order FEM model of the shadow mask is obtained from dynamic condensation of the mass and stiffness matrices, and damping wire is modeled using the lumped parameter method to effectively describe its contact interactions with the shadow mask. The nonlinear contact-impact model is composed of spring and damper elements, of which parameters are determined from the Hertzian contact theory and the restitution coefficient, respectively. The analysis model of the shadow mask with damping wires is experimentally verified through impact tests of shadow masks performed in a vacuum chamber.

• Proceedings of the Korean Society Of Semiconductor Equipment Technology
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• 2004.05a
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• pp.129-131
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• 2004

극자외선 리소그래피(EUV lithography) 기술은 50nm 이하의 선폭을 가지는 차세대 소자 제작에 있어서 선도적인 기술 중 하나이다. EUVL 에서 필수적인 요소중의 하나가 mirror 로 사용되는 blank mask 이다. Blank mask 에 있어서 가장 중요한 요소는 반사도이다. 이 blank mask 는 Si substrate 위에 반사를 위한 Mo/Si pair 가 40pair 이상 적층되어있다. Blank mask 는 매우 청결해야한다. 만약 결함이 있다면 blank mask 에는 치명적이다 결함은 blank mask 에 있어서 반사도를 떨어뜨리는 주 요소이기 때문이다. 그 결함에는 amplitude defect 과 phase defect 이 있다. FIB 에서는 amplitude defect 을 수정하는 것이 가능하다. 우리는 FIB 를 이용하여 mage mode, spot mode, bar rotation mode 를 사용하여 amplitude defect을 수정하였다. 그리고, 그 결과 효과적으로 amplitude defect을 수정하였다.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2005.10a
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• pp.268-271
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• 2005

Etch resistance of mask layer on silicon substrate modified by AFM-based Tribo-Nanolithography (TNL) in Aqueous Solution in an aqueous solution was demonstrated. n consists or sequential processes, nano-scratching and wet chemical etching. The simple scratching can form a mask layer on the silicon substrate, which acting as an etching mask. For TNL, a specially designed cantilever with diamond tip, allowing the formation of mask layer on silicon substrate easily by a simple scratching process, has been applied instead of conventional silicon cantilever fur scanning. This study demonstrates how the TNL parameters can affect the etch resistance of mask layer, hence introducing a new process of AFM-based maskless nanolithography in aqueous solution.

• Journal of the Korea Society of Computer and Information
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• v.27 no.10
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• pp.185-193
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• 2022

This study attempted to compare and analyze the commercially available multi-use patterns to develop mask patterns suitable for the face types of adult women. Through this, it was intended to provide necessary data to mask pattern development and products. As a results of comparing the dimensions and shapes of commercial multi-use mask patterns, there was a significant difference in dimensions even though it was a L-size mask manufactured for adults. As a result of the appearance evaluation of the virtual outfit, there were significant differences by design in the vertical of the center front line, the cover and space of the mask, the height of the nose, and the lower part of the mask. The side also showed significant differences in the covering of the side of the face, the space of the side, and the width and length of the string. As a result of the appearance evaluation, Mask 4 received the best evaluation. The shape of the mask pattern had a large dart in the lower part of the nose so that it can cover the three-dimensional shape of the face, but there was a difference in the degree and angle of the curve depending on the mask. Although the upper part of the mask, the lower part of the mask, and the cheek part are in close contact, the evaluation of the mask pattern, which has room in the nose and mouth, was high. It is thought that the mask pattern should be set according to the upper length, lower length, and nose height of the mask through analysis of the face shape and dimensions.

• Journal of the Semiconductor & Display Technology
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• v.9 no.4
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• pp.13-18
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• 2010

Extreme ultraviolet (EUV) lithography using 13.5 nm wavelengths is expected to be adopted as a mass production technology for 32 nm half pitch and below. One of the new issues introduced by EUV lithography is the shadowing effect. Mask shadowing is a unique phenomenon caused by using mirror-based mask with an oblique incident angle of light. This results in a horizontal-vertical (H-V) biasing effect and ellipticity in the contact hole pattern. To minimize the shadowing effect, a refilled mask is an available option. The concept of refilled mask structure can be implemented by partial etching into the multilayer and then refilling the trench with an absorber material. The simulations were carried out to confirm the possibility of application of refilled mask in 32 nm line-and-space pattern under the condition of preproduction tool. The effect of sidewall angle in refilled mask is evaluated on image contrast and critical dimension (CD) on the wafer. We also simulated the effect of refilled absorber thickness on aerial image, H-V CD bias, and overlapping process window. Finally, we concluded that the refilled absorber thickness for minimizing shadowing effect should be thinner than etched depth.

• Journal of Biomedical Engineering Research
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• v.43 no.3
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• pp.131-135
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• 2022

Due to COVID-19, Correct method of wearing mask is important to prevent COVID-19 and the other respiratory tract infections. And the deep learning technology in the image processing has been developed. The purpose of this study is to create the type of mask wearing dataset for deep learning models and select the deep learning model to detect the wearing mask correctly. The Image dataset is the 2,296 images acquired using a web crawler. Deep learning classification models provided by tensorflow are used to validate the dataset. And Object detection deep learning model YOLOs are used to select the detection deep learning model to detect the wearing mask correctly. In this process, this paper proposes to validate the type of mask wearing datasets and YOLOv5 is the effective model to detect the type of mask wearing. The experimental results show that reliable dataset is acquired and the YOLOv5 model effectively recognize type of mask wearing.