Effects of Deposition Parameters on TiN Film by Plasma Assisted Chemical Vapor Deposition(I) -Influence of Temperature on the TiN Deposition- (플라즈마 화학 증착법(PACVD)에 의한 TiN 증착시 증착변수가 미치는 영향(I) -증착온도를 중심으로-)
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- Journal of the Korean Society for Heat Treatment
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- v.2 no.4
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- pp.1-10
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- 1989