• Title/Summary/Keyword: Junction

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Thermal Stress at the Junction of Skirt to Head in Hot Pressure Vessel (고온 수직형 압력용기 Skirt 부의 열응력에 관한 연구)

  • 한명수;한종만;조용관
    • Journal of Welding and Joining
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    • v.16 no.2
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    • pp.111-121
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    • 1998
  • It is well recognized that a excessive temperature gradient from the junction of head to skirt in axial direction in a hot pressure vessel can cause unpredicted high thermal stress at the junction and/or in axial direction of a skirt. this thermal stress resulting from axial thermal gradient may be a major cause of unsoundness of structural integrity. In case of cyclic operation of hot pressure vessels, the thermal stress becomes one of the primary design consideration because of the possibility of fracture as a result of cyclic thermal fatigue and progressively incremental plastic deformation. To perform thermal stress analysis of the junction and cylindrical skirt of a vessel, or, at least, to inspect quantitatively the magnitude and effect of thermal stress, the temperature profile of the vessel and skirt must be known. This paper demonstrated the temperature distribution and thermal stress analysis for the junction of skirt to head using F.E. analysis. Effect of air pocket in crotch space was quantitatively investigated to minimize the temperature gradient causing the thermal stress in axial direction. Effect of the skirt height on thermal stresses was also studied. Analysis results were compared with theoretical formulas to verify th applicability to the strength calculation in design field.

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Bi-directional Two Terminal Switching Device based on SiGe for Spin Transfer Torque (STT) MRAM

  • Yang, Hyung-Jun;Kil, Gyu-Hyun;Lee, Sung-Hyun;Song, Yun-Heub
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.02a
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    • pp.385-385
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    • 2012
  • A two terminal N+/P/N+ junction device to replace the conventional selective transistor was studied as a bilateral switching device for spin transfer torque (STT) MRAM based on 3D device simulation. An N+/P/N+ junction structure with $30{\times}30nm$ area requires bi-directional current flow enough to write a data by a drain induced barrier lowering (DIBL) under a reverse bias at N+/P (or P/N+ junction), and high current on/off ratio of 106. The SiGe materials are widely used in hetero-junction bipolar transistors, bipolar compensation metal-oxide semiconductors (BiCMOS) since the band gap of SiGe materials can be controlled by changing the fraction and the strain epilayers, and the drift mobility is increased with the increasing Ge content. In this work, N+/P/N+ SiGe material based junction provides that drive current is increased from 40 to $130{\mu}A$ by increased Ge content from 10~80%. When Ge content is about 20%, the drive current density of SiGe device substantially increased to 2~3 times better than Si-based junction device in case of 28 nm P length, which is sufficient current to operation of STT-MRAM.

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Modified Approach through the Sacrococcygeal Junction to Block the Ganglion Impar (천미골 접합부를 이용한 외톨이 신경절 차단법)

  • Song, Sun-Ok;Kwon, Oh-Deuk;Kim, Seong-Ki
    • The Korean Journal of Pain
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    • v.10 no.2
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    • pp.254-257
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    • 1997
  • Ganglion impar lies immediately anterior to the sacrococcygeal junction and blockade of the ganglion is used to treat anorectal and perineal pain. Although the technique introduced by Plancarte et at is widely practised, the bent needle is sometimes difficult to position precisely and patients find the procedure painful. We modified this approach of block of ganglion impar by positioning the needle into the sacrococcygeal junction and using the loss of resistance technique. With the patient in the lateral position, a skin wheal was raised at 1-1.5cm below the sacral hiatus. Twenty-three gauge short needle was directly placed into the sacrococcygeal junction with aid of fluoroscopic guidance. From 1 cm behind the anterior margin of the vertebral body in lateral view, we used the loss of resistance technique to confirm the retroperitoneal space. We found this modified approach easier to perform during six blocks for three patients with anorectal or perineal pain. Our modified approach through the sacrococcygeal junction may provide opportunity for wider administration of this procedure because of its simple technique, reduced pain during procedure and decreased risk of infection.

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CORRELATION OF PERICORONITIS AND ERUPTION STATE OF THE MANDIBULAR THIRD MOLAR (하악 제3대구치의 맹출 양상과 치관주위염과의 상관관계)

  • Cheong, Jeong-Kwon
    • Journal of the Korean Association of Oral and Maxillofacial Surgeons
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    • v.32 no.2
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    • pp.161-167
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    • 2006
  • Objectives: Pericoronitis was the most common indication for mandibular third molar surgery and there are no universally acceptable predictive criteria for pericoronitis occurrence. This study was designed to analyze the correlation of the pericoronitis and the eruption state of the mandibular third molar using panoramic radiographs statistically. Materials and Methods: 218 patients whose chief complaint was the extraction of the mandibular third molar were examined. The presence and absence of pericoronitis, age, sex, position of extraction site, angulation, impaction degree, position to the anterior border of mandibular ramus, distance between distal cementoenamel junction of second molar and mesial cementoenamel junction of the mandibular third molar were assessed. Then the correlation of pericoronitis and the eruption state of the mandibular third molar were analyzed by Student's t-test and chi-square test. Results: There was no correlation between Pericoronitis and age, sex, position of the mandibular third molar. The angulation(P=0.005), impaction degree(P=0.043), relation with anterior border of mandibular ramus(P=0.003), distance between distal cementoenamel junction of second molar and mesial cementoenamel junction of the mandibular third molar(P<0.05) were correlated with pericoronitis. Conclusions: The occurrence of the pericoronitis can be predicted by the eruption state of the mandibular third molar such as angulation, impaction degree, relation with anterior border of mandibular ramus, distance between distal cementoenamel junction of second molar and mesial cementoenamel junction of third molar.

A design of Low Pass Filter using the equivalent circuit of T-junction microstrip line (T-접합선로의 등가회로를 고려한 저역통과 여파기 설계)

  • Dorjsuren, Baatarkhuu;Choi, Heung-Taek;Ahn, Dal
    • Journal of the Korea Academia-Industrial cooperation Society
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    • v.10 no.6
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    • pp.1180-1185
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    • 2009
  • In this paper, the Low Pass Filter (LPF) using the equivalent circuit of T-junction microstrip line is proposed. And we derived the formulas for lumped-elements of the equivalent circuit of T-junction microstrip line to solve the frequency shift characteristic. T-junction microstrip line is de-embedded by Electromagnetic simulation tool and exact lumped element value of T-junction microstrip line is calculated by the equation of Z-parameter. We can get excellent agreement between lumped-element LPF frequency response and transmission line LPF frequency response.

Large Tunneling Magnetoresistance of a Ramp-type Junction with a SrTiO3 Tunneling Barrier

  • Lee, Sang-Suk;Yoon, Moon-Sung;Hwang, Do-Guwn;Rhie, Kung-Won
    • Journal of Magnetics
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    • v.8 no.2
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    • pp.89-92
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    • 2003
  • The tunneling magnetoresistance (TMR) of a ramp-edge type junction with SrTiO$_3$barrier layer has been stud-ied. The samples with a structure of glass/NiO(600${\AA}$)/Co(100${\AA}$)/SrTiO$_3$(400 ${\AA}$)/SrTiO$_3$(20-100${\AA}$)/NiFe(100${\AA}$) were prepared by the sputtering and etched by the electron cyclotron (ECR) argon ion milling. Nonlinear I-V characteristics were obtained from a ramp-type tunneling junctions, having the dominant difference between two different external magnetic fields (${\pm}$100 Oe) perpendicular to the junction edge line. In the SrTiO$_3$ barrier thickness of 40${\AA}$, the TMR was 52.7% at a bias voltage of -50 mV The bias voltage dependence of resistance and TMR in a ramp-type tunneling junction was similar with those of the layered TMR junction.

Tunneling Magnetoresistance in Si/$SiO_2$/NiFe/$Al_2$$O_3$/Co Thin Films (Si/$SiO_2$/NiFe/$Al_2$$O_3$/Co 박막의 투과자기저항 특성 연구)

  • 현준원;백주열
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.14 no.11
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    • pp.934-940
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    • 2001
  • Magnetic properties were investigated for Si/SiO$_2$/NiFe(300 )/A1$_2$O$_3$(t)/Co(200 ) junction related with the parameters of $Al_2$O$_3$. Insulating $Al_2$O$_3$ layer was formed by depositing a 5~40 thick Al layer, followed by a 90~120s RF plasma oxidation in an $O_2$ atmosphere. Magnetoresistance was not observed for tunnel junction with 5~10 thick Al layer, but magnetoresistance was observed large for tunnel junction with 15~40 thick Al layer. Oxidation time did not largely influence magnetoresistance. Tunnel magnetoresistance effect depended on magnetization behavior of two ferromagnetic layers. Tunneling junction was confirmed through nonlinear I-V curve. In this work, tunneling magnetoresistance(TMR) up to 30 % was observed. This apparent TMR is an artifact of the nonuniform current flow over the junction in the cross geometry of the electrodes.

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Effect on the Transport Current and Quench Resistance of the HTS Wire with Normal-Superconducting Junction During the Fault Current Applying (사고전류 인가 시 초전도선재의 상전도-초전도 접합부가 통전전류와 ?치저항에 미치는 영향)

  • Hong, Gong-Hyun;Du, Ho-Ik;Han, Byoung-Sung
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.28 no.10
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    • pp.625-629
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    • 2015
  • The second-generation HTS wire its YBCO coated conductor is widely used in the superconducting power apparatus. The YBCO coated conductor uses the normal-superconducting junction to increase the transport capacity of superconducting power apparatus when it is applied. The normal-superconducting junction can be a cause of reducing the stability of the superconducting power apparatus when a fault current is applied. Thus, in this study we have conducted the effect analysing normal-superconducting junction for the fault current using transport current and quench resistance. From the experimental results when a fault current is applied, the effect on the normal-superconducting junction is reduced the larger the amplitude of the fault current and is helpful to maintain the thermal stability of the HTS wire.

Electric properties Analysis and fabrication of ZnO:As/ZnO:Al homo-junction LED (ZnO:As/ZnO:Al homo-junction LED의 제조와 전기적 특성 분석)

  • Kim, Kyeong-Min;So, Soon-Jin;Park, Choon-Bae
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2007.06a
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    • pp.55-56
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    • 2007
  • The p-type ZnO thin film, fabricated by means of the ampoule-tube method, was used to make the ZnO p-n junction, and its characteristics was analyzed. The ampoule-tube method was used to make the p-type ZnO based on the As diffusion, and the hall measurement was used to confirm that the p-type is formed. the current-voltage characteristics of the ZnO p-n junction were measured to confirm the rectification characteristics of a typical p-n junction and the low leakage voltage characteristics. Using the ampoule-tube to fabricate the p-type ZnO will provide a very useful technology for producing the UV ZnO LED and ZnO-based devices.

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Analysis on the V-I Curve of ZnO:As/ZnO:Al homo-junction LED (ZnO:As/ZnO:Al homo-junction LED의 V-I 특성 분석)

  • Oh, Sang-Hyun;Jeong, Yun-Hwan;Liu, Yan-Yan;Park, Choon-Bae
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2007.11a
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    • pp.410-411
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    • 2007
  • To investigate the ZnO LED which are interested in the next generation of short wavelength LEDs and Lasers, the ZnO thin films were deposited by RF magnetron sputtering system. The p-type ZnO thin film, fabricated by means of the ampoule-tube method, was used to make the ZnO p-n junction, and its characteristics was analyzed. The ampoule-tube method was used to make the p-type ZnO based on the As diffusion, and the hall measurement was used to confirm that the p-type is formed. the current-voltage characteristics of the ZnO p-n junction were measured to confirm the rectification characteristics of a typical p-n junction and the low leakage voltage characteristics. Analysis of ZnO LED V-I curve will provide a very useful technology for producing the UV ZnO LED and ZnO-based devices.

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