• Bulletin of the Korean Chemical Society
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• v.30 no.7
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• pp.1603-1606
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• 2009

A new 1D oxalato bridged compound Ni(en)(ox)-2$H_2$O, (ox = oxalate; en = ethylenediamine) has been hydrothermally synthesized and characterized by single crystal X-ray diffraction, IR spectrum, TG analysis, and magnetic measurements. In the structure the Ni atoms are coordinated with four oxygen atoms in two oxalate ions and two nitrogen atoms in one ethylenediamine molecule. The oxalate anion acts as a bis-bidentate ligand bridging Ni atoms in cis-configuration. This completes the infinite zigzag neutral chain, [Ni(en)(ox)]. The interchain space is filled by water molecules that link the chains through a network of hydrogen bonds. Thermal variance of the magnetic susceptibility shows a broad maximum around 50 K characteristic of one-dimensional antiferromagnetic coupling. The theoretical fit of the data for T > 20 K led to the nearest neighbor spin interaction J = -43 K and g = 2.25. The rapid decrease in susceptibility below 20 K indicate this compound to be a likely Haldane gap candidate material with S = 1.

• Korean Journal of Optics and Photonics
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• v.11 no.1
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• pp.13-18
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• 2000

The SiOxNy thin films were prepared on Si(lOO) by reactive RF sputtering method. The reactive gas ratio and the power were used as parameters for depositing SiOxNy thin fims. The properties of ${SiO_x}{N_y}$ thin tilms were investigated by XRD, XPS, refractive index and extinction coefficient analyzer (n'||'&'||'k analyzer), and FfIR. It was found by the results of the x-ray diffraction measurement that SiOxNy thin films were grown to an amorphous structure. From the results of the XPS, and the n'||'&'||'k analyzer, it was found that refractive index was intended to increase with the increasement of the relative nitrogen contents of the ${SiO_x}{N_y}$ thin films.

• Bulletin of the Korean Chemical Society
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• v.26 no.9
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• pp.1395-1402
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• 2005

The reaction of cis-[Cr([14]-decane)$(OH)_2]^+$ ([14]-decane = rac-5,5,7,12,12,14-hexamethyl-1,4,8,11-teraazacyclotetradecane) with auxiliary ligands {$L_a$ = acetylacetonate (acac), oxalate (ox) or malonate (mal)} leads to a new cis-[Cr([14]-decane)(acac)]$(ClO_4)_2{\cdot}(1/2)H_2O\;(1),\;cis-[Cr([14]-decane)(ox)]ClO_4{\cdot}(1/2)H_2O\;(2)\;or\;cis-[Cr([14]-decane)(mal)]ClO_4{\cdot}(1/4)H_2O\;(3)$. These complexes have been characterized by a combination of elemental analysis, conductivity, IR and Vis spectroscopy, mass spectrometry, and X-ray crystallography. Analysis of the crystal structure of cis-[Cr([14]-decane)(acac)]$(ClO_4)_2{\cdot}(1/2)H_2O$ reveals that central chromium(III) has a distorted octahedral coordination environment and two acetylacetonate-oxygen atoms are bonded to the chromium(III) ion in the cis positions. The angle $N_{axial}-Cr-N_{axial}$ deviates by $11^{\circ}$ from the ideal value of $180^{\circ}$ for a perfect octahedron. The bond angle O-Cr-O between the chromium(III) ion and the two acetylacetonate-oxygen atoms is close to $90^{\circ}$. The bond lengths of Cr-O between the chromium and the acetylacetonate-oxygen atoms are 1.950(3) and 1.954(2) $\AA$. They are shorter than those between chromium and nitrogen atoms of the macrocycle. The IR spectra of 1, 2 and 3 display bands at 1560 {ν (C=O)}, 1710 {${\nu}_{as}$(OCO)} and 1660 $cm^{-1}$ {${\nu}_{as}$(OCO)} attributed to the acac, ox and mal auxiliary ligands stretching vibrations, respectively.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2011.05a
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• pp.171-171
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• 2011

Atmospheric pressure- plasma enhanced chemical vapor deposition(AP-PECVD)Processes are recognized as promising and cost effective methods for wide-area coating on sheets of steel, glass, polymeric web, etc. In this study, $SiO_xC_y$ thin films were deposited by using AP-PECVD with a dielectric barrier discharge(DBD). The characteristic of $SiO_xC_y$ thin films were investigated as afunction of the HMDSO/O2/He flow rate. And the moisture permeability of $SiO_xC_y$ thin films was studied. The $SiO_xC_y$ thin films were characterized by the Fourier-transformed Infrared(FT-IR) spectroscopy and also investigated by X-ray photo electron spectroscopy(XPS), Auger Electron Spectroscopy(AES). The moisture permeability of $SiO_xC_y$ thin films was investigated by $H_2O$ permeability tester Detailed experimental results will be demonstrated through th present work.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2008.11a
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• pp.37-37
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• 2008

고온에서 안정적인 DLC막을 성막하기 위해 PECVD공정에서 실리콘을 첨가하여 제조하였다. 기존의 실리콘첨가 DLC막과는 다르게 고온에서 생성됨으로 마이크로 클러스터 형태의 DLC구조로서 disordered 영역이 넓게 존재하고 있어 I(D)/I(G)비에서의 변화가 있는 것이 관찰되었다. 실리콘 양이 증가할수록 값이 낮아지는 것이 관찰되는데 이는 실리콘량이 증가하면서 수소의 위치에 실리콘이 결합하면서 sp3 단일구조형태의 코팅 막을 만드는 것이 관찰된다. 고온 어닐링효과로 내부구조에서 다량의 sp2구조가 관찰되는 것으로서 DLC막이 어느 정도 흑연화되지만, 실리콘이 SiC에서 SiOx로 $SiO_2$와 SiOH막으로 바뀌는 면서 마찰계수가 낮은 DLC막을 유지할 것으로 기대되며, XPS와 FT-IR분석에 의해 이러한 상들의 존재를 관찰할 수 있었다. 특히 공정상 TMS이 증가하면 첨가된 Si에 의해 형성되는 막이 초기부터 OH기를 다량 포함하고 있는 것을 알 수 있었고, 온도 상승에 의해서 실리콘표층에 더욱 많은 SiOx계열의 물질이 생성되는 것이 명확하게 발견되었다.

• Proceedings of the Korean Vacuum Society Conference
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• 2013.08a
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• pp.138.2-138.2
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• 2013

Copper oxide is a multi-functional material being used in various research areas including catalysis, electrochemical materials, oxidizing agents etc. Among these areas, we have synthesized and utilized graphene based copper oxide nanocomposites (CuOx/Graphene) for the catalytic applications (C-N cross coupling reaction). Briefly, Cu precursors were anchored on the graphite oxide(GO) sheets being exfoliated and oxidized from graphite powder. Two different crystalline structures of Cu2O and CuO on graphene and GO were prepared by annealing them in Ar and O2 environments, respectively. The morphological and electronic structures were systemically investigated using FT-IR, XRD, XPS, XAFS, and TEM. Here, we demonstrate that the catalytic performance was found to depend on oxidative states and morphological structures of CuOx graphene nanocomposites. The relationship between the structure of copper oxides and catalytic efficiency toward C-N cross coupling reaction will be discussed.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2012.05a
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• pp.124-125
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• 2012

Korea institute of materials science (KIMS) use a linear deposition source called as a closed drift linear plasma source (CDLPS) as well as dual magnetron sputtering (DMS) to deposit SiOxCyHz films in $HMDSO/O_2$ plasma. The CDLPS generates linear plasma using closed drifting electrons and can reduce device degradations due to energetic ion bombardments on organic devices such as organic photovoltaic and organic light emission diode by controlling an ion energy. The deposited films are investigated by Fourier transform infrared (FT-IR) spectroscopy, X-ray photoelectron spectroscopy (XPS), and atomic force microscopy (AFM). Optical emission spectroscopy (OES) is used to measure relative radical populations of dissociation and recombination products such as H, CH, and CO in plasma. And SiOx film is applied to a barrier film on organic photovoltaic devices.

• Journal of the Korean institute of surface engineering
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• v.29 no.6
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• pp.760-765
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• 1996

Silicon oxide thin films are prepared by plasma-enhanced CVD (PECVD) using 100kHz and 13.56MHz generators. Source gases are two sorts of mixture, tetramethoxysilane (TMOS) and oxygen, and tetramethylsilane (TMS) and oxygen. We investigate the effect of frequency on film properties of deposited films including mechanical properties. 100kHz PECVD process can deposit silicon oxide films at $23^{\circ}C$ at the power of 20W. X-ray photoelectron spectroscopy (XPS), infrared spectroscopy (IR) and ellipsometric measurements reveal that the structural quality of the films prepared both by 100kHz process and by 13.56MHz process are very like silicon dioxide. The 100kHz process is adequate for low temperature deposition of SiOx films.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2012.05a
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• pp.341-342
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• 2012

일반적으로 낮은 표면에너지는 표면조도 및 표면 화학구조에 의하여 제어된다. 이 실험에서는 $SiO_x$ 박막의 표면에너지를 낮추기 위하여 인가전력을 제어하였으며, 동시에 표면 조도를 변화하였다. 인가전력의 의한 표면 조도 및 화학구조를 AFM과 FT-IR로 분석을 하였다. 더하여, 표면에너지의 변화를 접촉각 측정기로 측정하였다.

• Journal of the Korean Society for Environmental Technology
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• v.19 no.6
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• pp.536-542
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• 2018

A system combining an electrochemical method and an adsorption system using activated carbon was assessed to facilitate the reuse of cabbage-salting brine. IrOx/Ti insoluble catalyst electrodes were used in the experiment. The results were analyzed to identify any changes in the residual chlorine concentration according to variations in the current density at a salinity of 10 %, as well as the capacity of the activated carbon to adsorb the residual chlorine and organic matter. For current densities of $500A/m^2$ and $1,000A/m^2$, the residual chlorine concentration did not increase, instead stabilizing once the current reached 0.33 Ah/L. To assess the adsorption efficiency according to the residual chlorine concentration, the unit amount of the adsorption can be estimated from $Y=0.0066+2.087{\times}10^{-4}b$. For both residual chlorine generation using an electrochemical method and chlorine removal through activated-carbon adsorption, the unit amount of adsorption was 0.33 g/g. The maximum amount of $COD_{Cr}$ organic matter adsorbed by the activated carbon was 0.021 g/g, while for $COD_{Mn}$, the value was 0.004 g/g.