• Title/Summary/Keyword: Ionized gas

Search Result 155, Processing Time 0.022 seconds

PHOTOIONIZATION MODELS OF THE WARM IONIZED MEDIUM IN THE GALAXY (우리은하 중온 이온화 매질의 광이온화 모델)

  • Seon, Kwang-Il
    • Publications of The Korean Astronomical Society
    • /
    • v.22 no.4
    • /
    • pp.89-95
    • /
    • 2007
  • The warm ionized medium (WIM) outside classical H II regions is a fundamental gas-phase constituent of the Milky Way and other late-type spiral galaxies, and is traced by faint emission lines at optical wavelengths. We calculate the photoionization models of the WIM in the Galaxy by a stellar UV radiation with the effective temperature 35,000 K assuming not only spherical geometry but also plane parallel geometry, and compare the results with the observed emission line ratios. We also show the dependence of the emission line ratios on various gas-phase abundances. The emergent emission-line ratios are in agreement with the average-values of observed ratios of [S II] ${\lambda}6716/H{\alpha}$, [N II] ${\lambda}6583/H{\alpha}$, [O I] ${\lambda}6300/H{\alpha}$, [O III] ${\lambda}5007/H{\alpha}$, He I ${\lambda}5876/H{\alpha}$. However, their extreme values could not be explained with the photoionization models. It is also shown that the addition of all stellar radiation from the OB stars in the Hipparcos stellar catalog resembles that of an O7-O8 type star.

Ionization and Diffusion Coefficients in CH4 Gas by Simulation (시뮬레이션에 의한 CH4 기체의 전리 및 확산계수)

  • Kim, Sang-Nam
    • The Transactions of the Korean Institute of Electrical Engineers P
    • /
    • v.63 no.4
    • /
    • pp.317-321
    • /
    • 2014
  • This paper describes the information for quantitative simulation of weakly ionized plasma. We must grasp the meaning of the plasma state condition to utilize engineering application and to understand materials of plasma state. Using quantitative simulations of weakly ionized plasma, we can analyze gas characteristic. In this paper, the electron Ionization and diffusion Coefficients in $CH_4$ has been analysed over the E/N range 0.1~300[Td], at the 300[$^{\circ}K$] by the two term approximation Boltzmann equation method and Monte Carlo Simulation. Boltzmann equation method has also been used to predict swarm parameter using the same cross sections as input. The behavior of electron has been calculated to give swarm parameter for the electron energy distribution function has been analysed in $CH_4$ at E/N=10, 100 for a case of the equilibrium region in the mean energy. A set of electron collision cross section has been assembled and used in Monte Carlo simulation to predict values of swarm parameters. The result of Boltzmann equation and Monte Carlo Simulation has been compared with experimental data by Ohmori, Lucas and Carter. The swarm parameter from the swarm study are expected to sever as a critical test of current theories of low energy scattering by atoms and molecules.

The Analysis of Electron Energy Distribution Function in $CH_4$ Gas ($CH_4$ 기체의 전자에너지 분포함수 해석)

  • Kim, Sang-Nam;Seong, Nak-Jin
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
    • /
    • 2004.05c
    • /
    • pp.43-46
    • /
    • 2004
  • This paper describes the information for quantitative simulation of weal이y ionized plasma. We must grasp the meaning of the plasma state condition to utilize engineering application and to understand materials of plasma state. Using quantitative simulations of weakly ionized plasma, we can analyze gas characteristic. In this paper, the electron transport characteristic in $CH_4$ has been analysed over the E/N range 0.1~300[Td], at the $300[_{\circ}K]$ by the two tenn approximation Boltzmann equation method and Monte Carlo Simulation. Boltzmann equation method has also been used to predict swarm parameter using the same cross sections as input. The behavior of electron has been calculated to give swarm parameter for the electron energy distribution function has been analysed in $CH_4$ at E/N=10, 100 for a case of the equilibrium region in the mean energy. The result of Boltzmann equation and Monte Carlo Simulation has been compared with experimental data by Ohmori, Lucas and Carter. The swarm parameter from the swarm study are expected to sever as a critical test of current theories of low energy scattering by atoms and molecules.

  • PDF

Knock Detection Using an Ionization Probe Installed Spark Plug (이온프로브 장착 점화플러그를 이용한 노크발생 판정)

  • 한성주;이용규;민경덕;김응서
    • Transactions of the Korean Society of Automotive Engineers
    • /
    • v.8 no.6
    • /
    • pp.1-8
    • /
    • 2000
  • A new method of knock detection in SI engines, using a change of ion concentration in the combustion chamber, was developed. In order to measure in-cylinder ionization current, ionization probes were installed at spark plug and cylinder head of production engine. It was found that the electric current generated by ionized gas in core burned gas region of knocking cycle is between 2 and 10 times larger than that of normal cycle, because the burned gas temperature which is the dominant parameter of a change of ion concentration increases. However, a change of ionization current in boundary region of burned gas is relatively weak. Hence a change of ion concentration in core burned gas region can be used for knock detection.

  • PDF

Spectra of Optical-field Ionized Gases by a Femtosecond Ti:Sapphire Laser

  • Mock, Tomas;Shin, Hyun-Joon;Cha, Yong-Ho;Lee, Dong-Gun;Hong, Kyung-Han;Nam, Chang-Hee
    • Journal of the Optical Society of Korea
    • /
    • v.2 no.2
    • /
    • pp.50-53
    • /
    • 1998
  • We report on the spectroscopic investigation of optical-field ionized plasmas in the soft X-ray spectral region. The experiment was carried out by focusing pulses of the high-power Ti:Sapphire laser with an energy of ~ 40 mJ and time duration of ~30 fs into a gas jet of krypton, xenon, and argon from a pulsed nozzle. Strong soft X-ray emission on lines from ionic stages of $Kr^{7+} , Kr^{8+} , Xe^{7+} , Ar^{7+} , and Ar^{8+}$ is reported. The experimental result was found to be in good agreement with theoretical prediction.

Plasma Characterization of Facing Target Sputter System for Carbon Nitride Film Deposition

  • Lee, Ji-Gong;Lee, Sung-Pil
    • Transactions on Electrical and Electronic Materials
    • /
    • v.5 no.3
    • /
    • pp.98-103
    • /
    • 2004
  • The plasma properties in the facing target sputtering system during carbon nitride film deposition have been investigated. The ionized nitrogen species of the deposited films increased with increasing discharge current and were independent of the nitrogen pressure. The nitrogen content in the films did not vary significantly with the variation of nitrogen gas. The electron temperature was high close to that in the inter-cathode region, reduced as the electrons moved away from the most intense region of magnetic confinement and increased again outside this region. Calculations based on the film composition showed that the ion to carbon atom ratio at the substrate was about 50 and that the ratio between the ionized and neutral nitrogen molecules was about 0.25.

Analysis of Electron Transport Coefficients in Binary Mixtures of TEOS Gas with Kr, Xe, He and Ne Gases for Using in Plasma Assisted Thin-film Deposition

  • Tuan, Do Anh
    • Journal of Electrical Engineering and Technology
    • /
    • v.11 no.2
    • /
    • pp.455-462
    • /
    • 2016
  • The electron transport coefficients in not only pure atoms and molecules but also in the binary gas mixtures are necessary, especially on understanding quantitatively plasma phenomena and ionized gases. Electron transport coefficients (electron drift velocity, density-normalized longitudinal diffusion coefficient, and density-normalized effective ionization coefficient) in binary mixtures of TEOS gas with buffer gases such as Kr, Xe, He, and Ne gases, therefore, was analyzed and calculated by a two-term approximation of the Boltzmann equation in the E/N range (ratio of the electric field E to the neutral number density N) of 0.1 - 1000 Td (1 Td = 10−17 V.cm2). These binary gas mixtures can be considered to use as the silicon sources in many industrial applications depending on mixture ratio and particular application of gas, especially on plasma assisted thin-film deposition.

A Study on the Estimation of the GHGs Emissions to the Reuse of De-ionized Water Production Process in Semiconductor Factory (반도체 생산용 초순수 제조공정의 농축수 재이용에 따른 온실가스 발생량 평가에 관한 연구)

  • Han, Jong-Min;Chung, Jin-Do;Kim, San
    • Journal of the Korea Academia-Industrial cooperation Society
    • /
    • v.19 no.9
    • /
    • pp.518-525
    • /
    • 2018
  • In the 21st century, human beings are becoming increasingly concerned about greenhouse gas emissions as the environment changes due to climate change become serious. The temperature of Korea has risen by approximately $1.5^{\circ}C$ from 1904 to 2000, and the climate is changing gradually to a subtropical climate. As a result, the frequency of floods and droughts increases, so that the water available to humans is decreasing every year, and the cost of using city water is rising every year. The reuse of wastewater that is normally abandoned is inevitable. This study examined the monthly data for 6 months of operation by installing a reuse system of concentrated wastewater (Re R/O System) that is generated during the process of manufacturing de-ionized water (DI-Water System) used in semiconductor processing. As a result of the survey, the city water supply saved approximately $2,767m^3$ per month. The average annual greenhouse gas emissions was $1,329.07kg-CO_2$ per month due to the electricity consumption of the water reuse system. On the other hand, because of the reduction in city water supply, the average monthly average of $918.64kg-CO_2$ was reduced, and the greenhouse gas emissions were increased to $410.43kg-CO_2$ per month. If it improves some processes in the water reuse system, the amount of greenhouse gas emissions can be reduced by an average of $254.41kg-CO_2$ per month.

Effect of Shielding Gases on the Weldability of High Efficient GMAW Process (고능률 GMAW의 용접성에 미치는 보호가스의 영향)

  • 한기형;한종만;이민우;이은배;한용섭
    • Journal of Welding and Joining
    • /
    • v.13 no.1
    • /
    • pp.127-137
    • /
    • 1995
  • The possibility of new GMAW process using economic shielding gases including CO$_{2}$ gas was investigated on the effect of shielding gas on weldabilty. In the optimum welding condition using 600A power source, FCAW process showed low depositions rate, 114 g/min at 300A, but new GMAW using other mixed shielding gases exhibited high deposition rate, 208-224 g/min at 450A. TIME gas, Ar+CO$_{2}$ gas and Ar+CO$_{2}$+O$_{2}$ gas as a shielding gas were able to be used to the very high welding current(450A), moreover TIME gas and Ar+CO$_{2}$ gas showed the highest arc stability among shielding gases studied in this experiments. The weld penetration was performed by axial spray transfer mode of weld droplet. On the basis of workability, weldability and economic point of view, Ar mixture (80%Ar+20%CO$_{2}$) gas was recommended as a shielding gas for the development and application of new GMAW process. This shielding gas showed the low spatter, good weld quality, stable arc and low cost at the region of high welding current.

  • PDF

Ionization and Attachment Coefficients in Mixtures of $SF_6$ and $N_2$ ($SF_6-N_2$ 혼합기체(混合氣體)의 전리(電離) 및 부착계수(附着係數))

  • Kim, Sang-Nam
    • The Transactions of the Korean Institute of Electrical Engineers P
    • /
    • v.58 no.1
    • /
    • pp.44-47
    • /
    • 2009
  • This paper describes the information for quantitative simulation of weakly ionized plasma. We must grasp the meaning of the plasma state condition to utilize engineering application and to understand materials of plasma state. $SF_6$ gas is widely used in industrial of insulation field. In this paper, $N_2$ is mixed to improve pure $SF_6$ gas characteristics. Electron transport coefficients in $SF_6-N_2$ mixture gases are simulated in range of E/N values from 70 to 400 [Td] at 300K and 1 Torr by using Boltzmann equation method. The results of this method. which are ionization coefficient, attachment coefficient, effective ionization coefficient, and critical E/N, can be important data to present characteristic of gas for insulation. Specially critical E/N is a data to evaluate insulation strength of a gas and is presented in this paper for various mixture ratios of $SF_6-N_2$ mixture gases.