• Title/Summary/Keyword: Ionization probe

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A Study on the Flame Behavior of Substitute Fuel of Gasoline Engine (가솔린엔진용 대체연료의 화염거동에 관한 연구)

  • Yang, Jeong-Gyu;Ryu, Jeong-In
    • Journal of the Korean Society of Fisheries and Ocean Technology
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    • v.21 no.2
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    • pp.157-166
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    • 1985
  • The Purpose of this study are to investigate the characteristics of the flame behavior of gasoline-methanol blended fuels in spark ignition engine. Ionization probe were installed at the cylinder head and piston in order to measure flame speed. Other parameter such as engine performance, fuel consumption rate and exhaust gas were measured. The results were as follows. 1. In the case of increase methanol contents in blend fuel, flame propagation speed were increased, and thermal efficiency of the engine were increased due to decrease of energy consumption rate. 2. In the case of fixed equivalance ratio, NO sub(X) in exhaust gas were increased in accordance with increase of spark advance, and mean effective pressure were decreased in accordance with increase of methanol contents. 3. CO and HC concentration were decreased in accordance with increase of methanol contents.

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Development of simple and continuous microwave source using a microwave oven (전자오븐을 이용한 간편하고 연속적인 마이크로파 발생 장치 개발)

  • 권기청;김재현;김정희;이효석;전상진;허승회;최원호
    • Journal of the Korean Vacuum Society
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    • v.9 no.3
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    • pp.290-295
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    • 2000
  • In order to utilize as a pre-ionization means for reproducible ohmic plasma on KAIST-TOKAMAK, a simple, safe, economical and continuous microwave source has been developed using a home kitchen micro-wave oven. The magnetron used in the study can provide 500 W of power at 2.45 GHz. A conventional magnetron in a home kitchen microwave oven generates microwave for 8 ms at every 16 ms periodically due to the periodic (60 Hz) high voltage applied to the magnetron cathode. In order to generate continuous microwave which is suitable for tokamak pre-ionization, the magnetron operation circuit has been modified using a DC high voltage (5 kV, 1 A) power supply. It provides high-voltage with small ripple for magnetron cathode bias. Using the developed magnetron system, electron cyclotron resonace heated (ECH) plasmas were produced and the characteristics of the system were studied by diagnosing the ECH plasma using Langmuir probe and $H_{\alpha}$ emission diagnostics.

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Probe-based Charge Injection Study of DNA Charge Transfer for Applications to Molecular Electro-optic Switching (전극 기반의 전하 주입을 통한 DNA 전하수송 특성 측정)

  • Ryu, Ho-Jeong;Kim, Hee-Young;Kim, Dong-Hyun
    • Journal of the Institute of Electronics Engineers of Korea SC
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    • v.48 no.3
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    • pp.53-59
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    • 2011
  • Charge transfer through DNA oligonucleotides has been investigated for potential applications of DNA into molecular electrooptic switching devices. Electrons were injected using gold electrode probes where DNA oligomers were adsorbed that are separated in medium. The results show that increased adsorption of DNA reduces the ionization current due to the combined effect of charge transfer through DNA and surface-limited charge transport. The probe-based charge injection was extended to examine the capability of extinguishing fluorescence of Cy3 dye molecules attached to DNA. It is expected that the results may be employed to implementing a novel electrooptic switching device based on DNA molecules.

Manufacturing and characterization of ECR-PECVD system (ECR-PECVD 장치의 제작과 특성)

  • 손영호;정우철;정재인;박노길;황도원;김인수;배인호
    • Journal of the Korean Vacuum Society
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    • v.9 no.1
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    • pp.7-15
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    • 2000
  • An ECR-PECVD system with the characteristics of high ionization rat다 ability of plasma processing in a wide pressure range and deposition at low temperature was manufactured and characterized for the deposition of thin films. The system consists of a vacuum chamber, sample stage, vacuum gauge, vacuum pump, gas injection part, vacuum sealing valve, ECR source and a control part. The control of system is carried out by the microprocessor and the ROM program. We have investigated the vacuum characteristics of ECR-PECVD system, and also have diagnosed the characteristics of ECR microwave plasma by using the Langmuir probe. From the data of system and plasma characterization, we could confirmed the stability of pressure in the vacuum chamber according to the variation of gas flow rate and the effect of ion bombardment by the negative DC self bias voltage. The plasma density was increased with the increase of gas flow rate and ECR power. On the other hand, it was decreased with the increase of horizontal radius and distance between ECR source and probe. The calculated plasma densities were in the range of 49.7\times10^{11}\sim3.7\times10^{12}\textrm{cm}^{-3}$. It is also expected that we can estimate the thickness uniformity of film fabricated by the ECR-PECVD system from the distribution of the plasma density.

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Development of photoresist ashing process in an ICP with periodic axial magnetic field (주기적인 축방향 자기장을 추가한 유도결합형 플라즈마 장치에서의 감광제 제거공정 개발)

  • 송호영;라상호;박세근;오범환
    • Proceedings of the IEEK Conference
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    • 2000.06b
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    • pp.290-293
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    • 2000
  • Low frequency(<100Hz) weak magnetic field(<20gauss) is applied axially to an inductively coupled oxygen plasma(ICP), and its plasma characteristics are monitored by OES(Optical Emission Spectroscopy) and Langmuir probe. It is found that periodic magnetic field enhances ashing rate by 25% and improves its uniformity upto 4.5% over 8" wafer. From electron energy distribution function, both low and high energy electrons are identified and relative abundancy is found to be controlled by the applied frequency. Moreover, it is observed that ionization and dissociation species are varied with applied frequency. We insert an aluminium baffle in the chamber to get better uniformity and less plasma damage.

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On The Etching Mechanism of $ZrO_2$ Thin Films in Inductively Coupled $BCl_3$/Ar Plasma

  • Kim, Man-Su;Jung, Hee-Sung;Min, Nam-Ki;Lee, Hyun-Woo;Kwon, Kwang-Ho
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2007.06a
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    • pp.83-84
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    • 2007
  • $BCl_3$/Ar ICP 플라즈마를 이용한 $ZrO_2$ 박막의 식각 메카니즘이 실험 결과와 모델링을 통해 연구되었다. Ar 가스의 증가에 따라, $ZrO_2$의 식각 속도는 선형 변화의 경향을 보이지 않았고, Ar의 약 30% - 35%에서 41.4nm/min의 최대의 속도를 나타내었다. Langmuir probe 측정과 plasma 모델링 결과로부터, $BCl_3$/Ar 가스 혼합비가 플라즈마 파라미터와 active species의 형성에 큰 영향을 미침을 확인하였다. 한편 surface kinetics 모델링 결과로부터, $ZrO_2$의 식각 속도는 ion-assisted chemical reaction mechanism 에 의해 결정됨을 확인하였다.

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Electron-Impact Ionization Mass Spectroscopic Studies of Acetylene and Mixed Acetylene-Ammonia Clusters as a Structure Probe

  • Sung Seen Choi;Kwang Woo Jung;Kyung Hoon Jung
    • Bulletin of the Korean Chemical Society
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    • v.13 no.5
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    • pp.482-486
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    • 1992
  • Ion-molecule reactions of acetylene and mixed acetylene-ammonia cluster ions are studied using an electron impact time-of-flight mass spectrometer. The present results clearly demonstrate that $(C_2H_2)_n^+$ cluster ion distribution represents a distinct magic number of n=3. The mass spectroscopic evidence for the enhanced structural stabilities of $[C_6H_4{\cdot}(NH_3)_m]^+$ (m=0-8) ions is also found along with the detection of mixed cluster $[(C_2H_2)_n{\cdot}(NH_3)_m]^+$ ions, which gives insight into the feasible structure of solvated ions. This is rationalized on the basis of the structural stability for acetylene clusters and the dissociation dynamics of the complex ion under the presence of solvent molecules.

Probing neutral gas clouds and associated galaxies in the early universe

  • Ranjan, Adarsh
    • The Bulletin of The Korean Astronomical Society
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    • v.46 no.2
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    • pp.41.1-41.1
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    • 2021
  • Neutral (HI) gas clouds associated with galaxies are responsible for fuelling the star-formation in the universe. In literature, the extremely strong damped Lyman-alpha absorbers (or ESDLAs) have been known to be sensitive to the effects of HI-H2 transition and star-formation in galaxies. Yet, ESDLAs are rare to probe due to the smaller cross section they subtend on the sky (similar to galaxies). In my talk, I will focus primarily on my study of the nature of ESDLAs that are observed as absorption signature along the line-of-sight (LOS) of a quasar (QSO). I will further look at the HI-H2 transition and interesting results relevant to diffuse molecular gas and the multi-phase medium (gas in different ionization states) that are associated with ESDLAs. Furthermore, I will also discuss how the ESDLA environments differ from the high star-forming and molecular environments detected in blind optical and radio surveys consecutively.

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2D Fluid Modeling of Ar Plasma in a 450 mm CCP Reactor

  • Yang, Won-Gyun;Kim, Dae-Ung;Yu, Sin-Jae;Ju, Jeong-Hun
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.08a
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    • pp.267-267
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    • 2012
  • 최근 국내 반도체 장비 업체들에 의해서 차세대 반도체용 450 mm 웨이퍼 공정용 장비 개발이 진행 중에 있다. 반도체 산업은 계속해서 반도체 칩의 크기를 작게 하고, 웨이퍼 크기를 늘리면서 웨이퍼 당 칩수를 증가시켜 생산성을 향상해오고 있다. 현재 300 mm 웨이퍼에서 450 mm 웨이퍼를 도입하게 되면, 생산성 뿐만 아니라 30%의 비용절감과 50%의 cycle-time 단축이 기대되고 있다. 장비에 대한 이해와 공정에 대한 해석 능력을 위해 비용과 시간이 많이 들기 때문에 최근 컴퓨터를 활용한 수치 모델링이 진행되고 있다. 또한, 수치 모델링은 실험 결과와의 비교가 필수적이다. 본 연구에서는 450 mm 웨이퍼 공정용 장비의 전자밀도를 cut off probe를 통해 100 mTorr에 서 Ar 플라즈마를 파워에 따라 측정했다. 13.56 MHz 200 W, 500 W, 1,000 W로 입력 파워가 증가하면서 웨이퍼 중심에서 $6.0{\times}10^9#/cm^3$, $1.35{\times}10^{10}#/cm^3$, $2.4{\times}10^{10}#/cm^3$로 증가했다. 450 mm 웨이퍼 영역에서 전자 밀도의 불균일도는 각각 10.31%, 3.24%, 4.81% 였다. 또한, 이 450 mm 웨이퍼용 CCP 장비를 축대칭 2차원으로 형상화하고, 전극에 13.56 MHz를 직렬로 연결된 blocking capacitor ($1{\times}10^{-6}$ F/$m^2$)를 통해 인가할 수 있도록 상용 유체 모델 소프트웨어(CFD-ACE+, EXI corp)를 이용하여 계산하였다. 주요 전자-중성 충돌 반응으로 momentum transfer, ionization, excitation, two-step ionization을 고려했고, $Ar^+$$Ar^*$의 표면 재결합 반응은 sticking coefficient를 1로 가정했다. CFD-ACE+의 CCP 모델을 통해 Poisson 방정식을 풀어서 sheath와 wave effect를 고려하였다. Stochastic heating을 고려하지 않았을 때, 플라즈마 흡수 파워가 80 W, 160 W, 240 W에서 실험 투입 전력 200 W, 500 W, 1,000 W일 때와 유사한 반경 방향의 플라즈마 밀도 분포를 보였다. 200 W, 500 W, 1,000 W일 때의 전자밀도 분포는 수치 모델링과 전 범위에서 각각 10%, 3%, 2%의 오차를 보였다. 450 mm의 전극에 13.56 MHz의 전력을 인가할 때, 파워가 증가할수록 전자밀도의 최대값의 위치가 웨이퍼 edge에서 중심으로 이동하고 있음을 실험과 모델링을 통해 확인할 수 있었다.

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Experimental Study on Effect of Electrode Material and Thickness in a Dielectric Barrier Discharge Plasma Actuator Performance (전극 재료 및 두께가 DBD 플라즈마 액추에이터의 성능에 미치는 영향에 대한 실험적 연구)

  • Lee, Seung-Yeob;Shin, You-Hwan
    • The KSFM Journal of Fluid Machinery
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    • v.15 no.3
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    • pp.46-50
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    • 2012
  • Plasma actuator makes parallel flow on the wall surface by the interaction between plasma and neutral air particles. Dielectric barrier discharge (DBD) plasma actuator is widely studied as one type of plasma actuators, which consists of one electrode exposed to the environmental gas and the other encapsulated by a dielectric material. This paper is experimentally focused on the performance of DBD plasma actuator mounted on a flat plate, which depends on kinds of the electrode materials, their thicknesses and the supplied voltage including its frequency. We measured the velocity magnitudes of the induced flow by a stagnation probe as a performance parameter of the plasma actuators. The velocity profiles of the flow induced by the plasma actuators are similar in all measurement cases. The magnitude of the induced velocity is strongly influenced by the thickness of the electrodes and the frequency of the input voltage. The performance of DBD plasma actuators is related to the electric properties of the electrode materials such as the ionization energy and the electrical resistivity.