• 제목/요약/키워드: Ion-to-atom ratio

검색결과 28건 처리시간 0.023초

Plasma Characterization of Facing Target Sputter System for Carbon Nitride Film Deposition

  • Lee, Ji-Gong;Lee, Sung-Pil
    • Transactions on Electrical and Electronic Materials
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    • 제5권3호
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    • pp.98-103
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    • 2004
  • The plasma properties in the facing target sputtering system during carbon nitride film deposition have been investigated. The ionized nitrogen species of the deposited films increased with increasing discharge current and were independent of the nitrogen pressure. The nitrogen content in the films did not vary significantly with the variation of nitrogen gas. The electron temperature was high close to that in the inter-cathode region, reduced as the electrons moved away from the most intense region of magnetic confinement and increased again outside this region. Calculations based on the film composition showed that the ion to carbon atom ratio at the substrate was about 50 and that the ratio between the ionized and neutral nitrogen molecules was about 0.25.

글로벌 모델에 의한 저온 고밀도 플루오로카본 플라즈마 특성의 공정변수 의존성 해석 (Analysis of Process Parameter dependency on the characteristics of high density fluoro carbon plasma using global model)

  • 이호준;태흥식
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1999년도 추계학술대회 논문집 학회본부 C
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    • pp.879-881
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    • 1999
  • Radical and ion densities in a CF4 plasma have been calculated as a function of input power density. 9as pressure and feed gas flow rate using simple 0 dimensional global model. Fluorine atom is found to be the most abundant neutral particle. Highly fragmented species such as CF and CF+ become dominant neutral and ionic radical at the high power condition. As the pressure increases. ion density increases but ionization rate decreases due to the decrease in electron temperature. The fractional dissociation of CF4 feed gas decreases with pressure after increasing at the low pressure range. Electron density and temperature are almost independent of flow rate within calculation conditions studied. The fractional dissociation of CF4 monotonically decreases with flow rate. which results in increase in CF3 and decrease in CF density. The calculation results show that the SiO2 etch selectivity improvement correlates to the increase in the relative density of fluorocarbon ion and neutral radicals which has high C/F ratio.

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INVESTIGATIONS OF OXIDATIONS OF SnOx AND ITS CHANGES OF THE PROPERTIES PREPARED BDEPOSITIONY REACTIVE ION-ASSISTED

  • Cho, J.S.;Choi, W.K.;Kim, Y.T.;Jung, H.J.;Koh, S.K.
    • 한국표면공학회지
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    • 제29권6호
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    • pp.766-772
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    • 1996
  • Undoped $SnO_x$ thin films were deposited on Si(100) substrate by using reactive ioassisted deposition technique (R-IAD). In order to investigate the effect of initial oxygen content and heat treatment on the oxidation state and crystalline structure of tin oxide films, $SnO_x$ thin films were post-annealed at 400~$600^{\circ}C$ for 1 hr. in a vacuum ~$5 \times 10^{-3}$ -3/ Torr or were directly deposited on the substrate of $400^{\circ}C$ and the relative arrival ration ($Gamma$) of oxygen ion to Sn metal varied from 0.025 to 0.1, i.e., average impinging energy ($E_a$) form 25 to 100 eV/atom. As $E_a$ increased, the composition ratio of $N_ON{sn}$ changed from 1.25 to 1.93 in post-annealing, treatment and 1.21 to 1.87 in in-situ substrate heating. In case of post-annealing, the oxidation from SnO to $SnO_2$ was closely related to initial oxygen contents and post-annealing temperature, and the perfect oxidation of $SnO_2$ in the film was obtained at higher than $E_a$=75 eV/atom and $600^{\circ}C$. The temperature for perfect oxidation of $SnO_2$ was reduced as low as $400^{\circ}C$ through in-situ substrate heating. The variation of the chemical state of $SnO_x$ thin films with changing $E_a$'s and heating method were also observed by Auger electron spectroscopy.

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Structural Determination of Fatty Acyl Groups of Phospholipids by Fast Atom Bombardment Tandem Mass Spectrometry of Sodium Adduct Molecular Ions

  • 김영환;유종신;김명수
    • Bulletin of the Korean Chemical Society
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    • 제18권8호
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    • pp.874-880
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    • 1997
  • Various classes of phospholipids were investigated for the structural determination of fatty acyl groups by fast atom bombardment tandem mass spectrometry (FAB-MS/MS). Phospholipids were desorbed by FAB as molecules chelated with sodium ion (or ions). Collision-induced dissociation (CID) of intact sodium adduct molecular ions ([M+Na]+, [M-H+2Na]+ or [M+Na-2H]-) produced a series of homologous fragment ions via the charge-remote fragmentation along the fatty acid chains. These ions were found useful to locate the double bond positions even for the polyunsaturated fatty acid chains. The regiospecificity of the acyl chain linkages in phosphatidylcholine (PC) could also be determined based on the ratio of relative abundance of the product ions (i.e., [M+Na-85-R2COOH]+ vs [M+Na-85-R1COOH]+) in CID-MS/MS of [M+Na]+. These are generated by the loss of fatty acyl groups at sn-1 and sn-2, respectively, together with the choline group. In all the phospholipid compounds investigated, loss of the fatty acid at the sn-2 position was dominant. The present method was applied to the structural determination of molecular species of phosphatidylglycerols (PG) isolated from cyanobacterium Synechocystis sp. PCC 6803.

Micro-discharged plasma density, electron temperature and excited xenon density for enhancement of vacuum ultraviolet luminous efficiency in alternating current plasma display panel

  • Choi, Eun-Ha;Oh, Phil-Yong;Seo, Yoon-Ho;Cho, Guang-Sup;Uhm, Han-S
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2005년도 International Meeting on Information Displayvol.I
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    • pp.161-166
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    • 2005
  • The plasma ion density in AC-PDP has shown to be increased from $5.6{\times}10^{11}cm^{-3}$ to $9.0{\times}10^{11)cm^{-3}$ as the Xe mixture ratio to neon increase from 1 % to 10 %, respectively, at fixed pressure of 400 Torr, by using the micro-Langmuir probe. It is noted that the plasma ion density is density increases as the gas pressure increases in this experiment. The electron temperature decreases from 2.3 to 1.2 eV as the Xe mole fraction increases from 1 % to 10 % at fixed pressure of 400 Torr, which is measured by the micro Langmuir probe and high-speed ICCD camera in this experiment. It is noted that the electron temperature decreases as the gas pressure increases from 150 to 400 Torr in this experiment. It is also observed that the exited Xe atom density and the plasma ion density are in strong correlation sharp between each other in this experiment. It is noted that $5.2{\times}10^{12}cm^{-3}$ in the $1s_5$ metastable state and $1.2{\times}10^{12}cm^{-3}$ in the $1s_4$ resonance state for the PDP cell with gap of 50 um distances under the fixed gas pressure of 400 Torr and Xe content ratio of 10 %.

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Effects of Sb-Incorporation on the 2223 Phase in the Superconducting Bi-Pb-Sr-Ca-Cu-O System

  • Seong Han Kim;Dong Hoon Lee;Jong Sik Park;Seung Koo Cho;Sung Han Lee;Keu Hong Kim
    • Bulletin of the Korean Chemical Society
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    • 제15권2호
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    • pp.115-118
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    • 1994
  • Samples of ($Bi_{2-x}Sb_x)PbSr_2Ca_2Cu_3O_y$, compositions with x=0.0, 0.1, and 0.2 were prepared by solid-state reaction. The solubility of Sb into the 2223 phase is lower than 0.05 for the ratio of Sb/Bi. The lack of stability of the Sb-substituted $Bi_2O_2$ double layers is likely to cause the solubility low. There is no great dependence of lattice parameters on the Sb-content, and bonds around the square-pyramidal Cu atom are not affected by the $Sb^{3+}$ ion substituted. The superconducting transition temperature of this system is decreased gradually with increase of Sb, which is tentatively attributable to the perturbation of the Bi 6p-O 2p band and/or to the low volume fraction of the 2223 phase.

글로벌 모델에 의한 $CF_4$플라즈마에서의 라디칼 및 이온 밀도 계산 (Calculations of radical and ion densities in a $CF_4$ plasma using global model)

  • 이호준;태흥식;이정희;이용현;황기웅
    • 한국진공학회지
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    • 제7권4호
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    • pp.374-380
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    • 1998
  • 글로벌 모델을 사용하여 $CF_4$ 플라즈마 내부에서의 각 중성 및 이온 라디칼 밀도를 계산하였다. 중성 입자로서는 플루오린 원자가 가장 많고, 높은 입력 전력 조건의 경우 CF 나 $CF^+$와 같은 저 분자 해리종이 주종을 이룬다. 압력이 증가 할수록 하전 입자의 밀도는 증가하나 전자 온도의 감소로 이온화율은 감소한다. 공급 가스인 $CF_4$의 해리율은 압력에 따 라 증가한후 다시 감소하는 양상을 보인다. 전자 온도 및 밀도는 입력유량에 대해서 거의 변화가 없다. $CF_4$의 해리율은 유량 증가에 따라 선형적으로 감소하며 이는 $CF_3$의 증가와 CF의 감소로 이어진다. 식각 실험 결과와의 비교를 통해 플루오로 카본 이온종 및 높은 C/F비를 갖는 중성 라디칼의 상대적 밀도 증가가 $SiO_2$/Si식각 선택도 향상에 주요함을 알 수 있다.

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Model-Based Analysis of the $ZrO_2$ Etching Mechanism in Inductively Coupled $BCl_3$/Ar and $BCl_3/CHF_3$/Ar Plasmas

  • Kim, Man-Su;Min, Nam-Ki;Yun, Sun-Jin;Lee, Hyun-Woo;Efremov, Alexander M.;Kwon, Kwang-Ho
    • ETRI Journal
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    • 제30권3호
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    • pp.383-393
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    • 2008
  • The etching mechanism of $ZrO_2$ thin films and etch selectivity over some materials in both $BCl_3$/Ar and $BCl_3/CHF_3$/Ar plasmas are investigated using a combination of experimental and modeling methods. To obtain the data on plasma composition and fluxes of active species, global (0-dimensional) plasma models are developed with Langmuir probe diagnostics data. In $BCl_3$/Ar plasma, changes in gas mixing ratio result in non-linear changes of both densities and fluxes for Cl, $BCl_2$, and ${BCl_2}^+$. In this work, it is shown that the non-monotonic behavior of the $ZrO_2$ etch rate as a function of the $BCl_3$/Ar mixing ratio could be related to the ion-assisted etch mechanism and the ion-flux-limited etch regime. The addition of up to 33% $CHF_3$ to the $BCl_3$-rich $BCl_3$Ar plasma does not influence the $ZrO_2$ etch rate, but it non-monotonically changes the etch rates of both Si and $SiO_2$. The last effect can probably be associated with the corresponding behavior of the F atom density.

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Silver Ions in Zeolite A are Reduced by H$_2$ only at High Temperatures when 8-Rings are Blocked by Cs$^+$. Crystal Structures of Dehydrated $Ag_9Cs_3$-A Treated with H$_2$ at 23, 310, and 470${^{\circ}C}$

  • KIm, Yang;Seff, Karl
    • Bulletin of the Korean Chemical Society
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    • 제8권2호
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    • pp.69-72
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    • 1987
  • The structures of dehydrated $Ag_9Cs_3$-A treated with hydrogen gas at three different temperatures have been determined by single-crystal X-ray diffraction techniques. Their structures were solved and refined in the cubic space group Pm3m at 23(1) $^{\circ}C$. All crystals were ion exchanged in flowing streams of aqueous $AgNO_3$/$CsNO_3$ with a mole ratio 1:3.0 to achieve the desired crystal composition. The structures treated with hydrogen at $23^{\circ}C(a=12.288(1)\;{\AA})\;and\;310^{\circ}C(a=12.291(2)\;{\AA})$ refined to the final error indices R1 = 0.091 and R2 = 0.079, and 0.065 and 0.073, respectively, using the 216 and 227 reflections, respectively, for which I >3${\sigma}$(I). In both of these structures, eight $Ag^+$ ions are found nearly at 6-ring centers, and three $Cs^+$ ions lie at the centers of the 8-rings at sites of $D_{4h}$ symmetry. One $Ag^{\circ}atom$, presumably formed from the reduction of a $Ag^+$ ion by an oxide ion of a residual water molecule or of the zeolite framework during the dehydration process, is retained within the zeolite, perhaps in a cluster. In these two structures hydrogen gas could not enter the zeolite to reduce the $Ag^+$ ions because the large $Cs^+$ ions blocked all the 8-windows. However, hydrogen could slowly diffuse into the zeolite and was able to reach and to reduce about half of the $Ag^+$ ions in the structure only at high temperature ($470^{\circ}C$). The silver atoms produced migrated out of the zeolite framework, and the protons generated led to substantial crystal damage.

다중검출기유도결합플라즈마질량분석기를 이용한 Pu 동위원소비 정밀 분석법 (The Improved Method for Precise Determination of Pu Isotope Ratio using MC-ICP-MS)

  • 임성아;한은미;채정석;윤주용
    • Journal of Radiation Protection and Research
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    • 제35권3호
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    • pp.117-123
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    • 2010
  • Pu 동위원소는 기원에 따라 각기 다른 $^{240}Pu/^{239}Pu$ 동위원소비를 나타내는 특성이 있다. 질량분석법은 극미량 장반감기핵종 분석에 매우 유용한 방법으로서 검출기 특성상 낮은 검출한계를 갖고 있으며, 소량의 시료를 이용하여 짧은 시간에 측정을 할 수 있다는 장점을 갖고 있으므로 Pu을 비롯한 장반감기 핵종 분석에 유용하다. 다중검출기유도결합플라즈마질량분석기(Multicollector ICP-MS)는 다중검출시스템을 이용하여 분석하고자 하는 여러 핵종의 동시분석이 가능하며, 특별히 본 연구에서는 극미량 핵종의 검출이 가능한 multiple ion counter (MIC)를 사용하여 Pu 동위원소 분석에 적용하였다. 본 연구방법의 검출한계(detection limit)는 최적화된 조건에서 $^{239}Pu$$^{240}Pu$ 각각 $0.10\;fg\;ml^{-1}$ ($0.24\;{\mu}Bq\;ml^{-1}$), $0.12\;fg\;ml^{-1}$ ($0.97\;{\mu}Bq\;ml^{-1}$)이었으며, 240Pu 기준으로 약 200 cps 정도의 매우 낮은 농도수준에서 1%이하의 $^{240}Pu/^{239}Pu$ 동위원소비 계측편차를 나타내었다. 본 연구방법은 표준용액 및 다양한 매트릭스의 표준물질 분석에 적용함으로써 검증 확인하였다.