• Title/Summary/Keyword: Ion plating method

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A Study on the high velocity impact behavior of titanium alloy by PVD method (PVD처리한 티타늄 합금의 고속충격 거동에 관한 연구)

  • Sohn, Se-Won;Lee, Doo-Sung;Hong, Sung-Hee
    • Proceedings of the KSME Conference
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    • 2001.06a
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    • pp.567-572
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    • 2001
  • In order to investigate the fracture behaviors(penetration modes) and resistance to penetration during ballistic impact of Titanium alloy laminates and nitrified Titanium alloy laminates which were treated by PVD(Physical Vapor Deposition) method, ballistic tests were conducted. Evaporation, sputtering, and ion plating are three kinds of PVD method. In this research, Ion plating was used to achieve higher surface hardness and surface hardness test were conducted using a Micro vicker's hardness tester. Resistance to penetration is determined by the protection ballistic limit($V_{50}$), a statistical velocity with 50% probability for complete penetration. Fracture behaviors and ballistic tolerance, described by penetration modes, are respectfully observed at and above ballistic limit velocities, as a result of $V_{50}$ test and Projectile Through Plates (PTP) test methods. PTP tests were conducted with $0^{\circ}$ obliquity at room temperature using 5.56mm ball projectile. $V_{50}$ test with $0^{\circ}$ obliquity at room temperature were conducted with projectiles that were able to achieve near or complete penetration during PTP tests. Surface hardness, resistance to penetration, and penetration modes of Titanium alloy laminates are compared to those of nitrified Titanium alloy laminates.

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The study of Copper foil surface treatment for Flexible Copper Clad Laminate (FCCL) (플렉시블 동장적층판 개발을 위한 동박표면처리에 관한 연구)

  • Mun Won-Cheol;Lee Chang-Yong;Lee Jae-Hong;Jeong Seung-Bu
    • Proceedings of the KWS Conference
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    • 2006.05a
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    • pp.24-26
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    • 2006
  • The copper foil of 10fm of thickness was prepared, and the surface treatment on the copper foil was done by the method of the electrolytic plating in the acid solution with the sulfate ion as a purpose to remove the main element of the surface contaminant of copper variously. The structure on the surface of the copper foil in this study investigated AFM with SEM the changed phenomenon according to added plating time and current. The phenomenon of the structure's of the oxide on the surface of long plating time and high current growing was confirmed.

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Structural and discharge characteristics of MgO films prepared by Arc Ion Plating (AIP) method

  • Kim, Jong-Kuk;Kim, Do-Geun;Lee, Eun-Sung;Lee, Sung-Hun;Lee, Gun-Hwan
    • 한국정보디스플레이학회:학술대회논문집
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    • 2002.08a
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    • pp.625-627
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    • 2002
  • MgO thin films were deposited on glass and (100) Si substrates by an Arc Ion Plating (AIP) equipment using a magnesium metal target at various oxygen gas flow. In this work, we investigated the relationship between the structural properties and the discharge characteristics of MgO coating layers. X-ray diffraction and AFM have been used to study behaviors of the structure and surface morphology. The optical transmittance and the ion induced secondary electron emission coefficient of the MgO films have been also measured. The resistivity of the deposited MgO films was gradually increased from 0.17 G ohm/${\square}$ to 0.35 G ohm/${\square}$ with the oxygen gas flow. The growth rate of the MgO coating layer was decreased with increasing the oxygen gas flow, while the optical transmittance was improved.

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A Study on the Characteristics of the MgO Thin Film Deposited by the Hollow Cathode Discharge Ion Plating Method (HCD 이온 플레이팅법에 의해 증착된 MgO박막의 특성에 관한 연구)

  • Chung, Woo-Joon;Jeong, Heui-Seob;Whang, Ki-Woong
    • Proceedings of the KIEE Conference
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    • 1996.11a
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    • pp.200-202
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    • 1996
  • MgO film was deposited on the glass substrate by the hollow cathode discharge ion plating method and the characteristics of the MgO thin film such as deposition rate, crystalline orientation, surface morphology and secondary electron coefficient were investigated. The deposition rate of MgO thin films were $430^{\sim}1270{\AA}$/min at various temperatures and biases. The crystalline orientation of the MgO thin film changed from (200) to (220) upon increasing the HCD current from 100A to 200A. These results indicated that the crystallin orientation of the MgO thin film was determined by the super-saturation ratio. The (200) peak decreased and the (220) peak increased as the substrate bias increased, while both peaks increased as the substrate temperature increased. The grain size increased as the substrate bias increased and the secondary electron emission coefficient increased as the substrate bias increased.

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Wear properties of (Ti$_{1-x}$Cr$_{x}$)N coatings deposited by ion-plating method (이온 플레이팅법으로 제조한 (Ti$_{1-x}$Cr$_{x}$)N 박막의 마모특성에 관한 연구)

  • 이광희;박찬홍;이정중
    • Journal of the Korean institute of surface engineering
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    • v.34 no.2
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    • pp.125-134
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    • 2001
  • ($Ti_{1-x}$ $Cr_{x}$ )N coatings were deposited by an ion-plating method in a reactor with two separate metal sources, Ti and Cr. Ti was evaporated using an electron beam, while Cr evaporation was carried out by resistant heating. The Ti and Cr concentrations in the coatings were controlled by the Ti and Cr evaporation ratio. The coating hardness increased with increasing the Cr content(x) and showed a maximum value of 6,000 HK at around x=0.8. The critical load of the coatings, measured by the scratch test, was around 30 N. The wear resistance properties of the ($Ti_{1-x}$$Cr_{ x}$)N coatings were evaluated using a CSEM pin-on-disk type tribometer. A Cr-steel ball as well as a SiC ball, which had hardness values of 590 HK and 2,600 HK respectively, were used as the pin. After the wear test, the surface morphology, roughness and the concentration of the coatings were investigated, with the main focus being on the effect of wear debris and the transferred layer on the wear behavior.

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Effect of Working Pressure and Substrate Bias on Phase Formation and Microstructure of Cr-Al-N Coatings

  • Choi, Seon-A;Kim, Seong-Won;Lee, Sung-Min;Kim, Hyung-Tae;Oh, Yoon-Suk
    • Journal of the Korean Ceramic Society
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    • v.54 no.6
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    • pp.511-517
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    • 2017
  • With different working pressures and substrate biases, Cr-Al-N coatings were deposited by hybrid physical vapor deposition (PVD) method, consisting of unbalanced magnetron (UBM) sputtering and arc ion plating (AIP) processes. Cr and Al targets were used for the arc ion plating and the sputtering process, respectively. Phase analysis, and composition, binding energy, and microstructural analyses were performed using X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), and field emission scanning electron microscopy (FESEM), respectively. Surface droplet size of Cr-Al-N coatings was found to decrease with increasing substrate bias. A decrease of the deposition rate of Cr-Al-N films was expected due to the increase of substrate bias. The coatings were grown with textured CrN phase and (111), (200), and (220) planes. X-ray diffraction data show that all Cr-Al-N coatings shifted to lower diffraction angles due to the addition of Al. The XPS results were used to determine the $Cr_2N$, CrN, and (Cr,Al)N binding energies. The compositions of the Cr-Al-N films were measured by XPS to be Cr 23.2~36.9 at%, Al 30.1~40.3 at%, and N 31.3~38.6 at%.

Quality Management of ITO Thin Film for OLED Based on Relationship of Fabrication and Characteristics (OLED용 ITO박막의 공정조건과 품질특성 추론에 근거한 품질관리)

  • Seo, Jeong-Min;Park, Keun-Young;Lee, Sang-Ryong;Lee, Choon-Young
    • Journal of Institute of Control, Robotics and Systems
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    • v.14 no.4
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    • pp.336-341
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    • 2008
  • Recently, research on a flat panel display(FPD) has focused on organic light-emitting display(OLED) which has wide angle of view, high contrast ratio and low power consumption. ITO(Indium-Tin-Oxide) films are the most widely used material as a transparent electrode of OLED and also in many other display devices like LCD or PDP. The performance and efficiency of OLED is related to the surface condition of ITO coated glass substrate. The typical surface defect of glass substrate is measured for electric characteristics and physical condition for transmittance and roughness. Since ITO coated glass substrate can be destroyed for inspection about surface roughness, sheet resistance, film thickness and transmittance, precise fabrication condition should be made based on the estimated relationship. In this paper, ITO films were prepared on the commercial glass substrate by the Ion-Plating method changing the partial pressure of gas(Ar, 02) and the chamber temperature between $200^{\circ}C$ and $300^{\circ}C$. The characteristics of films were examined by the 4-point probe, supersonic thickness measurement, transmittance measurement and AFM. We estimated the relationship between processing parameters(Ar gas, O2 gas, Temperature) and properties of ITO films (Sheet Resistance, Film Thickness, Transmittance, Surface Roughness).

Wear Behavior of TiN Coatings Deposited on High Speed Steel and Alloy Tool Steel (TiN 코팅된 고속도강과 합금공구강의 마멸거동)

  • 김석삼;서창민;박준목
    • Transactions of the Korean Society of Mechanical Engineers
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    • v.19 no.3
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    • pp.705-712
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    • 1995
  • The wear characteristics and wear mechanisms in TiN coating deposited on high speed steel and alloy tool steel by ion plating were investigated. Pin on V-block wear tester was used for a wear test method. The specimen was composed of three kinds of high speed steel and alloy tool steel which had different hardness by changing the heat treating condition. Three kinds of coating thickness were also applied to each specimen. Microscopic observation of worn surfaces was made by SEM. The scratch test of coating surface by the ion plating showed that critical load to break the coating interface was greater than 50N. The critical load increased with both substrate hardness and coating thickness. The wear resistance of TiN coated high speed steel became 10 times greater than that of non-coated ones. SEM observation showed that leading edge of contact was compressive and trailing edge was under maximum tensile stress and then surface cracking broke out perpendicular to sliding direction.