• Title/Summary/Keyword: Ion damage

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Salt damage resistance of mortar substrate coated by the urethane and acrylic waterproofing membranes (우레탄계와 아크릴계 도막 방수재가 도포된 바탕 모르타르의 염해 저항성 평가)

  • Lee, Jun;Miyauchi, Hiroyuki;Koo, Kyung-Mo;Choe, Gyeong-Cheol;Miyauchi, Kaori;Kim, Gyu-Yong
    • Proceedings of the Korean Institute of Building Construction Conference
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    • 2013.05a
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    • pp.329-331
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    • 2013
  • The salt damage resistance of waterproofing membrane was evaluated on the cracked mortar substrate. The types of specimens are urethane, acrylic waterproofing membrane, and no coating mortar substrate. After these specimens were cured by water curing for 4 weeks, they were cured by atmospheric curing at 20±2Co for 8 weeks. The salt water immersion test was carried out by following KS F 2737, and the penetration depth of chloride ion into substrate was measured in 1, 4, 8, and 13 weeks. As a result, in the case of non coating specimen, the chloride ion penetrated within one week. In the coated specimens, a regardless of the membrane type, the chloride ion did not penetrate during 13 weeks-tests on condition that the cracked width of substrate is less than 0.3mm. Also, the penetration speeds of the coated specimens were lower than that of non coating specimen. Therefore, our results reached a conclusion that waterproofing membrane has high salt damage resistance.

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Chloride-ion Test of Seaside Concrete Structure (임해 콘크리트 구조물의 염분 침투량 분석)

  • 이장화;장종탁
    • Proceedings of the Korea Concrete Institute Conference
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    • 1990.10a
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    • pp.123-124
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    • 1990
  • Seaside concrete structure is deteriorated by chloride-ion, sulphate and salt cristalization in concrete pore. Therefore the amount of these chemical substance should be analyzed for evaluating the durability of seaside concrete structure. In this study, the amount of chloride-ion in concrete was surveyed in order to estimate the damage state of concrete structure within am influence of seawater.

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Room Temperature Luminescence from ion Beam or Atmospheric Pressure Plasma Treated SrTiO3

  • Song, Jin-Ho;Seok, Jae-Gwon;Yeo, Chang-Su;Lee, Gwan-Ho;Song, Jong-Han;Sin, Sang-Won;Choe, Jin-Mun;Jo, Man-Ho
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.02a
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    • pp.530-531
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    • 2013
  • 3 MeV protonirradiated SrTiO3 (STO) single crystal exhibits a blue and green mixed luminescence. However, the same proton irradiated STO deposited with very thin Pt layer does not show any luminescence. This Pt layer involved in preventing the damage caused by arcingthat comes from tens of kV surface voltage build-up due to secondary electron induced charge up at the surface of insulator during ion beam irradiation. It implies that luminescence of ion irradiated STO originated from the modified STO surface layer caused by arcing rather than direct ion beam irradiation effect. Atmospheric pressure plasma, a simple and cost-effective method, treated STO also exhibits the same kind of blue and green mixed luminescence as the ion beam treated STO, because this plasma also creates a surface damage layer by arcing.

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Room-Temperature Luminescence from Ion Beam or Atmospheric Pressure Plasma-Treated SrTiO3

  • Song, J.H.;Choi, J.M.;Cho, M.H.;Choi, E.J.;Kim, J.;Song, J.H.
    • Applied Science and Convergence Technology
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    • v.23 no.5
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    • pp.261-264
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    • 2014
  • $SrTiO_3$ (STO) single crystal irradiated with a 3-MeV proton beam exhibits blue and green mixed luminescence. However, the same proton beam when used to irradiate STO with a very thin layer of deposited Pt does not show any luminescence. This Pt layer prevents any damage which may otherwise be caused by arcing, which stems from the accumulated surface voltage of tens of kV due to the charge induced by secondary electrons on the surface of the insulator during the ion beam irradiation process. Hence, the luminescence of ion-irradiated STO originates from the modification of the STO surface layer caused by arcing rather than from any direct ion beam irradiation effect. STO treated with atmospheric-pressure plasma, a simple and cost-effective method, also exhibits the same type of blue and green mixed luminescence as STO treated with an ion beam, as the plasma also creates a layer of surface damage due to arcing.

Annealing Behavior of Ar Implant Induced Damage in Si (Ar이 이온주입된 Si 기판의 결함회복 특성)

  • 김광일;이상환;정욱진;배영호;권영규;김범만;삼야박
    • Journal of the Korean Vacuum Society
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    • v.2 no.4
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    • pp.468-473
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    • 1993
  • Damages on Si substrate induced by Ar ion implantation and it annealing behavior during rapid thermal annealing were investigated by the cross-sectional TEM (transmissin electron microscopy), RB(Rutherfordbackscattering) spectra an dthermal wave (TW) modulation reflectance methods. Continuous amorphous layer extending to the surface were generated by Ar ion implantation for higher doses than 1 $\times$1015cm-2. The recrystallization of the amorphous layer prodeeded as the annealing temperature increased . However the amorphous /crystal interfacial undulations caused the micro twins and damage clusters. Damage clusters generated by lower doses than 1 $\times$1015 cm-2 disappeared slowly as the annealing temperature increased, but even at 110$0^{\circ}C$ a few damage clusters still remained.

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Numerical simulation of three-dimensional crack features and chloride ion transport in unsaturated and damaged mortar

  • Zhiyong Liu;Yunsheng Zhang;Jinyang Jiang;Rusheng Qian;Tongning Cao;Yuncheng Wang;Guowen Sun
    • Computers and Concrete
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    • v.31 no.6
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    • pp.485-499
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    • 2023
  • Both damage and unsaturated conditions accelerate the transport of erosive media inside concrete. However, their combined effects have not been fully investigated. A multiscale mortar model using representative volume elements is developed, capturing the number and distribution in each phase. Afterwards, mortar damage microstructure evolution is simulated in the tensile process. Finally, the unsaturated mortar transport is predicted and analysed. The results indicate that damage significantly affects the diffusion process in the early stage, while the transport performance is weakened due to the obstruction of the nontransport phase in the later stage. The higher the saturation and the more connected pores, the faster the diffusion rate of chloride ions. Chloride ions spread around the cracks in a tree-like manner along. The model can very well predict the chloride ion transport performance of unsaturated and damaged mortar.

Blanking Process of Aluminum Thin Sheet for Lithium Ion Battery (리튬 이온전지용 알루미늄 박판의 블랭킹 공정에 관한 연구)

  • Kim, M.G.;Kim, J.H.;Shin, H.J.;Moon, J.H.;Ko, D.C.
    • Transactions of Materials Processing
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    • v.30 no.4
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    • pp.179-185
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    • 2021
  • Lithium ion batteries are generally manufactured by laser and etching using aluminum thin sheet. These processes are relatively expensive and have low productivity. In this study, blanking process of aluminum thin sheet for lithium ion battery was employed to replace laser cutting and etching process, all to reduce the production cost and improve productivity. Mechanical properties for aluminum and coating were determined by experimental results and rule of mixture for FE analysis of blanking process. Normalized Cockcroft-Latham criteria was also applied to describe shear behavior and critical damage values were determined by comparison of analytical and experimental result. We performed FE analysis to investigate the effects of clearance and punch-die radius on sheared surface of aluminum thin sheet and to determine optimal process condition. We manufactured the die set using the determined optimal process and conducted an experiment to confirm the feasibility of blanking process. The sheared surface of manufactured product was observed by optical microscope. As a results, the proposed process conditions successfully achieved the dimensional requirement in production of lithium ion battery parts.

The Characterization of Electrolytic Ion Water Generator by Electrode (전극에 따른 전해 이온수 발생장치의 특성)

  • Han, Byung-Jo;Lee, Yeon;Ryu, Bong-Jo;Koo, Kyung-Wan
    • The Transactions of The Korean Institute of Electrical Engineers
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    • v.65 no.10
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    • pp.1786-1791
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    • 2016
  • The damage has occurred inside the semiconductor pattern When using conventional wet station for semiconductor. It was used for electrolytic ion water generator in order to prevent damage to the semiconductor pattern. It was designed and developed a flow path electrode and the mesh electrode to check the efficiency of the electrode. And It confirmed the expected results through the simulation of the flow path. and ORP were measured in accordance with the current and voltage of mesh electrode and flow paht electrodes. Flow path electrode 22A is 3V, up to pH 9.8, the value of ORP-558mV was measured and the mesh electrode was measured up to pH 9.8, ORP -350mV.

A study of ion distribution after as heavy ion damage treatments (Arsenic heavy ion damage 처리 후 이온 분포에 관한 연구)

  • 안병목;정원채
    • Proceedings of the IEEK Conference
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    • 1998.06a
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    • pp.323-326
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    • 1998
  • 본 연구는 boron-doped 실리콘 기판에 heavy 인온인 비소를 먼저 이온 주입시키고 비소의 주입에 의해 실리콘 표면이 손상된 영역에 다시 인을 이온 주입시켰을때, 인의 확산을 관찰하기 위해 microtec 시뮬레이터를 통해 모의공정실험을 실행하였다. 손상된 비정질의 실리콘 기판에서 열처리 전과 inet(N/sub 2/) 분위기에서 인은 느리게 확산을 하였다. 그렇지만 dry와 wt oxidation 열처리 분위기에서는 의의 확산 속도가 증가됨 (OED:oxidation-enhanced idfusion)을 관찰되었다. 실리콘 기판에서 인의 확산을 관찰하기 위해 ICECREM 시뮬레이터를 사용하여 앞의 경우와 동일하게 먼저 비소를 주입하여 실리콘 표면에 손상을 입히고 그 다음 공정에서 인을 주입하였을 때, 열처리 전과 inet, dry 산화분위기에서는 비정질의 실리콘 기판에 이온 주입한 경우와 동일하게 의의 확산 속도가 증가하였지만, wet 산화분위기에서는 오히려 dry 산화분위기에서 보다 확산이 늦어짐이 관찰되었다.

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