• Journal of the Korean Institute of Telematics and Electronics
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• v.26 no.11
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• pp.1658-1665
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• 1989

Reactor design considerations over several critical parameters for a planar type reactive ion etcher are given. The etch uniformity is taken as a principal design constraint. The characteristics of economicaly available vacuum pumping system are taken as practical design constraints. A set of theoretical conditions on the chamber geometry and on the gas delivery and vacuum system, that satisfy the design constraints, are derived from basic properties of RF glow discharge and gas dynamics. The theoretical results are applied to decide design parameters of a practical single-wafer-per-chamber planar type reactive ion etching machine.

• Progress in Medical Physics
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• v.4 no.2
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• pp.9-17
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• 1993

The purpose of this paper is to develop a simple system to measure dose distribution in small fields of NEC LINAC 6 MVX using film and solid water instead of ion chamber and water phantom. Specific quantities measured include percent depth dose (PDD), off-axis ratio (OAR). We produced square fields of 1 to 3cm in perimeter in 1cm steps measured at SAD of 80cm. The PDD and OAR measured by film was compared with measurement made with ion chamber. We calculated the TMR from the basic PDD data using the conversion formula. The trends of our measured beam data and philips LINAC are similar each other. The measurement for the small field using film and solid water was simple. Hand-made film phantom was especially useful to measure OARs for the stereotactic radiosurgery.

• Journal of Radiation Protection and Research
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• v.34 no.2
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• pp.43-48
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• 2009

When the PDD (percentage depth dose) in the megavoltage beams is measured in the water phantom, the polarity and ion recombination effects of ionization chambers with depth in water are not usually taken into consideration. We try to investigate if those variations with depth should be taken into consideration or could be ignored for the thimble type semiflex ionization chamber (PTW $31010^{TM}$, SN 1551). According to the recommendation of IAEA TRS-398, the 4 representative depths of $d_s$, $d_{max}$, $d_{90}$ and $d_{50}$ were used for the electron beams. For the photon beams, the 4 depths were arbitrarily chosen for the photon beams, which were $d_s$, $d_{max}$, $d_{10}$ and $d_{20}$. For the high energy photon beam both polarity and ion recombination factors of the chamber with depth in water gives the good agreements within the maximum $\pm$0.2%, while the $C_{polS}$ with depth came within the maximum $\pm$ 0.4% and the $C_{IRS}$ within the maximum $\pm$0.6% in every electron beam used. This study shows that PDI (percentage depth ionization) could be a good approximation to PDD for the chamber used.

• Progress in Medical Physics
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• v.2 no.2
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• pp.155-160
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• 1991

We have studied the effective point of measurement for cylindrical ion chamber in water phantom for medical electron beams. Markus parallel plate chamber water phantom are used for the measurement of depth dose to determine the depth of the effective point of measurement for various energies(for electron 6MeV, 9MeV, 12MeV, 16MeV, and 20MeV; Co-60; for photon 6MV, 15MV). Cylindrical ion chambes(PTW233643 with r=2.75mm, PR-05P with r=2mm, and PM30 wiht r=15mm are used for the measurement of depth dose by same mtethod and the values of d$\_$50/ and R$\_$p/ obtained by three cylindrical chambers were compared with those of a flat chamber. From this we could evaluate the effective measuring points of cylindrical ion chamber. The effective point of measurement was estimated as 0.4～0.6r shifted toward surface from the center of the chamber for electron beam, 0.3～0.7r for $\^$60/Co X-ray.

• Proceedings of the Korean Vacuum Society Conference
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• 2014.02a
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• pp.154.1-154.1
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• 2014

Indium gallium zinc oxide (IGZO)는 차세대 디스플레이 평판 패널에 사용되는 반도체 화합물의 일종으로 최근 주목받고 있는 물질의 하나이다. 기존의 IGZO를 사용하여 박막을 증착한 뒤 표면 처리를 통해 박막의 특성 변화에 대한 연구들이 진행되어 왔으며, 기존의 연구들은 plasma 환경에 노출을 시켜 간접적인 plasma treatment를 통해 박막의 특성을 향상시켜 왔다. 본 연구에서는 기존의 plasma treatment에서 발견된 방식인 ion beam treatment를 통해 플라즈마를 직접적으로 표면에 조사하여 박막의 특성 변화를 알아보았다. 한국표준과학연구원에서 자체 제작한 chamber를 이용하여 RF sputter로 Si wafer 위에 IGZO 박막을 증착하고 수소 ion beam treatment를 한 뒤, SEM과 XPS를 사용하여 박막 표면의 물성 변화를 분석하였다. 실험에 사용된 chamber에는 sputter gun과 ion beam이 함께 장착되어 있으며, scroll pump와 TMP를 사용하여 pressure를 유지하였다. 실험 시 base pressure는 $1.4{\times}10^{-6}Torr$였다. RF power 150 W. ion beam power 2,000 V에서 실험을 진행하였다.

• Progress in Medical Physics
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• v.29 no.1
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• pp.16-22
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• 2018

Current dosimetry protocols recommend the use of parallel-plate chambers in electron dosimetry because the electron fluence perturbation can be effectively minimized. However, substitutable methods to calibrate and measure the electron output and energy with the widely used cylindrical chamber should be developed in case a parallel-plate chamber is unavailable. In this study, we measured the correction factors and absolute dose-to-water of electrons with energies of 4, 6, 9, 12, 16, and 20 MeV using Farmer-type and Roos chambers by varying the dose rates according to the AAPM TG-51 protocol. The ion recombination factor and absolute dose were found to be varied across the chamber types, energy, and dose rate, and these phenomena were remarkable at a low energy (4 MeV), which was in good agreement with literature. While the ion recombination factor showed a difference across chamber types of less than 0.4%, the absolute dose differences between them were largest at 4 MeV at approximately 1.5%. We therefore found that the absolute dose with respect to the dose rate was strongly influenced by ion-collection efficiency. Although more rigorous validation with other types of chambers and protocols should be performed, the outcome of the study shows the feasibility of replacing the parallel-plate chamber with the cylindrical chamber in electron dosimetry.

• Journal of the Korean Vacuum Society
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• v.8 no.4B
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• pp.548-555
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• 1999

The NBI (Neutral BGeam Injection) System for the Korea Superconducting Tokamak Advanced Research (KSTAR) is composed of ion sources, neutralizers, bending magnets, ion dumps, and calorimeter. The vacuum chamber, in which all of the beam line components are enclosed, is composed of differential pumping system for the effective transfer of the neutral beams. The needed pumping speeds of each of the divided vacuum chamber and the optimized gas flow rate ot the neutralizer were calculated with the help of the particle balance equations. The minimum gas flow rate to the ion sources for producing needed beam current (120kV, 65A, 78MW), the pressure distributions in the vacuum chamber for minimizing re-ionization loss, and the beam loss rate on the beam line components were used as the input in the calculation. Also the scenario for short pulse operation was determined by analysing the time dependent equations. It showed that beam extraction during less than 0.5 sec could be made only with TMP.

• Journal of Korean Vacuum Science & Technology
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• v.7 no.1
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• pp.1-7
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• 2003

The pressure distributions in the test stand built for developing KSTAR NBI ion sources were obtained using a network system composed of conductance elements modeling the ion source, the neutralizer, and other beam line components. The allowable regime was defined on the coordinates of the gas supply rate to the ion source and the neutralizer, considering the proper conditions of the three critical parameters, the ion source pressure for good arc discharge, the pressure integral in the neutralizer for sufficient neutralization, and the chamber pressure for minimum neutral beam loss. The neutral beam evolution along the path from the ion source extraction grid to the calorimeter through the neutralizer, the bending magnet and the vacuum chamber was estimated for typical pressure distributions.

• Journal of the Korean Society of Manufacturing Technology Engineers
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• v.24 no.4
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• pp.400-406
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• 2015

This study researched the structure of the source of an ion milling machine used to fabricate a scanning electron microscope (SEM) sample. An ion source is used to mill out samples of over 1 mm dimension using a broad ion beam to generate plasma between the anode and cathode using a permanent magnet. To mill the sample in the vacuum chamber, the ion source should be greater than 6 kV for a positive ion current over $200{\mu}A$. To discover the optimum operating conditions for the ion miller, the diameter of the extractor, anode shape, and strength of the permanent magnet were varied in the experiments. A silicon wafer was used as the sample. The sputter yield was measured on the milled surface, which was analyzed using the SEM. The wafer was milled by injecting 1 sccm of argon gas into the 0.5 mTorr vacuum chamber.

• Transactions of the Korean Society of Mechanical Engineers A
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• v.32 no.9
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• pp.728-732
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• 2008

This paper presents ion-based micro vibration sensor for the ultra-high frequency vibration detection. Presented sensor uses the motion of anion and cation in an electrolyte. Electrolyte vibration sensors have the high shock survival characteristics and a simple read-out circuit because of the small mass and own charges of ions. Presented sensor measures the induced electric potential by the mechanical-electrical coupling. It consist of electrolyte chamber and detection electrode. Electrolyte chamber was fabricated by PDMS molding. Detection electrode was made of gold evaporation on pyrex glass. Size of electrolyte chamber was designed as $600{\times}600{\times}100um$. Detection electrode had 200nm-thick and 42um-gap. In the experimental study, 5.8M sodium Chloride (NaCl) solution was used as electrolyte in 36nl-chamber. Mechanical vibration was measured from 2kHz to 4MHz.