• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2005.05a
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• pp.62-65
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• 2005

We studied the nematic liquid crystal (NLC) alignment capability by the Ultraviolet (UV) alignment method on a-C:H thin-films, and investigated electro-optical performances of the UV aligned twisted nematic (TN)-liquid crystal display (LCD) with the UV exposure on a-C:H thin film surface. A good LC alignment by UV irradiation on a-C:H thin-film surfaces was achieved. Monodomain alignment of the UV aligned TN-LCD can be observed. The good electro-optical (EO) characteristics of the UV aligned TN-LCD was observed with oblique UV exposure on the a-C:H thin film surface for 1min.

• Nuclear Engineering and Technology
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• v.55 no.1
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• pp.378-390
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• 2023

The SPES (Selective Production of Exotic Species) facility, currently under development at Legnaro National Laboratories of INFN, aims at the production of intense RIB (Radioactive Ion Beams) employing the Isotope Separation On-Line (ISOL) technique for interdisciplinary research. The radioactive isotopes of interest are produced by the interaction of a multi-foil uranium carbide target with a 40 MeV 200 μA proton beam generated by a cyclotron proton driver. The Target Ion Source (TIS) is the core of the SPES project, here the radioactive nuclei, mainly neutron-rich isotopes, are stopped, extracted, ionized, separated, accelerated and delivered to specific experimental areas. Due to efficiency reasons, the TIS unit needs to be replaced periodically during operation. In this highly radioactive environment, the employment of autonomous systems allows the manipulation, transport, and storage of the TIS unit without the need for human intervention. A dedicated remote handling infrastructure is therefore under development to fulfill the functional and safety requirement of the project. This contribution describes the layout of the SPES target area, where all the remote handling systems operate to grant the smooth operation of the facility avoiding personnel exposure to a high dose rate or contamination issues.

• Journal of radiological science and technology
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• v.43 no.5
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• pp.389-395
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• 2020

The evaluation of radioactivated components of heavy-ion accelerator facilities affects the safety of radiation management and the exposure dose for workers. and this is an important issue when predicting the disposal cost of waste during maintenance and dismantling of accelerator facilities. In this study, the FLUKA code was used to simulate the proton treatment device nozzle and classify the radio-nuclides and total radioactivity generated by each component over a short period of time. The source term was evaluated using NIST reference beam data, and the neutron flux generated for each component was calculated using the evaluated beam data. Radioactive isotopes caused by generated neutrons were compared and evaluated using nuclide information from the International Radiation Protection Association and the Korea Radioisotope association. Most of the nuclides produced form of beta rays and electron capture, and short-lived nuclides dominated. However, In the case of ⁵⁴Mn, which is a radioactive product of iron, the effect of gamma rays should be considered. In the case of tritium generated from a material with a low atomic number, it is considered that handling care should be taken due to its long half-life.

• Journal of the Korean Society of Radiology
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• v.17 no.7
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• pp.1157-1164
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• 2023

This study measures the additional dose for each treatment area using kV X-ray based OBI (On-Board Imager) and CBCT (Cone-Beam CT), which have excellent spatial resolution and contrast, and evaluates the adequacy and stability of radiation management aspects of IGRT. The subjects of the experiment were examined with OBI and CBCT attached to a linear accelerator (Clinac IX), and ring-shaped Halcyon CBCT under imaging conditions for each treatment area, and the dose at the center was measured using an ion chamber. OBI single fraction dose was measured as 0.77 mGy in the head area, 3.04 mGy in the chest area, and 7.19 mGy in the pelvic area. The absorbed doses from the two devices, Clinac IX CBCT and Halcyon CBCT, were measured to be similar in the pelvic area, at 70.04 mGy and 70.45 mGy. and in chest CBCT, the Clinac IX absorbed dose (70.05 mGy) was higher than the Halcyon absorbed dose (21.01 mGy). The absorbed dose to the head area was also higher than that of Clinac IX (9.08 mGy) and Halcyon (5.44 mGy). In kV X-ray-based IGRT, additional radiation exposure due to photoelectric absorption may affect the overall volume of the treatment area, and caution is required.

• Progress in Medical Physics
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• v.27 no.4
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• pp.241-249
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• 2016

The present study used a digital angiography x-ray device to measure the space dose and exposure dose of patients and practitioners using x-ray tube shielding devices developed in our laboratory. The intent of the study was to reduce the space dose within the test room, and to reduce the exposure dose of patients and practitioners. The patient and practitioner exposure doses were measured in five configurations in a human body model. The glass dosimeter was placed on the eye lenses, thyroid glands, left shoulder, right shoulder, and gonads. The beam was collimated at full size and at a 48% reduction for a comparative analysis of the measurements. The space dose was measured with an ion chamber at distances of 50 cm, 100 cm, and 150 cm from the x-ray tube under the following conditions: no shielding device; a shielding device made of 3-mm-thick lead (Pb) [Pb 3 mm shield], and a shielding device made of 3-mm-thick Pb (outside) and 3-mm-thick aluminum (Al) (inside) [Pb 3 mm＋Al 3 mm shield]. The absorbed dose was the lowest when the 3-mm-thick Pb＋3-mm-thick Al shield was used. For measurements made with collimated beams with a 48% reduction, the dose was the lowest at $154{\mu}Gy$ when the 3-mm-thick Pb＋3-mm-thick Al shield was used, and was $9{\mu}Gy$ lower than the measurements made with no shielding device. If the space dose can be reduced by 20% in all situations where the C-arm is employed by using the x-ray tube shielding devices developed in our laboratory, this is expected to play an important role in reducing the annual exposure dose for patients, practitioners, and assistants.

• Proceedings of the Optical Society of Korea Conference
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• 2009.02a
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• pp.133-134
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• 2009

Cold temperature development (CTD) of electron beam (EB) patterned resists and subsequent dry etching were investigated for fabrication of nano-patterned Niobium (Nb). Bulky Nb fims on GaAs substrates were deposited with EB evaporation. Line patterns on Nb cathode were fabricated by EB patterning and reactive ion etching (RIE). Size deviations of nano-sized line patterns from CAD designed patterns are dependent on the EB total exposure, but it can be improved by CTD of EB-exposed resist. Line patterns of 10 to 300 nm widths of EB-exposed resist patterns were drawn under various exposure conditions of $0.2{\mu}s$/dot (total 240,000 dot) with a constant current (50 pA). Compared with room temperature development (RTD), the CTD improves pattern resolution due to the suppression of backscattering effect. RIE with $CF_4$ was performed for formation of several nano-sized line patterns on Nb. Each EB-resist patterned samples with RTDs and CTDs were etched with two different $CF_4$ gas pressures of 5 Pa. Nb etching rate increases while GaAs (or ZEP) etching rate decreases as the chamber pressure increases. This different dependent of the etching rate on the $CF_4$ pressure between Nb and GaAs (or ZEP) has a significant meaning because selective etching of nano-sized Nb line patterns is possible without etching of the underlying active layer.

• Transactions of the Korean Society of Mechanical Engineers A
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• v.31 no.5
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• pp.550-555
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• 2007

The effective fracture toughness testing of materials intended for application in Micro Electro Mechanical Systems (MEMS) devices is required in order to improve understanding of how micro sized material used in device may be expected to perform upon the micro scale. ${\gamma}$-TiAl based materials are being considered for application in MEMS devices at elevated temperatures. Especially, in Alloy 4, both ${\alpha}_2$ and ${\gamma}$ lamellae were altered markedly in 3,000 h, $700^{\circ}C$ exposure. Parallel decomposition of coarse ${\alpha}_2$ into bunches of very fine (${\alpha}_2+{\gamma}$) lamellae. Parallel decomposition of coarse ${\alpha}_2$ into bunches of very fine (${\alpha}_2+{\gamma}$) lamellae. The materials were examined 2 types Alloy 4 on heat exposed specimen($700^{\circ}C$, 3,000 h) and no heat exposed one. Micro sized cantilever beams were prepared mechanical polishing on both side at $25{\sim}30{\mu}m$ and electro final stage polishing to observe lamellar orientation of same colony with EBSD (Electron Backscatter Diffraction Pattern). Through lamellar orientation as inter-lamellae or trans-lamellae, Cantilever beam was fabricated with Focused Ion Beam(FIB). The directional behavior of the lamellar structure was important property in single material, because of the effects of the different processing method and variations in properties according to lamellar orientation. In MEMS application, it is first necessary to have a reliable understanding of the manufacturing methods to be used to produce micro structure.

• Journal of Radiation Protection and Research
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• v.12 no.1
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• pp.1-11
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• 1987

Central axis percentage depth-doses, P(%), were measured at the points from the 2.5cm depth of reference point to 20 cm depth with 2.5 cm interval. Distance from the X-ray target to the water phantom($30{\times}30{\times}30cm^3$) surface was 1 m, and at this point three different beam sizes of $5cm{\phi},\;10cm{\phi},\;and\;15cm{\phi}$ were used. While the X-ray tube voltage varied from 150 to 250 kV, the tube current remained constant at 5 mA. Absorbed dose rate in water, $\dot{D}_w$, was determined using the air kerma calibration factor, $N_k$, which was derived from the exposure calibration factor, $N_x$, of the NE 2571 ion chamber. The reference exposure rate, $\dot{X}_c$, was measured using the Exradin A-2 ion chamber calibrated at ETL, Japan. The half value layers of the X-rays determined to meet ETL calibration qualities. The absorbed dose rates determined at the calibration point were compared to the values obtained from Burlin's general cavity theory, and the percentage depth-dose values determined from $N_k$ showed a good agreement with the values of the published depth dose data(BJR Suppl. 17).

• Journal of Radiation Protection and Research
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• v.22 no.3
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• pp.207-218
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• 1997

Purpose: The objective of this study is to develop an algorithm for estimation of tumor dose using measured transmission dose as a part of the development of on-line dosimetry system. Materials and Methods: Data of transmission dose were measured under various FS, Tp and PCD with a special water phantom for 6 MV and 10 MV X-ray. SCD (source-chamber distance) was set to 150 cm. Measurements were conducted with a 0.125 cc ion chamber. Results: Using measured data and regression analysis, two algorithms were developed for estimation of expected reading for measured data. Algorithm 1 consisted of the quadratic function of PCD and the tertiary function of AlP (area-perimeter ratio). Algorithm 2 consisted of the tertiary function of log(A/P)and the tertiary function of PCD. Algorithm 2 required less data set and was more accurate in comparing expected and observed dose. Conclusion: Using the algorithm developed, transmission dose can be estimated for any exposure condition, i.e. any given Tp, PCD and FS with high accuracy. To complete this algorithm, further developments are needed regarding the beam modifying device, the tissue inhomogeneity and the irregular body surface.

• Korean Journal of Materials Research
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• v.26 no.9
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• pp.486-492
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• 2016

Tungsten (W) thin film was deposited at $400^{\circ}C$ using pulsed chemical vapor deposition (pulsed CVD); film was then evaluated as a nucleation layer for W-plug deposition at the contact, with an ultrahigh aspect ratio of about 14~15 (top opening diameter: 240~250 nm, bottom diameter: 98~100 nm) for dynamic random access memory. The deposition stage of pulsed CVD has four steps resulting in one deposition cycle: (1) Reaction of $WF_6$ with $SiH_4$. (2) Inert gas purge. (3) $SiH_4$ exposure without $WF_6$ supply. (4) Inert gas purge while conventional CVD consists of the continuous reaction of $WF_6$ and $SiH_4$. The pulsed CVD-W film showed better conformality at contacts compared to that of conventional CVD-W nucleation layer. It was found that resistivities of films deposited by pulsed CVD were closely related with the phases formed and with the microstructure, as characterized by the grain size. A lower contact resistance was obtained by using pulsed CVD-W film as a nucleation layer compared to that of the conventional CVD-W nucleation layer, even though the former has a higher resistivity (${\sim}100{\mu}{\Omega}-cm$) than that of the latter (${\sim}25{\mu}{\Omega}-cm$). The plan-view scanning electron microscopy images after focused ion beam milling showed that the lower contact resistance of the pulsed CVD-W based W-plug fill scheme was mainly due to its better plug filling capability.