• Title/Summary/Keyword: Ion Range

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Electrochemical Characteristics of Aqueous Polymeric Gel Electrolyte for Supercapacitor (수퍼커패시터용 수용성 고분자 젤 전해질의 전기화학적 특성)

  • ;Masashi ISHIKAWA;Masayuki MORITA
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2001.11a
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    • pp.93-96
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    • 2001
  • We have reported to make nanostructured cobalt oxide electrode that have large capacitance over than 400F/g (specific capacitance) and good cycleability. But, It had serious demerits of low voltage range under 0.5V and low power density. Therefore, we need to increase voltage range of cobalt oxide electrode. we report here on the electrochemical properties of sol-gel-derived nanoparticulate cobalt xerogel in 1M KOH solution and aqueous polymeric gel electrolyte. In solution electrolyte, cobalt oxide electrode had over than 250F/g capacitance consisted of EDLC and pseudocapacitance. In gel electrolyte, cobalt oxide electrode had around 100F/g capacitance. This capacitance was only surface EDLC. In solution electrolyte, potassium ion as working ion reacted with both of layers easily. However, In gel electrolyte, reacted with only surface-active layer. Its very hard to reach resistive layer. So, e have studied on pretretmetn of electrode to contain working ions easily. We'll report more details.

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Optimization of the Profiles in MeV Implanted Silicon Through the Modification of Electronic Stopping Power

  • Jung, Won-Chae
    • Transactions on Electrical and Electronic Materials
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    • v.14 no.2
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    • pp.94-100
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    • 2013
  • The elements B, P and As can each be implanted in silicon; for the fabrication of integrated semiconductor devices and the wells in CMOS (complementary metal oxide semiconductor). The implanted range due to different implanted species calculated using TRIM (Transport of Ions in Matter) simulation results was considered. The profiles of implanted samples could be measured using SIMS (secondary ion mass spectrometry). In the comparison between the measured and simulated data, some deviations were shown in the profiles of MeV implanted silicon. The Moliere, C-Kr, and ZBL potentials were used for the range calculations, and the results showed almost no change in the MeV energy region. However, the calculations showed remarkably improved results through the modification of the electronic stopping power. The results also matched very well with SIMS data. The calculated tolerances of $R_p$ and ${\Delta}R_p$ between the modified $S_e$ of TRIM and SIMS data were remarkably better than the tolerances between the TRIM and SIMS data.

Electric Conductivities of LaC $l_3$-LiCl Binary Melts (용융 LaC $l_3$-LiCl 2성분계 혼합염의 전도도)

  • Kim Ki-Ho
    • Journal of Surface Science and Engineering
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    • v.37 no.5
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    • pp.301-306
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    • 2004
  • Electric Conductivities of $LaCl_3$-LiCl binary melts have been measured by the Kohlausch bridge method over the range of their liquidus temperatures to about 1200 K. The electric conductivity increases with the content of LiCl for all over the composition range of binary melts. Composition dependence of the electric conductivity and molar conductivity for the binary melt shows a non-linear relation from the additivity line, and the deviations displays a maximum value at about 60 mol % LiCl. This suggest the existence of the complex ion of$ LaCl_{4}^{-}$ in the melt. Activation energy for electric conductivity of the binary melts decrease monotonously with increasing content of LiCl.l.

Detection of Al3+ by fluorescent turn-on nitrogen/sulphur-binary doped carbon dots

  • Siti Raudhatul Kamali;Chang-Nan Chen;Tai-Huei Wei
    • Analytical Science and Technology
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    • v.36 no.4
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    • pp.161-169
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    • 2023
  • In this study, a straightforward and precise nitrogen/sulphur-codoped carbon dots (N/S-CD) was produced using a microwave irradiation approach. The N/S-CD was formulated from succinic acid (SA), bis-(3-aminopropyl)-amine (BAPA), and sodium thiosulphate (STS) as sources of carbon, nitrogen, and sulphur, respectively. The synthesized N/S-CD established a valuable quantum yield (QY) of 70 % and was sensitive to aluminium ion (Al3+) with a detection limit of 0.21 µM and a linear concentration range of 0-100 µM. When detecting Al3+ in real water samples, the N/S-CD resulted in a satisfactory recovery in the range of 91.14 %-103.37 %. Thus, the proposed study is very promising for Al3+ detection in environmental water samples.

A Continuous Monitoring System for the Determination of Cyanide Ions Using Nickel Complexation Reaction (흡수분광법을 적용한 시안화이온의 연속 모니터링 장치 구성 및 적용)

  • Kim, Kyung Min;Lee, Sang Hak;Kim, Young Ho;Kim, Gyu Man;Oh, Sang-Hyub
    • Applied Chemistry
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    • v.16 no.1
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    • pp.25-28
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    • 2012
  • A determination method of cyanide ion (CN-) using nickel complexation reaction by continuous monitoring system. The mechanical parameters and chemical conditions of the complexation reaction were investigated prior to application of continuous monitoring system for determination of cyanide. On the optimized conditions, the calibration curve was linear over the range from 5.0×10-6 to 1.0×10-4 M. In this range, 2.40% of the reproducibility (RSD, n=3) was obtained. The limit of detection (3σ/s) was calculated to be 1.8×10-6 M.

NO Removal Reactoin by Cu/zeolite (CU/제올라이트에 의한 NO 제거반응)

  • 신창섭
    • Journal of the Korean Society of Safety
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    • v.6 no.3
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    • pp.5-11
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    • 1991
  • To remove NO from flue gas, a direct decomposition method to $N_2$ and $O_2$ was investigated by using copper / zeolite catalyst. The copper ion-exchanged HY type zeolite has high activity on NO decomposition. The decomposition activity was increased with the increase of ion-exchange level, contacting time and reaction temperature in the range of 30$0^{\circ}C$ -50$0^{\circ}C$ , and decreased with the oxygen addition.

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Studies on Drug Analysis by Metal Chelate Ion II. Colorimetric Determination of Sulfa-Drugs with Dimethylglyoxime-Fe(II) (금속 chelate ion에 의한 의약품 정량에 관한 연구 (II) Dimethyglyoxime Fe(II)에 의한 Sulfa 제의 비색정량)

  • 이왕규;옥치완;김박광
    • YAKHAK HOEJI
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    • v.13 no.1
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    • pp.28-32
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    • 1969
  • For the colorimetric determination of Sulfa-drugs by means of solvent extraction, the sample solutions were added into dimethylglyoxime-Fe(II) complex solution, and extracted with pyridine-chloroform mixture (1:50) is a range of pH 7.5-8.5. The extracted solution shows stability and maximum absorption at 402m${\mu}$.

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Studies on Drug Analysis by Metal Chelate Ion. I. Colorimetric Determination of Nicotinamide with Dimethyglyoxime-Fe (II) (금속 chelate ion에 의한 의약품 정량에 관한 연구(I) Dimethylglyoxime-Fe(II)에 의한 Nicotinamide의 비색정량)

  • 이왕규
    • YAKHAK HOEJI
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    • v.13 no.1
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    • pp.22-27
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    • 1969
  • Nicotinamide Complex Compound was not formed in simple alkaline solution under two to one molar ratio of dimethyglyoxime and Fe (II), but it was formed with ammonia or pyridine under the same molar ratio. Based on this fact, nicotinamide solution was added into dimethyglyoxime-Fe (II) complex solution, and the chelation product was extracted with chloroform. The extraction was Completed in a range of pH 8.4-11.0. The chloroform solution shows stability and maximum absorption at 516 m${\mu}$.

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Oxidation Mechanism of SiC (SiC의 산화반응 기구)

  • 최태운;이홍림
    • Journal of the Korean Ceramic Society
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    • v.18 no.2
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    • pp.79-82
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    • 1981
  • SiC powder was heated in air over the temperature range of 1100-135$0^{\circ}C$. $\beta$-cristobalite was formed to cover the surfaces of SiC particles by the reaction: $SiC(s)+20_2(g)=SiO_2(s)+CO_2(g)$. It is assumed that the diffusion of oxygen ion through the formed surface layer of $\beta$-cristobalite controls the oxidation of the SiC particles. The diffusion coefficient of oxygen ion through the $\beta$-cristobalite layer was obtained as the following equation: $D=3.84{\times}10^{-17}$exp(-14.7/RT)

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Oxygen Plasma Characterization Analysis for Plasma Etch Process

  • Park, Jin-Su;Hong, Sang-Jeen
    • Journal of the Speleological Society of Korea
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    • no.78
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    • pp.29-31
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    • 2007
  • This paper is devoted to a study of the characterization of the plasma state. For the purpose of monitoring plasma condition, we experiment on reactive ion etching (RIE) process. Without actual etch process, generated oxygen plasma, measurement of plasma emission intensity. Changing plasma process parameters, oxygen flow, RF power and chamber pressure have controlled. Using the optical emission spectroscopy (OES), we conform to the unique oxygen wavelength (777nm), the most powerful intensity region of the designated range. Increase of RF power and chamber pressure, emission intensity is increased. oxygen flow is not affect to emission intensity.