Electrical Characterization of $HfO_2$ /Hf/Si(sub) Films Grown by Atomic Layer Deposition
(ALD방법으로 성장된 $HfO_2$ /Hf/Si 박막의 전기적 특성)
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- Proceedings of the IEEK Conference
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- 2006.06a
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- pp.565-566
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- 2006