• 제목/요약/키워드: Insulating Form

검색결과 107건 처리시간 0.03초

건식 유리섬유 심재를 사용한 진공단열재의 단열특성에 관한 연구 (A Study on the Thermal Insulation Performance of Vacuum Insulation Panel Using Dry Processing Glass Fiber Core)

  • 유채중;김민철;고성석
    • 대한건축학회논문집:구조계
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    • 제35권6호
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    • pp.121-128
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    • 2019
  • There is a big move to build zero-energy buildings in the form of passive houses that reduce energy waste worldwide. Korea has set a goal of reducing its greenhouse gas emissions by 37% by 2030 through the activation of green buildings, such as strengthening the energy levels of new buildings and improving the energy efficiency of existing buildings. The use of insulation with high insulation performance is one of the key technologies to realize this, and vacuum insulation is the next generation insulation that blocks the energy flow of the building. In this study, we measured the bonding structure of dry and wet processing glass fiber core materials and compared the insulation performance of vacuum insulation panel. In addition, the insulation performance of vacuum insulation panel was measured according to the thickness of the laminated core. It can be confirmed that the lamination structure of the core and the lamination thickness are important factors for the heat insulating performance of the vacuum insulating panel.

혹한온도 조건에서의 양생방법 변화에 따른 벽체 콘크리트의 온도이력 특성 (Temperature History of Wall Concrete with Heat Insulating Curing Method Subjected to Severly Cold Climate)

  • 손호정;한상윤;정상현;안상구;한천구;한민철
    • 한국건축시공학회:학술대회논문집
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    • 한국건축시공학회 2011년도 추계 학술논문 발표대회
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    • pp.51-52
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    • 2011
  • This study is to propose a curing method for a concrete wall structure under severe cold climate. The curing methods of using heated cable, heated panel and insulated form were applied. Results showed that the concrete cured by the heated cable resulted in the highest temperature history and the highest strength development at 28 days. Further, it is believed that the curing methods of the heated panel and insulated form are also recommendable for the resistance of the early frost damage on the concrete in practice.

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레이저 직접묘화법을 이용한 미세패턴 전도성 향상에 관한 연구 (Improvement of Conductive Micro-pattern Fabrication using a LIFT Process)

  • 이봉구
    • 한국산학기술학회논문지
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    • 제18권5호
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    • pp.475-480
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    • 2017
  • 본 논문에서는 레이저 유도증착 공정을 사용하여 절연기판위에 미세패턴의 전도성 향상시켰다. 기존의 레이저 유도증착의 공정에서 발생하는 높은 레이저빔 에너지로 인하여, 미세패턴의 낮은 증착밀도, 산화와 같은 문제점이 있다. 이러한 문제점을 폴리머 코팅층을 사용하여 증착정밀도와 전도성 향상하였다. 실리콘 웨이퍼 위에 미세패턴 증착을 위해서 크롬, 구리를 사용하였다. 본 연구에서는 다중펄스 방식의 레이저 빔을 금속박막에 조사하여 절연기판(insulating substrate: $SiO_2$) 위에 시드 층을 형성하고, 형성된 시드 층위에 무전해 도금을 적용하여 미세패턴 및 구조물을 제작하는 복합공정기술을 개발하였다. 레이저빔의 다중 스캔방식으로 조사함으로서 레이저빔의 에너지가 증착 층의 증착밀도와 표면품위를 향상시키고, 미세전극 패턴으로 사용가능한 전기 전도성을 갖게 되었음 알 수 있었다. 레이저 직접묘화법과 무전해 도금을 적용한 복합공정을 이용하여 미세전극을 증착 한 후 비저항을 측정한 결과 도금 전 저항이 $6.4{\Omega}$, 도금 후의 저항이 $2.6{\Omega}$으로 미세전극 패턴의 표면조직이 균일하고 증착되었다. 표면조직이 균일하고 치밀하게 증착되었기 때문에 전기 전도도가 약 3배정도 향상되었다.

콘크리트 건축물의 모놀리스적 표현특성에 관한 연구 단열경량골재콘크리트를 중심으로 (A Study on Monolithic Expression Characteristics of Concrete Buildings With focus on insulated lightweight aggregate concrete)

  • 원경섭
    • 한국산학기술학회논문지
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    • 제19권12호
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    • pp.363-373
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    • 2018
  • 오늘날 다변화된 사회에서 어떤 스타일의 건물이 동시대를 대표하는 건축적 양식인지 알기 어렵다. 그 중에서 모놀리스적 스타일의 건물에서 드러나는 단순함은 현대의 지극히 복잡한 사회구조와 대칭점을 이루며 그 가치를 인정받을 수 있다. 본 논문에서는 21세기 초반 단열경량골재콘크리트가 사용된 건물의 분석을 통해서 모놀리스적 표현에 대한 개념정의와 그 특징들이 공간 및 형태 그리고 건축구법에서 어떻게 표현되고 있는지에 대해 연구하였다. 여러 재료가 층을 이루어 구성되는 다층적 방식의 외벽시스템과는 달리, 단열경량골재콘크리트에 의한 외벽은 단일재료로서 콘크리트를 사용하여 거푸집을 빈틈없이 채워서 만들어진 덩어리 형태이며 그 자체로 모놀리스적이다. 이러한 점은 동일한 재료에 의한 내외부공간의 동질성, 고형(固形)으로서 표면의 연속성, 스테레오토믹적(stereotomic) 구축방식의 공간적 특성, 노출콘크리트사용에 의한 물질성의 표현, 덩어리와 공간 사이의 대비적 특성을 가진 공간을 만들어 낸다. 그리고 현대건축의 다층적 외벽 방식의 모놀리스적 건축에 대한 담론을 외부로 드러나는 형상적 특징과 더불어 구조와 재료, 그리고 그것이 공간에 끼치는 영향에 까지 논의의 범위를 넓힐 수 있는 기회를 제공한다.

광발광 측정으로부터 얻어진 $ZnIn_2Se_4$ 박막의 열처리 효과 (Effect of thermal annealing for $ZnIn_2Se_4$ thin films obtained by photoluminescience measurement)

  • 홍광준
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2009년도 하계학술대회 논문집
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    • pp.120-121
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    • 2009
  • Single crystalline $ZnIn_2Se_4$ layers were grown on thoroughly etched semi-insulating GaAs(100) substrate at $400^{\circ}C$ with hot wall epitaxy (HWE) system by evaporating, $ZnIn_2Se_4$ source at $630^{\circ}C$. After the as-grown $ZnIn_2Se_4$ single crystalline thin films was annealed in Zn-, Se-, and In-atmospheres, the origin of point defects of $ZnIn_2Se_4$single crystalline thin films has been investigated by the photoluminescence(PL) at 10 K The native defects of $V_{Zn}$, $V_{Se}$, $Zn_{int}$ and $Se_{int}$ obtained by PL measurements were classified as a donors or acceptors type. And we concluded that the heat-treatment in the Se-atmosphere converted $ZnIn_2Se_4$ single crystalline thin films to an optical p-type. Also, we confirmed that In in $ZnIn_2Se_4$/GaAs did not form the native defects because In in $ZnIn_2Se_4$ single crystalline thin films existed in the form of stable bonds.

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Hot Wall Epitaxy(HWE) 법에 의해 성장된 $CuGaSe_2$ 에피레이어의 광발광 특성 (Photoluminescience propeerties for $CuGaSe_2$ epilayers grown by hot wall epitaxy)

  • 김혜정;홍광준
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2008년도 추계학술대회 논문집 Vol.21
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    • pp.100-101
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    • 2008
  • To obtain the single crystal thin films, $CuGaSe_2$ mixed crystal was deposited on thoroughly etched semi-insulating GaAs(100) substrate by the hot wall epitaxy (HWE) system. The source and substrate temperatures were $610^{\circ}C$ and $450^{\circ}C$, respectively. After the as-grown $CuGaSe_2$ single crystal thin films was annealed in Cu-, Se-, and Ga-atmospheres, the origin of point defects of $CuGaSe_2$ single crystal thin films has been investigated by the photoluminescence(PL) at 10 K. The native defects of $V_{CU}$, $V_{Se}$, $Cu_{int}$, and $Se_{int}$ obtained by PL measurements were classified as a donors or acceptors type. And we concluded that the heat-treatment in the Cu-atmosphere converted $CuGaSe_2$ single crystal thin films to an optical n-type. Also, we confirmed that Ga in $CuGaSe_2$/GaAs did not form the native defects because Ga in $CuGaSe_2$ single crystal thin films existed in the form of stable bonds.

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Hot Wall Epitaxy(HWE)법에 의한 $CdGa_2Se_4$ 단결정 박막 성장과 점결함 (Growth and point defect for $CdGa_2Se_4$single crystal thin film by hot wall epitaxy)

  • 홍광준
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2007년도 추계학술대회 논문집
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    • pp.81-82
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    • 2007
  • The stochiometric mix of evaporating materials for the $CdGa_2Se_4$ single crystal thin films was prepared from horizontal furnace. To obtain the single crystal thin films, $CdGa_2Se_4$ mixed crystal was deposited on thoroughly etched semi-insulating GaAs(100) substrate by the Hot Wall Epitaxy (HWE) system. The source and substrate temperature were $630^{\circ}C\;and\;420^{\circ}C$, respectively. After the as-grown single crystal $CdGa_2Se_4$ thin films were annealed in Cd-, Se-, and Ga -atmospheres, the origin of point defects of single crystal $CdGa_2Se_4$ thin films has been investigated by PL at 10 K. The native defects of $V_{Cd},\;V_{Se},\;Cd_{int},\;and\;Se_{int}$ obtained by PL measurements were classified as donors or acceptors. And we concluded that the heat-treatment in the Cd-atmosphere converted single crystal $CdGa_2Se_4$ thin films to an optical p-type. Also, we confirmed that Ga in $CdGa_2Se_4$/GaAs did not form the native defects because Ga in single crystal $CdGa_2Se_4$ thin films existed in the form of stable bonds.

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Hot Wall Epitaxy (HWE) 법에 의한 $CuInSe_2$ 단결정 박막 성장과 점결함 연구 (Study point defect and growth for $CuInSe_2$ single crystal thin film by hot wall epitaxy)

  • 유상하;홍광준
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2007년도 하계학술대회 논문집 Vol.8
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    • pp.152-153
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    • 2007
  • $CuInSe_2$ single crystal thin film was deposited on thoroughly etched semi-insulating GaAs(100) substrate by the hot wall epitaxy (HWE) system. After the as-grown $CuInSe_2$ single crystal thin films was annealed in Cu-, Se-, and In-atmospheres, the origin of point defects of $CuInSe_2$ single crystal thin films has been investigated by the photoluminescence(PL) at 10 K. The native defects of $V_{Cu}$, $V_{Se}$, $Cu_{lnt}$, and $Se_{lnt}$ obtained by PL measurements were classified as a donors or acceptors type. And we concluded that the heat-treatment in the Cu-atmosphere converted $CuInSe_2$ single crystal thin films to an optical n-type. Also, we confirmed that In in $CuInSe_2$/GaAs did not form the native defects because In in $CuInSe_2$ single crystal thin films existed in the form of stable bonds.

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전기화학 공정을 이용한 질화규소 기판 상의 금속 전극 형성에 관한 연구 (Formation of Metal Electrode on Si3N4 Substrate by Electrochemical Technique)

  • 신성철;김지원;권세훈;임재홍
    • 한국표면공학회지
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    • 제49권6호
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    • pp.530-538
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    • 2016
  • There is a close relationship between the performance and the heat generation of the electronic device. Heat generation causes a significant degradation of the durability and/or efficiency of the device. It is necessary to have an effective method to release the generated heat. Based on demands of the printed circuit board (PCB) manufacturing, it is necessary to develop a robust and reliable plating technique for substrates with high thermal conductivity, such as alumina ($Al_2O_3$), aluminium nitride (AlN), and silicon nitride ($Si_3N_4$). In this study, the plating of metal layers on an insulating silicon nitride ($Si_3N_4$) ceramic substrate was developed. We formed a Pd-$TiO_2$ adhesion layer and used APTES(3-Aminopropyltriethoxysilane) to form OH groups on the surface and adhere the metal layer on the insulating $Si_3N_4$ substrate. We used an electroless Ni plating without sensitization/activation process, as Pd particles were nucleated on the $TiO_2$ layer. The electrical resistivity of Ni and Cu layers is $7.27{\times}10^{-5}$ and $1.32{\times}10^{-6}ohm-cm$ by 4 point prober, respectively. The adhesion strength is 2.506 N by scratch test.

전극 형태와 전극 간 거리에 따른 전기적 특성 분석 (Electrical Characteristics Analysis According to Electrode Shape and Distance Between Electrodes)

  • 김태희;이순형;황미용;최용성
    • 한국전기전자재료학회논문지
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    • 제36권4호
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    • pp.408-412
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    • 2023
  • In this paper, in order to analyze high electrical insulation and cooling performance using mineral oil, the liquid insulating oil was changed in electrode shape and distance between electrodes to compare and analyze electrical characteristics according to equal electric field, quasi-equivalent electric field, and unequal electric field. As a result, the breakdown voltages were 36,875 V and 36,875 V in the form of sphere-sphere and plate-plate electrodes with equal electric fields. The breakdown voltage was 31,475 V in the sphere-plate electrode type, which is a quasi-equilibrium field, and the breakdown voltage was 28,592 V, 27,050 V, and 22,750 V in the needle-needle, sphere-needle, and needle-plate electrode types, which are unequal fields. Through this, it is possible to know the difference in breakdown voltage according to the type of electric field. The more equal the field, the higher the breakdown voltage, and the more unequal field, the lower the breakdown voltage. The difference in insulation breakdown voltage could be seen depending on the type of electric field, the insulation breakdown voltage was higher for the more equal electric field, and the insulation breakdown voltage was lower for the more unequal electric field. Also, it was confirmed that the closer the distance between the electrodes, the higher the insulation breakdown voltage, the higher the insulation breakdown current, and the insulation breakdown voltage and the insulation breakdown current were proportional.