• Resources Recycling
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• v.10 no.5
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• pp.3-7
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• 2001

Indium frequently associated with the semiconductor industry is becoming an important metal element widely used in industry. In this paper, its properties especially in relation to its recovery from scrap are reviewed and discussed. Also presented in this paper is how best indium can be recovered by the hydrometallurgical means.

• Bulletin of the Korean Chemical Society
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• v.32 no.10
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• pp.3796-3798
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• 2011

• Korean Chemical Engineering Research
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• v.51 no.6
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• pp.661-665
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• 2013

Effect of organic acid on the preparation of indium-oxalate salt from indium scraps generated from ITO glass manufacturing process was studied. Effects of parameters, such as type and concentration of organic acids, pH of reactant, temperature, reaction time on indium-oxalate salt preparation were examined. The impurity removal efficiency was similar for both oxalic acid and citric acid, but citric acid did not make organic acid salt with indium. The optimum conditions were 1.5 M oxalic acid, pH 7, $80^{\circ}C$, and 6 hours. On the other hand, the recoveries increased with pH, but the purity decreased. The indium-oxalate salt purity prepared by two cycles was 99.995% (4N5). The indium-oxalate salt could be converted to indium oxide and indium metal by substitution reaction and calcination.

• Bulletin of the Korean Chemical Society
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• v.30 no.12
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• pp.3141-3142
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• 2009

• Resources Recycling
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• v.23 no.6
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• pp.63-67
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• 2014

Gallium is an important material and is used by industry of oxide semi-conductor and LED chip. However, the most of the gallium-containing waste resources became outflow abroad and the most of which is imported from oversea by following technical problem and low circulation rate. In this research, the recovery of high purity Gallium metal from Gallium scrap, which containing about 30% of Gallium, was investigated by using hydro-metallurgical process. As pretreatment, the Gallium scrap was pulverized and leached by strong acid such as hydro chloric acid. At the leached solution, Indium was separated as an Indium sponge by substitution reaction and then Gallium and Zinc hydroxide separated and filtrated using strong alkaline solution such as sodium hydroxide by precipitation method. Also, Gallium metal and Zinc metal was recovered by electrowinning method. To make an electrolytic solution, Gallium and Zinc hydroxide was leached by strong alkaline solution. Finally, High purity Gallium metal was recovered by vacuum refining process to remove the Zinc impurity.

• Journal of the Korean institute of surface engineering
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• v.41 no.1
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• pp.6-11
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• 2008

An Indium Zinc Oxide(IZO) transparent conductive layer was deposited on a large size glass substrate by using magnetron dc sputtering method with varying a deposition temperature. As the deposition temperature decreased to a room temperature, the sheet resistance of IZO film increased. But this deposition temperature range is included in an applicable to a device. From a standpoint of the sheet resistance, the differences of the sheet resistance were not great and the uniformity of the layer was uniformed around 10%. Crystallization particles were shown on the surface of the layer as deposition temperature increased, but these particles were not shown on the surface of the layer as deposition temperature decreased to the room temperature. It didn't make a scrap of difference in a transmittance of varying deposition temperature. Therefore, it is concluded that IZO thin film manufactured by the room temperature deposition condition can be used as a large size transparent conductive layer of a liquid crystal display device.