• Title/Summary/Keyword: InAs

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An Analysis of the Phase Diagram fo the Crystal Growth of InGaAsP/GaAs in the Visible Region (가시광 InGaAsP/GaAs 결정성장을 위한 상평형도 해석)

  • Hong, Tchang-Hee;Cho, Ho-Sung;Oh, Jong-Hwan;Yea, Beyong-Deok;Hwang, Sang-Ku;Bea, Jung-Chul
    • Journal of the Korean Institute of Navigation
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    • v.15 no.3
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    • pp.99-106
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    • 1991
  • In order to grow InGaAsP epitaxial layer on GaAs by LPE, an accurate phase diagram for In-Ga-As-P quarternary compounds is required. But the short wavelength InGaAsP/GaAs phase diagram for full wavelength range was not yet reported. In this study, therefore, a theoretical calculation has been carried out by using thermodynamic's equation for InGaAsP/GaAs in order to get the relation between the mole fraction of the sloute and solid phase compounds. And the calculation being compared with the dta of Kawanishi et. al, the result has been shown that his phase diagram obtained by the calculation can apply to growing InGaAsP/GaAs by LPE.

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Influence of GaAs/AlGaAs Superlattice Layers on Optical Properties of InAs Quantum Dots (InAs 양자점의 광학적 성질에 미치는 초격자층의 영향)

  • Jeong Yonkil;Choi Hyonkwang;Park Yumi;Hwang Sukhyon;Yoon Jin-Joo;Lee Jewon;Leem Jae-Young;Jeon Minhyon
    • Korean Journal of Materials Research
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    • v.14 no.2
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    • pp.146-151
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    • 2004
  • We investigated the effects of high potential barriers on the optical characteristics of InAs quantum dots (QDs) by using photoluminescence (PL) and photoreflectance (PR) spectroscopy. A sample with regular InAs quantum dots on GaAs was grown by molecular beam epitaxy (MBE) as a reference. Another InAs QDs sample was embedded in single AlGaAs barriers. On the other hand, a sample with GaAs/AlGaAs superlattice barriers was adopted for comparison with a sample with a single AlGaAs layer. In results, we found that the emission wavelength of QDs was effectively tailored by using high potential barriers. Also, it was found that the optical properties of a sample with QDs embedded in GaAs/AlGaAs superlattices were better than those of a sample with QDs embedded in a single layer of AlGaAs barriers. We believe that GaAs/AlGaAs superlattice could effectively prevent the generation of defects.

The Types of Korean As-Parenthetical Constructions

  • Kim, Mija
    • Language and Information
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    • v.19 no.1
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    • pp.37-57
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    • 2015
  • This paper is primarily intended to provide a new insight on which the structural properties of As-Parenthetical constructions shown by Potts (2002) might be regarded as cross-linguistically common one. As a first attempt, it introduces the characteristics of Korean As-Parenthetical by carefully investigating them through the data, focusing on the similarities or differences between two languages with a constructional theoretical perspective. The paper here provides three properties of Korean as-clauses in the morphological and syntactic aspects. First, the morpheme 'as' in English as-clause would be realized as three different morphemes as a bound one. Korean as-clauses can be introduced by three different morphemes, '-tusi, -chelem, -taylo' and unlike that in English as-clauses, they behave as bound morphemes which do not stand alone. Even though they are attached into different morpho-syntactic stems, they do not make any meaning change only under this clause. Secondly, two syntactic types of as-clauses can also be found in Korean, similarly to those of English: CP-As type and Predicate-As type, depending on which types of gap they involve in. English has one more subtype of Predicate-As type (called inverted Predicate-As clause), while Korean does not show this subtype. Thirdly, the various mismatches attributed by the gap and the antecedent come from the constructional restrictions of as-clauses in Korean. In addition, the paper attempts to display various ambiguities from the as-clauses through disjoint references or negative sentences in As-Parenthetical constructions.

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The TIME AS SPACE Metaphor in English and in French: A Cognitive Analysis

  • Hamdi, Sondes
    • Cross-Cultural Studies
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    • v.28
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    • pp.67-86
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    • 2012
  • Metaphors were conceived of as a figure of speech whose role consisted in merely ornamenting the language. However, with their seminal book Metaphors we live by (1980), Lakoff and Johnson have revolutionized the conception of metaphors by placing them as central to human language, thought and action. Cognitive linguists argue that humans tend to conceptualize abstract concepts, such as time, through more experiential and tangible concepts. For instance, it has been observed that the abstract concept of time is conceptualized as space in several unrelated languages. According to the Conceptual Metaphor Theory (CMT), TIME AS SPACE metaphor covers two more specific metaphors: (1) The MOVING TIME metaphor wherein the observer is conceived as a stationary entity, as in The end of the academic year is getting closer; and (2) The TIME AS A LOCATION metaphor wherein times are conceived as stationary points and the observer is conceived as moving relative to these locations, as in We are first approaching the end of the year. This paper aims at probing the validity of the CMT representations of time on the basis of an analysis of time metaphors in two languages: English and French. This analysis is conducted within the framework of CMT. The results corroborate the CMT representations of time, suggesting that in both languages the abstract concept of time is expressed in spatial terms. In English, as in French, time is conceptualized as a moving entity and as having extension in space. In both languages, time can be seen as bounded; therefore, one can perform actions within defined limits of time.

InAlAs/AlGaAs을 이용한 808 nm 대역 양자점 성장

  • Kim, Su-Yeon;Song, Jin-Dong;Lee, Eun-Hye;Han, Il-Gi;Lee, Jeong-Il;Kim, Tae-Hwan
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.02a
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    • pp.166-166
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    • 2010
  • 산업 전반에 걸쳐 중요한 광원인 808 nm 대역의 레이저 다이오드 제작에는 현재 InGaAsP/InGaP/GaAs 및 InGaAlAs/GaAs 양자우물을 이용하여 제작되고 있다. 이는 양자우물과 이를 둘러싸는 장벽물질간의 band-offset이 적어 효율적인 고출력 레이저 다이오드의 제작에 어려움이 있기 때문에 강한 캐리어 구속 효과를 지니는 양자점을 사용하는 것이 고출력 레이저 다이오드를 제작할 수 있는 방법이다. 실험에 사용된 InAlAs 양자점은 Riber사의 compact21 MBE 장치를 사용하여 성장하였으며 GaAs기판을 610도에서 가열하여 표면의 산화층을 제거하고 580도에서 약 100 nm 두께의 GaAs 버퍼층 및 30 nm 두께의 $Al_{0.4}Ga_{0.6}As$층을 성장하였다. GaAs 기판의 온도를 내린 후 migration enhanced epitaxy 방법을 사용하여 InAs 및 AlAs를 번갈아 주입하여 성장하였다. InAlAs 양자점의 성장 중에 InAlAs의 양, 성장 온도, As flux량 및 As 분자 상태 변화 등 다양한 조건을 변화 시켜 샘플을 성장시켰다. 그 결과 기판 온도가 600도이며 As4 flux가 $1\;{\times}\;10^{-6}\;Torr$ 조건하에서 성장한 InAlAs/AlGaAs 양자점이 양질의 808 nm의 파장 대역을 얻을 수 있었다.

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Growth and characterizations of INAlAs epilayers and InGaAs/INAlAs quantum well structures by low pressure metalorganic chemical vapor deposition (저압 유기금속 화학증착법을 이용한 InAIAs 에피층과 InGaAs/InAIAs 양자 우물 구조의 성장과 분석)

  • 유경란;문영부;이태완;윤의준
    • Journal of the Korean Vacuum Society
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    • v.7 no.4
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    • pp.328-333
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    • 1998
  • Lattice-matched InAIAs epilayers were grown on (001) InP substrate by low pressure metalorganic chemical vapor deposition. The effects of growth conditions on the properties of InAIAs were analyzed, and InGaAs/InAIAs single and multiple quantum wells were successfully grown. It was observed that the optical property of InAIAs epilayers was improved in the temperature range of 620~$700^{\circ}C$ as the growth temperature increased due to the reduction of oxygen incorporation, however, the crystallinity decreased at temperatures higher than $750^{\circ}C$ due to the degraded crystallinity of the bufter layers. The enhanced incorporation of AI into epilayer was observed at high $AsH_3$flow rates and it was explained in terms of the differences in bond strengths of AI-As and In-As. The measured photoluminescence peak energies from InGaAs/InAIAs single quantum wells were consistent with the calculated ones based on transfer matrix method. High-order satellite peaks and fine thickness fringes were observed by high-resolution x-ray diffraction, implying that the high-quality multiple quantum wells with abrupt heterointerfaces were grown.

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As BEP Effects on the Properties of InAs Thin Films Grown on Tilted GaAs(100) Substrate (기울어진 GaAs(100) 기판 위에 성장된 InAs 박막 특성에 대한 As BEP 효과)

  • Kim, Min-Su;Leem, Jae-Young
    • Journal of the Korean institute of surface engineering
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    • v.43 no.4
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    • pp.176-179
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    • 2010
  • The InAs thin films were grown on GaAs(100) substrate with $2^{\circ}C$ tilted toward [$0\bar{1}\bar{1}$] with different As beam equivalent pressure (BEP) by using molecular beam epitaxy. Growth temperature and thickness of the InAs thin films were $480^{\circ}C$ and 0.5 ${\mu}m$, respectively. We studied the relation between the As BEP and the properties of InAs thin films. The properties of InAs thin films were observed by reflection high-energy electron diffraction (RHEED), optical microscope, and Hall effect. The growth, monitored by RHEED, was produced through an initial 2D (2-dimensional) nucleation mode which was followed by a period of 3D (3-dimensional) island growth mode. Then, the 2D growth recovered after a few minutes and the streak RHEED pattern remained clear till the end of growth. The crystal quality of InAs thin films is dependent strongly on the As BEP. When the As BEP is $3.6{\times}10^{-6}$ Torr, the InAs thin film has a high electron mobility of 10,952 $cm^2/Vs$ at room temperature.

Influence of InGaAs Capping Layers on the Properties of InAs/GaAs Quantum Dots (InAs/GaAs 양자점의 발광특성에 대한 InGaAs 캡층의 영향)

  • Kwon, Se Ra;Ryu, Mee-Yi;Song, Jin Dong
    • Journal of the Korean Vacuum Society
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    • v.21 no.6
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    • pp.342-347
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    • 2012
  • The optical properties of InAs quantum dots (QDs) grown on a GaAs substrates by migration enhanced molecular beam epitaxy method have been investigated by using photoluminescence (PL) and time-resolved PL measurements. The luminescence properties of InAs/GaAs QDs have been studied as functions of temperature, excitation laser power, and emission wavelength. The PL peak of InAs QDs capped with $In_{0.15}Ga_{0.85}As$ layer (QD2) measured at 10 K is redshifted about 80 nm compared with that of InAs QDs with no InGaAs layer (QD1). This redshift of QD2 is attributed to the increase in dot size due to the diffusion of In from the InGaAs capping layer. The PL decay times of QD1 and QD2 at 10 K are 1.12 and 1.00 ns taken at the PL peak of 1,117 and 1,197 nm, respectively. The reduced decay time of QD2 can be explained by the improved carrier confinement and enhanced wave function overlap due to increased QD size. The PL decay times for both QD1 and QD2 are independent on the emission wavelength, indicating the uniformity of dot size.

MOCVD Growth of AlGaAs/InGaAs/GaAs Pseudomorphic Structures and Transport Properties of 2DEG (AlGaAs/InGaAs/GaAs Pseudomorphic 구조의 MOCVD 성장 및 2차원 전자가스의 전송특성)

  • 양계모;서광석;최병두
    • Journal of the Korean Vacuum Society
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    • v.2 no.4
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    • pp.424-432
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    • 1993
  • AlGaAs/InGaAs/GaAs pseudomorphic structures have been grown by atmosheric pressure-MOCVD . The Al incorporation efficiency is constant but slightly exceeds the Ga incorporation during the growth of AlGaAs layers at $650^{\circ}C$ . Meanwhile , the In incorporation efficiency is constant but slightly less than the Ga incorporation in InGAAs layers. InGaAs/GaAs QWs were grown and their optical properties were characterized . $\delta$-doped Al0.24Ga0.76As/In0.16 Ga0.84As p-HEMT structures were successfully grown by MOCVD and their transport properties were characterized by Hall effect and SdH measurements. SdH Measurements at 3.7K show clear magnetoresistance oscillations and plateaus in the quantum Hall effect confirming the existence of a two-dimensional electron gas(2DEG) and a parallel conduction through the GaAs buffer layer. The fabricated $1.5\mu\textrm{m}$gatelength p-HEMTs having p-type GaAs in the buffer layer show a high transconductance of 200 mS/mm and a good pinch-off characteristics.

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Effects of growth temperatures on properties of InAlAs epilayers grown on InP substrate by molecular beam epitaxy (MBE법으로 InP 기판위에 성장한 InAlAs 에피층의 특성에 대한 성장온도의 효과)

  • 우용득;김문덕
    • Journal of the Korean Vacuum Society
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    • v.12 no.4
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    • pp.251-256
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    • 2003
  • Indium aluminum arsenide(InAlAs) was grown by molecular beam epitaxy on (001) indium phosphide (InP) substrate and the effects of growth temperature on the properties of epitaxial layers were studied. In the temperature range of 370-$400 ^{\circ}C$, we observed that the surface morphology, optical quality and structural quality of InAlAs epilayers were improved as growth temperature increased. However, the InAlAs epilavers grown at $430 ^{\circ}C$ have the bad surface morphology and show the same trends as structural and epical quality. As a result of these measurements, it is suggested that the InAlAs epilayers of very good properties can be grown at $400 ^{\circ}C$.