• 제목/요약/키워드: InAs

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가시광 InGaAsP/GaAs 결정성장을 위한 상평형도 해석 (An Analysis of the Phase Diagram fo the Crystal Growth of InGaAsP/GaAs in the Visible Region)

  • 홍창희;조호성;오종환;예병덕;황상구;배정철
    • 한국항해학회지
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    • 제15권3호
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    • pp.99-106
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    • 1991
  • In order to grow InGaAsP epitaxial layer on GaAs by LPE, an accurate phase diagram for In-Ga-As-P quarternary compounds is required. But the short wavelength InGaAsP/GaAs phase diagram for full wavelength range was not yet reported. In this study, therefore, a theoretical calculation has been carried out by using thermodynamic's equation for InGaAsP/GaAs in order to get the relation between the mole fraction of the sloute and solid phase compounds. And the calculation being compared with the dta of Kawanishi et. al, the result has been shown that his phase diagram obtained by the calculation can apply to growing InGaAsP/GaAs by LPE.

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InAs 양자점의 광학적 성질에 미치는 초격자층의 영향 (Influence of GaAs/AlGaAs Superlattice Layers on Optical Properties of InAs Quantum Dots)

  • 정연길;최현광;박유미;황숙현;윤진주;이제원;임재영;전민현
    • 한국재료학회지
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    • 제14권2호
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    • pp.146-151
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    • 2004
  • We investigated the effects of high potential barriers on the optical characteristics of InAs quantum dots (QDs) by using photoluminescence (PL) and photoreflectance (PR) spectroscopy. A sample with regular InAs quantum dots on GaAs was grown by molecular beam epitaxy (MBE) as a reference. Another InAs QDs sample was embedded in single AlGaAs barriers. On the other hand, a sample with GaAs/AlGaAs superlattice barriers was adopted for comparison with a sample with a single AlGaAs layer. In results, we found that the emission wavelength of QDs was effectively tailored by using high potential barriers. Also, it was found that the optical properties of a sample with QDs embedded in GaAs/AlGaAs superlattices were better than those of a sample with QDs embedded in a single layer of AlGaAs barriers. We believe that GaAs/AlGaAs superlattice could effectively prevent the generation of defects.

The Types of Korean As-Parenthetical Constructions

  • Kim, Mija
    • 한국언어정보학회지:언어와정보
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    • 제19권1호
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    • pp.37-57
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    • 2015
  • This paper is primarily intended to provide a new insight on which the structural properties of As-Parenthetical constructions shown by Potts (2002) might be regarded as cross-linguistically common one. As a first attempt, it introduces the characteristics of Korean As-Parenthetical by carefully investigating them through the data, focusing on the similarities or differences between two languages with a constructional theoretical perspective. The paper here provides three properties of Korean as-clauses in the morphological and syntactic aspects. First, the morpheme 'as' in English as-clause would be realized as three different morphemes as a bound one. Korean as-clauses can be introduced by three different morphemes, '-tusi, -chelem, -taylo' and unlike that in English as-clauses, they behave as bound morphemes which do not stand alone. Even though they are attached into different morpho-syntactic stems, they do not make any meaning change only under this clause. Secondly, two syntactic types of as-clauses can also be found in Korean, similarly to those of English: CP-As type and Predicate-As type, depending on which types of gap they involve in. English has one more subtype of Predicate-As type (called inverted Predicate-As clause), while Korean does not show this subtype. Thirdly, the various mismatches attributed by the gap and the antecedent come from the constructional restrictions of as-clauses in Korean. In addition, the paper attempts to display various ambiguities from the as-clauses through disjoint references or negative sentences in As-Parenthetical constructions.

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The TIME AS SPACE Metaphor in English and in French: A Cognitive Analysis

  • Hamdi, Sondes
    • 비교문화연구
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    • 제28권
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    • pp.67-86
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    • 2012
  • Metaphors were conceived of as a figure of speech whose role consisted in merely ornamenting the language. However, with their seminal book Metaphors we live by (1980), Lakoff and Johnson have revolutionized the conception of metaphors by placing them as central to human language, thought and action. Cognitive linguists argue that humans tend to conceptualize abstract concepts, such as time, through more experiential and tangible concepts. For instance, it has been observed that the abstract concept of time is conceptualized as space in several unrelated languages. According to the Conceptual Metaphor Theory (CMT), TIME AS SPACE metaphor covers two more specific metaphors: (1) The MOVING TIME metaphor wherein the observer is conceived as a stationary entity, as in The end of the academic year is getting closer; and (2) The TIME AS A LOCATION metaphor wherein times are conceived as stationary points and the observer is conceived as moving relative to these locations, as in We are first approaching the end of the year. This paper aims at probing the validity of the CMT representations of time on the basis of an analysis of time metaphors in two languages: English and French. This analysis is conducted within the framework of CMT. The results corroborate the CMT representations of time, suggesting that in both languages the abstract concept of time is expressed in spatial terms. In English, as in French, time is conceptualized as a moving entity and as having extension in space. In both languages, time can be seen as bounded; therefore, one can perform actions within defined limits of time.

InAlAs/AlGaAs을 이용한 808 nm 대역 양자점 성장

  • 김수연;송진동;이은혜;한일기;이정일;김태환
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2009년도 제38회 동계학술대회 초록집
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    • pp.166-166
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    • 2010
  • 산업 전반에 걸쳐 중요한 광원인 808 nm 대역의 레이저 다이오드 제작에는 현재 InGaAsP/InGaP/GaAs 및 InGaAlAs/GaAs 양자우물을 이용하여 제작되고 있다. 이는 양자우물과 이를 둘러싸는 장벽물질간의 band-offset이 적어 효율적인 고출력 레이저 다이오드의 제작에 어려움이 있기 때문에 강한 캐리어 구속 효과를 지니는 양자점을 사용하는 것이 고출력 레이저 다이오드를 제작할 수 있는 방법이다. 실험에 사용된 InAlAs 양자점은 Riber사의 compact21 MBE 장치를 사용하여 성장하였으며 GaAs기판을 610도에서 가열하여 표면의 산화층을 제거하고 580도에서 약 100 nm 두께의 GaAs 버퍼층 및 30 nm 두께의 $Al_{0.4}Ga_{0.6}As$층을 성장하였다. GaAs 기판의 온도를 내린 후 migration enhanced epitaxy 방법을 사용하여 InAs 및 AlAs를 번갈아 주입하여 성장하였다. InAlAs 양자점의 성장 중에 InAlAs의 양, 성장 온도, As flux량 및 As 분자 상태 변화 등 다양한 조건을 변화 시켜 샘플을 성장시켰다. 그 결과 기판 온도가 600도이며 As4 flux가 $1\;{\times}\;10^{-6}\;Torr$ 조건하에서 성장한 InAlAs/AlGaAs 양자점이 양질의 808 nm의 파장 대역을 얻을 수 있었다.

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저압 유기금속 화학증착법을 이용한 InAIAs 에피층과 InGaAs/InAIAs 양자 우물 구조의 성장과 분석 (Growth and characterizations of INAlAs epilayers and InGaAs/INAlAs quantum well structures by low pressure metalorganic chemical vapor deposition)

  • 유경란;문영부;이태완;윤의준
    • 한국진공학회지
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    • 제7권4호
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    • pp.328-333
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    • 1998
  • 저압 유기금속 화학증착법을 이용하여 (001) InP 기판 위에 격자 일치된 InAlAs 에 피층 성장 결과 620~$700^{\circ}C$범위에서 성장 온도가 증가할수록 산소 유입량의 감소 때문으로 생각되는 광학적 성질의 향상이 관찰되었으나 $750^{\circ}C$이상의 고온에서는 InP완충층의 열화에 의한 결정성의 감소가 발견되었다. 또한, AsH3의 유량이 증가됨에 따라 성장된 InAlAs층의 Al함유량이 증가하는 현상이 관찰되었고, 이는 Al-As와 In-As의 bond strength 차이로 설 명하였다. InGaAs/InAlAs 단일 양자우물구조에서 측정된 우물두께에 따른 photoluminescence peak energy는 계산 값과 잘 일치하였고, high resolution x-ray diffraction 측정을 통하여 뚜렷한 satellite peak와 fine thickness fringe들이 관찰되는 우수 한 계면특성을 가지는 다중 양자우물구조가 성장됨을 확인하였다.

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기울어진 GaAs(100) 기판 위에 성장된 InAs 박막 특성에 대한 As BEP 효과 (As BEP Effects on the Properties of InAs Thin Films Grown on Tilted GaAs(100) Substrate)

  • 김민수;임재영
    • 한국표면공학회지
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    • 제43권4호
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    • pp.176-179
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    • 2010
  • The InAs thin films were grown on GaAs(100) substrate with $2^{\circ}C$ tilted toward [$0\bar{1}\bar{1}$] with different As beam equivalent pressure (BEP) by using molecular beam epitaxy. Growth temperature and thickness of the InAs thin films were $480^{\circ}C$ and 0.5 ${\mu}m$, respectively. We studied the relation between the As BEP and the properties of InAs thin films. The properties of InAs thin films were observed by reflection high-energy electron diffraction (RHEED), optical microscope, and Hall effect. The growth, monitored by RHEED, was produced through an initial 2D (2-dimensional) nucleation mode which was followed by a period of 3D (3-dimensional) island growth mode. Then, the 2D growth recovered after a few minutes and the streak RHEED pattern remained clear till the end of growth. The crystal quality of InAs thin films is dependent strongly on the As BEP. When the As BEP is $3.6{\times}10^{-6}$ Torr, the InAs thin film has a high electron mobility of 10,952 $cm^2/Vs$ at room temperature.

InAs/GaAs 양자점의 발광특성에 대한 InGaAs 캡층의 영향 (Influence of InGaAs Capping Layers on the Properties of InAs/GaAs Quantum Dots)

  • 권세라;류미이;송진동
    • 한국진공학회지
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    • 제21권6호
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    • pp.342-347
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    • 2012
  • Migration-enhanced molecular beam epitaxy법을 이용하여 GaAs 기판에 성장한 InAs 양자점(quantum dots: QDs)의 광학적 특성을 PL (photoluminescence)과 time-resolved PL을 이용하여 분석하였다. 시료 온도, 여기 광의 세기, 발광 파장에 따른 InAs/GaAs QDs (QD1)과 $In_{0.15}Ga_{0.85}As$ 캡층을 성장한 InAs/GaAs QDs (QD2)의 발광특성을 연구하였다. QD2의 PL 피크는 QD1의 PL 피크보다 장파장에서 나타났으며, 이것은 InGaAs 캡층의 In이 InAs 양자점으로 확산되어 양자점의 크기가 증가한 것으로 설명된다. 10 K에서 측정한 QD1과 QD2의 PL 피크인 1,117 nm와 1,197 nm에서 PL 소멸시간은 각각 1.12 ns와 1.00 ns이고, 발광파장에 따른 PL 소멸시간은 PL 피크 근처에서 거의 일정하게 나타났다. QD2의 PL 소멸시간이 QD1보다 짧은 것은 QD2의 양자점이 커서 파동함수 중첩이 향상되어 캐리어 재결합이 증가한 때문으로 설명된다.

AlGaAs/InGaAs/GaAs Pseudomorphic 구조의 MOCVD 성장 및 2차원 전자가스의 전송특성 (MOCVD Growth of AlGaAs/InGaAs/GaAs Pseudomorphic Structures and Transport Properties of 2DEG)

  • 양계모;서광석;최병두
    • 한국진공학회지
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    • 제2권4호
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    • pp.424-432
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    • 1993
  • AlGaAs/InGaAs/GaAs pseudomorphic structures have been grown by atmosheric pressure-MOCVD . The Al incorporation efficiency is constant but slightly exceeds the Ga incorporation during the growth of AlGaAs layers at $650^{\circ}C$ . Meanwhile , the In incorporation efficiency is constant but slightly less than the Ga incorporation in InGAAs layers. InGaAs/GaAs QWs were grown and their optical properties were characterized . $\delta$-doped Al0.24Ga0.76As/In0.16 Ga0.84As p-HEMT structures were successfully grown by MOCVD and their transport properties were characterized by Hall effect and SdH measurements. SdH Measurements at 3.7K show clear magnetoresistance oscillations and plateaus in the quantum Hall effect confirming the existence of a two-dimensional electron gas(2DEG) and a parallel conduction through the GaAs buffer layer. The fabricated $1.5\mu\textrm{m}$gatelength p-HEMTs having p-type GaAs in the buffer layer show a high transconductance of 200 mS/mm and a good pinch-off characteristics.

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MBE법으로 InP 기판위에 성장한 InAlAs 에피층의 특성에 대한 성장온도의 효과 (Effects of growth temperatures on properties of InAlAs epilayers grown on InP substrate by molecular beam epitaxy)

  • 우용득;김문덕
    • 한국진공학회지
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    • 제12권4호
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    • pp.251-256
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    • 2003
  • 분자선에피탁시법을 이용하여 InP(001) 기판위에 성장한 InAlAs 에피층의 특성에 대한 성장온도 (370-$430 ^{\circ}C$)의 효과를 Normalski 현미경, 원자력현미경 (AFM), 광발광 (PL), 이중결정 x-선 회절법 (DCXRD)을 사용하여 분석하였다. InAlAs 에피층의 표면형상, 구조적, 광학적 특성은 370-$400^{\circ}C$에서 성장한 시료에서는 성장온도의 증가로 향상되지만, $430 ^{\circ}C$로 성장한 시료에서는 특성이 나빠졌다. 결과적으로 $400 ^{\circ}C$로 성장한 InAlAs 에피층의 특성이 가장 우수하였다.