• Journal of the Institute of Electronics Engineers of Korea TC
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• v.37 no.6
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• pp.388-388
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• 2000

A design method for a multisection impedance transforming branch-line hybrid using a genetic algorithm suitable for MMIC applications is proposed. In contrast to the previous design methods, an asymmetric structure is introduced to optimize the hybrid. Optimization is performed within the impedance range to achieve the realizable hybrids with a microstrip line in a desired frequency range. This design method is applicable to the hybrid which has the arbitrary power division ratio, impedance transforming ratio, isolation, directivity and bandwidth. The hybrid designed by the proposed method has 3∼10％ more bandwidth than the previous results.

• Journal of the Institute of Electronics Engineers of Korea TC
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• v.37 no.6
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• pp.28-35
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• 2000

A design method for a multisection impedance transforming branch-line hybrid using a genetic algorithm suitable for MMIC applications is proposed. In contrast to the previous design methods, an asymmetric structure is introduced to optimize the hybrid. Optimization is performed within the impedance range to achieve the realizable hybrids with a microstrip line in a desired frequency range. This design method is applicable to the hybrid which has the arbitrary power division ratio, impedance transforming ratio, isolation, directivity and bandwidth. The hybrid designed by the proposed method has 3∼10％ more bandwidth than the previous results.

• The Journal of Korean Institute of Electromagnetic Engineering and Science
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• v.22 no.2
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• pp.245-251
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• 2011

In this paper, dual-band bandpass filter by using Pseudo-Interdigital Stepped-Impedance Resonator(PI-SIR) and Open-Loop Ring Resonator(OLRR) is proposed. The first passband and second passband are formed by PI-SIR and the second passband is reinforced by an OLRR. In a PI-SIR the first band and second band are easily and exactly adjusted by characteristic impedance ratio and electrical length ratio. The proposed design method may be confirmed to be useful from fabricated and measured results for dual-band bandpass filter operated at 2.45 GHz and 5.8 GHz.

• Proceedings of the Korean Institute of IIIuminating and Electrical Installation Engineers Conference
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• 2009.10a
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• pp.47-50
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• 2009

When the lightning currents flow through the ground electrode, the grounding system should be evaluated by the grounding impedance rather than the ground resistance because a grounding system shows the transient impedance characteristic by the inductance of the ground electrode and the capacitance of the soil. The ratio of the peak values of electric potential and currents is the conventional impedance that shows the transient characteristic about impulse currents of the grounding system in a roundabout way. The grounding system having low conventional impedance is a fine grounding system with low electric potential when the lightning currents flow. In this paper the conventional impedance of the counterpoise is calculated by using the distributed parameter circuit model and embodied the distributed parameter circuit model by using the EMTP program The adequacy of the distributed parameter model is examined by comparing the simulated and the measured results. The conventional impedance of the counterpoise is analyzed for first short stroke and subsequent short stroke currents.

• Proceedings of the Korean Vacuum Society Conference
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• 2011.02a
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• pp.32-32
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• 2011

Plasma etching is used in microelectronic processing for patterning of micro- and nano-scale devices. Commonly, optical emission spectroscopy (OES) is widely used for real-time endpoint detection for plasma etching. However, if the viewport for optical-emission monitoring becomes blurred by polymer film due to prolonged use of the etching system, optical-emission monitoring becomes impossible. In addition, when the exposed area ratio on the wafer is small, changes in the optical emission are so slight that it is almost impossible to detect the endpoint of etching. For this reason, as a simple method of detecting variations in plasma without contamination of the reaction chamber at low cost, a method of measuring plasma impedance is being examined. The object in this research is to investigate the suitability of using plasma impedance monitoring (PIM) with statistical approach for real-time endpoint detection of $SiO_2$ etching. The endpoint was determined by impedance signal variation from I-V monitor (VI probe). However, the signal variation at the endpoint is too weak to determine endpoint when $SiO_2$ film on Si wafer is etched by fluorocarbon plasma on inductive coupled plasma (ICP) etcher. Therefore, modified principal component analysis (mPCA) is applied to them for increasing sensitivity. For verifying this method, detected endpoint from impedance analysis is compared with optical emission spectroscopy (OES). From impedance data, we tried to analyze physical properties of plasma, and real-time endpoint detection can be achieved.

• The Transactions of The Korean Institute of Electrical Engineers
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• v.58 no.9
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• pp.1778-1783
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• 2009

Ground impedance for the large grounding system is measured according to the IEEE Standard 81.2 which is based on the revised fall-of-potential method of installing auxiliary electrode at a right angle. When the auxiliary electrodes are located at an angle of $90^{\circ}$, the ground impedance inevitably includes the error due to earth mutual resistance. In this paper, in order to accurately measure the ground impedance of vertically-driven ground electrodes, error rates due to earth mutual resistance are evaluated by ground resistance and ground impedance measuring devices and compared with calculated values. As a result, the measured results are in good agreement with the computed results considering soil layer with different resistivity. The error rates due to earth mutual resistance decrease with increasing the length of ground electrode in the case that the ratio of the distance between the ground rod to be measured and the auxiliary electrodes to the length of ground electrode(D/L) is same. The ground impedance should be measured at the minimum distance between the auxiliary electrodes that will have an estimated measurement accuracy due to earth mutual resistance.

• Journal of the Korea Institute of Information and Communication Engineering
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• v.16 no.4
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• pp.661-668
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• 2012

A coaxial-cable impedance transformer that can be used in high power and wideband frequency range is an arbitrary impedance transformation ratio by an additional coaxial cable. The coaxial-cable impedance transformer to be 50-${\Omega}$ to 25-${\Omega}$ impedance transformation ratio is easily operated an wideband power divider by connecting two 50-${\Omega}$ lines at 25-${\Omega}$ impedance point. This wideband power divider has a poor output matching characteristic and a poor isolation characteristic between two output ports. In this paper, it proposes a coaxial-cable power divider to be a good output matching and isolation characteristics as it uses the singly terminated filter design theory. The odd-mode operation characteristic of the suggested power divider to use singly terminated low pass filter coefficient due to matching order and ripple value is examined by ADS program. And, it fabricates and measures the operation characteristic of 2-way power divider with 2nd-order and 4th-order matching circuit.

• Journal of the Korean Magnetics Society
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• v.13 no.4
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• pp.160-164
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• 2003

The external magnetic field dependency of the impedance, resistance, and inductance of the meander pattern fabricated by using Co-base amorphous ribbon has been investigated in the frequency range of 300 ㎑∼1 ㎓. The amorphous ribbon was patterned to the meander pattern through conventional photolithography and wet etching process. The extremely high sensitivity in impedance changing ratio by external magnetic field was observed. This is due to the transverse magnetic anisotropy the pattern which was induced by magnetic field annealing. The impedance had peak value at the external field of -13 Oe and the impedance changing ratio 100 ${\times}$ (Z$\_$13/-Z$\_$0/)/Z$\_$0/) was about 210％ at the frequency of 50 MHz.

• Journal of Biomedical Engineering Research
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• v.26 no.4
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• pp.215-221
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• 2005

We describe the development of a prototype multi-channel electrical impedance tomography (EIT) system. The EIT system can be equipped with either a single-ended current source or a balanced current source. Each current source can inject current between any chosen pair of electrodes. In order to reduce the data acquisition time, we implemented multiple digital voltmeters simultaneously acquiring and demodulating voltage signals. Each voltmeter measures a differential voltage between a fixed pair of adjacent electrodes. All voltmeters are configured in a radially symmetric architecture to optimize the routing of wires and minimize cross-talks. To maximize the signal-to-noise ratio, we implemented techniques such as digital waveform generation, Howland current pump circuit with a generalized impedance converter, digital phase-sensitive demodulation, tri-axial cables with both grounded and driven shields, and others. The performance of the EIT system was evaluated in terms of common-mode rejection ratio, signal-to-noise ratio, and reciprocity error. Future design of a more innovative EIT system including battery operation, miniaturization, and wireless techniques is suggested.

• Journal of the Korean Vacuum Society
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• v.18 no.3
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• pp.176-185
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• 2009

The realization and the performance of ICP source are strongly affected by its electrical impedance and the electric/magnetic field distribution. The ICP source impedance is determined by the antenna impedance and the plasma one. It is preferred to keep the imaginary impedance between -100 ohm to 100 ohm, since it should be avoided the high voltage formation on the antenna and abrupt impedance variation during the thin film process. The plasma uniformity is affected by the electric and magnetic field which is formed by the antenna current and voltage. The influence of azimuthal symmetry are shown by the electromagnetic simulation and the measurement result of plasma density. The radial uniformity can be controlled by locating the concentric antennas which have different diameters. The power distribution ratio and its control method are presented in the case of parallel antenna connections.