• The Transactions of the Korean Institute of Electrical Engineers P
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• v.61 no.1
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• pp.55-58
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• 2012

By using EEG and HRV, subjects were estimated on their psychological and physiological reaction when reading psychrometric chart in 7 point century font, in an environmental test room in the condition of temperature 25[$^{\circ}C$], relative humidity 50[RH%], air current speed 0.02[m/sec], giving variation in illuminance to 0.1, 300, 600, 1000, 1300 and 1600[lux]. As a result, it was at 1300[lux] that absolute ${\alpha}$ wave, SMR, SDNN were most vitalized, and also both sides ${\alpha}$ wave asymmetry index, SEF50, HRT, stress and fatigue degree were at the lowest. It was found that a certain illuminance which minimizes psychological stress and fatigue degree while enhancing concentration and task achievement stably does exist.

• Journal of the Korean Institute of Intelligent Systems
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• v.24 no.4
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• pp.343-348
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• 2014

Face recognition system has advanctage to automatically recognize a person without causing repulsion at deteciton process. However, the face recognition system has a drawback to show lower perfomance according to illumination variation unlike the other biometric systems using fingerprint and iris. Therefore, this paper proposed a robust face recogntion method against illumination varition by slective fusion technique using both visible and infrared faces based on fuzzy linear disciment analysis(fuzzy-LDA). In the first step, both the visible image and infrared image are divided into four bands using wavelet transform. In the second step, Euclidean distance is calculated at each subband. In the third step, recognition rate is determined at each subband using the Euclidean distance calculated in the second step. And then, weights are determined by considering the recognition rate of each band. Finally, a fusion face recognition is performed and robust recognition results are obtained.

• Korean Journal of Optics and Photonics
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• v.12 no.3
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• pp.190-199
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• 2001

In this paper, we have researched the depth of focus (DOF) and cutoff intensity of the $0.1{\mu}m$rule dense line'||'&'||'space pattern according to the various off-axis illumination (OAl) conditions in the optical system of 0.65 NA using ArF excimer laser (193 nm). We have also studied the variation of the DOF and cutoff intensity according to the sub-resolution pattern (hammer head type) size for optical proximity correction (OPC) applied to the capacitor pattern and the various OAl conditions in the same optical system. As a result, it is revealed that the cross type quadrupole or annular illumination is preferred to the conventional X type quadrupole for printing the $0.1{\mu}m$ rule dense pattern. Also, we can investigate the optimal illumination condition and the size of ope sub-resolution pattern to keep a consistent DGF and cutoff intensity trends.

• Korean Journal of Optics and Photonics
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• v.15 no.1
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• pp.79-85
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• 2004

We report on a transmittance controlled photomask with phase patterns on the back quartz surface. Theoretical analysis for changes in illumination pupil shape with respect to the variation of size and density of backside phase patterns and experimental results for improvement of critical dimension uniformity on a wafer by using the transmittance controlled photomask are presented. As phase patterns for controlling transmittance of the photomask we used etched contact-hole type patterns with 180" rotative phase with respect to the unetched region. It is shown that pattern size on the backside of the photomask must be made as small as possible in order to keep the illumination pupil shape as close as possible to the original pupil shape and to achieve as large an illumination intensity drop as possible at a same pattern density. The distribution of illumination intensity drop suitable for correcting critical dimension error was realized by controlling pattern density of the contact-hole type phase patterns. We applied this transmittance controlled photomask to a critical layer of DRAM (Dynamic Random Access Memory) having a 140nm design rule and could achieve improvement of the critical dimension uniformity value from 24.0 nm to 10.7 nm in 3$\sigma$.TEX>.

• Transactions on Electrical and Electronic Materials
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• v.10 no.2
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• pp.53-57
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• 2009

In this paper we develop a method to observe faults in semiconductor devices and transmission lines by calculating the variation of the reflection function in a dielectric microstrip line that has an open-ended termination containing an optically induced plasma region. It is analyzed with the assumption that the plasma is distributed homogeneously in laser illumination. With the non linear material of degradation, the concentration of the carrier in the part of the material has changed. Since the input wave has produced the phenomenon of reflection, the input signal to the open-ended microstrip lines can be observed on reflection to identify the location of the fault. The characteristic impedances resulting from the presence of plasma are evaluated by the transmission line model. The variation of the reflection wave in the microwave system has been calculated by using an equivalent circuit model. The transient response has been also evaluated theoretically for changing the phase of the variation in the reflection. The variation of characteristic response in differentially localized has been also evaluated analytically.

• Journal of KIISE:Software and Applications
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• v.31 no.1
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• pp.54-60
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• 2004

Face recognition is one of the problems to be solved by appearance based matching technique. However, the appearance of face image is very sensitive to variation in illumination. One of the easiest ways for better performance is to collect more training samples acquired under variable lightings but it is not practical in real world. ]:n object recognition, it is desirable to focus on feature extraction or normalization technique rather than focus on classifier. This paper presents a simple approach to normalization of faces subject to directional illumination. This is one of the significant issues that cause error in the face recognition process. The proposed method, ICR(illumination Compensation based on Multiple Linear Regression), is to find the plane that best fits the intensity distribution of the face image using the multiple linear regression, then use this plane to normalize the face image. The advantages of our method are simple and practical. The planar approximation of a face image is mathematically defined by the simple linear model. We provide experimental results to demonstrate the performance of the proposed ICR method on public face databases and our database. The experimental results show a significant improvement of the recognition accuracy.

• Journal of The Korean Astronomical Society
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• v.34 no.1
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• pp.41-45
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• 2001

We tested the characteristics of the BOAO Medium Dispersion Spectrograph (MDS) such as the CCD capabilities, wavelength shift by gravity direction variation, slit illumination function and efficiency. Then we calculated the appropriate exposure time to obtain the given S/N ratio for several given magnitudes. Also the remaining problems to be improved were discussed.

• Proceedings of the IEEK Conference
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• 2002.07b
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• pp.991-994
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• 2002

Photon mapping is an efficient global illumination technique for realistic image synthesis that has been developed in computer graphics. In this paper, an adaptive photon mapping in the use of automatic differentiation is proposed. Since the automatic differentiation is used when photons emit from the light sources through the scene, we can check the variation of surrounding shape. Therefore, we can decrease the number of photons and generate an image in relatively low computational cost.

• Proceedings of the Optical Society of Korea Conference
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• 2004.02a
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• pp.18-19
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• 2004

• 전기의세계
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• v.17 no.2
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• pp.16-26
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• 1968

Cds is possible to add excess donors and to compensate partially using other group metals as acceptors. The impurities can ble incorporated either during crysta growth or by diffusion into a bulkcrystal. The addition of rimpurities leads also to the production of vacancies in a manner depending on the atmosphere surrounding the crystal during growth, during the diffusion process or using bulk. Cds of the mentioned above affects spectral sensitivity, speed of response, the variation on photocurrent, electron life time, and decay of photoconductivity with temperature and with intensity of illumination. In the work to be deseribed, these properties have been studied between liquid nitrogen and room temperature. In addition, the electron trap distribution has been correlated with speed of response, variation of photocurrent with temperature in various atmosphere. Four major trapping levels have been observed, and their identification with impurity and vacancy levels is discussed. And also the effects of lattice imperfections on the photoconductive properties CdS were investigated in detail.