• 공업화학
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• 제30권1호
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• pp.68-73
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• 2019

실리카 표면의 개질을 위하여 다양한 조건 하에서 tetraethyl orthosilicate (TEOS)로부터 졸-겔 공법으로 제조한 실리카 졸에 실란 커플링제인 octyltrimethoxysilane (OTMS) 또는 hexadecyltrimethoxysilane (HDTMS)을 반응시켰다. 얻어진 반응물들의 SEM-EDS, 열분석 및 원소분석을 통하여 실리카의 표면이 유기물로 개질된 것을 확인할 수 있었다. 유기용매에서의 분산성 및 에폭시 수지와 복합화한 필름의 표면 조도 등을 평가한 결과, 에탄올을 용매로 사용하여 $50^{\circ}C$에서 TEOS를 24 h 가수분해하고, OTMS를 2 h 반응시킨 물질이 최적으로 나타났다. 이와 같은 표면 개질 실리카를 포함하는 복합체 필름의 산소 투과도를 측정한 결과, 개질 실리카를 포함하지 않는 필름에 비하여 산소 투과도가 12% 저하된 것을 확인할 수 있었다.

• 마이크로전자및패키징학회지
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• 제8권2호
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• pp.31-36
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• 2001

Plasma Polymerization를 이용하여 Teflon-like 불화 유기 박막을 Si, $SiO_2$, Al, TEOS 위에 증착하였다. Difluoromethane $(CH_2F_2$)에 Ar, $O_2$, 그리고 $CH_4$를 첨가하여 첨가 가스에 따른 불화 유기 박막의 특성을 평가하였다. 각각의 첨가가스에 대하여 압력, 온도, 그리고 첨가가스의 비율을 변화시켜 박막을 증착하여 정접촉각 통한 표면의 친수성 (hydrophilicity)과 소수성(hydrophobicity) 정도를 관찰하였다. Ar을 첨가한 경우 Ar 첨가량과 power의 증가에 따라 정접촉각의 감소를 관찰하였다. 그러나 증착압력이 증가함에 따라 정접촉각이 증가하였다. Ar 첨가시 2 Torr이상의 증착압력에서 분말형태의 초소수성 불화 유기박막을 얻을 수 있었다. $O_2$를 첨가한 경우, $O_2$의 첨가량과 증착압력이 증가함에 따라 정접촉각은 감소하였다. 약 100W까지의 power에서는 정접촉각은 일정하였지만 power의 증가에 따라 정접촉각은 감소하여 200W에서는 천수성표면을 얻을 수 있었다. $CH_4$를 첨가하여 불화유기박막을 증착하였을 경우 $CH_4/CH_2F_2$비율이 5까지 급격한 증가를 나타내었고, 비율이 5이상인 경우에서는 일정한 정접촉각을 나타내었다. 화학기상증착에 의해 제조된 박막보다 plasma polymerization으로 제작된 불화유기박막이 히스테리시스(hysteresis)가 낮은 불화유기박막을 형성하였다.

• 공업화학
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• 제21권3호
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• pp.317-322
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• 2010

본 연구에서는 폴리메틸메타아크릴에이트(polymethylmethacrylate : PMMA) 표면을 친수성으로 개질하기 위하여 불소와 산소의 혼합비율을 변수로 하여 함산소불소화를 실시하였다. 함산소불소화 처리 된 PMMA 표면 및 광투과 특성을 접촉각, 표면자유에너지. X-ray 광전자 분광기(XPS), UV-Vis 분광기를 통하여 분석하였다. 함산소불소화 처리된 PMMA의 표면은 친수화 되어 물 접촉각이 $69^{\circ}$에서 $44^{\circ}$로 감소하였다. 또한 PMMA의 표면자유에너지가 $46\;mN\;m^{-1}$ 에서 $58\;mN\;m^{-1}$로 증가하였다. 이는 함산소불소화를 통한 PMMA표면에 친수성 관능기의 형성으로 기인하였다. 또한, XPS 분석 결과로부터 함산소불소화 처리 시 PMMA 표면에 O/C비율이 증가하였고, 불소 부분압이 증가할수록 친수성을 나타내는 C-OH 결합의 �t량이 6.7%에서 24.8%로 증가하는 것을 알 수 있었다. 본 함산소불소화 조건(상온, 총압 1 bar, 불소 및 산소 혼합비 5 : 5)에서는 함산소불소화가 PMMA의 광투과 특성에 영향을 주지 않으면서도 그 표면특성이 개선됨을 관찰할 수 있었다. 이 결과로부터 함산소불소화는 PMMA 표면을 친수성으로 개질하는데 효과적인 방법으로 기대된다.

• Journal of Korean Vacuum Science & Technology
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• 제6권2호
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• pp.105-107
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• 2002

a-C:H films were coated on windows of mobile telephone by RF plasma chemical vapor deposition equipment made in our company. Thickness of the coatings is about 0.7 micrometers and they have high hardness, low friction coefficient, good adhesion, high optical transparency and chemical inertness. Knoop hardness of the diamond-like carbon films on glass substrate is 2328 kg/mm$^2$. The adherence between films and substrate is good and shows to be 69 N by scratching test. The optical performance is improved obviously owing to coat the film on it. The index of the coated windows is 2.5, transmission of visible light is larger than 90%, and transmission of ultraviolet light decreases by 30% and the ultraviolet light can be obstructed obviously. The coated glass also has self-clean effect and decontamination ability. The films have hydrophobic character and the soakage angle of water drop is larger than 90 degrees. The windows have fog-proof ability owing to eliminate the capillary phenomena in the inner surface. The physics and chemical properties of the coated windows are steady. Study indicates that the performance of a-C:H coated mobile phone windows are improved notably on wear-resistance, corrosion-proof and optical properties and it is excellent mobile windows protective coatings.

• Membrane and Water Treatment
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• 제2권3호
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• pp.137-145
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• 2011

Membrane processes are major breakthrough for the removal of organic pollutants in water remediation. The separations of solutes depend on nature of the membranes and solutes. The separation performance depends on the nature of the solutes (i.e., molecular volume, polarity, and hydrophobicity) for the same membrane. As 4-chlorophenol is of more dipolemoment compared to 2-chlorophenol, the orientation of the molecule enables it pass through the pores of the membrane, which is of negatively charged and thus separation order follows: 2-chlorophenol > 4-chlorophenol. Hydrophobicity factor also supports the order. Addition of sodium dodecyl sulfate (SDS) to chlorophenol solution shows remarkable increase in separation performance of the membrane. The improvement in separation is 1.8 and 1.5 times for 4- and 2- chlorophenol consecutively in case of 0.0082 M SDS (1cmc = 0.0082 M) in the solution. 4-chlorophenol has better attachment tendency with SDS because of its relatively more hydrophobic nature and thus reflects in performance i.e. the separation performance of 4-chlorophenol with SDS through the membrane is better compared to 2-chlorophenol.

• 산업기술연구
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• 제22권A호
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• pp.193-200
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• 2002

Drying shrinkage cracking which may be caused by the relatively large specific surface IS a matter of grave concern for latex modified concrete(LMC) overlay and rapid-setting cement latex modified concrete(RSLMC) overlay. LMC and RSLMC were studied for field applications very actively in terms of strength and durability in Korea. However, there were no considerations in drying shrinkage. Therefore, the purpose of this dissertation was to study the drying shrinkage properties of LMC and RSLMC with the main experimental variables such as cement types(ordinary portland cement, rapid setting cement), water-cement ratios and curing days at a same controlled environment of 60% of relative humidity and $20^{\circ}C$ of temperature The drying shrinkage for specimens was measured with a digital dial gauge of Demec. The test results showed that the drying shrinkage of LMC and RSLMC were considerably lower with low water-cement ratio, respectively This might be attributed to the interlocking of hydrated cement and aggregates by a film of latex particles, water retention due to hydrophobic, and colloidal properties of the latexes resulting in reduced water evaporation.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2009년도 하계학술대회 논문집
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• pp.88-89
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• 2009

In this paper, we investigated about wet cleaning effect as deep trench formation methods for Power chip devices. Deep trench structure was classified by two methods, PSU (Poly Stick Up) and Non-PSU structure. In this paper, we could remove residue defect during wet. cleaning after deep trench etch process for non-PSU structure device as to change wet cleaning process condition. V-SEM result showed void image at the trench bottom site due to residue defect and residue component was oxide by EDS analysis. In order to find the reason of happening residue defect, we experimented about various process conditions. So, defect source was that oxide film was re-deposited at trench bottom by changed to hydrophobic property at substrate during hard mask removal process. Therefore, in order to removal residue defect, we added in-situ SCI during hard mask removal process, and defect was removed perfectly. And WLR (Wafer Level Reliability) test result was no difference between normal and optimized process condition.

• 한국윤활학회:학술대회논문집
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• 한국윤활학회 2002년도 제35회 춘계학술대회
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• pp.25-33
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• 2002

Effect of surface topography on the water wetting nature and micro/nano tribological characteristics of Si-wafer and PTFE was experimentally studied. The ion beam treatment was performed with a hollow cathode ion gun in different argon don dose conditions in a vacuum chamber to change the surface topography, Micro/nano tribological characteristics, water wetting angles and roughness were measured with a micro tribo tester, SPM (scanning prove microscope), contact anglemeter and profilometer, respectively. Results showed that surface roughness increased with the argon ion dose. The water wetting angle of tile ion beam treated samples also increased with the ion dose. Results also showed that micro-adhesion and micro-friction depend on the wetting characteristics of the PTFE samples. However, nano-triboloSical characteristics showed little dependence on the wetting angles. The water wetting characteristics of modified PTFE samples were discussed in terms of the surface topographic characteristics.

• 한국염색가공학회지
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• 제30권2호
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• pp.90-97
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• 2018

Hydrophilic reactive hot-melt polyurethane adhesive(HRHA) using a hydrophilic polyol having different molecular weight and NCO index was synthesized. This HRHA was synthesized using Polyethylene glycol(PEG) as a hydrophilic polyol, Polypropylene glycol(PPG) and Polycaprolactone diol(PCL) as hydrophobic polyols, and Methylene diphenyl diisocyanate(MDI) as an isocyanate. The changes in IR spectrum, viscosity and thermal properties of HRHA with different PEG molecular weights and NCO index were investigated, and the tensile strength and elongation of the HRHA casting film and the peel strength, moisture permeability and water pressure of the HRHA coated fabric were confirmed. In this experiment, as the molecular weight of PEG and NCO index increased, the adhesive strength, tensile strength, elongation and moisture permeability was increased but viscosity and Tg was decreased.

• The Plant Pathology Journal
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• 제16권1호
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• pp.19-24
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• 2000

The direct effects of acute $\textrm{O}_3$ on the growth, sporulation and infection of Pyricularia grisea, rece blast pathogen, were investigated to understand the interactions between ozone and the pathogen. Acute exposure of 200 nl $\textrm{l}^{-1}$ ozone for 8 h significantly reduced conidia germination on water atar. Ozone exposure of 200 nl $\textrm{l}^{-1}$ for 8h per day for 5 days had no effect on increase in colony diameter, but severely damaged actively growing aerial mycelia. However, the damage to mycalia was recovered during the following 16 h exposure of unpolluted air. Conidial production was also stimulated by the acute ozone exposure for 5 days. The conidia exposed to the acute ozone for 5 days normally germinates but slightly reduce appressoria formation on rice leaf. However, the conidia produced by artificial stimulation under the same ozone concentration for 10 days showed significant reduction in appressorea for mation on a hydrophobic film. This study suggests that the acute ozone could ingibit appressoria formation as well as vegetative growth of the pathogen, resulting in decrease in rece blast development in the field during summer when high ozone episodes could occur occasionally.