• Title/Summary/Keyword: Hydrofluoric acid (HF)

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Fabrication and Characteristics of Porous Silicon (다공성 실리콘의 제조 및 특성에 관한 연구)

  • 이철환;조원일;백지흠;박성용;안춘호;유종훈;조병원;윤경석
    • Journal of the Korean institute of surface engineering
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    • v.28 no.3
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    • pp.182-191
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    • 1995
  • A highly porous silicon layer was fabricated by anodizing single crystalline silicon in a dilute solution of hydrofluoric acid. The color of the porous silicon changed from red and blue to yellow gold during the anodizing process. The current-voltage (I-V) curve of the anodizing process showed a typical Schottky diode rectification form. The cell voltage decreased with the increase of HF concentration in the solution at high current range. However, the voltage was independent on HF concentration in the solution at low current range. The pore size was dependant on anodizing condition (HF concentration, current and anodizing time). The pore size and wall width of porous silicon layer were 4~6 and 1~3 nm, respectively. Surface of the porous silicon was covered with silicon compound ($SiH_x$etc.) according to IR spectrum analysis. The peak wavelength and width of photoluminescence (PL) spectrum of porous silicon were 650~850 nm (1.5~1.9 eV) and 250 nm, respectively. The photoluminescence intensity and peak wavelength, and porosity of porous silicon increased with increasing anodizing current and decreased with increasing HF concentration in the anodizing solution.

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Optimum formation method of curved core cross section of silica fiber (실리카 광섬유 코어의 곡률단면 형성 최적화 방법)

  • Kim, Se-Min;Kim, Seung-Hwan;Lee, Seung-Hun;Hwang, Seok-Hyeon;Kim, Mi-Gyeong;HwangBo, Chang-Gwon;Kim, Gyeong-Heon
    • Proceedings of the Optical Society of Korea Conference
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    • 2009.10a
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    • pp.288-289
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    • 2009
  • We report an optimum fabrication condition for formation of concave lens shaped core cross-section of silica single-mode fibers with hydrofluoric (HF) acid solutions and arc discharge. A desired depth of curved cross-section of the silica fiber core and its surface smoothness were obtained with optimized concentration of the HF solution, etching time, and arc discharge condition.

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Removal Characteristics of Gaseous Contaminants by a Wet Scrubber with Different Packing Materials (충진제의 종류에 따른 습식 스크러버의 가스상 물질 제거특성)

  • Han, Bang-Woo;Kim, Hak-Joon;Kim, Yong-Jin;Han, Kyeong-Soo
    • Journal of Korean Society for Atmospheric Environment
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    • v.23 no.6
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    • pp.744-751
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    • 2007
  • Wet scrubber is widely used to remove toxic gaseous contaminants in various industries such as semi-conductor industry, display manufacturing industry and so on. In this study, to optimize a packed bed scrubber as one of typical wet scrubber size while keeping its performance, four different packing materials were investigated at different air flow rates, liquid-gas ratios and pH values. Ammonia, hydrochloric acid and hydrofluoric acid were used as test gases to characterize the scrubber performance. Gas removal efficiency increased as the packing size decreased, which resulted in the increase of specific surface area. The increase of air flow rate led to the decrease of gas removal efficiency, while the increase of liquid-gas ratio led to the increase of gas removal efficiency. For the case of $NH_3$ gas, lower pH, and for the cases of HCl and HF, higher pH contributed to higher gas removal efficiency. Gas removal efficiency of a wet scrubber increased in the order of HCl < $NH_3$ < HF according to its water solubility.

Development of sacrificial layer wet etch process of TiNi for nano-electro-mechanical device application

  • Park, Byung Kyu;Choi, Woo Young;Cho, Eou Sik;Cho, Il Hwan
    • JSTS:Journal of Semiconductor Technology and Science
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    • v.13 no.4
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    • pp.410-414
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    • 2013
  • We report the wet etching of titanium nickel (TiNi) films for the production of nano-electro-mechanical (NEM) device. $SiO_2$ and $Si_3N_4$ have been selected as sacrificial layers of TiNi metal and etched with polyethylene glycol and hydrofluoric acid (HF) mixed solution. Volume percentage of HF are varied from 10% to 35% and the etch rate of the $SiO_2$, $Si_3N_4$ and TiNi are reported here. Within the various experiment results, 15% HF mixed polyethylene glycol solution show highest etch ratio between sacrificial layer and TiNi metal. Especially $Si_3N_4$ films shows high etch ratio with TiNi films. Wet etching results are measured with SEM inspection. Therefore, this experiment provides a novel method for TiNi in the nano-electro-mechanical device.

Ion-Pair Extraction of Boron Complex Anions (Ⅱ). Effect of Fluoride and Bifluoride Ions (붕소 착물 음이온의 이온쌍 추출 (제2보). $F^-$$HF_2^-$-이온의 영향)

  • Hyung-Soo Song;Hai-Dong Kim;Kim Kang-Jin
    • Journal of the Korean Chemical Society
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    • v.27 no.6
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    • pp.411-418
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    • 1983
  • The effects of existing anions in hydrofluoric acid solutions, $F^-$ and $HF_2$on the extraction of methylene blue-$BF_4^-$ ion-pair into 1,2-dichloroethane have been investigated by spectrophotometry. The absorbance of the extracted ion-pair is found to be independent of $F^-$ion up to $10^{-2}$ molar concentration, which implies that $F^-$ion dose not directly interfere with the extraction. However, $HF_2^-$ ion competes with $BF_4^-$ion for methylene blue and the extraction constant for methylene blue-H$F_2$ion-pair is calculated to be 8.5 at $25^{\circ}C$.

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Effect of Pre-treatments on the Content of Heavy Metals in Packaging Paper

  • Jo, Byoung-Muk;Jeong, Myung-Joon
    • Proceedings of the Korea Technical Association of the Pulp and Paper Industry Conference
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    • 2006.06b
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    • pp.465-469
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    • 2006
  • Pre-treatment methods to determine various heavy metal contents in packaging papers were investigated by ICP-ES (Inductively Coupled Plasma Emission Spectrometry) analysis. Pre-treatment methods utilized in this study include dry ashing and decomposition methods ($HNO_{3-}HClO_{4-}HF,\;HNO_{3},\;and\;H_{2}SO_{4-}HNO_{3}$). They were compared with the conventional extraction (water) and migration (3% acetic acid) methods. The five representative heavy metals (Cd, As, Pb, Cr and Hg) were analyzed. For Cd, Hg, and As, the results were below detection limit of the instrument. In case of Cr and Pb, the migration test is considered to be a better method compared to the extraction test, but all pretreated methods showed much higher detection efficiency than the extraction or migration test. However, the detection ratio between the migration test and decomposition methods was different. Among all decomposition methods, the nitric acid - perchloric acid - hydrofluoric acid treatment brought a slightly higher detection value than others, but there was no significant difference among them except sulfuric acid - nitric acid method. Concerning Pb, the sulfuric acid - nitric acid method showed a low detection efficiency compared to other decomposition methods. The sulfuric acid - nitric acid method is, thus, not considered to be a suitable analysis method for Pb in packaging papers.

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Effect of Fluorination of Carbon Nanotubes on Physico-chemical and EMI Shielding Properties of Polymer Composites (고분자 복합재의 물리화학적 및 전자파차폐 특성에 미치는 탄소나노튜브의 불소화 영향)

  • Lee, Si-Eun;Kim, Doyoung;Lee, Man Young;Lee, Min-Kyung;Jeong, Euigyung;Lee, Young-Seak
    • Polymer(Korea)
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    • v.39 no.1
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    • pp.114-121
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    • 2015
  • Mutli-walled carbon nanotubes (MWCNTs) were surface-modified by a hydrofluoric acid solution to remove impurities and improve interfacial bonding and dispersion of nanotubes in an epoxy matrix. The crystallinity on the surface of treated MWCNTs was investigated by X-ray photoelectron spectroscopy and Raman spectroscopy. The mechanical properties were characterized by tensile test, and the enhancement of mechanical properties of the modified MWCNTs/epoxy composites was indicated by a 33% increase in tensile strength. The electromagnetic interference shielding effectiveness (EMI-SE) of modified MWCNTs/epoxy composites was improved with an increase in concentration of hydrofluoric solution, and EMI-SE showed the maximum increase with 25% HF. However, mechanical and EMI-SE properties didn't show further increase with over 50% HF concentration because the properties of MWCNTs were influenced by degradation of crystallinity and intrinsic properties of MWCNTs. The mechanical and electrical property enhancements of the polymer composites are attributed to the modification of MWCNTs which improve crystallinity of MWCNTs and dispersion in the epoxy resin.

Investigation of Isotropic Etching of Multicrystalline Silicon Wafers with Acid solution (Acid solution을 이용한 다결정 실리콘 기판의 등방성 에칭에 관한 연구)

  • Kim, Ji-Sun;Kim, Bum-Ho;Lee, Soo-Hong
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2007.11a
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    • pp.70-71
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    • 2007
  • Multicrystalline silicon(mc-Si) solar cells are steadily increasing their share of the PV market due to the lower material costs. However, commercial mc-Si solar cells have lower efficiency than singlecrystalline silicon solar cells. To improve efficiency of mc-Si solar cells, it is important to reduce optical losses from front surface reflection. Isotropic etching with acid solution based on hydrofluoric acid(HF) and nitric acid$(HNO_3)$ is one of the promising methods that can reduce surface reflectance for mc-Si solar cells. Anisotropic etching is not suitable for mc-Si because of its various grain orientations. In this paper, we isotropically etched mc-Si using acid solution. After that, etched surface was observed by Scanning Electron Microscope(SEM) and surface reflectance was measured. We obtained 29.29% surface reflectance by isotropic etching with acid solution in wavelength from 400nm to 1000nm for fabrication of mc-Si solar cells.

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Quantitative Analysis of Heavy Metals in Packaging Papers

  • Jo, Byoung-Muk;Jeong, Myung-Joon
    • Journal of Korea Technical Association of The Pulp and Paper Industry
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    • v.39 no.5
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    • pp.45-51
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    • 2007
  • This study was carried out to investigate various heavy metal contents in packaging papers by pre-treatments for ICP-ES (Inductively Coupled Plasma Emission Spectrometry) analysis. Pre-treatment methods of heavy metals in this study include extraction, migration and decomposition methods (dry ashing, $HNO_3-HClO_4-HF,\;HNO_3,\;and\;H_2SO_4-HNO_3$). Test results were compared with conventional extraction (water) and migration (3% acetic acid) methods. The five representative heavy metals (Cd, As, Pb, Cr and Hg) were analyzed. For Cd, Hg, and As, the results were below detection limit of the instrumental technique. It was considered that the migration test was a better method compared to extraction test, but all the decomposition methods showed much higher detection values than the extraction or migration test. In case of recycled corrugated containers, 3% acetic acid solution extracted about 25% of chromium and 30% of lead compared to the content by decomposition methods. Among all decomposition methods, the nitric acid - perchloric acid - hydrofluoric acid treatment brought a slightly higher detection value than others, but there was no significant difference among them except sulfuric acid - nitric acid method.

Study on recovery of $Na_{2}SiF_6$ and acetic acid from waste acid produced during semiconductor wafer process (반도체 웨이퍼 제조공정(製造工程) 중 발생불산(發生廢酸)으로부터 $Na_{2}SiF_6$ 및 초산의 회수(回收)에 관한 연구(硏究))

  • Kim, Hyun-Sang;Kim, Ju-Yup;Lee, Hyang-Sook;Shin, Chang-Hoon;Kim, Jun-Young;Bae, Woo-Keun;Ahn, Jong-Kwan
    • Resources Recycling
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    • v.17 no.5
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    • pp.3-10
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    • 2008
  • We researched recycle of mixed waste acids including HF, $CH_{3}COOH$, $HNO_3$ produced during semiconductor wafer process. At first, we recovered HF in form of $Na_{2}SiF_6$ by precipitation using $NaNO_3$ and $Na_{2}SiO_3$. Concentration of HF was made down from 110 g/L, initial concectration, to 0.5 g/L and Recovery rate of HF was 99.5%. After recovery of HF, concentration of $HNO_3$ and $CH_{3}COOH$ is 498 g/L, 265 g/L respectively. From that mixed acid, we recovered $CH_{3}COOH$ using 2 stages of fractional distillation. In first stage, $CH_{3}COOH$ was distilled for separation from $HNO_3$. And in second stage, we recoverd refined $CH_{3}COOH$ by using fractional distillation for removing a little amount of $HNO_3$ in $CH_{3}COOH$ vapor. The concentration of recovered $CH_{3}COOH$ in second stage is 20% and finally recovery rate of $CH_{3}COOH$ is about 87.5%.